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Engineering Physics 2 Unit-2

Apr 04, 2018

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    Un

    it

    Un

    it

    Un

    it

    Un

    it2222

    1

    Materials

    Materials

    Materials

    Materials

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    BasicS

    emicondu

    ctorCrys

    talStruct

    ure

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    INTROD

    UCTION

    Material

    having

    electrical

    resistiv

    ity

    (or)

    ele

    ctrical

    conductivityinbetween

    aconductorandaninsulato

    r.

    (or)

    Solidwhichhastheen

    ergybandsimilartothatofan

    insulator.

    Itactsasaninsulatoratab

    solutezeroandasa

    conductorathightem

    peraturesandintheprese

    nceof

    impurities

    .

    Examples:

    Si,Ge,GaA

    s,InP,GaPetc

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    Resistivityvariesfrom10-4to106m.(Conductor&Insulator).

    At0K,it

    behavesasinsulators.

    At0Ktheyhaveempty

    conductionbandandalmostfilled

    valenceband.

    PropertiesofSemicond

    uctors

    Bothelectronsandholes

    arechargecarriers.

    Haveneg

    ativetemper

    aturecoefficient

    ofresistance.

    =

    (e+h)

    1 T T

    or

    L NM M M

    O QP P P

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    Band

    Structure

    s

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    Band

    Structures

    Plentyoffreee-s

    Veryfew(or)no

    freee-s

    Fewfree

    e-s

    OverlappingVB&CB

    La

    rgeE

    g(7eV)

    NarrowEg(1eV)

    Verysmallele

    ctricfield

    forconduction.

    Verylargeelectric

    field

    forconduction.

    Smallelectric

    fieldfor

    conduction.

    +TCR(Temp

    Co-effiof

    Resistan

    ce)

    -TCR

    -TCR

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    Semicon

    ductor

    Semicon

    ductor

    Semicon

    ductor

    Semicon

    ductor

    omosition

    omosition

    omosition

    omosition

    PuritPuritPuritPurit

    Classif

    ication

    Classif

    ication

    Classif

    ication

    Classif

    ication

    10

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    ElementalS.C

    Singleele

    ment.(Ge,Si)

    GroupIV

    elements.

    CompoundS

    .C

    Two

    (or)moreelements.

    (GaAS

    ,InP)

    III-V

    (or)II-VIelem

    ents.

    Composition

    Composition

    Composition

    Composition

    ovaent

    on

    ueto

    bounding

    ofneighboring

    atomswith4valencee-s).

    Indirectb

    andgap

    semiconductors.

    (recombinationofe-sandho

    les

    takeplace

    throughtraps)

    (due

    todifferencein

    electro

    negativity).

    Directbandgap

    semiconductors.

    (reco

    mbinationofe-sand

    holestakeplacedire

    ctly)

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    Elemen

    talS.C

    Heatisproducedduring

    recombina

    tion.

    Lifetimeofchargecarriersis

    C

    ompoundS.C

    Photonsareproducedduring

    recom

    bination.

    Lifetimeofchargeca

    rriersis

    Composition

    Composition

    Composition

    Composition

    more.

    Diode,tra

    nsistor,etc.,

    less.

    LED,Laserdiodes,etc.,

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    TypesofSem

    icon

    ductors

    TypesofSem

    icon

    ductors

    TypesofSem

    icon

    ductors

    TypesofSem

    icon

    ductors

    Puresem

    iconductorwithoutanyimpurities-Intrin

    sicS.C.

    Eg:Si,Ge,etc.In

    trinsicS

    emiconductor

    Extrinsic

    Semicondu

    ctor

    Impurefo

    rmofsemiconductors-Extrin

    sicS.C

    *N-type:

    (IntrinsicS.C

    +

    Pentavalentatoms(P,Ar,An,etc.,)

    ).

    *P-type:(IntrinsicS.C

    +Trivalentatom

    s(B,A

    l,Ga,etc.,

    )).

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    IntrinsicSemiconducto

    r

    Semic

    onductorsGe,S

    ihavecrystallinestructurean

    dfour

    valenceelectronsino

    utermostshell(tetravalent).

    AtomicnumberofGe

    is32.

