Vacuum Pump Systems Fore Vacuum Pump Systems - oil-sealed (RUTA) Central Vacuum Supply Systems with SOGEVAC Fore Vacuum Pump Systems - dry compressing (RUTA) High Vacuum Pump Systems TMP with oil sealed Fore Vacuum Pumps with dry compressing Fore Vacuum Pumps UNIVEX High Vacuum Experimentation Systems Calibration Systems 250.00.02 Excerpt from the Oerlikon Leybold Vacuum Full Line Catalog 2013 Catalog Part Vacuum Pump Systems Edition 2013
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Vacuum Pump Systems
Fore Vacuum Pump Systems - oil-sealed (RUTA)Central Vacuum Supply Systems with SOGEVACFore Vacuum Pump Systems - dry compressing (RUTA)High Vacuum Pump Systems TMP
Applications and Accessoriesfor UNIVEX High Vacuum Experimentation Systems
Passive components
Sensor technology
Opto-electronics
Tribology
Soldering
Dactyloscopy (Vacuum metal deposition)
Glove box applications
Special applications
Thermal conduction experiments
UNIVEX 35
0
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Sonde
rausfü
hrun
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Accessories / Process Components
Page
136
138 / 140
140
141
141
142
143
144
UNIVEX 3
50 G
UNIVEX 4
50 B
Standard accessories
Thermal evaporation
Electron-beam evaporation
DC sputtering
RF sputtering
Glow discharge cleaning
Film thickness measurement
Substrate manipulation
(rotation, heating, cooling, bias)
Applications Bell jar system Door systems
UNIVEX 30
0
General
The UNIVEX multi-purpose experimen-tation systems were developed byOerlikon Leybold Vacuum for applica-tions in research and development, aswell as for setting up pilot productionsystems.
Their range of applications focuseschiefly on vacuum coating technologyas well as vacuum process engineeringexperiments.
The universal experimentation systemsfrom Oerlikon Leybold Vacuum arebased on a modern modular conceptsuited for customized expansion.
Generalto UNIVEX High Vacuum Experimentation Systems
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013118
UNIVEX 300
Bench System with a Vacuum Bell Jar (300 mm diameter)
Typical Applications
- Vacuum coating in research anddevelopment
- Special experiments
Basic Unit
- The pump system and the electricalsupply system are housed in a 19" rack cabinet
- Moreover, the 19" cabinet providesspace for a vacuum gauge and athickness measuring instrument aswell as power supply units for theprocess components
- The basic unit may be placed on abench top
Vacuum Chamber
- The base plate is attached to thelateral intake port of the basic unit
- Either a vacuum chamber made ofstainless steel or glass may beplaced on the base plate
Pump System
- The standard pumping equipmentcomprises a TRIVAC D 8 B two-stage rotary vane pump and a TURBOVAC 361 turbomolecularpump
Vacuum Measurement
- Depending on the type of applica-tion, a combination vacuum gaugeoperating according to the coldcathode or hot cathode principlemay be installed
Advantages to the User
- Modular system design
- Any kind of process componentmay be installed (except RF)
- Process components may be retro-fitted without problems
- Free access to vacuum bell jar,base plate and chamber units
- Very simple to operate and use
- Pump system adapted to the indi-vidual use
Options
- Upon request, the UNIVEX 300 maybe equipped with a manual liftingfacility for the bell jar or also a PLCcontroller for process automation
- For processes in which aggressivemedia need to be pumped, a seal-ed gas version of the turbomolecu-lar pump and a rotary vane pumpwith a special oil filling can be sup-plied
- For particularly sensitive processes,a dry compressing backing pumplike the SCROLLVAC SC 30 D canbe used
More information on these optionsis available upon request.
UNIVEX 300, typical arrangement with stainless steel bell jar and process components
Dimensional drawing for the UNIVEX 300 with base plate and stainless steel bell jar
120
170Height = 14
230
30° 15°DN 40 KF
DN 10 KF
DN 10 KFDN 100 ISO-K
Dimensional drawing for the base plate on the UNIVEX 300
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013120
Technical Data UNIVEX 300
Stainless Steel with Viewing Window (optional: Pyrex glass)
Vacuum chamber
Diameter mm
Base plate
Material
High vacuum connection flange DN
Dimensions (H x dia.) mm
Installation bores mm
Further side flanges DN
Vacuum bell jar
High vacuum pump
Nominal pumping speed for N2 l x s-1
Power supply
Backing pump
Nominal pumping speed m3 x h-1
Controller
Electrical connection
Cooling water connection
Hose DN 10 bar
Cooling water consumption, approx.
