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Un
it
Un
it
Un
it
Un
it2222
1
Materials
Materials
Materials
Materials
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BasicS
emicondu
ctorCrys
talStruct
ure
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INTROD
UCTION
Material
having
electrical
resistiv
ity
(or)
ele
ctrical
conductivityinbetween
aconductorandaninsulato
r.
(or)
Solidwhichhastheen
ergybandsimilartothatofan
insulator.
Itactsasaninsulatoratab
solutezeroandasa
conductorathightem
peraturesandintheprese
nceof
impurities
.
Examples:
Si,Ge,GaA
s,InP,GaPetc
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Resistivityvariesfrom10-4to106m.(Conductor&Insulator).
At0K,it
behavesasinsulators.
At0Ktheyhaveempty
conductionbandandalmostfilled
valenceband.
PropertiesofSemicond
uctors
Bothelectronsandholes
arechargecarriers.
Haveneg
ativetemper
aturecoefficient
ofresistance.
=
(e+h)
1 T T
or
L NM M M
O QP P P
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Band
Structure
s
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Band
Structures
Plentyoffreee-s
Veryfew(or)no
freee-s
Fewfree
e-s
OverlappingVB&CB
La
rgeE
g(7eV)
NarrowEg(1eV)
Verysmallele
ctricfield
forconduction.
Verylargeelectric
field
forconduction.
Smallelectric
fieldfor
conduction.
+TCR(Temp
Co-effiof
Resistan
ce)
-TCR
-TCR
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Semicon
ductor
Semicon
ductor
Semicon
ductor
Semicon
ductor
omosition
omosition
omosition
omosition
PuritPuritPuritPurit
Classif
ication
Classif
ication
Classif
ication
Classif
ication
10
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ElementalS.C
Singleele
ment.(Ge,Si)
GroupIV
elements.
CompoundS
.C
Two
(or)moreelements.
(GaAS
,InP)
III-V
(or)II-VIelem
ents.
Composition
Composition
Composition
Composition
ovaent
on
ueto
bounding
ofneighboring
atomswith4valencee-s).
Indirectb
andgap
semiconductors.
(recombinationofe-sandho
les
takeplace
throughtraps)
(due
todifferencein
electro
negativity).
Directbandgap
semiconductors.
(reco
mbinationofe-sand
holestakeplacedire
ctly)
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Elemen
talS.C
Heatisproducedduring
recombina
tion.
Lifetimeofchargecarriersis
C
ompoundS.C
Photonsareproducedduring
recom
bination.
Lifetimeofchargeca
rriersis
Composition
Composition
Composition
Composition
more.
Diode,tra
nsistor,etc.,
less.
LED,Laserdiodes,etc.,
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TypesofSem
icon
ductors
TypesofSem
icon
ductors
TypesofSem
icon
ductors
TypesofSem
icon
ductors
Puresem
iconductorwithoutanyimpurities-Intrin
sicS.C.
Eg:Si,Ge,etc.In
trinsicS
emiconductor
Extrinsic
Semicondu
ctor
Impurefo
rmofsemiconductors-Extrin
sicS.C
*N-type:
(IntrinsicS.C
+
Pentavalentatoms(P,Ar,An,etc.,)
).
*P-type:(IntrinsicS.C
+Trivalentatom
s(B,A
l,Ga,etc.,
)).
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IntrinsicSemiconducto
r
Semic
onductorsGe,S
ihavecrystallinestructurean
dfour
valenceelectronsino
utermostshell(tetravalent).
AtomicnumberofGe
is32.
(1s22s22
p63s23p
64s23
d104p2).28
electronstightlyboun
dand4electron
srevolveinoutermostorbit.
AtomicnumberofSiis14.
(1s22s22
63s23p2).10electrons
tightlyboundand4electronsrevolve
inoutermostorbit.
When
twosemicondu
ctingatomsare
broughttogeth
er,each
positivecoreattracts
thevalenceelectronfromothe
ratomand
Soeachelectronissharedbytwoatoms.
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Intrinsicsemi
conductor
Acovale
ntbondisform
edbetweenthe
2electronsofa
nytwo
atoms.Sosuchelectronpairsarenotav
ailableforconduction.
At0K,a
puresemiconductoractsasaninsulator.Energ
yneedto
breaksuchacovalentbo
ndis0.72eVfo
rGeand1.1eV
forSi.
Whenelectronescapesfromcovalentbond,anemptyspaceis
.
Onceah
oleiscreated,anelectronfromthecovalentb
ondofa
nearby
atomshiftsto
occupythishole.
