Weir PW ASML XT14xx – ASML_OV_EX1 Dataset:Overlay & Registration Data Features: TEA Systems Corp. 65 Schlossburg St. Alburtis, PA 18011 610 682 4146 [email protected].

Weir PWWeir PWWeir PWWeir PW

ASML XT14xx – ASML_OV_EX1

Dataset: Overlay & Registration Data

Features:

TEA Systems Corp.65 Schlossburg St.Alburtis, PA 18011

610 682 [email protected]

May 25,2007

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Project Summary

• Program: Weir PW • Situation:

Import of AMAT NanoSEM 3D with multi-feature types.

TEA Systems Corp. Confidential

ASML_OV_EX1_family

Analysis of data by wafer

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Overall Data for 3 wafers

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Wafer model

• Wafer modeled values

• This is a “Process Model” since we look for vector change as a function of position on the wafer rather than it’s grid location.

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Wafer Response

• “WaferResponse_Vector” workbook sheet showing residual & systematic variation

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Modeled values for each wafer

• WaferModel_Vector worksheet

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Residuals to the wafer model

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Wafer & Field Fitted response

• Only first 5 terms of field model used

• Validation is turned on

• Model is fitted to each column of data So no trap values

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Field Response only

• Fitted wafer contribution is not shown here

• (above) X-offset by column location for 3 wafers

Offset by Column Location (Xreg)

-2.00

-1.00

0.00

1.00

2.00

3.00

4.00

5.00

-16 -11 -6 -1 4 9 14

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Offset +/- Std Error

• Graph generated for each “family” In this case for each wafer

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Range of Field Fitted Response

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ASML_OV_Ex1 May 2007

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ASML XT1400 Family Data

• Overlay and Matching data

• Note: Data headings have been changed from the

dz-H, dz-V names to the correct Xreg & Yreg nams

Please ignore and dz-h,v names on these graphs

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Imported overlay

• XY Overlay Data

• Image Data is summarized on a data sheet

• Four (4) data sheets are imported

1. Overlay Data

2. Excluded Data points

3. Registration #1 and

4. Registration #2 data

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Excluded Data

• 25 Data points were excluded

• All were on the last field of wafer #3

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Registration & Overlay Data • Overlay = Reg2 – Reg1

Registration 1 Registration 2 Overlay

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Raw Overlay Wafer #1

XoverlayYoverlay

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Wafer #2 raw overlay

Xoverlay Yoverlay

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Precision Calculation• Precision of the Raw X,Y overlay data

• X & Y registration have an average 2 nm precision (one sigma)

• Most of the variation comes from InterField or Field-to-Field variation i.e. “Stage-stepping precision”

• Variation within a field is (0,3, 1.6) nm one sigma

• Wafer to wafer variation is (0.3, 0.6) nm

Xreg Yreg Magnitude_____ _____ _____ _____Average 0.0019 -0.0020 0.0046Range 0.0282 0.0342 0.0190#Points: 1475.0000_Precision______ _____ _____Lot 0.0024 0.0038 0.0025Wafer 0.0024 0.0038 0.0025InterWafer 0.0003 0.0006 0.0006Field 0.0023 0.0033 0.0022Field Grid 0.0023 0.0034 0.0024Site 0.0022 0.0028 0.0023IntraField 0.0003 0.0016 0.0006InterField 0.0051 0.0103 0.0060Column 0.0021 0.0020 0.0018InterColumn 0.0014 0.0028 0.0016Row 0.0022 0.0036 0.0023InterRow 0.0012 0.0011 0.0010

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Covariance

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ASML Wafer Model

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Column-base modeled overlayFirst 5 terms of the ASML model will be applied to each individual

column of each field.

