DIRECT ELECTRON-BEAM WRITING WITH HIGH ASPECT RATIO FOR FABRICATING ION-BEAM LITHOGRAPHY MASK 2002. 04. 20. Byeonug-Nam Lee, Yong-Hoon Cho Department of Physics, Chungbuk…
Slide 1 Nanoimprint lithography (NIL) Overview. Thermal NIL resists. Residual layer after NIL. NIL for large features (more difficult than small one). Room temperature NIL,…
Slide 1 Nanoimprint lithography (NIL) Overview. Thermal NIL resists. Residual layer after NIL. NIL for large features (more difficult than small one). Room temperature NIL,…