    (1s22s22

    p63s23p

    64s23

    d104p2).28

    electronstightlyboun

    dand4electron

    srevolveinoutermostorbit.

    AtomicnumberofSiis14.

    (1s22s22

    63s23p2).10electrons

    tightlyboundand4electronsrevolve

    inoutermostorbit.

    When

    twosemicondu

    ctingatomsare

    broughttogeth

    er,each

    positivecoreattracts

    thevalenceelectronfromothe

    ratomand

    Soeachelectronissharedbytwoatoms.

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    Intrinsicsemi

    conductor

    Acovale

    ntbondisform

    edbetweenthe

    2electronsofa

    nytwo

    atoms.Sosuchelectronpairsarenotav

    ailableforconduction.

    At0K,a

    puresemiconductoractsasaninsulator.Energ

    yneedto

    breaksuchacovalentbo

    ndis0.72eVfo

    rGeand1.1eV

    forSi.

    Whenelectronescapesfromcovalentbond,anemptyspaceis

    .

    Onceah

    oleiscreated,anelectronfromthecovalentb

    ondofa

    nearby

    atomshiftsto

    occupythishole.

    Thisprocesscontinuesandtheholegoesonshiftingfromone

    atomtoanother.

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    Intrinsicsem

    iconductor..

    Holea

    ctslikeafreep

    ositivecharge.

    So,sem

    iconductorhas

    bothholesand

    electronsascharge

    carr

    iers.

    Dueto

    thermalexcita

    tion,whenelectronsaretransf

    erredfrom

    thev

    alencebandto

    theconduction

    bandaneual

    numberof

    hole

    sarecreatedin

    thevalenceban

    d.

    Fermilevelatthemiddle

    ofthegapindicatesthatthenu

    mberof

    electronsa

    ndholesareequalinintrinsicsemiconductor.

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    Structure&

    Latticeofa

    'normal'purecrystalofSilicon.

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    E

    xtrinsicSemiconductor

    Processofaddingimpuri

    tyatomstose

    miconductoratoms(the

    orderof1im

    purityatomp

    er10million(ormore)atom

    softhe

    semiconductor)iscalledDo

    ping.(theratioofabout105:1).

    Impurefo

    rmofsemiconductors-Extrin

    sicS.C

    *N-type:

    (IntrinsicS.C

    +

    Pentavalentatoms(P,Ar,An,etc.,)

    ).

    *P-type:(IntrinsicS.C

    +Trivalentatom

    s(B,A

    l,Ga,etc.,

    )).

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    Arsenic,A

    ntimonyorPh

    osphorusatom

    s-fivee-s-o

    utermost

    valanceband

    share

    with

    otheratoms-"Pent

    avalent"

    impuritie

    s.

    Fourof

    thefivee-s-bondwithits

    neighbouringS

    iatoms-

    leavingone"freeelectron"tomo

    ve-whenan

    electrical

    voltaeisa

    lied.

    N-typeSemicondu

    ctor.

    Eachimp

    urityatom"do

    nates"onee--

    "Donors".

    Antimony

    -51e-s-5shellsaroundthenucleus-5valancee-s.

    Excessof

    currentcarryinge-s-withanegativecharge

    "N-type"

    material-e-sa

    s"MajorityCa

    rriers"&resultantholes

    "Minority

    Carriers".

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    Structure&

    Latticeofthedonorimpu

    rityatomAntimony.

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    MaterialswhichhavePentavalentimpu

    rityatoms(donors)and

    conductby"electron"m

    ovement-N-ty

    peSemiconduc

    tors.

    Inthesetypesofmaterialsare:

    1

    .Donorsarepentavalentatom

    s.

    2

    .Therearealargenumberoffr

    eeelectrons.

    3

    .Asmallnumberofholesinrelationtothenum

    berof

    Su

    mmary-N-type(Antim

    ony)

    freeelec

    trons.

    4

    .Dopinggives

    :

    negativelychargedfree

    electrons.

    5

    .Supplyofene

    rgygives:

    negativelychargedfree

    electrons.

    positive

    lychargedhole

    s.

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    P-Type

    Semiconductor

    "Trivalen

    t"(3e-)impurity-Aluminium,BoronorIndium.