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Column model, offset only

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Field-Column Model Response

• FieldResponse_Column

ASML_OV_EX1_0507 - Feature: Horizontal/Vertical

Vector Raptor Ver: 0.1.2Date: 5/17/2007

Lot: ASML_OV_EX1_0507 Path: E:\Customer\ASML\ASML_DataFormat_xt1400_0507\ASML_OL_0507

Data CullingMethod Setting #Culled Range: 0.0000 0.0000 Sigma: 0.0000 0.0000

Family Summary: Modeled Offset and ResidualsFamily Feature Offset _SE Count Mean Median SEM Maximum Minimum Range StDev Mean+3SigmaBA-XY-NOMXreg 0.0019 0.0011 1475.0000 0.0000 -0.0014 0.0000 0.0082 -0.0109 0.0191 0.0012 -0.0037BA-XY-NOMYreg -0.0020 0.0009 1475.0000 0.0000 0.0000 0.0000 0.0068 -0.0068 0.0135 0.0010 -0.0029BA-XY-NOMMagnitude 1475.0000 0.0012 0.0059 0.0000 0.0118 0.0000 0.0118 0.0011 0.0044

Family Summary: Systematic Across-Field VarianceFamily Feature Count Mean Median SEM Maximum Minimum Range StDev Mean+3SigmaBA-XY-NOMXreg 1475.0000 0.0019 0.0010 0.0001 0.0092 -0.0073 0.0165 0.0021 0.0082BA-XY-NOMYreg 1475.0000 -0.0020 0.0010 0.0001 0.0156 -0.0137 0.0294 0.0037 -0.0131BA-XY-NOMMagnitude 1475.0000 0.0045 0.0082 0.0001 0.0162 0.0002 0.0160 0.0024 0.0116

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Column Model Summary

• Sheet

Column Wafer Field Xloc Yloc Feature Family Offset Offset_SE-12.7200 XY1 WXY1F5 -90.0000 0.0000 dz-H[nm] BA-XY-NOM 0.0033 0.0008

-8.4800 XY1 WXY1F5 -90.0000 0.0000 dz-H[nm] BA-XY-NOM 0.0018 0.0008-4.2400 XY1 WXY1F5 -90.0000 0.0000 dz-H[nm] BA-XY-NOM 0.0016 0.00080.0000 XY1 WXY1F5 -90.0000 0.0000 dz-H[nm] BA-XY-NOM 0.0018 0.00084.2400 XY1 WXY1F5 -90.0000 0.0000 dz-H[nm] BA-XY-NOM 0.0023 0.00088.4800 XY1 WXY1F5 -90.0000 0.0000 dz-H[nm] BA-XY-NOM 0.0024 0.0010

12.7200 XY1 WXY1F5 -90.0000 0.0000 dz-H[nm] BA-XY-NOM 0.0000 0.0009

Column Wafer Field Xloc Yloc Feature Family Offset Offset_SE-12.7200 XY1 WXY1F5 -90.0000 0.0000 dz-V[nm] BA-XY-NOM 0.0014 0.0005

-8.4800 XY1 WXY1F5 -90.0000 0.0000 dz-V[nm] BA-XY-NOM 0.0005 0.0006-4.2400 XY1 WXY1F5 -90.0000 0.0000 dz-V[nm] BA-XY-NOM -0.0005 0.00050.0000 XY1 WXY1F5 -90.0000 0.0000 dz-V[nm] BA-XY-NOM -0.0018 0.00064.2400 XY1 WXY1F5 -90.0000 0.0000 dz-V[nm] BA-XY-NOM -0.0034 0.00058.4800 XY1 WXY1F5 -90.0000 0.0000 dz-V[nm] BA-XY-NOM -0.0046 0.0008

12.7200 XY1 WXY1F5 -90.0000 0.0000 dz-V[nm] BA-XY-NOM -0.0058 0.0007

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Modeled column offset

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Column offset values

• Field is next Collapsed into the vector results for a single field

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Offset by column position

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Xreg Column offset by wafer

• This is X overlay data

• The “dz-H” value shown here is wrong but the data is right

• This has been changed

Wafer 1

Wafer 2

Wafer 3

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ASML Row Model

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ASML Row Model Applied

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Row Model Summary

• Data sheet: “FieldModel_Row_Summary_Xyvec”

