www.lesker.com + 44 (0) 1424 458100 [email protected]
www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerKurt J LeskerIs a global supplier and manufacturer of high & ultra high vacuum solutions
Established in 1954 Kurt J Lesker Company
www.lesker.com + 44 (0) 1424 458100 [email protected] Customer Support6 Global distribution centres
8 Strategic Sales Offices
www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerKurt J Lesker Company LTD
European HeadquartersEstablished in 1991New facility 2008
Centre for European operationsSales support officeDesign officeTest & Assembly Clean RoomExtensive warehouse facilities
Strategic Business Segmentswww.lesker.com + 44 (0) 1424 458100 [email protected]
www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerVacuum Components
www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerManufacturingVacuum Chamber Manufacturing Pittsburgh- USAHastings UK
CapabilitiesStandard vacuum chambersComplete bespoke Solutions
Quality Management3D Inspection facilitiesISO Certification
www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerMaterials GroupKurt J Lesker support a wide range of production groups
Solar panel manufactureSemiconductorElectronic devicesOptical coatingsAutomotive lightingR&DComplete custom solutions available
MaterialsBacking platesFilaments
www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerProcess Equipment DivisionPVD Tools21 Standard vacuum platforms
Custom PVD ToolsBespoke design and process solutions
Thin Film Deposition Expertise:ThermalE-BeamOLEDsputteringMetal /Organic chemical vapour depositionAtomic layer deposition
www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerProcess Equipment DivisionSputtering /OLED SourcesSputtering Linear CathodesWe develop & manufacture our own range of sputtering/ OLED sourcesIn addition we are able to offer a wide selection of linear cathodes
FeaturesSystem DesignersManufacturersExperts Manufacturing systems since 1974
Chamber manufacturers
Extensive application knowledge
USA & UK clean room assembly areas
KJL designed and built Magnetron Torus sputter guns
KJL designed and built OLED sources
8 standard system platforms
Custom solutions available
Magnetron sputtering
Thermal evaporation
Atomic layer deposition
E-beam evaporation
Organic evaporation
Kurt J Lesker SystemsDeposition Techniques:NANO 36PVD SeriesPVD 75PVD 225PVD 250PVD 500CMS SeriesCMS-18CMS-24LAB-18SPECTROS SeriesMini-SPECTROSSPETROS 100/150Super-SPECTROS 150/200LUMINOSOCTOSALD SeriesAXXISwww.lesker.com + 44 (0) 1424 458100 [email protected]
NANO36Adaptable chamber options
Compact integrated design
High speed diffusion pump
Single wide range gauge
PLC control with touch screen interface
Film thickness monitor with thermal sourcesMulti-technique options: Up to 3 metal thermal sources Torus circular magnetron sputtering sources 1-4 optionsOptions: SS bell jar SS chamber Dry roughing pump 300l/s Turbo Substrate rotation Heating to either 150 C or 350 Cwww.lesker.com + 44 (0) 1424 458100 [email protected]
NANO36 The Nano36 is the newest and most economical deposition system
It showcases our ability to provide the versatility and reliability that the Kurt J. Lesker Company has become known for around the world
The Nano36 is our most affordable deposition platform available designed with the entry to mid level user in mind
The Nano36 will accommodate most evaporation processes as well as magnetron sputtering
The Nano36 has a small footprintwww.lesker.com + 44 (0) 1424 458100 [email protected]
PLC control
This affordable, full feature system offers reliable PLC control with a color touch screen interface
Single button commands and manual operation are accessed from the touch screen
This offers a simple and convenient user interface with the Nano36Process controlwww.lesker.com + 44 (0) 1424 458100 [email protected]
Chamber options
The Nano36 has standard configurations to suit most users
Chamber choices are either a simple 12Diameter x 18 High glass bell jar or a 16 x 16 stainless steel box chamber
The box chamber door opens wide for easy chamber access
Maintenance of the chamber, source replenishment, and source change out can be performed in a matter of minutesProcess Chamber16 x 16 Box Chamber as shown. Also a 12 Diameter x 18 high glass bell jar available.www.lesker.com + 44 (0) 1424 458100 [email protected]
VacuumPumps
The Nano 36 has 3 standard High Vacuum pumping options: 300L/S Turbo, 685 L/S Turbo, or a 700 L/S Diffusion PumpHigh Vacuum pump choices include 300 L/S Turbo, 685 L/S Turbo, or 700 L/S Diffusion PumpDry Foreline/Roughing pumps available (as pictured) as well as oil sealed rotary vane pumpswww.lesker.com + 44 (0) 1424 458100 [email protected]
PlatenFlat plate substrate fixture
Substrate options include primary rotation and heating up to 350 C with dual quartz lamp heatersDual Quartz Lamp HeatersSubstrate Plate on central twist lock hub. Substrate can be held in a fixed position or rotated about the central shaft.www.lesker.com + 44 (0) 1424 458100 [email protected]