    Only3valencee-s-available-fourthco

    valentbondcan

    notbe

    formed.

    Complete

    connectionis

    notpossib

    le

    -

    giving

    rise

    -

    abundanceofpositively

    chargedcarriers-holes.

    Adjoining

    freee--attrac

    ted-willtryto

    moveintothehole.

    e-fillingtheholeleavesanotherholebehindit.

    Thisintu

    rnattractsanothere-wh

    ichcreatesanother

    hole.

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    Holesaremovingasapositivecharge.

    Eachimp

    urityatomgen

    eratesahole-

    "Acceptors"-asthey

    arecontinually"accepting"extraelectro

    ns.

    Boron-trivalentadditive-5e-s-2sh

    ellsaroundnucleus-3

    -

    Addition

    ofBoroncaus

    esconduction

    -mainlyofpositive

    chargeca

    rriers-"P-type"material.

    Positiveholes-"Majo

    rityCarriers"&

    freeelectrons-

    "Minority

    Carriers".

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    Structure&

    Latticeoftheacceptorim

    purityatom

    Boron.

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    S

    ummary-P

    -type(Boro

    n)

    Materialsw

    hichhaveTrivalentimpuritya

    toms(acceptors)and

    conductby

    "hole"movem

    entandarecalled,P-typeSemiconds.

    Inthesetypesofmaterials

    are:

    1.Acceptorsaren

    egativelycharg

    ed.

    (Readilyacc

    epts).

    2.Therearealargenumberofholes.

    3.Asmallnumber

    offreeelectron

    sinrelationto

    the

    num

    ero

    oes.

    4.Dopinggives:

    negativelychargedacceptors.

    positivelychargedholes.

    5.Supplyofenerg

    ygives:

    positivelychargedholes.

    negatively

    chargedfreeelectrons.

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    Intrin

    sic

    Extrinsic

    Extrinsic

    Ntype

    P-type

    P

    entavalent

    Trivalent

    Donoratom

    Acceptoratom

    Donatese-s

    Acceptse-s

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    CarrierC

    oncentration

    inIntrinsicSemiconductor

    CarrierConcentration

    inIntrinsicSemiconductor

    CarrierC

    oncentration

    inIntrinsicSemiconductor

    CarrierConcentration

    inIntrinsicSemiconductor

    At0K,i

    ntrinsicsemico

    nductorbehavesasinsulator,andiftemp.

    increase

    d,e-sfromvale

    ncebandexcitedintothecond

    uctionband.

    Number

    ofchargecarriersperunitvo

    lumeofthematerialis

    calledCa

    rrierConcentration.

    esee

    ectronseave

    ereeparc

    e.

    Holescreatedbythese

    e-sinthevalencebandalsobe

    havelikea

    freeparticle.

    So,massoftheelectron

    andholeisreplacedbyitseffectivemass

    me*a

    ndmh

    *respectiv

    ely.

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    CarrierCo

    ncentrationinIntrins

    icSemiconductor

    CarrierCo

    ncentrationinIntrins

    icSemiconductor

    CarrierCo

    ncentrationinIntrins

    icSemiconductor

    CarrierCo

    ncentrationinIntrins

    icSemiconductor

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    Densit

    yofelectronsinconduc

    tionband

    Numberofc

    hargecarriersperunitvolume

    ofthematerial

    (i.e.,

    intrinsicsem

    iconductor)isk

    nownasCarrie

    rConcentration.

    (

    )

    (

    )

    dn

    ZE

    dEFE

    =

    1

    NumberofelectronsinCB-integratingfrom

    Ec

    to

    Pa

    ge1.1

    9eqn.

    (12)

    Densityofsta

    tesZ(E)dEofelectronsintheconductionband

    is

    (

    )

    ()

    cE

    n

    dn

    ZEFEd

    E

    =

    =

    2

    *

    3/2

    1/2

    3

    4

    (

    )

    (2

    )e

    ZEdE

    m

    E

    dE

    h=

    3

    me-me*

    Page1.2

    0

    P

    age1.1

    9eqn.

    (11)

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    Ec

    Lowesten

    ergy

    levelofCB

    .

