J. B. Hastings [email protected] LUSI DOE Review July 23, 2007 X-ray Optics 1 X-ray Optics J. B. Hastings Beam definition Attenuators Slits Pulse picker.

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 1

X-ray Optics J. B. Hastings

X-ray Optics J. B. Hastings

Beam definitionAttenuatorsSlitsPulse picker

FocusingBe lensKirkpatrick-Baez Mirror systems

Diffractive opticsMonochromatorPulse compressorSplit and delay

Summary

Beam definitionAttenuatorsSlitsPulse picker

FocusingBe lensKirkpatrick-Baez Mirror systems

Diffractive opticsMonochromatorPulse compressorSplit and delay

Summary

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 2

6

1 24 5

1 SXR Imag

2 AMOS (LCLS)

3 XR pump-probe Full instrument

4 XPCS Full instrument

5 CXI Full instrument

6 HEDS

1 SXR Imag

2 AMOS (LCLS)

3 XR pump-probe Full instrument

4 XPCS Full instrument

5 CXI Full instrument

6 HEDS

LCLSLUSI

HEDS (NNSA)

Offset MonochromatorExp. ChamberDetector

Beam Transport

LUSI schematicLUSI schematic

XPP

3

XCS CXI

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 3

InstrumentsInstrumentsXCSXPPCXI

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 4

AttenuatorsAttenuatorsXCSXPPCXI

AttenuatorsVariable, up to 10 6 reductionHigh damage threshold (Be or B4C)

AttenuatorsVariable, up to 10 6 reductionHigh damage threshold (Be or B4C)

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 5

Slits SystemSlits SystemXCSXPPCXI

Slit systemsVariable horizontal and vertical gap from 5 μm – 5 mmCan withstand full LCLS flux – unfocusedMinimize background scatter from blades

Slit systemsVariable horizontal and vertical gap from 5 μm – 5 mmCan withstand full LCLS flux – unfocusedMinimize background scatter from blades

B. Lengeler et al., J. Synchrotron Rad., 6, 1153-1167 (1999).

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 6

Pulse PickerPulse PickerXCSXPPCXI

Pulse pickerPermit LCLS operation at 120 hzSingle pulses. Useful for samples supported on substratesReduced rate ex. 10 hz operationHigh damage thresholdUse rotating discs, concept already in use at ESRF

Pulse pickerPermit LCLS operation at 120 hzSingle pulses. Useful for samples supported on substratesReduced rate ex. 10 hz operationHigh damage thresholdUse rotating discs, concept already in use at ESRF

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 7

Be Focusing LensesBe Focusing LensesXCSXPPCXI

Beryllium CRL> 40% throughput

Positioning resolution and repeatability to 1 µmZ translation to vary spot size

Beryllium CRL> 40% throughput

Positioning resolution and repeatability to 1 µmZ translation to vary spot size

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 8

KB MirrorKB MirrorXCSXPPCXI

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 9

KB focusing mirrorsKB focusing mirrors

Mirror system (1 µm and 0.1 µm KB)

KB mirrors have produced 50 nm focuses of SR (Yamauchi et al., SRI 2006).Bent plane mirrors – or pre-figured Achromatic focusing.Use B4C as coating

Damage resistantGood reflectivity

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 10

KB Pair for 0.1 μm focusGrazing angle 0.2 DegB4C coatingHorz. Mirror 20 cmVert. Mirror 10 cmFocal spot size (FWHM in microns)

Horz: 0.097Vert: 0.083

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 11

LLNL has state-of-the-art surface metrology for the figure, mid- and high spatial frequency ranges

LLNL has state-of-the-art surface metrology for the figure, mid- and high spatial frequency ranges

10-2

103

108

1013

1018

10-8 10-6 10-4 10-2 100

diamond-turned Alpolyimide on Al, ML-coated

Frequency (nm-1)

PSD

(nm

4 )Slope error = 100 rad rms

= 2.7 Ǻ rms

= 17.6 Ǻ rms

AFM

Diamond-turned Aluminum surface, after polyimide and Mo/Si multilayer coating

Polyimide smoothes high spatial frequency roughness, including 10 m-range diamond turning marks

180 m

14

0

m

Measurements obtained with a Zygo New ViewTM optical profiling microscope operated at 40objective lens magnification

Diamond-turned Aluminum surface, as-received from manufacturer

100 nm

-200 nm

0 nm

Visible light interferometry results from multilayer-coated, diamond-turned condenser mirror

Height map Slope map

R. Soufli, E. Spiller, M. A. Schmidt, J. C. Robinson, S. L. Baker, S. Ratti, M. A. Johnson, E. M. Gullikson, Opt. Eng. 43(12), 3089-3095 (2004).

