What Is Going On Here? Standards for Glass Analysis Satellite Lines? Beta Lines?

What Is Going On Here?

230 240 250 260 270

Line N um bers

21800

21900

22000

22100cp

s p

er

30

nA

S i Ka O n-Peak C ountsSpec 2 , TAP15 keV , 30 nA , 20 sec

Q uartz S iO 2 G lass Q uartz SiO 2 G lass

Standards for Glass Analysis Satellite Lines? Beta Lines?

26000 28000 30000

sin theta * 10^5

1 0

1 0 0

1 0 0 0

1 0 0 0 0

1 0 0 0 0 0

cps

pe

r 3

0 n

A

S iO 2 G lassS iO 2 Q uartz

S i Ka Spec 2 TAP15 keV , 20 nA , 5 um beamVariab le step

80500 81000 81500 82000 82500 83000

sin theta * 10^5

1

10

100

1000

10000

cps

per

30 n

A

S iO 2 G lassS iO 2 Q uartz

S i Ka Spec 3 PET15 keV, 20 nA , 5 um beamVariable step

74000 76000 78000 80000 82000 84000

sin theta * 10^5

1

10

100

1000

10000

cps

pe

r 3

0 n

A

S iO 2 G lassS iO 2 Q uartz

S i Ka-K b S pec 4 P ET15 keV , 30 nA , Focussed beamVariab le step, 20 sec

Peak Shifts?Subtle peak shift effects demonstrated for different silicate minerals

Fournelle, 2004, 2005

Between glass and crystal SiO2?

27560 27600 27640 27680 27720 27760sin theta * 10^5

8000

12000

16000

20000

24000

cps

pe

r 3

0 n

A

SiO 2 G lass-1S iO 2 Q uartz-1S iO 2 G lass-2S iO 2 Q uartz-2S iO 2 G lass-3S iO 2 Q uartz-3S iO 2 G lass-4S iO 2 Q uartz-4

Si Ka-FW H M , Spec 2 TAP15 keV , 30 nA, 5 um beam30 sec per point

81160 81180 81200 81220 81240 81260 81280sin theta * 10^5

1200

1600

2000

2400

2800

cps

pe

r 3

0 n

A

SiO 2 G lass-1S iO 2 Q uartz-1S iO 2 G lass-2S iO 2 Q uartz-2S iO 2 G lass-3S iO 2 Q uartz-3S iO 2 G lass-4S iO 2 Q uartz-4

Si Ka-FW H M , Spec 4 PET15 keV , 30 nA, 5 um beam50 sec per point

Sample Damage?SiO2 Glass

SiO2 Quartz

Beam Damage? Si Ka

15 keV, 30 nA, focussed

0 20 40 60 80

Sequence N um ber (~ 30 m inutes)

198000

199000

200000

201000

202000

203000

Inte

nsity

Si Ka, Spec 2 TAPSiO 2 Q uartzS iO 2 G lass

Beam Damage? O Ka

0 20 40 60 80

Sequence N um ber (~ 30 m inutes)

56000

60000

64000

68000

72000

76000

Inte

nsi

ty O Ka, Spec 2 TAPSiO 2 Q uartzS iO 2 G lass

0 20 40 60 80E la sp e d Tim e (se c)

5600

5800

6000

6200

6400

6600

6800

Inte

nsi

ty (

cps)

S iO2 Qu a rtz- O K aLine 5

L ine 6

L ine 7

L ine 8

Or Sub Surface Charging?

For more information see:Cazaux, 2004

SiO2 Glass (80 sec elapsed time)ELEM: Si Si Si OAVER: 46.257 46.325 46.106 48.915SDEV: .120 .304 .299 .269

VOL%: .348 .426 .478 1.786

DEV%: .0 .1 .1 .1

SiO2 Quartz (80 sec elapsed time)ELEM: Si Si Si O AVER: 46.672 46.614 46.459 50.260SDEV: .145 .383 .327 .371

VOL%: .346 .038 .290 -8.022DEV%: .0 .1 .1 .2

0 20 40 60 80

Sequence N um ber (~ 30 m inutes)

2 3

2 3 . 5

2 4

2 4 . 5

2 5

2 5 . 5

2 6

nA

Absorbed Current, Spec 2 TAPSiO 2 G lassS iO 2 Q uartz