l x min-1
Weight, approx. kg
Base panel with bell jar fitted from the top
300
Stainless steel
100 ISO-K, attached at the side
60 x 350
� 34.5 (13 x) 1)
2 x 10 ISO-KF, 1 x 40 ISO-KF 1)
Stainless steel with viewing window (optional: Pyrex glass)
TURBOVAC 361
345
TURBOTRONIK NT 20
TRIVAC D 8 B
9.7
Power supply with main switch slot module
230 V, 50 Hz, max. 16 A 2), 3)
4 to 7
1 3)
170 3)
Ordering Information
UNIVEX 300
1) Standard configuration, other hole patterns / flanges upon request2) Other voltages and frequencies upon request3) Without chamber installations / process components
1) With punched steel cover for implosion protection
Part No.
upon request 1)
350
341 300
373
Dimensional drawing for the glass bell jar withimplosion protection
Pyrex Glass Bell Jar (Vacuum Chamber)
Technical Data
380 x 321
300
FPM (FKM)
9.6
Ordering Information
Bell jar, stainless steel
2) With DN 100 viewing window and 2 carrying handles; hole at the top (34.5 mm dia.)
Part No.
upon request 2)
321
380
190
Drawn offsetby 90°
160
10
Dimensional drawing for the stainless steel bell jar
Stainless Steel Bell Jar (Vacuum Chamber)
Bell Jar, Pyrex Glass
Bell Jar, Stainless Steel
Bell Jar, Stainless Steel
Dimensions (H x dia.) mm
Height, cylindrical section mm
Seal
Weight kg
Dimensions (H x dia.) mm
Height, cylindrical section mm
Seal
Weight kg
Bell Jar, Pyrex Glass
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013122
UNIVEX 350
Laboratory System with Cubic Vacuum Chamberand Front Door (350 mm diameter)
Typical Applications
- Vacuum coating in research anddevelopment
Pre-production trials
- Special experiments
Design
- The UNIVEX 350 consists of twoseparable 19" rack mount cabinets
- The process chamber and thepump system are accommodated inone cabinet
- Accommodated in the second cabi-net section is the electric powersupply with the PLC based systemcontroller with graphic touchscreen.Moreover, the supply units for theprocess components are also ac-commodated in this cabinet section
Advantages to the User
- Modular system design
- Freedom of installation and retrofit-ting of process components withoutproblems
- Vacuum chamber with front door foradded flexibility
- Convenient access to the chamberinstallations
- Very simple to operate and use viaprogrammable control
- For installation into clean-room walls
- High frequency sputtering possible
- Pump system adapted to the indivi-dual process
UNIVEX 350
Vacuum Chamber
- The base plate is attached to thebase frame
- The door is equipped with a viewingwindow
- Bottom plate and lid are providedwith installation holes
- Additional flanges at the side forpump system and process compo-nents
Pump System
- The standard pumping equipmentcomprises a TRIVAC D 25 B two-stage rotary vane pump and a TURBOVAC 600 C turbomolecularpump
Vacuum Measurement
- Depending on the type of applica-tion, a combination vacuum gaugeoperating according to the coldcathode or hot cathode principlemay be installed
UNIVEX 350, custom version with higher vacuumchamber and on castors
UNIVEX 350, custom version with second coatingmodule
- A water-cooled vacuum chambercan also be supplied
- Evaporation protection plates whichmay be easily disassembled areavailable
- Fitting of a second coating modulewith a vacuum chamber (fitted tothe right of the electrical cabinet) ispossible
- For processes requiring large vol-umes of gas or which require lowoperating pressures, the UNIVEX 350 can also be equippedwith a turbomolecular pump havinga higher pumping speed (TURBOVAC 1000, for example) orwith cryopumps
- For processes which involve pump-ing corrosive gases, a corrosionresistant version of the turbomole-cular pump and a rotary vane pumpwith a filling of special oil may besupplied
- For especially sensitive processesalso a dry compressing pump likethe SCROLLVAC SC 30 D can beused as the backing pump
1472 = 33 HE
486
UNIVEX 350
486 = 19"
380
894840
370
100
566 566
1132
1233
1652
1742
Dimensional drawing for the UNIVEX 350
484
440
500580
370
220 220
195
380
Dimensional drawing for the vacuum camber
Number, size as well as position of the flangesand installation bores can be adapted accord-ing to customer specifications!
