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Documents Exciton formation in graphene bilayer PHYSICAL REVIEW B 78, 045401 (2008) Raoul Dillenschneider, and...

Slide 1Exciton formation in graphene bilayer PHYSICAL REVIEW B 78, 045401 (2008) Raoul Dillenschneider, and Jung Hoon Han Presented by Wan-Ju Li 02/25/2009 PHYSICAL REVIEW…

Documents Nanoparticles for Nanomedicine Neil S. Forbes Nanotechnology Institute University of Massachusetts,....

Slide 1Nanoparticles for Nanomedicine Neil S. Forbes Nanotechnology Institute University of Massachusetts, Amherst July 24, 2009 University of Massachusetts Chemical Engineering…

Documents 1 Vacuum Pumping Via Titanium- Zirconium-Vanadium Thin Films Yulin Li Laboratory for...

Slide 11 Vacuum Pumping Via Titanium- Zirconium-Vanadium Thin Films Yulin Li Laboratory for Elementary-Particles Physics, Cornell University, Ithaca, NY 14853, USA NEG Thin…

Documents NIST Synchrotron Measurement Science Vision at NSLS Establish structure function relationships for.....

Slide 1NIST Synchrotron Measurement Science Vision at NSLS Establish structure function relationships for rational materials design to promote innovation and industrial competitiveness…

Documents University of Illinois Non-linear Electrodynamic Response of Dielectric Materials microwave...

Slide 1 University of Illinois Non-linear Electrodynamic Response of Dielectric Materials microwave applications (radar, etc) phase shifters tuned filters voltage controlled…

Documents Microscopy Compound Light Microscope – Objective lens = real image –Eye piece = virtual image...

Slide 1 Slide 2 Microscopy Compound Light Microscope – Objective lens = real image –Eye piece = virtual image –Magnification –Condenser lens and iris diaphragm –Other…

Documents CELL CULTURE AND DIAGNOSTIC VIROLOGY. Since the discovery by Enders (1949) that polioviruses could.....

Slide 1 CELL CULTURE AND DIAGNOSTIC VIROLOGY Slide 2 Since the discovery by Enders (1949) that polioviruses could be cultured tissue, cell culture has become a very useful…

Documents Wafer processing - I Clean room environment Semiconductor clean room: - controlled temperature...

Slide 1 Wafer processing - I Clean room environment Semiconductor clean room: - controlled temperature (20ºC), air pressure, humidity (30%) - controlled airbone particulates…