Documents ION ENERGY AND ANGULAR DISTRIBUTIONS INTO SMALL FEATURES IN PLASMA ETCHING REACTORS: THE WAFER-...

Slide 1 ION ENERGY AND ANGULAR DISTRIBUTIONS INTO SMALL FEATURES IN PLASMA ETCHING REACTORS: THE WAFER- FOCUS RING GAP* Natalia Yu. Babaeva and Mark J. Kushner Iowa State…

Documents EDGE EFFECTS IN REACTIVE ION ETCHING: THE WAFER- FOCUS RING GAP* Natalia Yu. Babaeva and Mark J....

Slide 1 EDGE EFFECTS IN REACTIVE ION ETCHING: THE WAFER- FOCUS RING GAP* Natalia Yu. Babaeva and Mark J. Kushner Iowa State University Department of Electrical and Computer…

Documents ION ENERGY AND ANGULAR DISTRIBUTIONS INTO SMALL FEATURES IN PLASMA ETCHING REACTORS:

ION ENERGY AND ANGULAR DISTRIBUTIONS INTO SMALL FEATURES IN PLASMA ETCHING REACTORS: THE WAFER- FOCUS RING GAP* Natalia Yu. Babaeva and Mark J. Kushner Iowa State University…