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013124
Technical Data UNIVEX 350
Vacuum chamber
Material
Dimensions
Inside width mm
Inside depth mm
Inside heigth mm
Connections 1)
Front side
Rear side DN
Bottom plate
Cover plate
Left side DN
Right side DN
High vacuum pump
Nominal pumping speed for N2 l x· s-1
Power supply
Backing pump
Nominal pumping speed m3 x h-1
Controller
Required supplies
Voltage
Cooling water
Inlet pressure bar (abs.)
Consumption, approx. l x min-1
Feed temperature °C
Compressed air bar (abs.)
Weight, approx. kg
Stainless steel
370
380
500
Door with window
160 ISO-K (pump system connection), 2 x 16 ISO-KF, 2 x 40 ISO-KF
15 installation holes 34.5 mm dia.
7 installation holes 34.5 mm dia.
160 ISO-K
160 ISO-K
TURBOVAC 600 C
560
TURBOTRONIK NT 20
TRIVAC D 25 B
29.5
PLC with graphic touchscreen
400 V, 3 phases + N, 50/60 Hz 2)
4 to 7
1 3)
+15 to +25
4 to 7
400 3)
Ordering Information
UNIVEX 350
1) Standard configuration, other hole patterns/flanges upon request2) Other voltages and frequencies upon request3) Without chamber installations / process components
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013126
UNIVEX 350 G
Advantages to the User
- Intended for fitting to the rear sideof a glove box
- Convenient access to the processthrough the glove box by means ofthe sliding front door
- Easy access to the chamber unitthrough the rear service door
- Only the sliding door is located inthe glove box. All other systemcomponents can be easily acces-sed from the outside
- Modular system design
- Freedom of installation and retrofit-ting of process components withoutproblems
- Very simple to operate and use viaprogrammable control
- High frequency sputtering possible
- Pump system adapted to the indivi-dual process
Laboratory System for Glove Box Attachmentwith Cubic Vacuum Chamberand Front Sliding Door (350 mm diameter)
Typical Applications
- Vacuum coating in research anddevelopment
- Pre-production trials
- Special experiments
Design
- The UNIVEX 350 G consists of acoating module and a 19" rackcabinet
- Installed in the coating module isthe process chamber and the pumpsystem
- Accommodated in the cabinet is theelectric power supply with the PLCbased system controller with gra-phic touchscreen. Moreover, thesupply units for the process compo-nents are also accommodated inthis cabinet section
UNIVEX 350 G, consisting of electrical cabinet (left) and coating module (right)
Vacuum Chamber
- The base plate is attached to thebase frame
- The sliding front door is operatedmanually and closed pneumatically
- Bottom plate and lid are providedwith installation holes
- Additional flanges at the side forpump system and process compo-nents
Pump System
- The standard pumping equipmentcomprises a TRIVAC D 25 B two-stage rotary vane pump and a TURBOVAC 600 C turbomolecularpump
Vacuum Measurement
- Depending on the type of appli-cation, a combination vacuumgauge operating according to thecold cathode or hot cathode prin-ciple may be installed
- Easy to disassemble coating pro-tection panels are available
- For short pumpdown times, abypass line bypassing the highvacuum pump can be provided
- For processes producing increasedamounts of gas or for low operatingpressures, the UNIVEX 350 G mayalso be equipped with turbomolecu-lar pumps offering a higher pumpingspeed (TURBOVAC 1100 C, forexample) or cryogenic pumps maybe specified
- For processes which involve pump-ing corrosive gases, a corrosionresist version of the turbomolecularpump and a rotary vane pump witha special oil filling can be supplied
- For particularly sensitive processes,a dry compressing backing pumplike the SCROLLVAC SC 30 D canbe used
490
315
1708
1676
1365
1023
762
320
1189
544
Dimensional drawing for the UNIVEX 350 G
3D view of a glove box with the UNIVEX 350 G coating module fitted to the rear
Turnkey Solutions
Upon request Oerlikon LeyboldVacuum will also arrange the deliveryof turnkey solutions consisting of theUNIVEX 350 G coating system and aglove box from a single source.
More information on such systemsis available upon request.