• Only offset values shown

• Summary of each model fit by row location on field

Row Wafer Field Xloc Yloc Feature Family Offset Offset_SE-16.2180 XY1 WXY1F17 -60.0000 -76.0000 Xreg BA-XY-NOM 0.0015 0.0007-10.8120 XY1 WXY1F17 -60.0000 -76.0000 Xreg BA-XY-NOM 0.0014 0.0000

-5.4060 XY1 WXY1F17 -60.0000 -76.0000 Xreg BA-XY-NOM 0.0021 0.00060.0000 XY1 WXY1F17 -60.0000 -76.0000 Xreg BA-XY-NOM 0.0021 0.00005.4060 XY1 WXY1F17 -60.0000 -76.0000 Xreg BA-XY-NOM 0.0020 0.0005

10.8120 XY1 WXY1F17 -60.0000 -76.0000 Xreg BA-XY-NOM 0.0020 0.000016.2180 XY1 WXY1F17 -60.0000 -76.0000 Xreg BA-XY-NOM 0.0024 0.0008

Row Wafer Field Xloc Yloc Feature Family Offset Offset_SE-16.2180 XY1 WXY1F17 -60.0000 -76.0000 Yreg BA-XY-NOM -0.0017 0.0008-10.8120 XY1 WXY1F17 -60.0000 -76.0000 Yreg BA-XY-NOM -0.0019 0.0007

-5.4060 XY1 WXY1F17 -60.0000 -76.0000 Yreg BA-XY-NOM -0.0019 0.00090.0000 XY1 WXY1F17 -60.0000 -76.0000 Yreg BA-XY-NOM -0.0019 0.00065.4060 XY1 WXY1F17 -60.0000 -76.0000 Yreg BA-XY-NOM -0.0022 0.0008

10.8120 XY1 WXY1F17 -60.0000 -76.0000 Yreg BA-XY-NOM -0.0021 0.000816.2180 XY1 WXY1F17 -60.0000 -76.0000 Yreg BA-XY-NOM -0.0023 0.0008

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Row-model response

• FieldResponse_Row_Xyvec

Modeled Field Uniformity ResponseASML_OV_EX1_0507 - Feature: Horizontal/Vertical

Vector Raptor Ver: 0.1.2Date: 5/17/2007

Lot: ASML_OV_EX1_0507 Path: E:\Customer\ASML\ASML_DataFormat_xt1400_0507\ASML_OL_0507

Data CullingMethod Setting #Culled Range: 0.0000 0.0000 Sigma: 0.0000 0.0000

Family Summary: Modeled Offset and ResidualsFamily Feature Offset _SE Count Mean Median SEM Maximum Minimum Range StDev Mean+3SigmaBA-XY-NOMXreg 0.0019 0.0006 1475.0000 0.0000 0.0000 0.0000 0.0043 -0.0043 0.0087 0.0008 0.0025BA-XY-NOMYreg -0.0020 0.0010 1475.0000 0.0000 0.0025 0.0000 0.0124 -0.0073 0.0197 0.0012 -0.0037BA-XY-NOMMagnitude 1475.0000 0.0011 0.0062 0.0000 0.0125 0.0000 0.0125 0.0010 0.0042

Family Summary: Systematic Across-Field VarianceFamily Feature Count Mean Median SEM Maximum Minimum Range StDev Mean+3SigmaBA-XY-NOMXreg 1475.0000 0.0019 0.0007 0.0001 0.0148 -0.0133 0.0282 0.0023 0.0088BA-XY-NOMYreg 1475.0000 -0.0020 -0.0030 0.0001 0.0079 -0.0139 0.0218 0.0036 -0.0129BA-XY-NOMXyvec 1475.0000 0.0045 0.0091 0.0001 0.0180 0.0002 0.0179 0.0024 0.0116

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Row Magnification Change

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TEA Systems Corp. Confidential

ASML Full Field Model

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Overall Response of Raw Data

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Overall Model Response

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Wafer (process) based response

• Vectors are modeled by their location on the wafer Does not use “grid”

stepping location of scanner

Process-induced response of overlay or

Overall effect of wafer mag/rotation error.

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Full-Field, selected components

• Wafer & Field were modeled

• Only the offset, mag & rotation were displayed

• Fitted data is only for these 3 coefficients