    Energy(E)forane-inCBequalto

    (E-Ec).

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    Densityo

    felectronsinC

    B

    Eqn.

    3becom

    es

    *

    3/2

    1/2

    3

    4

    (

    )

    (2

    )

    (

    )

    e

    c

    ZEdE

    m

    E

    E

    dE

    h

    =

    4

    WeknowF(E)

    1

    (

    )

    1

    exp(

    )F

    F

    E

    E

    EKT

    =

    +

    5

    E=(E-Ec).

    Su

    b.eqn.4and5ineqn2

    ()

    (

    )

    cE

    n

    dn

    ZEFEdE

    =

    =

    =

    1

    /2

    *

    3/2

    3

    (

    )

    4

    (2

    )

    1

    exp(

    )

    c

    c

    e

    F

    E

    B

    E

    E

    dE

    m

    E

    E

    h

    K

    T

    +

    6

    *

    3/2

    1

    /2

    3

    4

    (

    2

    )

    (

    )

    1

    exp(

    )

    c

    e

    c F

    E

    B

    m

    E

    E

    dE

    h

    E

    EKT

    +

    n=

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    F

    B

    E

    E

    KT

    1

    F

    B

    E

    EKT

    exp

    1

    FB

    E

    EKT

    1e

    xp

    e

    xp

    F

    F

    B

    B

    E

    E

    E

    E

    KT

    KT

    +

    =

    Foralltem

    peratures,theen

    ergyrequiredbyanelectrontomove

    fromthev

    alencebandto

    theconduction

    bandisalwaysgreater

    than4KB

    T.

    1

    1

    exp

    1

    exp

    exp

    F

    B

    F

    F

    B

    B

    E

    E

    K

    T

    E

    E

    E

    E

    K

    T

    K

    T

    =

    =

    =

    +

    Eqn.6becomes

    *

    3/2

    1/2

    3

    4

    (2

    )

    (

    )

    exp

    c

    F

    e

    c

    B

    E

    E

    E

    n

    m

    E

    E

    dE

    h

    KT

    =

    e

    xp

    FB

    E

    EKT

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    Eqn.6

    becomes

    *

    3/2

    1/2

    3

    4

    (2

    )

    exp

    (

    )

    ex

    p

    c

    F

    e

    c

    B

    B

    E

    E

    E

    n

    m

    E

    E

    dE

    h

    KT

    KT

    =

    7

    Tosolveeqn7

    theintegrallimitsalsogetchang

    edaccordinglyasfollows

    c

    E

    E

    x

    =

    +

    c

    E

    Ex

    =

    Letusassum

    e

    dEd

    x

    =

    c

    c

    E

    E

    x

    =

    cEx

    =

    case:1

    case:2

    c

    W

    hen

    E

    E=

    whenE=

    0

    x=

    x=

    (Lower

    limi

    t)

    (Upper

    limit)

    Eqn.

    7becomes

    *

    3/2

    1/2

    3

    0

    4

    (2

    )

    exp

    (

    )

    (

    )

    exp

    (

    )

    C

    F

    e

    B

    B

    E

    x

    E

    n

    m

    x

    dx

    h

    KT

    KT

    +

    =

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    /

    1/2

    3/2

    0

    (

    )

    2

    B

    xK

    T

    B

    xe

    dx

    KT

    =

    *

    3/2

    3/2

    4

    F

    c

    E

    E

    =

    Usinggammafunction

    Therefore,

    9

    /

    *

    3/2

    1/

    2

    3

    0

    4

    (2

    )

    exp

    B

    xKT

    F

    c

    e

    B

    E

    E

    n

    m

    x

    e

    dx

    h

    KT

    =

    8

    3

    2

    e

    B

    h

    KT

    Eqn.

    (10)-

    densityofelectronsintheconduction

    band.

    3/2

    * 2

    2

    2

    exp

    e

    B

    F

    C

    B

    mK

    T

    E

    E

    n

    h

    K

    T

    =

    10

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    Asthep

    resenceoftheholecan

    be

    regarde

    dastheabsenc

    eofanelectro

    n.