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013128
Technical Data UNIVEX 350 G
Vacuum chamber
Material
Dimensions
Inside width mm
Inside depth mm
Inside heigth mm
Connections 1)
Front side
rear side
Bottom plate
Cover plate
Left side DN
Right side DN
High vacuum pump
Nominal pumping speed for N2 l x s-1
Power supply
Backing pump
Nominal pumping speed m3 x h-1
Controller
Required supplies
Voltage
Cooling water
Inlet pressure bar (abs.)
Consumption, approx. l x min-1
Feed temperature °C
Compressed air bar (abs.)
Weight, approx. kg
Stainless steel
370
380
500
Sliding door for glove box access; manually operated and pneumatically closing
turning door for service access; manually locked
15 installation holes 34.5 mm dia.
7 installation holes 34.5 mm dia.
160 ISO-K (pump system connection), 40 ISO-KF, 16 ISO-KF
40 ISO-KF, 16 ISO-KF
TURBOVAC 600 C
560
TURBOTRONIK NT 20
TRIVAC D 25 B
29.5
PLC with graphic touchscreen
400 V, 3 phases + N, 50/60 Hz 2)
4 to 7
1 3)
+15 to +25
4 to 7
350 3)
Ordering Information
UNIVEX 350 G
1) Standard configuration, other hole patterns / flanges / viewing windows upon request2) Other voltages and frequencies upon request3) Applies only to the coating module, without chamber units / process components
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013130
UNIVEX 450 B
Laboratory System with Cubic Vacuum Chamberand Front Door (500 mm diameter)
Typical Applications
- Vacuum coating in research anddevelopment
- Pre-production trials
- Special experiments
Design
- The UNIVEX 450 B consists of twoseparable 19" cabinet sections
- Accommodated in one cabinet sec-tion is the process chamber and thepump system
- Accommodated in the second cabi-net section is the electric powersupply with the PLC based systemcontroller with graphic touchscreen.Moreover, the supply units for theprocess components are also ac-commodated in this cabinet section
Advantages to the User
- Modular system design
- Freedom of installation and retrofit-ting of process components withoutproblems
- Vacuum chamber with door
- Convenient access to the chamberinstallations
- Very simple to operate and use viaprogrammable control
- Suited for being installed in a cleanroom wall
- High frequency sputtering possible
- Pump system adapted to the individual process
UNIVEX 450 B with water-cooled vacuum chamber (option)
Vacuum Chamber
- The base plate is attached to thebase frame
- The door is equipped with a viewingwindow
- Bottom plate and lid are providedwith installation holes
- Additional flanges at the side forpump system and process compo-nents
Pump System
- The standard pumping equipmentcomprises a TRIVAC D 65 B two-stage rotary vane pump and a TURBOVAC 1100 C turbomole-cular pump
Vacuum Measurement
- Depending on the type of appli-cation, a combination vacuumgauge operating according to thecold cathode or hot cathode prin-ciple may be installed
UNIVEX 450 B with water-cooled process chamber and manually operatedload lock chamber (option)
- The chamber can also be deliveredin a water-cooled version
- Easy to disassemble coating pro-tection panels are available
- For short pumpdown times, abypass line bypassing the highvacuum pump can be provided
- Fitting of a second coating modulewith a vacuum chamber (fitted tothe right of the electrical cabinet) ispossible
- For processes producing increasedamounts of gas or for low operatingpressures, the UNIVEX 450 B mayalso be equipped with turbomolecu-lar pumps offering a higher pumpingspeed (TURBOVAC T 1600, forexample) or cryogenic pumps maybe specified
- For processes in which aggressivemedia need to be pumped, a sealgas version of the turbomolecularpump and a rotary vane pump witha special oil filling can be supplied
- For particularly sensitive processes,a dry compressing backing pumplike the SCROLLVAC SC 30 D canbe used
Dimensional drawing for the vacuum camber
Number, size as well as position of the flangesand installation bores can be adapted accord-ing to customer specifications!
700
660760
300 300
500
235
520
702 486 = 19"
1348782 566
160636HE
1922
1826
1270
100
500
520480
1020
136
840
976
Dimensional drawing for the UNIVEX 450 B
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013132
Technical Data UNIVEX 450 B
Vacuum chamber
Material
Dimensions
Inside width mm
Inside depth mm
Inside heigth mm
Connections 1)
Front side
Rear side DN
Bottom plate
Cover plate
Left side DN
Right side DN
High vacuum pump
Nominal pumping speed for N2 l x s-1
Power supply
Backing pump
Nominal pumping speed m3 x h-1
Controller
Required supplies
Voltage
Cooling water
Inlet pressure bar (abs.)