Thisprocesscontinuesandtheholegoesonshiftingfromone
atomtoanother.
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Intrinsicsem
iconductor..
Holea
ctslikeafreep
ositivecharge.
So,sem
iconductorhas
bothholesand
electronsascharge
carr
iers.
Dueto
thermalexcita
tion,whenelectronsaretransf
erredfrom
thev
alencebandto
theconduction
bandaneual
numberof
hole
sarecreatedin
thevalenceban
d.
Fermilevelatthemiddle
ofthegapindicatesthatthenu
mberof
electronsa
ndholesareequalinintrinsicsemiconductor.
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Structure&
Latticeofa
'normal'purecrystalofSilicon.
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E
xtrinsicSemiconductor
Processofaddingimpuri
tyatomstose
miconductoratoms(the
orderof1im
purityatomp
er10million(ormore)atom
softhe
semiconductor)iscalledDo
ping.(theratioofabout105:1).
Impurefo
rmofsemiconductors-Extrin
sicS.C
*N-type:
(IntrinsicS.C
+
Pentavalentatoms(P,Ar,An,etc.,)
).
*P-type:(IntrinsicS.C
+Trivalentatom
s(B,A
l,Ga,etc.,
)).
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Arsenic,A
ntimonyorPh
osphorusatom
s-fivee-s-o
utermost
valanceband
share
with
otheratoms-"Pent
avalent"
impuritie
s.
Fourof
thefivee-s-bondwithits
neighbouringS
iatoms-
leavingone"freeelectron"tomo
ve-whenan
electrical
voltaeisa
lied.
N-typeSemicondu
ctor.
Eachimp
urityatom"do
nates"onee--
"Donors".
Antimony
-51e-s-5shellsaroundthenucleus-5valancee-s.
Excessof
currentcarryinge-s-withanegativecharge
"N-type"
material-e-sa
s"MajorityCa
rriers"&resultantholes
"Minority
Carriers".
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Structure&
Latticeofthedonorimpu
rityatomAntimony.
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MaterialswhichhavePentavalentimpu
rityatoms(donors)and
conductby"electron"m
ovement-N-ty
peSemiconduc
tors.
Inthesetypesofmaterialsare:
1
.Donorsarepentavalentatom
s.
2
.Therearealargenumberoffr
eeelectrons.
3
.Asmallnumberofholesinrelationtothenum
berof
Su
mmary-N-type(Antim
ony)
freeelec
trons.
4
.Dopinggives
:
negativelychargedfree
electrons.
5
.Supplyofene
rgygives:
negativelychargedfree
electrons.
positive
lychargedhole
s.
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P-Type
Semiconductor
"Trivalen
t"(3e-)impurity-Aluminium,BoronorIndium.
Only3valencee-s-available-fourthco
valentbondcan
notbe
formed.
Complete
connectionis
notpossib
le
-
giving
rise
-
abundanceofpositively
chargedcarriers-holes.
Adjoining
freee--attrac
ted-willtryto
moveintothehole.
e-fillingtheholeleavesanotherholebehindit.
Thisintu
rnattractsanothere-wh
ichcreatesanother
hole.
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Holesaremovingasapositivecharge.
Eachimp
urityatomgen
eratesahole-
"Acceptors"-asthey
arecontinually"accepting"extraelectro
ns.
Boron-trivalentadditive-5e-s-2sh
ellsaroundnucleus-3
-
Addition
ofBoroncaus
esconduction
-mainlyofpositive
chargeca
rriers-"P-type"material.
Positiveholes-"Majo
rityCarriers"&
freeelectrons-
"Minority
Carriers".
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Structure&
Latticeoftheacceptorim
purityatom
Boron.
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S
ummary-P
-type(Boro
n)
Materialsw
hichhaveTrivalentimpuritya
toms(acceptors)and
conductby
"hole"movem
entandarecalled,P-typeSemiconds.
Inthesetypesofmaterials
are:
1.Acceptorsaren
egativelycharg
ed.
(Readilyacc
epts).
2.Therearealargenumberofholes.
3.Asmallnumber
offreeelectron
sinrelationto
the
num
ero
oes.
4.Dopinggives:
negativelychargedacceptors.
positivelychargedholes.
5.Supplyofenerg
ygives:
positivelychargedholes.
negatively
chargedfreeelectrons.