    Den

    sityofHole

    sinValanceband

    Numberofholesperunit

    volumeintheV

    Bofasemicon

    ductor

    canbefou

    ndinasimilarmanner.

    F(E)repre

    sentstheproba

    bilityoffilled

    state.

    Asthemaximumprobab

    ilitywillbe1,the

    probabilityofunfilledstateswill

    be1-F(E)

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    CarrierConcentrat

    ioninIntrinsicSemiconductor

    CarrierConcentrat

    ioninIntrinsicSemiconductor

    CarrierConcentrat

    ioninIntrinsicSemiconductor

    CarrierConcentrat

    ioninIntrinsicSemiconductor

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    1

    1

    1

    exp

    F

    B

    E

    EKT

    =

    +

    F

    B

    E

    E

    KT

    Here

    1

    ()

    FE

    exp

    1

    exp

    F

    B

    F

    B

    EEKT E

    E

    K

    T

    =

    +

    1

    F

    E

    E

    exp

    1

    F

    E

    E

    B

    1

    exp

    1

    F

    B

    E

    E

    K

    T

    +

    =

    1

    (

    )

    exp

    F

    B

    E

    E

    F

    E

    KT

    =

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    (

    )[1

    (

    )]

    dp

    ZE

    F

    E

    dE

    =

    *

    3/2

    1/2

    3

    4

    (2

    )(

    )

    exp

    F

    h

    EE

    dp

    m

    E

    dE

    h

    KT

    =

    Takingthe

    effectivemass

    ofholesasmh*

    Numbe

    rofholesinth

    eenergyintervalEandE+dE

    intheVBis

    11 12

    *

    3/2

    1/2

    3

    4

    (2

    )

    (

    )

    exp

    F

    h

    v

    B

    EE

    dp

    m

    E

    E

    dE

    h

    KT

    =

    *

    3/2

    1/2

    3

    4

    (2

    )

    (

    )

    exp

    vE

    F

    h

    v

    B

    E

    E

    p

    dp

    m

    E

    E

    dE

    h

    KT

    =

    =

    Energy(E

    )foranholesinVBequalto(Ev-E).

    HolesinVB

    calculated-inte

    grating-

    toEv

    13

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    En

    ergy(E)foran

    holesinVBequalto(Ev-E).

    Ec

    Lowestenergy

    levelofCB.

    Ev

    Higheste

    nergy

    levelofVB.

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    v

    E

    E

    x

    =

    E=

    Letusconside

    r

    Tosolveeqn.(14)

    vE

    Ex

    =

    dE

    d

    x

    =

    *

    3/2

    1/2

    3

    4

    (2

    )

    exp

    (

    )

    ex

    p

    vE

    F

    h

    v

    B

    B

    E

    E

    p

    m

    E

    E

    dE

    h

    KT

    KT

    =

    14

    v

    v

    v

    E

    E

    x

    =

    (

    )

    v vE

    x

    E

    x

    =

    +

    =

    ase:

    x

    =

    (Lo

    wer

    limit)

    0

    x=

    (Upper

    limit)

    Eqn.

    (14)becomes

    0

    *

    3/2

    1/2

    3

    4

    (2

    )

    exp

    e

    xp

    (

    )

    v

    F

    h

    B

    B

    E

    x

    E

    p

    m

    x

    dx

    h

    KT

    KT

    =

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    0

    *

    3/2

    1/2

    3

    4

    (2

    )

    exp

    ex

    p

    (

    )

    v

    F

    h

    B

    B

    E

    x

    E

    p

    m

    x

    dx

    h

    KT

    KT

    =

    0

    *

    3/2

    1/2

    3

    4

    (2

    )

    exp

    exp

    (

    )

    v

    F

    h

    B

    B

    E

    E

    x

    m

    x

    dx

    h

    KT

    KT

    =

    Toremov

    evesignintegrallimitsis

    changed

    /

    *

    3/2

    1/2

    3

    0

    4

    (2

    )

    ex

    p

    B

    xKT

    v

    F

    h

    B

    E

    E

    m

    xe

    dx

    h

    KT

    =

    1/2

    /

    3/2

    0

    (

    )

    2

    xkT

    B

    x

    e

    dx

    KT

    =

    Using

    gammafu

    nction

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    * 2

    2

    2

    exp

    h

    B

    V

    F

    B

    mK

    T

    E

    E

    P

    h

    K

    T

    =

    aboveequationcanbesolve

    dwiththehelpofgammafunctionand

    then

    15

    qn.

