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Selective Functionalization of OWL Nanostrutures Using Simple Wet-Etchant Techniques William A. Gallopp, Skidmore College Matthew J. Rycenga, Chemisty Chad A. Mirkin, Chemistry Northwestern University
18

Will- 2012 REU Symposium Presentation

Jan 22, 2018

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Page 1: Will- 2012 REU Symposium Presentation

Selective Functionalization of OWL Nanostrutures Using Simple Wet-Etchant

Techniques

William A. Gallopp, Skidmore CollegeMatthew J. Rycenga, Chemisty

Chad A. Mirkin, ChemistryNorthwestern University

Page 2: Will- 2012 REU Symposium Presentation

Outline

• Motivation and strategy of selective functionalization

• Fabrication of nanorods (On Wire Lithography)

• Optimized etchant parameters

• Energy Dispersive Spectroscopy analysis of

selectively functionalized rods

Page 3: Will- 2012 REU Symposium Presentation

What is Selective Functionalization?

The ability to control the molecular coverage of a nanoparticle surface.

Page 4: Will- 2012 REU Symposium Presentation

Selective Functionalization is Critical to Nanotechnology

P. Muhlschlegel, et al. Science, 2005, 308, 1607Y. Xia, et al. Adv. Mater., 2008, 308, 1607

Page 5: Will- 2012 REU Symposium Presentation

Etching Sonication

1. Dissolve Template (NaOH )

Electrochemical Synthesis

Au or Ag

Ni

Au/Ti or SiO2

2. Disperse rods on Glass Slides

Deposit Backing(SiO2, metals)

Mirkin and coworkers, Science

On-Wire Lithography (OWL)

Page 6: Will- 2012 REU Symposium Presentation

(Alumina Membrane)

HNO3

NaOH

Ag Evaporation

Ag Electrodeposition

Rinse

New Plating Sol’n

Reference electrodeCounter electrode

Working electrode

Rinse

New Plating Sol’n

Nanorod Fabrication

Page 7: Will- 2012 REU Symposium Presentation

Length: 380 nm Au segment: 100 nm and 200 nm Diameter: 55 nm Ni segment : 80 nm

Page 8: Will- 2012 REU Symposium Presentation

Scale bars = 300 nm (top) 100 nm (bottom)

Nano Lett. 2007, 7, 3849

Currently No Control Over Functionalization

Page 9: Will- 2012 REU Symposium Presentation

Proposed Strategy for Selective Functionalization

= Streptavidin-FeO3NPs (d = 10 nm)

HS OO

OO

OO

NH

O

S

NH

HNO

Biotin thiol

MHA (Hydroxy thiol)

Page 10: Will- 2012 REU Symposium Presentation

Monitoring Etching process by UV-Vis: Unprotected Rods

Unetched Rods

Etched Rods

200 nm

500 nm

Page 11: Will- 2012 REU Symposium Presentation

Monitoring Etching process by UV-Vis: Unprotected Rods vs. Coated Rods

2.76mM HCl solution

MHA Coated Rods

Unprotected Rods

200 nm

200 nm

Page 12: Will- 2012 REU Symposium Presentation

MHA Coated Rods require longer etch times and higher HCl concentration

27.7 mM HCl solution1.0 -1.5 hrs

500 nm 2.00 um200 nm

Page 13: Will- 2012 REU Symposium Presentation

Energy-Dispersive X-Ray Spectroscopy (EDS)

Page 14: Will- 2012 REU Symposium Presentation

EDS for Identification of FeO

Au Ni FeImage

Page 15: Will- 2012 REU Symposium Presentation

Summary

• Importance of selective functionalize

• OWL and selective functionalization processes

• Optimized etchant parameters

• EDS Analysis of functionalized rods

Page 16: Will- 2012 REU Symposium Presentation

Future work

• Optimize biotin/streptadvin coupling

• EDS confirmation of selective functionalization

• Deposit silica backing to nanorods (OWL)

• Selectively functionalize rods with DNA

Page 17: Will- 2012 REU Symposium Presentation

Acknowledgements

• Prof. Chad Mirkin

• Dr. Matthew Rycenga

• Dr. Chad Shade

• Dr. Gilles Bourret

• NSF

Page 18: Will- 2012 REU Symposium Presentation

EDS: Fe Particles