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Intrin
sic
Extrinsic
Extrinsic
Ntype
P-type
P
entavalent
Trivalent
Donoratom
Acceptoratom
Donatese-s
Acceptse-s
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CarrierC
oncentration
inIntrinsicSemiconductor
CarrierConcentration
inIntrinsicSemiconductor
CarrierC
oncentration
inIntrinsicSemiconductor
CarrierConcentration
inIntrinsicSemiconductor
At0K,i
ntrinsicsemico
nductorbehavesasinsulator,andiftemp.
increase
d,e-sfromvale
ncebandexcitedintothecond
uctionband.
Number
ofchargecarriersperunitvo
lumeofthematerialis
calledCa
rrierConcentration.
esee
ectronseave
ereeparc
e.
Holescreatedbythese
e-sinthevalencebandalsobe
havelikea
freeparticle.
So,massoftheelectron
andholeisreplacedbyitseffectivemass
me*a
ndmh
*respectiv
ely.
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CarrierCo
ncentrationinIntrins
icSemiconductor
CarrierCo
ncentrationinIntrins
icSemiconductor
CarrierCo
ncentrationinIntrins
icSemiconductor
CarrierCo
ncentrationinIntrins
icSemiconductor
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Densit
yofelectronsinconduc
tionband
Numberofc
hargecarriersperunitvolume
ofthematerial
(i.e.,
intrinsicsem
iconductor)isk
nownasCarrie
rConcentration.
(
)
(
)
dn
ZE
dEFE
=
1
NumberofelectronsinCB-integratingfrom
Ec
to
Pa
ge1.1
9eqn.
(12)
Densityofsta
tesZ(E)dEofelectronsintheconductionband
is
(
)
()
cE
n
dn
ZEFEd
E
=
=
2
*
3/2
1/2
3
4
(
)
(2
)e
ZEdE
m
E
dE
h=
3
me-me*
Page1.2
0
P
age1.1
9eqn.
(11)
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Ec
Lowesten
ergy
levelofCB
.
Energy(E)forane-inCBequalto
(E-Ec).
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Densityo
felectronsinC
B
Eqn.
3becom
es
*
3/2
1/2
3
4
(
)
(2
)
(
)
e
c
ZEdE
m
E
E
dE
h
=
4
WeknowF(E)
1
(
)
1
exp(
)F
F
E
E
EKT
=
+
5
E=(E-Ec).
Su
b.eqn.4and5ineqn2
()
(
)
cE
n
dn
ZEFEdE
=
=
=
1
/2
*
3/2
3
(
)
4
(2
)
1
exp(
)
c
c
e
F
E
B
E
E
dE
m
E
E
h
K
T
+
6
*
3/2
1
/2
3
4
(
2
)
(
)
1
exp(
)
c
e
c F
E
B
m
E
E
dE
h
E
EKT
+
n=
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F
B
E
E
KT
1
F
B
E
EKT
exp
1
FB
E
EKT
1e
xp
e
xp
F
F
B
B
E
E
E
E
KT
KT
+
=
Foralltem
peratures,theen
ergyrequiredbyanelectrontomove
fromthev
alencebandto
theconduction
bandisalwaysgreater
than4KB
T.
1
1
exp
1
exp
exp
F
B
F
F
B
B
E
E
K
T
E
E
E
E
K
T
K
T
=
=
=
+
Eqn.6becomes
*
3/2
1/2
3
4
(2
)
(
)
exp
c
F
e
c
B
E
E
E
n
m
E
E
dE
h
KT
=
e
xp
FB
E
EKT
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Eqn.6
becomes
*
3/2
1/2
3
4
(2
)
exp
(
)
ex
p
c
F
e
c
B
B
E
E
E
n
m
E
E
dE
h
KT
KT
=
7
Tosolveeqn7
theintegrallimitsalsogetchang
edaccordinglyasfollows
c
E
E
x
=
+
c
E
Ex
=
Letusassum
e
dEd
x
=
c
c
E
E
x
=
cEx
=
case:1
case:2
c
W
hen
E
E=
whenE=
0
x=
x=
(Lower
limi
t)
(Upper
limit)
Eqn.
7becomes
*
3/2
1/2
3
0
4
(2
)
exp
(
)
(
)
exp
(
)
C
F
e
B
B
E
x
E
n
m
x
dx
h
KT
KT
+
=
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/
1/2
3/2
0
(
)
2
B
xK
T
B
xe
dx
KT
=
*
3/2
3/2
4
F
c
E
E
=
Usinggammafunction
Therefore,
9
/
*
3/2
1/
2
3
0
4
(2
)
exp
B
xKT
F
c
e
B
E
E
n
m
x
e
dx
h
KT
=
8
3
2
e
B
h
KT
Eqn.
