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Secondary Electron Yield for SRF Materials Sarah Aull
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Sarah aull secondary electron yield of srf materials

Aug 05, 2015

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Page 1: Sarah aull   secondary electron yield of srf materials

Secondary Electron Yield for SRF Materials

Sarah Aull

Page 2: Sarah aull   secondary electron yield of srf materials

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Looking back to the SRF13

• 500 nm MgB2 on a Nb substrate (deposited by Chris Yung at STI)

• Strong multipacting on 1st RF test• After new rinsing: even stronger

multipacting + „burn marks“ in high E field regions

• XPS measurements show only 70% MgB2

Cause for multipacting?

Emax

Page 3: Sarah aull   secondary electron yield of srf materials

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Secondary Electron Yield (SEY)

• Primary electron travels through the material, creating secondaries

• Most secondaries are produced at the end of the primary path

• Penetration depth primary energy• Probability of emission decreases

exponentially with depth XS

• : Few secondaries, but easy emission• : Many secondaries, but low emission

Page 4: Sarah aull   secondary electron yield of srf materials

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• SEY is closely connected to the electrical conductivity• Metals:

• internal secondaries scatter mainly with free electrons• Vacuum barrier is in the order of 10 eV• low SEY: 0.5 (Li) – 1.8 (Pt); SEY(Nb) = 1.3

• Insulators:• Internal secondaries scatter with phonons and defects• Vacuum barrier is in the order of 1 eV• High SEY: 4 – 15 (MgO)

• The SEY of alloys ranges usually between 1.5 and 3

Literature values usually refer to pure material, not the technical surfaces!

SEY of (non) conductors

Page 5: Sarah aull   secondary electron yield of srf materials

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• If the primary electron arrives in a grazing angle, secondaries are more likely emitted ( higher SEY)

• If the surface is rough, emitted secondaries can be reabsorbed ( lower SEY)

• Oxides and contamination on the surface might influence the SEY significantly• Contamination: hydrocarbons, condensed water and gases

(especially on a cryogenic surface), foreign material

Influence of the Surface

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SEY setup at CERN

• SEY measurement• under UHV• at room temperature• with normal angle

• Sample can be transferred to the XPS setup under vacuum so that the surface condition is not altered.

Page 7: Sarah aull   secondary electron yield of srf materials

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• The XPS setup includes a sputter ion gun (Argon)• XPS measurements were performed with every SEY measurement

(before and after sputtering) to estimate the cleanliness of the surface

• Sputtering removes contaminants but also changes the chemical composition of the surface!

• Few nm were sputtered off for removal of the carbon peak

XPS & Sputtering

Nb

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• Gases will condense on the cold surface• RF conditioning will not remove nm of material, but

helium processing might• Angular dependence might play an important role• It is unknown if the SEY changes below Tc

The SEY data before and after sputtering serves as a bad case and good case scenario!

From SEY data to multipacting in a cavity

Page 9: Sarah aull   secondary electron yield of srf materials

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SEY of technical bulk Nb

• Both samples cut from same Nb sheet.• Carbon and oxides have strong impact on the SEY.

C Nb O Rest0

10

20

30

40

50

60

47

5

38

10

23

7

57

13

32

18

45

55

4743

4

BCP BCP degreased EP degreased EP sputtered

Atom

ic C

ompo

sition

[%]

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NbTiN

• Kindly prepared by A-M Valente-Feliciano, JLab• NbTiN on Nb via HIPIMS

C 1s N 1s Na 1s Nb 3d5 O 1s Ti 2p30

10

20

30

40

50

33

9

2

11

41

35

35

0

29

23

9

before sputteringafter sputtering

Atom

ic C

ompo

sition

[%]

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Nb3Sn

• Kindly prepared by Sam Posen, Cornell• Nb3Sn on Nb via reactive evaporation

• Nb3Sn cavity did not reach multipacting band yet

C 1s O 1s Nb 3d5 Cu 2p Sn 3d50

10

20

30

40

50

60

26

48

8

2

15

5

55

26

1

13

before sputteringafter sputtering

Atom

ic C

ompo

sition

[%]

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MgB2

• Kindly provided by X.X. Xi, Temple University• No sputtering to avoid further oxidation• Formation of MgO will increase the SEY.

B 1s C 1s Cl 2p3 F 1s Mg 2s O 1s0

10

20

30

40

50

1821

1 1

16

43

17

25

20

15

411018c1018d

Atom

ic C

ompo

sition

[%]

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Conclusion

• The SEY of technical surfaces need to be considered for SRF applications.

• SEY of NbTiN & Nb3Sn comparable to Nb (after sputtering).

• Validation through RF tests is however needed.

• MgB2 needs a non-dissipating passivation with low SEY.

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Acknowledgements

• Thank you for providing and preparing samples:• MgB2 for the QPR: Chris Yung, STI

• MgB2 for SEY: Xiaoxing Xi, Temple University• NbTiN; Anne-Marie Valente-Feliciano, Jefferson Lab• Nb3Sn: Sam Posen, Cornell• Nb: Nuria Valverde Alonso, CERN• BCP/EP: Serge Forel & Leonel Ferreira, CERN

• Mauro Taborelli for access to the SEY setup• Mounir Mensi and Holger Neupert for performing the

measurements with me (and answering all my questions).