    -nu

    m

    ero

    oes

    orvacance

    sn

    evaence

    an.

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    e-sinCB

    HolesinVB

    F(E)dE

    1-F(E)dE

    (E

    -EF

    )>>K

    BT

    (

    E-EF

    )

    1

    exp

    exp

    a

    F

    a

    F

    B

    B

    E

    E

    EE

    KT

    KT

    +

    =

    exp

    1

    a

    F

    B

    E

    E

    K

    T

    >>

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    (

    )

    exp

    F

    a

    a

    B

    E

    E

    F

    E

    K

    T

    =

    exp

    F

    a

    a

    B

    E

    E

    nN

    KT

    =

    Thereforeeqn(2)

    becomes

    Atequilibrium

    (

    )

    a

    a

    nN

    FE

    =

    3

    Densityofh

    olesin

    VB(eqn.1)

    Densityofelectronsinacceptor

    energylevel.

    (eqn.

    3)

    =

    3/2

    * 2

    2

    2

    exp

    exp

    V

    f

    h

    B

    F

    a

    a

    B

    B

    E

    E

    m

    KT

    E

    E

    N

    h

    KT

    KT

    =

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    3/2

    * 2

    2

    2

    exp

    exp

    h

    B

    V

    F

    F

    a

    a

    B

    B

    m

    KT

    E

    E

    E

    E

    N

    h

    KT

    KT

    =

    (

    )/

    3/2

    (

    )/

    * 2

    2

    2

    V

    F

    B

    F

    a

    B

    E

    E

    KT

    a

    E

    E

    KT

    h

    B

    N

    e e

    mKT

    h

    =

    ((

    )

    2

    )/

    3/2

    * 2

    2

    2

    V

    a

    F

    B

    E

    E

    E

    KT

    ah

    B

    N

    e

    mK

    T

    h

    +

    =

    (

    )/

    3/2

    * 2

    22

    V

    F

    a

    F

    B

    E

    E

    E

    E

    KT

    ah

    B

    N

    e

    m

    KT

    h

    +

    =

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    Takinglogonbothsides

    3/2

    * 2

    (

    )

    2

    log

    2

    2

    V

    a

    F

    a

    B

    h

    B

    E

    E

    E

    N

    KT

    m

    KTh

    +

    =

    3/2

    * 2

    2

    (

    )

    log

    2

    2

    a

    F

    V

    a

    B

    h

    B

    N

    E

    E

    E

    K

    T

    m

    KT

    h

    =

    +

    (

    )

    2V

    a

    F

    E

    E

    E

    +

    =

    3/2

    * 2

    (

    )

    log

    2

    2

    2

    2

    V

    a

    a

    B

    F

    h

    B

    E

    E

    N

    KT

    E

    m

    KT

    h

    +

    =

    0

    ,

    0,

    AtK

    whenT

    =

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    Expressionfor

    Expressionfor

    Expressionfor

    Expressionforp

    p

    p

    p

    ininininVBVBVBVBintermsof

    intermsof

    intermsof

    intermsofNNNNaaaa

    Whent

    empincreases,

    more&moreacceptoratomsionize.

    Whentempfurtherincreases,allacceptoratomsionized.

    Furtherincreasesintemp,

    -

    Asare

    sult,fermilevelmoves

    toward

    sintrinsicferm

    ilevel.

    a

    .

    Thusat

    highertemp,intrinsic

    behaviourismaintaine

    d.

