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Wa fe r F a b ric a tio n P a rt II
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22
Introduction to Wafer Fabrication
• Introduction to TMEC• History from Edison’s Light Bulb to Pentium 4• Semiconductor Materials • Wafer Preparation• Wafer Fabrication Processes• Thin Film Deposition Process• Patterning Process• Etching Process• Doping Process• Contamination
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33
Microelectronics Fabrication
Lithography
Etching
Doping
Thin Film Deposition
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44
Wafer Fabrication Processes
CMOS Process Bipolar Process
BiCMOS Process
Technologie 0.25µm BiCMOS SiGe,Philips
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55
CMOS Process Flow
p-type Silicon Substrate
1. Starting wafer2. n-well3. Active4. Gate5. Junction6. ILD7. Contacts and metal 18. Vias and metal 29. Passivation
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66
Wafer
p-type Cz wafer
p-type
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77
Process flow
p-type Silicon Substrate
1. Starting wafer2. n-well3. Active4. Gate5. Junction6. ILD7. Contacts and metal 18. Vias and metal 29. Passivation
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88
Initial oxidation: O2/H2 (Thickness: 420 nm)
p-type
n-well
SiO2
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99
n-well
Photolithography : NWELL
p-type
Photoresist (PR)
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1010
n-well
Dry etch oxide
p-type
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1111
n-well
n-well implantation : Phosphorus (3x1012 cm-3, 100 keV)
p-type
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1212
Resist strip
p-type
n-well
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1313
n-well drive : Anneal : N2
Differential Oxidation : O2/H2 Anneal : N2
p-type
n-well
n-well
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1414
Process flow
p-type Silicon Substrate
1. Starting wafer2. n-well3. Active4. Gate5. Junction6. ILD7. Contacts and metal 18. Vias and metal 29. Passivation
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1515
Active
Wet etch all oxide + Pad oxidation (20 nm)
p-type
n-well
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1616
Deposition : Nitride (150 nm)
p-type
n-well
Active
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1717
Photolithography : ACTIVE
p-type
n-well
Active
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1818
Dry etch nitride
p-type
n-well
Active
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1919
Resist strip
p-type
n-well
Active
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2020
Photolithography : NFIELD
p-type
n-well
Active
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2121
NField implantation : Boron (8x1013 cm-3, 60 keV)
p-type
n-well
Active
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2222
Resist strip
p-type
n-well
Active
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2323
Field oxidation : O2/H2
p-type
n-well
Active
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2424
Active
Wet etch Nitride
p-type
n-well
Active
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2525
Process flow
p-type Silicon Substrate
1. Starting wafer2. n-well3. Active4. Gate5. Junction6. ILD7. Contacts and metal 18. Vias and metal 29. Passivation
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2626
Gate
Etch Pad oxide + WR oxidation : H2/O2 (50 nm)
p-type
n-well
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2727
Photolithography : NFIELD
p-type
n-well
Gate
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2828
APT Implantation : Boron (6.5x1011 cm-3, 110 keV)
p-type
n-well
Gate
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2929
Resist strip
p-type
n-well
Gate
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3030
Anneal : N2
p-type
n-well
Gate
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3131
Etch WR oxide + Gate oxidation (25 nm)
p-type
n-well
Gate
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3232
VTA implantation : Boron (8x1011 cm-3, 20 keV)
p-type
n-well
Gate
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3333
Poly deposition
p-type
n-well
Gate
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3434
TEOS deposition
p-type
n-well
Gate
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3535
Poly implantation : Phosphorus (1.2x1016 cm-3, 50 keV)
p-type
n-well
Gate
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3636
Anneal : N2
p-type
n-well
Gate
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3737
Wet etch TEOS
p-type
n-well
Gate
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3838
Photolithography : POLY
p-type
n-well
Gate
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3939
Dry etch poly
p-type
n-well
Gate
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4040
Resist strip
