Documents Mitigation of fast particles from laser- produced Sn plasma for an extreme ultraviolet lithography.....

Slide 1Mitigation of fast particles from laser- produced Sn plasma for an extreme ultraviolet lithography source Y.Tao and M.S.Tillack [email protected] University of California,…

Documents Laser System Upgrade Overview RF Gun review @ 19, Nov, 2015.

Inj group 150318 Laser System Upgrade Overview RF Gun review @ 19, Nov, 2015 Requirement of laser system for RF-Gun Laser energy 500 mJ for Ir5Ce cathode 50 mJ for Ce2Te…

Documents Y.Tao and M.S.Tillack yetao@ucsd University of California, San Diego EUV Source Workshop

Mitigation of fast particles from laser-produced Sn plasma for an extreme ultraviolet lithography source Y.Tao and M.S.Tillack [email protected] University of California, San…