Consumption, approx. l x min-1
Feed temperature °C
Compressed air bar (abs.)
Weight, approx. kg
Stainless steel
500
500
650
Door with window
250 ISO-K (pump system connection), 4 x 16 ISO-KF, 2 x 40 ISO-KF
20 installation holes 34.5 mm dia.
10 installation holes 34.5 mm dia.
250 ISO-K
250 ISO-K
TURBOVAC 1100 C
1050
TURBOTRONIK NT 20
TRIVAC D 25 B
29.5
PLC with graphic touchscreen
400 V, 3 phases + N, 50/60 Hz 2)
4 to 7
1 3)
15 to 25
4 to 7
500 3)
Ordering Information
UNIVEX 450 B
1) Standard configuration, other flanges / hole patterns / viewing windows upon request2) Other voltages and frequencies upon request3) Applies only to the basic unit without coating equipment
- VMD has been shown to detectlatent prints even after othermethods have been tried and failed(e.g. cyanoacrylate or fuming)
- Large surface areas (up to 80 x 40 cm) can be coated
- Process time can be as little as 10 minutes depending on the mate-rial makeup of the evidence
- Good contrast on multicolour surfa-ces
- Deposition process does not dam-age the evidence. Zinc can beremoved using regular householdvinegar
UNIVEX 450 for dactyloscopy
Dactyloscopy is the science of finger-print identification. Oerlikon LeyboldVacuum has designed a system thatuses a process known in the forensicsworld as Vacuum Metal Deposition(VMD), for developing fingerprints.
VMD is a well established forensic toolfor the development of latent finger-prints. Latent prints are formed by perspiration or grease from the skinsurface which is left on a different surface. They are not visible to thenaked eye and must therefore be“developed” before they can be seen.
The process requires a piece of evi-dence suspected of having these
latent prints to be placed inside avacuum chamber. After pumping thechamber down to a relatively low pres-sure (10-5 mbar (Torr)), a monolayer ofgold is then evaporated onto the evi-dence. These gold atoms will then beabsorbed by the greasy ridges thatmake up the print but will remain be-hind in the valleys between the ridges.Next, a second metal layer of zinc isdeposited. Zinc has a unique propertyin that it only adheres to other metalssuch as gold left behind in the valleys.The end result will be a very distinctnegative image of a fingerprint. Theimage is photographed and reversedfor final identification.
For special applications we can alsosupply cluster systems based on theUNIVEX concept. These clusters areequipped according to customers re-quirements and incorporate separateprocessing and load lock and transferchambers.
UNIVEX 450 C with coating module and electrical cabinet (example photograph). The coating module consists of two process chambers (left and right) as well as the loadlock and transfer chamber in between
Test Systems with a Vacuum Chamber
We can also supply vacuum chamberswith custom pump systems for testingof various components.
Test system with a 700 mm dia. chamber
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013136
Low pressure safety switch PS 113 A, DN 16 ISO-KF; complete with 3 m long cable
Part No.
230 011
PS 113 A Safety Switch
PS 113 A Safety Switch
For safety interlock arrangements inconnection with the UNIVEX systemcontroller, respectively optionally con-nected power supply equipment (forsputtering, electron-beam evaporationor vacuum etching, for example).
Safety Switch
Safety Switch
Technical Data
Gas admission rate qL mbar x l x s-1
Connection flange DN
5 x 10-6 to 1 x 103
16 ISO-KF
Ordering Information
Variable leak valve with isolation valve
(see also Catalog Part “Valves”)
Part No.
215 010
Variable Leak Valve withIsolation Valve
For manually controlled admission ofgas in connection with plasma proces-ses (sputtering, etching and glow dis-charge cleaning).
For controlled admission of gas in con-nection with automated plasma pro-cesses (sputtering, etching, glow dis-charge cleaning). Intended to be remo-tely controlled by the customer’s PC orPLC, i.e. a separate MFC controllerunit is not included in the delivery.
Gas Flow controller
Gas Flow controller
Technical Data
Control voltage V DC
Dimensions of the shutter panel mm
Weight kg
24 (pulses per second)
different, for example 42 x 42 or 100 mm dia.
0.2
Ordering Information
Electrically operated vapor source shutter
Part No.
upon request
Electrically Operated VaporSource Shutter
For covering the source during thermalor electron-beam evaporation. Withgear motor and shutter panel; can befitted to the inside sections of thechamber.
