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Documents 1 Hf Based High-k Dieelctrics

16 Hafnium-based High-k Gate Dielectrics A. P. Huang1,2, Z. C. Yang1 and Paul K. Chu2 1Department of Physics, Beijing University of Aeronautics and Astronautics, Beijing…

Documents UK SiGe Research Programme EPSRC Final Review Meeting, Thursday November 4th 2004

UK SiGe Research Programme EPSRC Final Review Meeting, Thursday November 4th 2004 Electrical and Electronic Engineering Dept, Imperial College, Device Modelling in the New…