(10)-
densityofelectronsintheconduction
band.
3/2
* 2
2
2
exp
e
B
F
C
B
mK
T
E
E
n
h
K
T
=
10
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Asthep
resenceoftheholecan
be
regarde
dastheabsenc
eofanelectro
n.
Den
sityofHole
sinValanceband
Numberofholesperunit
volumeintheV
Bofasemicon
ductor
canbefou
ndinasimilarmanner.
F(E)repre
sentstheproba
bilityoffilled
state.
Asthemaximumprobab
ilitywillbe1,the
probabilityofunfilledstateswill
be1-F(E)
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CarrierConcentrat
ioninIntrinsicSemiconductor
CarrierConcentrat
ioninIntrinsicSemiconductor
CarrierConcentrat
ioninIntrinsicSemiconductor
CarrierConcentrat
ioninIntrinsicSemiconductor
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1
1
1
exp
F
B
E
EKT
=
+
F
B
E
E
KT
Here
1
()
FE
exp
1
exp
F
B
F
B
EEKT E
E
K
T
=
+
1
F
E
E
exp
1
F
E
E
B
1
exp
1
F
B
E
E
K
T
+
=
1
(
)
exp
F
B
E
E
F
E
KT
=
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(
)[1
(
)]
dp
ZE
F
E
dE
=
*
3/2
1/2
3
4
(2
)(
)
exp
F
h
EE
dp
m
E
dE
h
KT
=
Takingthe
effectivemass
ofholesasmh*
Numbe
rofholesinth
eenergyintervalEandE+dE
intheVBis
11 12
*
3/2
1/2
3
4
(2
)
(
)
exp
F
h
v
B
EE
dp
m
E
E
dE
h
KT
=
*
3/2
1/2
3
4
(2
)
(
)
exp
vE
F
h
v
B
E
E
p
dp
m
E
E
dE
h
KT
=
=
Energy(E
)foranholesinVBequalto(Ev-E).
HolesinVB
calculated-inte
grating-
toEv
13
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En
ergy(E)foran
holesinVBequalto(Ev-E).
Ec
Lowestenergy
levelofCB.
Ev
Higheste
nergy
levelofVB.
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v
E
E
x
=
E=
Letusconside
r
Tosolveeqn.(14)
vE
Ex
=
dE
d
x
=
*
3/2
1/2
3
4
(2
)
exp
(
)
ex
p
vE
F
h
v
B
B
E
E
p
m
E
E
dE
h
KT
KT
=
14
v
v
v
E
E
x
=
(
)
v vE
x
E
x
=
+
=
ase:
x
=
(Lo
wer
limit)
0
x=
(Upper
limit)
Eqn.
(14)becomes
0
*
3/2
1/2
3
4
(2
)
exp
e
xp
(
)
v
F
h
B
B
E
x
E
p
m
x
dx
h
KT
KT
=
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0
*
3/2
1/2
3
4
(2
)
exp
ex
p
(
)
v
F
h
B
B
E
x
E
p
m
x
dx
h
KT
KT
=
0
*
3/2
1/2
3
4
(2
)
exp
exp
(
)
v
F
h
B
B
E
E
x
m
x
dx
h
KT
KT
=
Toremov
evesignintegrallimitsis
changed
/
*
3/2
1/2
3
0
4
(2
)
ex
p
B
xKT
v
F
h
B
E
E
m
xe
dx
h
KT
=
1/2
/
3/2
0
(
)
2
xkT
B
x
e
dx
KT
=
Using
gammafu
nction
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* 2
2
2
exp
h
B
V
F
B
mK
T
E
E
P
h
K
T
=
aboveequationcanbesolve
dwiththehelpofgammafunctionand
then
15
qn.
-nu
m
ero
oes
orvacance
sn
evaence
an.
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e-sinCB
HolesinVB
F(E)dE
1-F(E)dE
(E
-EF
)>>K
BT
(
E-EF
)
1
exp
exp
a
F
a
F
B
B
E
E
EE
KT
KT
+
=
exp
1
a
F
B
E
E
K
T
>>
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(
)
exp
F
a
a
B
E
E
F
E
K
T
=
exp
F
a
a
B
E
E
nN
KT
=
Thereforeeqn(2)
becomes
Atequilibrium
(
)
a
a
nN
FE
=
3
Densityofh
olesin
VB(eqn.1)
Densityofelectronsinacceptor
energylevel.
