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1.Introduction and application. 2.Ion implantation tools. 3.Dopant distribution. 4.Mask thickness and lateral distribution. 5.Effect of channeling. 6.Damage.
Documents 1.Introduction and application. 2.Ion implantation tools. 3.Dopant distribution. 4.Mask thickness...

Slide 11.Introduction and application. 2.Ion implantation tools. 3.Dopant distribution. 4.Mask thickness and lateral distribution. 5.Effect of channeling. 6.Damage caused…

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