Workshop Workshop on Advanced Method on Advanced Method s s for Interpretation of for Interpretation of TEM, X TEM, X - - Ray and SIMS Measurement Ray and SIMS Measurement s s in in Nano Nano and Atomic Scale and Atomic Scale 1- 3 June 2005 3 June 2005 , , INSTITUTE OF PHYSICS INSTITUTE OF PHYSICS, PAS PAS Warsaw Warsaw , , Poland Poland http:// http:// info.ifpan.edu.pl info.ifpan.edu.pl/ cepheus cepheus/ Workshop Workshop/WORKSHOP2005.htm /WORKSHOP2005.htm Chair Chair Person : Person : S.Kret S.Kret E-mail mail : : [email protected] [email protected] Methods Methods : : ● Synchrotron Synchrotron Radiation adiation (XRSR, EXAFS, GIDAFS) (XRSR, EXAFS, GIDAFS) ● Transmission Electron Microscopy Transmission Electron Microscopy (EELS (EELS, , TEM, HRTEM) TEM, HRTEM) ● Secondary Ion Mass Spectroscopy (SIMS) Secondary Ion Mass Spectroscopy (SIMS) ● Advanced Processing of Raw Data Advanced Processing of Raw Data ● Modeling : Modeling : Molecular Dynamics (MD) olecular Dynamics (MD) Finite Element Methods (FEM). Finite Element Methods (FEM). Object of Investigations: Object of Investigations: ● Quantum Quantum Heterostructures Heterostructures ● Integrated Devices Integrated Devices ● Nanocrystalline Nanocrystalline Materials Materials Invited Speakers: Invited Speakers: M. M. Bersani Bersani ( Povo Povo- Trento Trento, Italy) , Italy) Ultra Ultra shallow depth hallow depth profiling rofiling by SIMS in microelectronic materials and processes by SIMS in microelectronic materials and processes S. S. Hovmöller Hovmöller (Stockholm, Sweden) (Stockholm, Sweden) Computer aided electron crystallography as powerful tool to stru Computer aided electron crystallography as powerful tool to structure determination cture determination V. V. Holý Holý ( Masaryk Masaryk, Czech Republic) Czech Republic) X-ray investigation of self ray investigation of self-organized semiconductor nanostructures organized semiconductor nanostructures M. M. Hÿtch Hÿtch ( Vitry Vitry- sur sur- Seine Seine, France) , France) Geometric phase analysis for measuring strain in nanostructures: Geometric phase analysis for measuring strain in nanostructures: challenges and challenges and recent advances. recent advances. I. I. Demchenko Demchenko (Warsaw, Poland) (Warsaw, Poland) EXAFS as a tool for investigation the local environment of EXAFS as a tool for investigation the local environment of Ge Ge atoms in buried low atoms in buried low- dimensional dimensional structures structures P. Galindo P. Galindo ( Cádiz Cádiz, Spain) , Spain) The Peak Pairs strain mapping algorithm and its application to H The Peak Pairs strain mapping algorithm and its application to HRTEM images RTEM images E. Knudsen E. Knudsen ( Roskilde Roskilde, Denmark) , Denmark) Algorithms and Algorithms and instrumentation nstrumentation for generating 3d grain maps in for generating 3d grain maps in polycrystals polycrystals by 3DXRD by 3DXRD B. B. Pałosz Pałosz (Warsaw, Poland) (Warsaw, Poland) Diffraction study of Diffraction study of nanocrystals nanocrystals under ambient and non under ambient and non-ambient conditions ambient conditions H. H. Renevier Renevier ( Grenoble Grenoble, France) , France) Grazing Incidence Anomalous Diffraction and Diffraction Anomalou Grazing Incidence Anomalous Diffraction and Diffraction Anomalous Fine Structure s Fine Structure (GIDAFS) to study nanostructures (GIDAFS) to study nanostructures A. A. Rosenauer Rosenauer (Bremen, Germany) (Bremen, Germany) Composition evaluation by lattice fringe analysis (CELFA) in sem Composition evaluation by lattice fringe analysis (CELFA) in semiconductors iconductors nanostructures investigation nanostructures investigation A. Sanchez A. Sanchez (Universidad de (Universidad de Cádiz Cádiz, Spain) , Spain) Plasmon Plasmon peak in EE peak in EELS. The beginning of a new technique to determine the strain in S. The beginning of a new technique to determine the strain in semiconductor semiconductor heterostructures heterostructures K. K. Scheerschmidt Scheerschmidt ( Halle Halle, Germany) , Germany) Molecular dynamics modeling for enhanced interpretation of TEM i Molecular dynamics modeling for enhanced interpretation of TEM images mages by courtesy of S. by courtesy of S. Hovmöller Hovmöller by courtesy of B.Pałosz by courtesy of H. Renevier by courtesy of V. Holý by courtesy of M. Bersani 0 1000 2000 3000 4000 5000 6000 7000 8000 9000 10 12 14 16 18 20 22 24 eV GaAs InGaAs Plasmon Emax Emax shift Image by courtesy of A.Sanchez by courtesy of K. Scheerschmidt Cross-sectional HREM image of the interface of two (100) silicon wafer bonded in UHV MD generated structures by courtesy of P. galindo by courtesy of E. Knutsen 3D grain in polycrystals by 3DXRD.