Nanolithography using DI Nanolithography Software for Explorer PMMA C6 spun at 4000 RPM onto a Si(100) Substrate: thickness ~ 200 nm Baked at 115 o C for 30 seconds Pattern scratched onto surface: Previously used NSC A tip did the actual writing T-B ~ -5 nA, Setpoint = 5 nA With feedback off, a relative z offset of 100 nm was added to the z scanner to move the tip closer to the surface Write speed was 1m/s After Befor e