PlatenFlat plate substrate fixture
The Nano36 can accommodate up to an 8 diameter substrate mounting plate
One single 8 wafer or multiple smaller wafers can be held in place
The substrate plate can be easily removed or placed into the system with either a lift up and out hub mount or a twist-lock mountingPin/Hub mounted platen can easily be lifted and removed with one hand.www.lesker.com + 44 (0) 1424 458100 [email protected]
Film thickness control
Evaporation methods are controlled via a quartz crystal sensor in conjunction with a thin film controller
The controller offers ease of use and reliability that is necessary to control the most demanding evaporation processesTwist-Lock platen with quartz crystal monitor head.Front Panel Film Thickness ControllerFilm Thicknesswww.lesker.com + 44 (0) 1424 458100 [email protected]
Thermal Evaporation Source
The Nan36 can be configured with three thermal evaporation sources on the base plate
The evaporation sources are sufficiently isolated from each other by shields to prevent cross contamination
The sources also are stood off of the base plate of the chamber and are mounted on water cooled posts to limit excess heating of the chamber
Thermal sources can be filament, basket heaters, box heaters, boats (coated and uncoated), rods, and screens
Easy access to the boats and the mounting posts makes these sources very user friendly
The Kurt J. Lesker Company is a global supplier of a large range of deposition sources and deposition materials
EvaporationUp to Three thermal evaporation sources can be accommodated. The thermal sources are well shielded from each other and the chamber by the use of shielding.www.lesker.com + 44 (0) 1424 458100 [email protected]
www.lesker.com + 44 (0) 1424 458100 [email protected] Sputtering Source
The Nan36 can be configured with two thermal evaporation sources on the base plate
Pneumatic shutters
DC, RF or Pulsed DC
Easy access for target change
UtilitiesUtilites
The Nano36 has a small footprint and comes with heavy duty wheels and retractable mounting pads. This makes the system very easy to wheel into place, set up, and level
Utilities are accessed from central point on the back of the system so utilities hook up is easy and straight forward
This makes the Nano36 very portable. It is easy to move and set up anywhereUtilities located across the back panel of the systems framewww.lesker.com + 44 (0) 1424 458100 [email protected]
Service and warrantyYearly service package One day Two days Three days Four days Five days
Package includes:
Service/preventative maintenance and/or Training Excludes:
Parts, Travel and subsistence
Warranty
12 months on all systems
Options within warranty period: 1 year extended warranty 2 years extended warrantywww.lesker.com + 44 (0) 1424 458100 [email protected]
NANO 36 benefitsDesigned for:UniversitiesIndustrial and Government laboratories R&D applications Compact footprint design Multiple chamber options Easy to use Plug & Play Installation Quick Deliver Cost Effective Price A professional and attractive system that is self contained and ready to work, the Nano36 is manufactured with quality components supplied and stocked by the Kurt J. Lesker Company. We provide the quality, availability, and economy that our customers have come to expect from uswww.lesker.com + 44 (0) 1424 458100 [email protected]
PVD 75D-shaped 304 stainless steel chamberAluminium door with rectangular viewportTurbomolecular or cryogenic pumpingManual touch-screenSingle, multiple or custom substrate fixturesFully enclosed zero clean room footprint designMulti-technique options: up to 3 Torus circular magnetron sputtering sources
multi-pocket electron beam evaporation source
multiple thermal evaporation sourcesOptions:Recipe-controlled PC based process automation
Glow discharge / RF BiasFeatureswww.lesker.com + 44 (0) 1424 458100 [email protected]
FrameworkFully enclosed system cabinet
Can be flush mounted in clean room wall
Utilities: Single service drop (220VAC, 50Hz, single phase, 30 Amps-- based on configuration). Dedicated earth ground required
E-beam power supply: 400V AC/ 3phase/ 50Hz/ 40amps
Compressed air Swagelok @ 80 psi
Dry Nitrogen Vent Gas Swagelok @ 10 psi
Water: Typically 2 to 3 gpm, 25 C @ 50 psi
Process Gas Swagelok @ 5 to 7 psi (if applicable)
Leveling pads
Options:
400VAC, 50/60Hz, 3 phase, 5-wire, 30 Amps power distribution
www.lesker.com + 44 (0) 1424 458100 [email protected]
Process ChamberD-shaped
304 SS chamber
14" x 24" D-shaped
ISO-250 top-plate & base plate ports
Aluminum Door with 5.25x 3.25 viewing area
ISO 100 & 160 gauging & pumping portswww.lesker.com + 44 (0) 1424 458100 [email protected]
SputteringUp to 3 Torus Magnetron sources
1- 4 diameter
Axial, right angle, flex and custom mounts
Integral flip or swing shutters
RF, DC, pulsed DC power
Mass flow controlled gas inlet
