1. Intel Demonstrates High-k + Metal Gate Transistor Breakthroughon 45 nm MicroprocessorsMark BohrKaizad Mistry Steve Smith Intel Senior Fellow 45 nm Program ManagerVice…

Slide 1ITRS MOSFET Scaling Trends, Challenges, and Key Technology Innovations Workshop on Frontiers of Extreme Computing Santa Cruz, CA October 24, 2005 Peter M. Zeitzoff…

Slide 1 High-K Dielectrics The Future of Silicon Transistors Matthew Yang EECS 277A Professor Nelson Slide 2 Outline Introduction Problem with SiO 2 Solution: High-K Dielectric…

Volume 12 Issue 01 Published, February 21, 2008 ISSN 1535-864X DOI: 10.1535/itj.1201 Intel’s 45nm CMOS Technology Intel® Technology Journal More information, including…

Introduction to CMOS Process Integration OVERVIEW: PRODUCT CATEGORY Source: IDC 31 21 18 16 9 = 100 Discrete Analog Logic Memory MPU • Design dominated by leading design…

An efficient, mixed semiclassical/quantum mechanical model to simulate planar and wire nano-transistors L.Selmi, P.Palestri, D.Esseni, L.Lucci, M.De Michielis DIEGM-IUNET,…

Detection of photo resist residue on advanced gate layers using optical scattering and advanced analysis techniques Scott Ku*a, Ying-Hsueh Chang Chiena, C.M Yangb aTaiwan…

An efficient, mixed semiclassical/quantum mechanical model to simulate planar and wire nano-transistors L.Selmi, P.Palestri, D.Esseni, L.Lucci, M.De Michielis DIEGM-IUNET,…