Documents IC Processing. Initial Steps: Forming an active region Si 3 N 4 is etched away using an F-plasma:...

Slide 1IC Processing Slide 2 Slide 3 Slide 4 Slide 5 Initial Steps: Forming an active region Si 3 N 4 is etched away using an F-plasma: Si3dN4 + 12F → 3SiF 4 + 2N 2 Or…