Vapor Source Shutter
Vapor Source Shutter
Technical Data
Rating per conductor VA
Seal
Weight kg
max. 70016
FPM (FKM)
0.3
Ordering Information
6-way measurement feedthrough
Part No.
upon request
6-way measurement feedthrough
6-Way MeasurementFeedthroughs
For connection of the vapor sourceshutter; for 34.5 mm holes, plug-in soldered contact on the inside.
Technical Data
Lenght m
Weight kg
3
0.2
Ordering Information
6-way control cable
Part No.
upon request
Control Cable, 6-Way
For connection between measurementfeedthrough and power supply unit forthe vapor source shutter, completewith connection plugs.
Measurement Feedthrough
Control Cable
Measurement Feedthrough
Control Cable
Technical Data
Mechanical closing contact
Electrical closing contact
Safety door switch
floating
Ordering Information
Interlocking kit for UNIVEX vacuum chamber
Part No.
upon request
Interlocking Kit
Interlocking Kit
Interlocking Kit
For providing touch protection againsthigh-voltage carrying parts within thevacuum chamber. The safety contactmust be connected to the interlock in-put at the high-voltage power supplyunit thereby ensuring that the equip-ment can be enabled only while thechamber door is closed.
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013138
Technical Data
Rating per conductor V
A
Seals
Water connection mm
Weight kg
max. 100
500
FPM (FKM)
Hose 4/6 dia.
2.5
Ordering Information
Single thermal evaporator
Part No.
upon requestSingle thermal evaporator
Components for Thermal Evaporation of High Melting Point Materials (metals)Single Thermal Evaporator
Consisting of two water-cooled highvoltage feedthroughs with terminalblocks for 34.5 mm dia. holes.
Technical Data
Rating per conductor V
A
Seals
Water connection mm
Weight kg
max. 100
500
FPM (FKM)
Hose 4/6 dia.
3.9
Ordering Information
Dual thermal evaporator
Part No.
upon requestDual thermal evaporator
Dual Thermal Evaporator
Consisting of three water-cooled highvoltage feedthroughs with terminalblocks for 34.5 mm dia. holes.
Technical Data
Length m
Rating V
A
Cross section mm2
Weight kg
2 1)
max. 100
500
120
3.5
Ordering Information
Power supply cable
1) Standard length. Other lengths can be specified2) For the single thermal evaporator, two supply lines are required
For the dual thermal evaporator, three supply lines are required
Part No.
upon request 2)
Power Supply Cables
For single and dual thermal evapora-tors, equipped with terminals andclamping pieces.
For supplying thermal evaporators andone solenoid-actuated source shutter.With LCD display for current read outand membrane key pad.
AS 053/2 Power Supply Unit
For supplying power to two thermalevaporators with vapor sourceshutters.With LCD display for current read outand membrane key pad.
Power Supply Unit
Power Supply Unit
Technical Data
Cabinet
mm
Outputs
Inputs
Main power supply
Weight kg
19" rack module, 3 HU
400 deep
2 x evaporator output, 5 V, 400 A max.
can be rewired to 10 V, 200 A max.
2 x shutter output, 24 V DC,
1 s pulse
Remote control unit for controlling the
evaporation power (0 to 10 V)
Remote control for the shutter
Switchover evaporator 1 / 2
230 V, 50/60 Hz, 10 A
30
Ordering Information
AS 053/2 power supply unit
Part No.
upon request
Power Supply Unit
Power Supply Unit
leyboldOerlikon Leybold VacuumCatalog Part Vacuum Pump Systems, Edition 2013140
For the purpose of evaporating tempe-rature sensitive materials, commonly ofan organic nature, Oerlikon LeyboldVacuum is offering special organicmaterial evaporators.
These ensure a coating process atprecisely controlled evaporation tem-peratures which typically range be-tween 200 °C and 400 °C.
Components for Thermal Evaporation of Low Melting Point Materials (organic)
Various models of electron-beam eva-porators and power supplies are avail-able for installation in the UNIVEXsystems.
Electron-Beam Evaporator
The selection of a suitable electron-beam evaporator will primarily dependon the amount of available space, thedesired evaporation rate and the filmthickness as well as the number andtype of materials which need to beevaporated. Single crucible as well asrotatable multi-crucible evaporators areavailable.
