Nanoimprint Lithography Wei Wu, Hewlett-Packard Labs, Palo Alto, USA Content 1 Introduction 191 2 Mold 192 3 Resist 195 4 Press 196 5 Resolution Limit 197 6 3-D Nanoimprint…
Slide 1 C LAUS B RABRAND C ONCURRENCY (Q3,’06) M AR 13, 2006 C LAUS B RABRAND © 2005, University of Aarhus [ [email protected] ] [ http://www.daimi.au.dk/~brabrand/…
Outline Introduction to Nanoimprint Lithography (NIL) Promise UV curing for NIL Motivation for work Cross-bar circuits Single layer resist NIL Issues Best line patterns with…