(eqn.
3)
=
3/2
* 2
2
2
exp
exp
V
f
h
B
F
a
a
B
B
E
E
m
KT
E
E
N
h
KT
KT
=
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3/2
* 2
2
2
exp
exp
h
B
V
F
F
a
a
B
B
m
KT
E
E
E
E
N
h
KT
KT
=
(
)/
3/2
(
)/
* 2
2
2
V
F
B
F
a
B
E
E
KT
a
E
E
KT
h
B
N
e e
mKT
h
=
((
)
2
)/
3/2
* 2
2
2
V
a
F
B
E
E
E
KT
ah
B
N
e
mK
T
h
+
=
(
)/
3/2
* 2
22
V
F
a
F
B
E
E
E
E
KT
ah
B
N
e
m
KT
h
+
=
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Takinglogonbothsides
3/2
* 2
(
)
2
log
2
2
V
a
F
a
B
h
B
E
E
E
N
KT
m
KTh
+
=
3/2
* 2
2
(
)
log
2
2
a
F
V
a
B
h
B
N
E
E
E
K
T
m
KT
h
=
+
(
)
2V
a
F
E
E
E
+
=
3/2
* 2
(
)
log
2
2
2
2
V
a
a
B
F
h
B
E
E
N
KT
E
m
KT
h
+
=
0
,
0,
AtK
whenT
=
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Expressionfor
Expressionfor
Expressionfor
Expressionforp
p
p
p
ininininVBVBVBVBintermsof
intermsof
intermsof
intermsofNNNNaaaa
Whent
empincreases,
more&moreacceptoratomsionize.
Whentempfurtherincreases,allacceptoratomsionized.
Furtherincreasesintemp,
-
Asare
sult,fermilevelmoves
toward
sintrinsicferm
ilevel.
a
.
Thusat
highertemp,intrinsic
behaviourismaintaine
d.
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Substituting
valueofE
Fineqn1
1
3
/2
* 2
2
2
exp
h
B
V
F
B
mKT
E
E
n
h
KT
=
3/2
* 2
(
)
log
2
2
2
2
V
a
a
B
F
h
B
E
E
N
KT
E
mK
T
h
+
=
3/2
*
3/2
2
* 2
log
2
2
2
2
2
2
xp
V
a
a
B
V
e
h
B
h
B
B
E
E
N
KT
E
mK
T
h
mKT
p
e
h
K
T
+
=
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3/2
*
3/2
2
* 2
log
2
2
2
2
2
2
xp
V
a
a
B
V
e
h
B
h
B
B
E
E
N
KT
E
m
KT
h
mK
T
p
e
h
K
T
+
+
=
3/2
*
3/2
2
1
2
xp
log
h
B
V
a
a
e
mK
T
E
E
N
p
e
=
+
3/2
*
3/4
2
* 2
2
2
xp
exp
log
2
2
2
a
h
B
V
a
e
B
h
B
N
mK
T
E
E
p
e
h
K
T
m
KT
h
=
2
2
2
B
h
B
m
KT
h
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3/2
*
3/4
2
* 2
2
2
x
p
2
2
2
a
h
B
V
a
B
h
B
N
m
KT
E
E
p
e
h
KT
m
KT
h
=
3/4
* 2
2
2
xp
2
h
B
V
a
a
B
mK
T
E
E
n
N
e
h
KT
=
E-E
=In
iz
in
nr
fA
r
E=Amou
ntofenergyrequiredtotransfe
rane-fromEvtoEa.
3/4
*
2
2
2
2
BEKT
h
B
a
m
KT
n
N
e
h
=
Eqnisvalid
onlyatlowtemperatures.Butathightemp,wemust
taketheintrinsiccarrierc
oncentrationalongwiththis.
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Variationof
Variationof
Variationof
VariationofEEEEFFFFwithwithwithwithtemp
andan
dan
dan
dNNNN
aaaa
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Variat
ionof
Variat
ionof
Variat
ionof
Variat
ionofnnnneeee&&&&
nnnnhhhhwithwithwithwith
temptemptemptemp
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Variationof
Variationof
Variationof
Variationofelectrical
electrical
electrical
electricalcond
cond
cond
condwithwithwithwithte
mp
te
mp
te
mp
te
mp
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HallEffect
Measurem
entofconductivitywillnotdeterminewhetherthe
conduct
ionisduetoelectronorholesan
dthereforewilln
ot
distingu
ishbetweenp-ty
peandn-typese
miconductor.
typesofcarriersandtheirc
arrierdensitiesan
disusedtodetermine
themobilityofchargecarriers.