Power Supplies
The power supply unit for the individualelectron-beam evaporators is selecteddepending on the maximum evapora-tion power which is required, as wellas the demanded properties for X/Ybeam deflection. Models with outputpower ratings ranging from 3 kW to 10 kW are available.
As a rule, the maximum output powerof the power supply may not exceedthe maximum permissible power speci-fied for the evaporator.
When installing electron-beam evapo-rators within the UNIVEX 300, only thestainless steel bell jar can be used.Moreover, a safety interlocking systemwill be necessary for all UNIVEX types.For the UNIVEX 300 a separate inter-locking kit is available; in the case ofthe UNIVEX 350 and 450 B this kit isalready included.
Additionally a water flow monitor isrequired for each electron-beam eva-poration unit so as to ensure adequatecooling of the electron-beam evapora-tor.
This water flow monitor is included inthe delivery of a UNIVEX system equip-ped with an electron-beam evaporator.
Components for Electron-Beam Evaporation
Upon request we shall be pleased to provide an offer which specifically matches the requirements of your applica-tion.
For installation within the UNIVEXsystems, Oerlikon Leybold Vacuumsupplies organic material evaporatorsas a complete package, consisting ofevaporator source, automatic shutter,rotary vacuum feed through and 19"rack mount controller.
A variety of DC sputtering sources maybe fitted within all UNIVEX systems.Their selection will depend on the sizeof the substrate, the required targetmaterial and the available installationspace. Circular planar sputtering sour-ces of 50 mm to 200 mm in diameteras well as various rectangular sourcesare available. The power supply units(providing an output power between500 W and 3 kW) may be installedwithin the UNIVEX 19" electrical cabi-nets.
DC sputtering equipment is suited forall UNIVEX systems.
RF Sputtering
A variety of RF sputtering sources maybe fitted within all UNIVEX systems(exception: UNIVEX 300). Their selec-tion will depend on the size of the sub-strate, the required target material andthe available installation space. Circularplanar sputtering sources of 50 mm to200 mm in diameter as well as variousrectangular sources together with thenecessary RF matching componentsare available. The power supply units(providing an output power between150 W and 1.5 kW) may be installedwithin the UNIVEX systems.
Gas Inlet
Sputtering sources can only be opera-ted with a process gas present. Forthis, manually operated variable leakvalves or automatically controlled massflow controllers are available.
Throttling the Pumping Speed
In order to protect the high vacuumpump against the high process pres-sure present during plasma operation,and to reduce process gas consump-tion, the UNIVEX systems are generallyequipped with a three position highvacuum gate valves.
Components for Sputtering
Safety Regulations in Connection with SputteringApplications
When installing electron-beam evapo-rators within the UNIVEX 300, only thestainless steel bell jar can be used.Moreover, a safety interlocking systemwill be necessary for all UNIVEX types.For the UNIVEX 300 a separate inter-locking kit is available; in the case ofthe UNIVEX 350 and 450 B this kit isalready included.
Additionally a water flow monitor isrequired for each electron-beam eva-poration unit so as to ensure adequatecooling of the electron-beam evapora-tor.
This water flow monitor is included inthe delivery of a UNIVEX system equip-ped with an electron-beam evaporator.
Upon request we shall be pleased to provide an offer which specifically matches the requirements of your applica-tion.
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Technical Data
Electrode material
Insulation
Max. ratings V
mA
Sealing material of the
high voltage feedthrough
Aluminum
Ceramics
3000
100
FPM (FKM)
Ordering Information
Glow discharge assembly
for UNIVEX 300, 350 and 350 G
for UNIVEX 450 B
Part No.
upon request
upon requestGlow discharge assembly with high voltage feed-through and connection cable
Components for Glow Discharge Cleaning
Glow Discharge Assembly
The glow discharge electrode utilizes ahigh voltage feedthrough mounted in a34.5 mm dia. hole along with a con-nection cable fitted to a central rotaryfeedthrough.
Technical Data
Cabinet
Output V
mA
Electrical connection V / Hz
Remote control and locking input
19" rack module, 3 HU
max. 3000
max. 100
230 / 50/60 Hz
included
Ordering Information
HP 2500 high voltage power supply unit
Part No.
upon request
HP 2500 High VoltagePower Supply Unit
For supplying the glow dischargeassembly.
Glow Discharge Assembly
High Voltage Power Supply Unit
Glow Discharge Assembly
High Voltage Power Supply Unit
Gas Admission
To operate the glow discharge cleaningaccessory, a process gas such asArgon is required. A simple manuallyoperated gas dosing valve or automati-cally controlled mass flow controllersare available upon request.