Manual or automatic upstream pressure control
Compression fittings to adjust source to substrate distance
VHV compatibleOptions: High strength magnet upgrade for use when depositing magnetic materials Gas injection ring and deposition chimney
www.lesker.com + 44 (0) 1424 458100 [email protected]
E-BeamElectron Beam Evaporation Source
KJLC 4 pocket (8cc) E-Beam gun
5kW solid state power supply with programmable sweep and automatic crucible indexing
High voltage discharge hook
Includes all electrical and water feedthroughs and shielding
One pneumatically actuated source shutter
14 throw distance
www.lesker.com + 44 (0) 1424 458100 [email protected]
EvaporationThermal Evaporation Source Module Up to 3 Thermal Source assembly with water cooled high current feedthroughs (for sequential deposition)
2 kW Power Supply
Computer controlled 3-Position Source Selection Switch
1 pneumatically actuated shutter covers all sources
Cross contamination shielding
Options: Additional 2 kW power supply and transformer to allow co-deposition
Upgrade to 4kW power supply and transformer in place of 2 kWwww.lesker.com + 44 (0) 1424 458100 [email protected]
Low temperature organic evaporation source
KJLC 10cc LTE organic material evaporation source with integrated pneumatic flip shutter (Up to 6 sources may be configured in the system)
KJLC LTE evaporation source power supply
Options:
LTE sources
- 1cc
- 30ccOrganicwww.lesker.com + 44 (0) 1424 458100 [email protected]
PlatenSubstrate holder Non-rotating, top mounted substrate platen (12) using KJLC multi-site substrate fixture
Single or multiple substrates
Options: Rotary drive (up to 20rpm) for platen, variable speed
Pneumatically actuated flip style substrate shutter (compatible with substrates up to 8)
Pneumatically actuated swing style substrate shutter (compatible with substrates up to 4)
Custom configurations are available
Substrate heating options: 150 C - 350 C (quartz lamp) Up to 600 C (resistive element, compatible with only substrates up to 4)
www.lesker.com + 44 (0) 1424 458100 [email protected]
VacuumPumps
260 l/s Pfeiffer turbomolecular pump standard
Backing/roughing pump
Rotary vane mechanical pump
Options: 685 l/s Pfeiffer turbomolecular
1500 l/s CTI cryogenic pump
Oil free Scroll Pump
Base Pressure 5 x 10-7 mbar or less with 260 l/s turbo
2 x 10-7 mbar or less with 685 l/s turbo
5 x 10-8 mbar or less with 1500 l/s cryo pumpwww.lesker.com + 44 (0) 1424 458100 [email protected]
PressureGauges
Wide range vacuum gauge reads from atmosphere to 10-10 mbar (Ion gauge and Pirani)
Pirani gauge in Cryo / foreline (when applicable)
Readout is displayed on system control panel
Options:
Capacitance manometer for sputtering applicationswww.lesker.com + 44 (0) 1424 458100 [email protected]
Pumping260 l/s turbomolecular pump (standard)5 x 10-6 in 18 minutes5 x 10-7 OvernightBase Pressure 3 x 10-7 mbar685 l/s turbomolecular pump (option)5 x 10-6 in 16 minutes2 x 10-7 in 35 minutesBase pressure 1 x 10-7 mbar1500 l/s cryogenic pump (option)5 x 10-6 in 4 minutes5 x 10-7 in 10 minutes5 x 10-8 in 65 minutesBase pressure 2 x 10-8 mbar
Pump down times based on clean and dryproperly conditioned chamberwww.lesker.com + 44 (0) 1424 458100 [email protected]
Process controlProcess PC based with optional Recipe-Control
Touch screen controller
Film thickness monitor/controller
Automatic pump down and vent
Integrated power distribution
Mass flow controlled gas inlet
Options: Heating
Cooling
Substrate bias
Ion Source www.lesker.com + 44 (0) 1424 458100 [email protected]
Computer controlPC-based control system
KJLC C-Ware Visual Basic based software (Windows XP)
Screen layouts follow the guidelines of SEMI E95-0200
Includes Graphical User Interface (When applicable):
Vacuum Deposition Gas Motion Cooling HeatingOptions:Recipe driven computer control Creation and storage using Microsoft Access database Selection of pre-written recipe Edit, copy of existing recipeswww.lesker.com + 44 (0) 1424 458100 [email protected]
Service and warrantyYearly service package One day Two days Three days Four days Five days
Package includes: Service/preventative maintenance and/or Training
Excludes: Parts, Travel and subsistence
Warranty 12 months on all systems
Options within warranty period:
1 year extended warranty 2 years extended warrantywww.lesker.com + 44 (0) 1424 458100 [email protected]
PVD 75 benefitsDesigned for:
Universities
Industrial, Government laboratories
R&D applications
Small batch production
zero clean room footprint design
Plug & play installation
Quick delivery
Cost effective price:
Thermal $65K - $120Sputter $90K - $180KE-beam $150K - $220KOrganic on requestwww.lesker.com + 44 (0) 1424 458100 [email protected]
www.lesker.com + 44 (0) 1424 458100 [email protected] J LeskerKurt J Lesker website and catalogueOver 14,000 standard products are found in our catalogueOur website offers real time information on all our products & services
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