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    Substituting

    valueofE

    Fineqn1

    1

    3

    /2

    * 2

    2

    2

    exp

    h

    B

    V

    F

    B

    mKT

    E

    E

    n

    h

    KT

    =

    3/2

    * 2

    (

    )

    log

    2

    2

    2

    2

    V

    a

    a

    B

    F

    h

    B

    E

    E

    N

    KT

    E

    mK

    T

    h

    +

    =

    3/2

    *

    3/2

    2

    * 2

    log

    2

    2

    2

    2

    2

    2

    xp

    V

    a

    a

    B

    V

    e

    h

    B

    h

    B

    B

    E

    E

    N

    KT

    E

    mK

    T

    h

    mKT

    p

    e

    h

    K

    T

    +

    =

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    3/2

    *

    3/2

    2

    * 2

    log

    2

    2

    2

    2

    2

    2

    xp

    V

    a

    a

    B

    V

    e

    h

    B

    h

    B

    B

    E

    E

    N

    KT

    E

    m

    KT

    h

    mK

    T

    p

    e

    h

    K

    T

    +

    +

    =

    3/2

    *

    3/2

    2

    1

    2

    xp

    log

    h

    B

    V

    a

    a

    e

    mK

    T

    E

    E

    N

    p

    e

    =

    +

    3/2

    *

    3/4

    2

    * 2

    2

    2

    xp

    exp

    log

    2

    2

    2

    a

    h

    B

    V

    a

    e

    B

    h

    B

    N

    mK

    T

    E

    E

    p

    e

    h

    K

    T

    m

    KT

    h

    =

    2

    2

    2

    B

    h

    B

    m

    KT

    h

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    3/2

    *

    3/4

    2

    * 2

    2

    2

    x

    p

    2

    2

    2

    a

    h

    B

    V

    a

    B

    h

    B

    N

    m

    KT

    E

    E

    p

    e

    h

    KT

    m

    KT

    h

    =

    3/4

    * 2

    2

    2

    xp

    2

    h

    B

    V

    a

    a

    B

    mK

    T

    E

    E

    n

    N

    e

    h

    KT

    =

    E-E

    =In

    iz

    in

    nr

    fA

    r

    E=Amou

    ntofenergyrequiredtotransfe

    rane-fromEvtoEa.

    3/4

    *

    2

    2

    2

    2

    BEKT

    h

    B

    a

    m

    KT

    n

    N

    e

    h

    =

    Eqnisvalid

    onlyatlowtemperatures.Butathightemp,wemust

    taketheintrinsiccarrierc

    oncentrationalongwiththis.

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    Variationof

    Variationof

    Variationof

    VariationofEEEEFFFFwithwithwithwithtemp

    andan

    dan

    dan

    dNNNN

    aaaa

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    Variat

    ionof

    Variat

    ionof

    Variat

    ionof

    Variat

    ionofnnnneeee&&&&

    nnnnhhhhwithwithwithwith

    temptemptemptemp

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    Variationof

    Variationof

    Variationof

    Variationofelectrical

    electrical

    electrical

    electricalcond

    cond

    cond

    condwithwithwithwithte

    mp

    te

    mp

    te

    mp

    te

    mp

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    HallEffect

    Measurem

    entofconductivitywillnotdeterminewhetherthe

    conduct

    ionisduetoelectronorholesan

    dthereforewilln

    ot

    distingu

    ishbetweenp-ty

    peandn-typese

    miconductor.

    typesofcarriersandtheirc

    arrierdensitiesan

    disusedtodetermine

    themobilityofchargecarriers.

    Halleffe

    ctwasexplained

    by

    E.Hallin

    1879.

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    H

    allEffect

    Whencon

    ductor(metalo

    rsemiconductor)carryingacu

    rrent(I)

    isplace

    dinatransversemagneticfield(B),an

    electric

    field(EH)isproducedinsidetheconductorina

    direction

    normaltoboththecur

    rentandthemagneticfield.

    ThisphenomenonisknownasHallEffect.

    Thegeneratedvoltageisc

    alledHallVoltage.

    I

    B

    EH

    +++++

    +++++++++++++++++

    +++++

    +++++++++++++++++

    EH

    B

    I

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    N

    -Type

    P-Type

    -

    -

    Chargemov

    ement

    Righttoleft.

    (electrons)

    Lefttoright.(H

    oles)

    Magneticfield

    applied

    Z-dir

    Z-dir

    Voltageproduced

    Y-dir

    Y-dir

    Duetofield

    e-smovetowardsface1

    w

    ithvelocityv

    holesmovetowards

    face1withvelo

    cityv

    Thereforeap

    .doccursb/wf

    ace(1)andface

    (2)-givesEH

    -Ydir.