p-type
n-well
Gate
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4141
Process flow
p-type Silicon Substrate
1. Starting wafer2. n-well3. Active4. Gate5. Junction6. ILD7. Contacts and metal 18. Vias and metal 29. Passivation
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4242
Junctions
Oxidation : O2
p-type
n-well
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4343
Photolithography : NPLUS
p-type
n-well
Junctions
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4444
Nplus implantation : Phosphorus (1014 cm-2, 70 keV)Arsenic (6x1015 cm-2, 130 keV)
p-type
n-well
Junctions
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4545
Resist strip
p-type
n-well
Junctions
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4646
Photolithography : PPLUS
p-type
n-well
Junctions
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4747
Pplus implantation :Boron (5x1015 cm-2, 20 keV)
p-type
n-well
Junctions
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4848
Resist strip
p-type
n-well
Junctions
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4949
Coat front + Backside etch
p-type
n-well
Junctions
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5050
Resist strip
p-type
n-well
Junctions
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5151
Rapid thermal anneal : N2
p-type
n-well
Junctions
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5252
Process flow
p-type Silicon Substrate
1. Starting wafer2. n-well3. Active4. Gate5. Junction6. Interlayer Dielectric (ILD)7. Contacts and metal 18. Vias and metal 29. Passivation
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5353
Interlayer Dielectric
TEOS deposition : UTEOS
p-type
n-well
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5454
SOG coatSOG cureSOG coatSOG Cure
p-type
n-well
Interlayer Dielectric
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5555
PSG depositionPSG densification
p-type
n-well
Interlayer Dielectric
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5656
Coat frontBackside etch
p-type
n-well
Interlayer Dielectric
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5757
Resist strip
p-type
n-well
Interlayer Dielectric
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5858
Process flow
p-type Silicon Substrate
1. Starting wafer2. n-well3. Active4. Gate5. Junction6. ILD7. Contacts and metal 18. Vias and metal 29. Passivation
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5959
Contacts and Metal1
Photolithography : CONTACT
p-type
n-well
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6060
Dry etch contacts : isotropic + anisotropic
p-type
n-well
Contacts and Metal1
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6161
Resist strip
p-type
n-well
Contacts and Metal1
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6262
Contract cleanMetal 1 sputtering : TiTiN
AlSiCu TiN
p-type
n-well
Contacts and Metal1
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6363
Photolithography : METAL1
p-type
n-well
Contacts and Metal1
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6464
Dry etch Metal 1
p-type
n-well
Contacts and Metal1
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6565
Resist strip
p-type
n-well
Contacts and Metal1
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6666
Process flow
p-type Silicon Substrate
1. Starting wafer2. n-well3. Active4. Gate5. Junction6. ILD7. Contacts and metal 18. Vias and metal 29. Passivation
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6767
Via and Metal2
Plasma oxide deposition
p-type
n-well
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6868
SOG coatSOG cure
p-type
n-well
Via and Metal2
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6969
Plasma oxide deposition
p-type
n-well
Via and Metal2
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7070
Photolithography : VIA
p-type
n-well
Via and Metal2
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7171
Dry etch vias : isotropic + anisotropic
p-type
n-well
Via and Metal2
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7272
Resist strip
p-type
n-well
Via and Metal2
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7373
Metal2 sputtering : AlsiCu TiN
p-type
n-well
Via and Metal2
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7474
Photolithography : METAL2
p-type
n-well
Via and Metal2
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7575
Dry etch metal2
p-type
n-well
Via and Metal2
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7676
Resist strip
p-type
n-well
Via and Metal2
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7777
Process flow
p-type Silicon Substrate
1. Starting wafer2. n-well3. Active4. Gate5. Junction6. ILD7. Contacts and metal 18. Vias and metal 29. Passivation
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Passivation
PECVD nitride deposition, Photolithography : PASS, Dry etch nitride, Resist strip, Sintering : Forming gas
p-type
n-well