Halleffe
ctwasexplained
by
E.Hallin
1879.
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H
allEffect
Whencon
ductor(metalo
rsemiconductor)carryingacu
rrent(I)
isplace
dinatransversemagneticfield(B),an
electric
field(EH)isproducedinsidetheconductorina
direction
normaltoboththecur
rentandthemagneticfield.
ThisphenomenonisknownasHallEffect.
Thegeneratedvoltageisc
alledHallVoltage.
I
B
EH
+++++
+++++++++++++++++
+++++
+++++++++++++++++
EH
B
I
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N
-Type
P-Type
-
-
Chargemov
ement
Righttoleft.
(electrons)
Lefttoright.(H
oles)
Magneticfield
applied
Z-dir
Z-dir
Voltageproduced
Y-dir
Y-dir
Duetofield
e-smovetowardsface1
w
ithvelocityv
holesmovetowards
face1withvelo
cityv
Thereforeap
.doccursb/wf
ace(1)andface
(2)-givesEH
-Ydir.
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N-Type
P-Type
Forceduetop.d
=
(-)eE
H
=eE
H
Forceduetomagfield
=(-)Bev
=Be
v
AtE
quilibrium
(-)eE
=(-)
Bev
eE=Bev
EH=Bv
EH=Bv
Currentdensity(Jx)inX-dir
Jx
=(-)n
ee
v
Jx
=nhev
v=(-)Jx/
nee
v=Jx/nhe
(1)
(2)
Su
b.
(2)in(1)
EH=(-)BJx
/nee
EH=BJ
x/nhe
RHHallCo-efficient
Negative(-veY
dir)
Positive(+veYdir)
EH=(-)BJ
xRH
EH=B
JxRH
RH=1
/nee
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H
allco-effintermsofHallVoltage
EH=
BJxRH
RH
=EH/BJx
HalfCoefficient(RH)isdefinedastheHallfield(EH)
developedperunitcurrentdensity(Jx
)perunit
applied
magneticfield(B).
Ifthethickn
essofthesample
istandthevoltagedevelopedisVH,
thenHallvo
ltage
EH=
BJxR
H
(1)
VH=
EH.t
(2)
u.
n
,wege
VH
=BJxRH
t
(3)
Ifbisthewidthofthesample,
thenareaof
thesampleis(b.t)
Therefore,c
urrentdensity
=Jx
=Ix/(b.t)
(4)
H
V
H
x
RIBt
bt
=
Sub.
(4)in(3
),weget
H
HallVoltageV
H
x
RIB
b
=
H
HallCoeffi
H xVb
R
IB
=
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ExperimentalDeterminationofH
allEffect
H
allEffect
H
allEffect
H
allEffect
Asemiconductorslabofthicknesstandbrea
dthbistakenandcurrent
ispassedusingthebattery.
Theslabisp
lacedbetweenthepolepiecesofanelectromagnets
othat
currentdirectioncoincideswithx-axisandma
gneticfieldcoincideswith
z-axis.
magneticfieldalong
z-axis.
twoprobesatthecenterofthe
topand
bottomfaces
oftheslab(y-axis).
IfBismagn
eticfieldapplied
andtheVH
istheHallv
oltageproduced,
thenthe
Hallcoeff
icientcanbecalculatedfrom
H
H
allCoeffi
H xVb
R
IB
=
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Mobilityof
chargeCarriers
Mobilityof
chargeCarriers
Mobilityof
chargeCarriers
Mobilityof
chargeCarriers
H
1
HallCoeffi
R
ne
=
Weknow
O
nlyfordriftvelocity
H
3
1
HallCoeffi
8
R
ne
=
Semi.Cond-Avgvelocity
H
1.1
8
R
=
(3)
(2)
Weknowtheconductivityforntypeis
e
e
ne
=
1
e e
ne
=
Eqn.(3)canberewritten
as
H
1
1.1
8R
n
e
=
(
4)
(5)
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Substitutingeqn.
(5)in(4
)weget,
1.1
8e
H
e
R
=
H
HallCoeffi
H xVb
R
IB
=
Sin
ce
(6)
1.1
8
e
H
e
R
= 1
.18e
H
e
xVb
IB
=
therefore
Thusbyfind
ingHallvoltag
e,Hallcoefficientcanbecalcu
latedand
thusthemob
ilityofthecharg
ecarriers(e
&
h)canalsobedetermined.
(7)
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94