Throttling the Pumping Speed
In order to protect the high vacuumpump against the high process pres-sure present during plasma operation,and reduce process gas consumption,the UNIVEX systems are generallyequipped with high vacuum gate val-ves having three positions which arefitted between chamber and highvacuum pump.
Various thin film thickness measuringinstruments may be installed in theUNIVEX units.
The selection depends on the mea-surements needed and the requireddegree of automation.
As standard, oscillating crystal systemsare used. These may consist of one orseveral sensing heads with or withoutshutter, and upon request are availablefor UHV operation (i.e. are suitable fordegassing).
These are driven either by a monitor(allowing only the measurement ofdeposition rate and film thickness) orby a controller (allowing measurementof the film parameters and control ofthe deposition rate).
Upon request we can provide anoffer which specifically matches therequirements of your application.
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Substrate Rotation
In order to improve or change the filmproperties during the deposition pro-cess, rotation of the substrates is oftennecessary.
The Oerlikon Leybold Vacuum UNIVEXsystem is available with a wide rangeof possible accessories for substraterotation such as a simple static or ro-tatable workholder plate or a more ela-borate planetary drive mechanism.Additional options include the heating,cooling or biasing of the substratebefore, during or after the depositionprocess. Your specific requirements willdictate how the UNIVEX will be confi-gured.
Substrate Manipulation Solutions
Planetary gear
Substrate Holding
For mounting the substrate within thechamber, Oerlikon Leybold Vacuumoffers vacuum substrate holders manu-factured according to customer’s spe-cifications.
Rotatable, temperature controlled substrate hol-der with substrate shutter
Substrate Heating
For temperature controlled heating ofsubstrates, Oerlikon Leybold Vacuumoffers a variety of different optionssuch as resistance heaters or a widerange of quartz lamp heaters. Depend-ing on the size of the substrate andthe temperature range specified, weare prepared to offer customized solu-tions.
Substrate Cooling
Heat sensitive substrates or substratemasks require cooling during deposi-tion. Oerlikon Leybold Vacuum offerssubstrate holders that can be water-cooled, LN2 cooled or used with spe-cial cooling fluids.
Substrate Bias
Precleaning of the substrate with RF orDC biasing prior to deposition canimprove the adhesive properties of thefilm. Oerlikon Leybold Vacuum offerssubstrate biasing using insulated sub-strate mounts and the customer speci-fied power supply units and matchingnetworks when required.
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CS Calibration Systems
The requirements imposed on vacuumengineering with regard to accuracy ofthe measurements, reproducibility andunambiguity of the determined vacuumpressures have increased significantlyover the last years.
500 mm(19.69 in.)
500 mm
(19.69 in.)
850
mm
(33.
64 in
.)
2100 mm(82.68 in.)
1750
mm
(68.
90 in
.)
CS7 calibration system
CS3 calibration system
Routine calibrations of vacuum gaugesare an important component of qualityassurance schemes. The calibrationsystems from Oerlikon LeyboldVacuum put the customer in a positionto check and recalibrate on his ownthe specified and necessary accuracyof his vacuum gauges.
Calibration systems are available for thispurpose which cover a calibration rangefrom 1000 mbar to 1 x 10-7 mbar(750 to 0.75 x 10-7 Torr).
Each system is equipped with severalcertified reference pressure sensors(transmitter standards), which eachcover a part of the specified range ofcalibration pressures. In the pumpsystem, turbomolecular pumps withTRIVAC rotary vane or DIVAC dia-phragm pumps are used. A variableleak valve is used to admit the gas intothe calibration chamber. In the case ofthe calibration system CS7, the gasinlet line is, moreover, equipped withit’s own pump system.
The CS7 is equipped with a heater forthe vacuum chamber, for the purposeof attaining lower chamber pressuresmore rapidly. The temperature of theheating collars can be controlled whereby the maximum degassing tem-perature will depend on the compo-nents installed (flanges, pressure sen-sors, valves).
Advantages to the User
- Vacuum gauges and measurementsystems of any make may becalibrated
- Designed in accordance with DIN 28 418/ISO/DIS 3567
- Transfer standards with PTB-, DAkkS- or factory certificate
- Easier DIN/ISO 9000 approval
- Reliable and reproducible measure-ments
- Quick start-up
- Measurement system free of hydro-carbons when using dry com-pressing vacuum pumps