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    N-Type

    P-Type

    Forceduetop.d

    =

    (-)eE

    H

    =eE

    H

    Forceduetomagfield

    =(-)Bev

    =Be

    v

    AtE

    quilibrium

    (-)eE

    =(-)

    Bev

    eE=Bev

    EH=Bv

    EH=Bv

    Currentdensity(Jx)inX-dir

    Jx

    =(-)n

    ee

    v

    Jx

    =nhev

    v=(-)Jx/

    nee

    v=Jx/nhe

    (1)

    (2)

    Su

    b.

    (2)in(1)

    EH=(-)BJx

    /nee

    EH=BJ

    x/nhe

    RHHallCo-efficient

    Negative(-veY

    dir)

    Positive(+veYdir)

    EH=(-)BJ

    xRH

    EH=B

    JxRH

    RH=1

    /nee

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    H

    allco-effintermsofHallVoltage

    EH=

    BJxRH

    RH

    =EH/BJx

    HalfCoefficient(RH)isdefinedastheHallfield(EH)

    developedperunitcurrentdensity(Jx

    )perunit

    applied

    magneticfield(B).

    Ifthethickn

    essofthesample

    istandthevoltagedevelopedisVH,

    thenHallvo

    ltage

    EH=

    BJxR

    H

    (1)

    VH=

    EH.t

    (2)

    u.

    n

    ,wege

    VH

    =BJxRH

    t

    (3)

    Ifbisthewidthofthesample,

    thenareaof

    thesampleis(b.t)

    Therefore,c

    urrentdensity

    =Jx

    =Ix/(b.t)

    (4)

    H

    V

    H

    x

    RIBt

    bt

    =

    Sub.

    (4)in(3

    ),weget

    H

    HallVoltageV

    H

    x

    RIB

    b

    =

    H

    HallCoeffi

    H xVb

    R

    IB

    =

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    ExperimentalDeterminationofH

    allEffect

    H

    allEffect

    H

    allEffect

    H

    allEffect

    Asemiconductorslabofthicknesstandbrea

    dthbistakenandcurrent

    ispassedusingthebattery.

    Theslabisp

    lacedbetweenthepolepiecesofanelectromagnets

    othat

    currentdirectioncoincideswithx-axisandma

    gneticfieldcoincideswith

    z-axis.

    magneticfieldalong

    z-axis.

    twoprobesatthecenterofthe

    topand

    bottomfaces

    oftheslab(y-axis).

    IfBismagn

    eticfieldapplied

    andtheVH

    istheHallv

    oltageproduced,

    thenthe

    Hallcoeff

    icientcanbecalculatedfrom

    H

    H

    allCoeffi

    H xVb

    R

    IB

    =

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    Mobilityof

    chargeCarriers

    Mobilityof

    chargeCarriers

    Mobilityof

    chargeCarriers

    Mobilityof

    chargeCarriers

    H

    1

    HallCoeffi

    R

    ne

    =

    Weknow

    O

    nlyfordriftvelocity

    H

    3

    1

    HallCoeffi

    8

    R

    ne

    =

    Semi.Cond-Avgvelocity

    H

    1.1

    8

    R

    =

    (3)

    (2)

    Weknowtheconductivityforntypeis

    e

    e

    ne

    =

    1

    e e

    ne

    =

    Eqn.(3)canberewritten

    as

    H

    1

    1.1

    8R

    n

    e

    =

    (

    4)

    (5)

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    Substitutingeqn.

    (5)in(4

    )weget,

    1.1

    8e

    H

    e

    R

    =

    H

    HallCoeffi

    H xVb

    R

    IB

    =

    Sin

    ce

    (6)

    1.1

    8

    e

    H

    e

    R

    = 1

    .18e

    H

    e

    xVb

    IB

    =

    therefore

    Thusbyfind

    ingHallvoltag

    e,Hallcoefficientcanbecalcu

    latedand

    thusthemob

    ilityofthecharg

    ecarriers(e

    &

    h)canalsobedetermined.

    (7)

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    94