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ABSTRACT         SURI,  RAHUL.  Device  Design  of  Sub‐100nm  Fully‐depleted  Silicon‐on‐Insulator  (SOI)  Devices  Based on High‐k Epitaxial‐Buried Oxide. (Under the direction of Dr. Veena Misra). …

Advanced Silicon/Silicon-Germanium Device Simulations John Barker in collaboration with Asen Asenov, Mirela Borici, Scott Roy, Jeremy Watling, Richard.
Documents Advanced Silicon/Silicon-Germanium Device Simulations John Barker in collaboration with Asen Asenov,...

Slide 1Advanced Silicon/Silicon-Germanium Device Simulations John Barker in collaboration with Asen Asenov, Mirela Borici, Scott Roy, Jeremy Watling, Richard Wilkins, Lianfeng…

Advancing Strained Silicon A O’Neill, S Olsen, University of Newcastle P-E Hellstrom, M Ostling, KTH K Lyutovich, E Kasper, University of Stuttgart.
Documents Advancing Strained Silicon A O’Neill, S Olsen, University of Newcastle P-E Hellstrom, M Ostling,.....

Slide 1Advancing Strained Silicon A O’Neill, S Olsen, University of Newcastle P-E Hellstrom, M Ostling, KTH K Lyutovich, E Kasper, University of Stuttgart Slide 2 Scope…

Development of a Deep-Submicron CMOS Process for Fabrication of High Performance 0.25 m Transistors Michael Aquilino Microelectronic Engineering Department.
Documents Development of a Deep-Submicron CMOS Process for Fabrication of High Performance 0.25 m Transistors...

Slide 1 Development of a Deep-Submicron CMOS Process for Fabrication of High Performance 0.25  m Transistors Michael Aquilino Microelectronic Engineering Department Rochester…

Michael Aquilino Microelectronic Engineering Department Rochester Institute of Technology
Documents Michael Aquilino Microelectronic Engineering Department Rochester Institute of Technology

Development of a Deep-Submicron CMOS Process for Fabrication of High Performance 0.25 m Transistors Michael Aquilino Microelectronic Engineering Department Rochester Institute…

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