11 April 2005 SEMICON Europa 2005 - Munich, Germany SEMI Standards Workshop on e-Manufacturing and e-Diagnostic Practical Implementation of Interface A on a Novellus Gamma 2130 photoresist strip tool Jaideep Jain Sr. Director, Software and Controls Engineering Novellus Systems, Inc. Russell Fleming Sr. Manager, Advanced Equipment and Process Control Novellus Systems, Inc. Dave Faulkner EVP, Sales and Marketing Cimetrix, Inc.
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Practical Implementation of Interface A on a Novellus Gamma 2130 photoresist strip tool
Practical Implementation of Interface A on a Novellus Gamma 2130 photoresist strip tool. Jaideep Jain Sr. Director, Software and Controls Engineering Novellus Systems, Inc. Russell Fleming Sr. Manager, Advanced Equipment and Process Control Novellus Systems, Inc . Dave Faulkner - PowerPoint PPT Presentation
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11 April 2005 SEMICON Europa 2005 - Munich, Germany
SEMI Standards Workshop on e-Manufacturing and e-Diagnostics
Practical Implementation of Interface A on a Novellus Gamma 2130 photoresist strip tool
Jaideep JainSr. Director, Software and Controls EngineeringNovellus Systems, Inc.
Russell FlemingSr. Manager, Advanced Equipment and Process ControlNovellus Systems, Inc.
Dave FaulknerEVP, Sales and MarketingCimetrix, Inc.
11 April 2005 SEMICON Europa 2005 - Munich, Germany
SEMI Standards Workshop on e-Manufacturing and e-Diagnostics
11 April 2005 SEMICON Europa 2005 - Munich, Germany
SEMI Standards Workshop on e-Manufacturing and e-Diagnostics
Data Collection Concept
CIMPortal
Equipment ControlSystem
CIMConnect API
CIMConnectDCIM
GEMTranslation
Fab Host
CIM300 API
Host 1-nMultihost
Fab Host
HSMSInterface A
11 April 2005 SEMICON Europa 2005 - Munich, Germany
SEMI Standards Workshop on e-Manufacturing and e-Diagnostics
Lessons Learned• Integration difficulties with existing standards
– E116 is difficult to map from GEM to E125 because of each EPT object having its own single event for the state machine
– It would be nice to have SemiObjTypeInstance for SubstrateLocation, EPTTracker, and BatchLoc objects that are static objects. The type would include a ObjID for the static object and an SemiObjTypeRef to the SEMIObjType of the object
• Data Collection Plans– Current restriction of attaching an event to a state machine could
lead to the creation of many state machines or of not mapping events currently provided through GEM to E125
– UID for elements could hinder using "common components" for tools from the same vendor if not implemented correctly
– Equipment suppliers and IC makers need to work together to decide on the type of data available for collection. Tool suppliers should provide tested built-in plans that balance data quality and tool performance while providing the most amount of data to the IC maker
11 April 2005 SEMICON Europa 2005 - Munich, Germany
SEMI Standards Workshop on e-Manufacturing and e-Diagnostics
Lessons Learned• Security
– Security for SSL is complex and difficult to use given the required human interaction to create and maintain certificates
– E132 does not be define how to use SSL certificates (time, validation, etc.)
– Certificate server implementation should use standards to prevent multiple implementation formats
• Performance– Size of E125 metadata structure response can be enormous (1-n MB, 3
times size of model XML file) so this should be done sparingly – 1,600 parameters on this tool equates to over 26,000 lines (1.3 MB) of
XML in the model. Care must be taken to ensure that the models are accurate and up to date
– IC makers should work with the equipment suppliers to determine poll rates that are not faster than the tool’s control system can supply fresh data
– Tool design should provide capabilities to buffer or throttle data such that over sampling of data does not overwhelm the tool and affect tool performance
– Data gathering technique has a larger impact on performance than data serialization
11 April 2005 SEMICON Europa 2005 - Munich, Germany
SEMI Standards Workshop on e-Manufacturing and e-Diagnostics
Conclusions• Novellus & Cimetrix successfully demonstrated a fully
working EDA interface• Performance was not a problem with single or two clients
– Tested at 1Hz and 10Hz with one and two clients– 1000 VIDs at 1Hz or 100 VIDs at 10Hz showed minimal CPU
usage
• No major issues with the EDA standards were identified• Many good suggestions were identified and given to ISMI • Novellus plans for Interface A deployment during 2005
11 April 2005 SEMICON Europa 2005 - Munich, Germany
SEMI Standards Workshop on e-Manufacturing and e-Diagnostics
Thank you!
11 April 2005 SEMICON Europa 2005 - Munich, Germany
SEMI Standards Workshop on e-Manufacturing and e-Diagnostics
E132 Standards Compliance• Section # Feature Description Implemented in Prototype
• E120 – Common Equipment Model• 7.3 CEM object definitions made available electronically to the factory host Y• 8.5.4.1 Equipment Class Y• 8.5.4.2 Module Class Y• 8.5.4.3 Subsystem Class Y• 8.5.4.4 IODevice Class Y• 8.5.4.5 Material Location Class Y
• Standard Implemented in Prototype• E37 High-Speed SECS Message Services (HSMS) Y• E40 Standard for Processing Management Y• E84 Specification for Enhanced Carrier Handoff Y• E87 Specification for Carrier Management Y• E90 Specification for Substrate Tracking Y• E94 Provisional Specification for Control Job Management Y