“Polymer Pen” Nanolithography J. Wu Phys. Dept. eferences: engwei Huo, Zijian Zheng, Gengfeng Zheng, Louise R. Giam, Hua Zhang, and Chad A. Mirkin Science, 321, 1658 (2008). NSE 203
“ Polymer Pen” Nanolithography
Jan 04, 2016
NSE 203. “ Polymer Pen” Nanolithography. J. Wu Phys. Dept. references: Fengwei Huo, Zijian Zheng, Gengfeng Zheng, Louise R. Giam, Hua Zhang, and Chad A. Mirkin Science, 321 , 1658 (2008). An old wisdom: Dip-Pen technology. On Jan, 1999. - PowerPoint PPT Presentation
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“Polymer Pen” Nanolithography
J. Wu
Phys. Dept.
references: Fengwei Huo, Zijian Zheng, Gengfeng Zheng, Louise R. Giam, Hua Zhang, and Chad A. Mirkin Science, 321, 1658 (2008).
NSE 203
PenPen
InkInk
SubstrateSubstrate
An old wisdom: Dip-Pen technologyAn old wisdom: Dip-Pen technology
More than 4000 years ago… On Jan, 1999
PatternsPatterns
Dip-pen lithography is straightforward. Any draw back?
Lithography:
Parallel replication
Serial replication
Photolithography
Contact printing
Nanoimprint lithography
E-beam lithography
Ion-beam lithography
Advantage: Time effective, economic
Dip-pen lithography
?
The secret: multi-identical-pensThe secret: multi-identical-pens
~11,000,000 pens
Second Advantage: size controllableSecond Advantage: size controllable
Pattern size controlled by the pressure on polymer.
Chinese calligraphy
Massive production of patterns
2008 Beijing Olympic logo
The total time required is less than 40 mins.
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