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 12

The LLNL DC-magnetron sputtering system can fit multiple large-area substrates in a single deposition

The LLNL DC-magnetron sputtering system can fit multiple large-area substrates in a single deposition

4-mirror and 2-mirror EUV cameras have been multilayer-coated in a single deposition run, achieving optic-to-optic wavelength matching within 1 = 0.010 nm

Underneath view of LLNL chamber lid with 5 sputtering targets

R. Soufli, E. Spiller, M. A. Schmidt, J. C. Davidson, R. F. Grabner, E. M. Gullikson, B. B. Kaufmann, S. L. Baker, H. N. Chapman, R. M. Hudyma, J. S. Taylor, C. C. Walton, C. Montcalm, and J. A. Folta, Proc. SPIE 4343, 51-59 (2001).

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 13

Stress and roughness vs. pressureStress and roughness vs. pressure

Lower pressure films reduce roughnessAlso increase stressCurves shift upwards as thickness grows

Favor thinner films grown at higher pressures

Higher micro-roughness, minimize risk of delamination

-2000

-1500

-1000

-500

0

500

1000

0 2 4 6 8 10 12 14 16 18 20

1

10

roughness

stress

dB

4C= 542- 565 Å

Ar sputtering pressure (mTorr)

Str

ess

(MP

a)

Rou

ghn

ess

(Å r

ms)

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 14

Offset MonochromatorOffset MonochromatorXCSXPPCXI

Parameter Value

Energy Range 6 – 24 keV

Horizontal Offset 600 mm

Scattering Angle 90 - 500

Accuracy 0.02 arcsec

χ Accuracy 4 arcsec

Double Crystal Offset monochromator Increase longitudinal coherence length (narrow X-ray spectrum)Multiplexes LCLS beam

Double Crystal Offset monochromator Increase longitudinal coherence length (narrow X-ray spectrum)Multiplexes LCLS beam

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 15

Offset MonochromatorOffset Monochromator

Double Crystal Offset monochromator for 2 µm Si (111) @ 1.5 Å

85% transmission ,2.5% - Mono beam, 1.3% - Diagnostics beam

Double Crystal Offset monochromator for 2 µm Si (111) @ 1.5 Å

85% transmission ,2.5% - Mono beam, 1.3% - Diagnostics beam

Scattering Angles (2 theta)

1.5 Å 0.5 Å

Silicon

11127.6° 9.1°

Silicon

22045.8° 14.9°

Diamond 111

42.5° 13.9°

Diamond 220

- 22.8°

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 16

Pulse CompressorPulse CompressorXCSXPPCXI

λ(nm)

d(nm)

θB b Sin βH

(mm)Δλ/λ(%)

0.15 2.0 2.1º +1 0.03 2600 0.5%

Parameters for a Laue case pulse compressor for the LCLS.

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 17

Split and DelaySplit and DelayXCSXPPCXI

Provided by DESY/SLAC MoU Prototype existing 1st Commissioning May 2007 pulse duration < delay < 3 ns

based on Si (511) with 2θ = 90º

E=8.389 keV

Provided by DESY/SLAC MoU Prototype existing 1st Commissioning May 2007 pulse duration < delay < 3 ns

based on Si (511) with 2θ = 90º

E=8.389 keV

J. B. [email protected]

LUSI DOE Review July 23, 2007X-ray Optics 18

SummarySummary

Optical components are conceptually the same as those for SR experiments: slits, attenuators, double crystal monochromators, refractive lens, KB focusingOptical components are in general not beyond state of the artCharacteristics of the LCLS beam demand extreme precision and damage tolerance: sub-micro radian rotations, B4C coatingsMultiplexing capability relies on thin Si or perfect diamond crystals