Weir PSFM Zspin side analysis II Dataset:Integrated_FEM_V_S4_Modified.csv Features:Focus Dose Matrix TEA Systems Corp. 65 Schlossburg St. Alburtis, PA.

Weir PSFMWeir PSFMWeir PSFMWeir PSFM

Zspin side analysis II

Dataset: Integrated_FEM_V_S4_Modified.csv

Features: Focus Dose Matrix

TEA Systems Corp.65 Schlossburg St.Alburtis, PA 18011

610 682 [email protected]

www.TEAsystems.com

March 29, 2005

March 2005 Weir PSFM/ Zspin Page -2-TEA Systems Corp. Confidential

Zspin, site in field center

• X & Y Calibration

MeanXoffset 0.0706Yoffset -0.0720Xslope 0.4331Yslope -0.4232X_2_order 0.0184Y_2_order -0.0317X_3_order 0.0001Y_3_order -0.0002Xoffset_sigma 0.0014Yoffset_sigma 0.0013Xslope_sigma 0.0129Yslope_sigma 0.0113X_2_OrderSigma 0.0209Y_2_OrderSigma 0.0183X_3_OrderSigma 0.0799Y_3_OrderSigma 0.0699Xfocus -0.1634Yfocus -0.1712XFsigma 0.0013YFsigma 0.0009

March 2005 Weir PSFM/ Zspin Page -3-TEA Systems Corp. Confidential

Upper left corner

• Y slope is a lot noisier. Could be mask or Archer

MeanXoffset 0.0316Yoffset -0.0400Xslope 0.4808Yslope -0.4700X_2_order -0.0290Y_2_order 0.0387X_3_order -0.0002Y_3_order 0.0000Xoffset_sigma 0.0016Yoffset_sigma 0.0022Xslope_sigma 0.0143Yslope_sigma 0.0196X_2_OrderSigma 0.0233Y_2_OrderSigma 0.0319X_3_OrderSigma 0.0889Y_3_OrderSigma 0.1218Xfocus -0.0657Yfocus -0.0845XFsigma 0.0015YFsigma 0.0022

March 2005 Weir PSFM/ Zspin Page -4-TEA Systems Corp. Confidential

Offset/ full field (mean offset)

March 2005 Weir PSFM/ Zspin Page -5-TEA Systems Corp. Confidential

Offset response

Xreg

=

mean Yreg

+

March 2005 Weir PSFM/ Zspin Page -6-TEA Systems Corp. Confidential

Higher-Order Response

• Variation from Mean response

• Chart (above) shows variation in slope as a function of it’s height on field. More slope variation in top row

TEA Systems Corp. Confidential

ZSPIN Principle: Illustration of systematic errors due to patterning

1st Exposure: reference pattern 2nd Exposure: focus sensitive pattern with pinhole offset

Resulting behavior through focus:

- +0

+-

offset

focus

Black: Individual calibration curve with pinhole alignedBlue and Red: Individual calibration curve with pinhole misalignmentDashed Green: Calibration after combining both calibration curves for any case of misalignment

March 2005 Weir PSFM/ Zspin Page -8-TEA Systems Corp. Confidential

Calibration (assume it’s the Xleft & Xright data)

+-

offset

focus

=Xreg-average

=(Xleft – Xright)/2

ONLY <> if there is a mask-hole mialignment

Simply subtracting is more sensitive to the metrology errors.

Better to add in both curves, negate the values of the 2nd reading and then fit the

curve to the result.Wafer Test Diex Diey X_reg Y_reg Zmean

13.0000 1.0000 1.0000 2.0000 0.2714 -0.2625 0.004513.0000 1.0000 1.0000 2.0000 0.2603 -0.2791 0.132313.0000 2.0000 1.0000 2.0000 0.2960 -0.2717 0.012113.0000 2.0000 1.0000 2.0000 0.2620 -0.2780 0.1409

March 2005 Weir PSFM/ Zspin Page -9-TEA Systems Corp. Confidential

Plotting “all” points

• Best response analysis is to include all points• They’ll be calibrated out anyway

Splitting from:• Local aberration of lens or• Metrology tool (Y-axis noise)• Mask-tool stripe error

“flat” response from:• Local aberration of lens or• Exposure-tool focus stepping error

March 2005 Weir PSFM/ Zspin Page -10-TEA Systems Corp. Confidential

Calibration Summary• Calibration stability

• Focus estimation, one sigma, is only (1.8, 1.3) uncertainty!

[Dose, NA, PCinner, PCouter]:15.0000 0.6000 0.0000 0.3000

Mean Maximum Minimum Range StdErr CountXoffset 0.0510 0.0872 0.0104 0.0768 0.0190 56.0000Yoffset -0.0510 -0.0160 -0.0857 0.0697 0.0186 56.0000Xslope 0.4275 0.4808 0.3960 0.0849 0.0198 56.0000Yslope -0.4167 -0.3815 -0.4700 0.0886 0.0201 56.0000X_2_order 0.0038 0.0511 -0.0407 0.0919 0.0227 56.0000Y_2_order -0.0094 0.0387 -0.0607 0.0994 0.0240 56.0000X_3_order 0.0005 0.0538 -0.0310 0.0849 0.0198 56.0000Y_3_order 0.0003 0.0355 -0.0530 0.0886 0.0201 56.0000Xoffset_sigma 0.0019 0.0032 0.0012 0.0020 0.0004 56.0000Yoffset_sigma 0.0015 0.0022 0.0010 0.0012 0.0003 56.0000Xslope_sigma 0.0173 0.0289 0.0109 0.0180 0.0034 56.0000Yslope_sigma 0.0132 0.0196 0.0088 0.0108 0.0024 56.0000X_2_OrderSigma 0.0281 0.0469 0.0176 0.0292 0.0055 56.0000Y_2_OrderSigma 0.0215 0.0319 0.0143 0.0175 0.0039 56.0000X_3_OrderSigma 0.1075 0.1791 0.0674 0.1117 0.0210 56.0000Y_3_OrderSigma 0.0821 0.1218 0.0548 0.0670 0.0149 56.0000Xfocus -0.1191 -0.0219 -0.2068 0.1848 0.0444 56.0000Yfocus -0.1221 -0.0353 -0.2052 0.1699 0.0438 56.0000XFsigma 0.0018 0.0032 0.0002 0.0030 0.0006 56.0000YFsigma 0.0013 0.0024 -0.0003 0.0027 0.0006 56.0000

Focus & Uncertainty

March 2005 Weir PSFM/ Zspin Page -11-TEA Systems Corp. Confidential

Calibration Residuals

March 2005 Weir PSFM/ Zspin Page -12-TEA Systems Corp. Confidential

X & Y Focus responseX slit Y-Scan

March 2005 Weir PSFM/ Zspin Page -13-TEA Systems Corp. Confidential

Mean Focus response