Documents New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout...

Slide 1New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout Andrew B. Kahng (UCSD) Shailesh Vaya (UCLA) Alex Zelikovsky (GSU) Slide…

Documents Subwavelength Design: Lithography Effects and Challenges Part II: EDA Implications Andrew B. Kahng,....

Slide 1 Slide 2 Subwavelength Design: Lithography Effects and Challenges Part II: EDA Implications Andrew B. Kahng, UCLA Computer Science Dept. ISQED-2000 Tutorial March…

Documents New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout

New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout Andrew B. Kahng (UCSD) Shailesh Vaya (UCLA) Alex Zelikovsky (GSU) * ASPDAC’2001…

Documents Subwavelength Optical Lithography: Challenges and Impact on Physical Design Part II: Problem...

Subwavelength Optical Lithography: Challenges and Impact on Physical Design Part II: Problem Formulations and Tool Integration Andrew B. Kahng, UCLA CS Department ISPD-99…