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Florida International University Florida International University
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FIU Electronic Theses and Dissertations University Graduate School
6-12-2020
Understanding the Effects of Plasma Assisted Nanoparticle Understanding the Effects of Plasma Assisted Nanoparticle
Deposition for the Enhancement of Optical and Electrochemical Deposition for the Enhancement of Optical and Electrochemical
Response Response
Apurva Sonawane [email protected]
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FLORIDA INTERNATIONAL UNIVERSITY
Miami, Florida
UNDERSTANDING THE EFFECTS OF PLASMA ASSISTED NANOPARTICLE
DEPOSITION FOR THE ENHANCEMENT OF OPTICAL AND
ELECTROCHEMICAL RESPONSE
A dissertation submitted in partial fulfillment of
the requirements for the degree of
DOCTOR OF PHILOSOPHY
in
ELECTRICAL AND COMPUTER ENGINEERING
by
Apurva Sonawane
2020
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To: Dean John L. Volakis
College of Engineering and Computing
This dissertation, written by Apurva Sonawane, and entitled Understanding the Effects of
Plasma Assisted Nanoparticle Deposition for The Enhancement of Optical and
Electrochemical Response, having been approved in respect to style and intellectual
content, is referred to you for judgment.
We have read this dissertation and recommend that it be approved.
_______________________________________
Jean Andrian
_______________________________________
Nezih Pala
_______________________________________
Bruce McCord
_______________________________________
Mubarak Mujawar
_______________________________________
Shekhar Bhansali, Major Professor
Date of Defense: June 12, 2020
The dissertation of Apurva Sonawane is approved.
_______________________________________
Dean John L. Volakis
College of Engineering and Computing
_______________________________________
Andrés G. Gil
Vice President for Research and Economic Development
and Dean of the University Graduate School
Florida International University, 2020
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© Copyright 2020 by Apurva Sonawane
All rights reserved.
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DEDICATION
To H. H. Shri Mataji Nirmala Devi
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DEDICATION
To my husband, Mr. Shailendra Chivate
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ACKNOWLEDGMENTS
I am grateful to my major advisor, Dr. Shekhar Bhansali, for the opportunity to
perform this study towards my doctoral dissertation. I want to express gratitude from the
bottom of my heart for his continuous efforts in guiding me throughout this journey, which
helped me develop my skills as a researcher.
I am thankful to my committee members, Dr. Jean Andrian, Dr. Nezih Pala, Dr.
Bruce McCord, and Dr. Mubarak Mujawar, for their valuable input. Their comments
helped me understand the topic profoundly. I would like to thank Dr. Pala for his advice
on biosensing measurements. I am thankful to Dr. Bruce McCord for his insightful
comments on the validation of the hypothesis with cortisol detection. I thank Dr. Andrian
for his guidance in signal handling, processing, and analysis. I want to thank the Advanced
Materials and Engineering Research Institute (AMERI) at FIU, as Sensor fabrication and
Imaging could not have been carried out without its facilities and assistance. I am thankful
to the managers of AMERI labs for their services. My special thanks go to Dr. Mubarak
Mujawar for introducing me to the plasma field and his valuable comments on my work.
I am thankful to the Electrical and Computer Engineering department. I also thank
Ms. Pat Brammer, Ms. Layla El-Hilu, and Ms. Luisa Ruiz for their administrative support.
I am thankful to Mr. Gordon Osborne for encouraging me to pursue a Ph.D. program and
for mentoring me during my early days in the U.S. I would like to thank Dr. Pandiaraj and
Dr. Yogeswaran for helping me understand and clearing my doubts about electrochemical
measurements. I am thankful to Dr. Khalid Pasha and Krystine for training me on
microfabrication tools. I would like to thank my former and present fellow graduate
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students, Michelle, Pulak, and Lamar, for accompanying me and for their moral support
during this journey.
Special thanks to Mr. Anjan Upadhya and Mrs. Louisa Upadhya and Sahaja family
for believing in me and being supportive in my difficult times. I immensely thank my in-
laws, Mr. Suresh Chivate and Mrs. Supriya Chivate, for their love and motivation
throughout my research journey. I am grateful to my parents, Mr. Fakirrao Sonawane and
Mrs. Anita Sonawane, for the support they have provided me throughout my life and for
being the reason behind all my endeavors. Many thanks go to my husband, Mr. Shailendra,
who stood by me through thick and thin, and for all the efforts he has made to keep me
focused.
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ABSTRACT OF THE DISSERTATION
UNDERSTANDING THE EFFECTS OF PLASMA ASSISTED NANOPARTICLE
DEPOSITION FOR THE ENHANCEMENT OF OPTICAL AND
ELECTROCHEMICAL RESPONSE
by
Apurva Sonawane
Florida International University, 2020
Miami, Florida
Professor Shekhar Bhansali, Major Professor
In this work, the effects of atmospheric plasma treatment on morphology, optical,
and electrochemical properties of 10 ± 3nm spherical silver and gold nanoparticles (AgNPs
and AuNPs) functionalized substrates were studied. The nanoparticles (NPs) were
deposited on substrates by drop-casting, aerosol spray, and a low-temperature atmospheric
plasma-assisted aerosol jet. The reduction in nanoparticle size was observed, which was
explained by the redox reaction that occurs on the nanoparticle surface. This phenomenon
was evident by the presence of AgO, Ag2O, and AuOx Raman peaks in the treated sample.
The surface charge changed as a result of plasma treatment, as indicated by a significant
change in the zeta potential from +25.1 ± 4 mV for the untreated AgNPs to −25.9 ± 6 mV
after 15 minutes of plasma treatment and from -20.9 ± 4 mV to -43.9± 5 mV for AuNPs.
Surface-enhanced Raman spectroscopy of the plasma-treated films was carried out with
the fluorescent dye Rhodamine 6G, which showed a ~120-fold enhancement for AgNPs
and ~95 fold for AuNPs in the signal intensity relative to the untreated substrates. This
surface charge tuning during deposition led to the effective surface coverage with
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comparatively uniform NPs films as observed in Scanning Electron Microscopy, and
Transmission Electron Microscopy images. This technique can be applied to a wide range
of nanoparticle systems used in biosensing applications as substrates prepared by this
method can serve as effective SERS substrates due to the cumulative effect of surface
roughness, and size reduction.
The electrochemical performance of plasma-assisted NPs-modified
microelectrodes was studied. These microelectrodes were fabricated using standard
photolithography, Chrome/Gold evaporation, and lift-off techniques. These electrodes
showed more enhancement in the electroactive surface area and improved inter-electrode
variability than in other methods. Electrochemical Impedance spectroscopy results showed
the improvement in the conductivity of plasma-assisted NPs functionalized electrodes.
Cortisol was detected using self-assembled monolayer, and antibodies functionalized on
plasma-assisted NP-modified electrodes, which showed increased sensitivity.
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TABLE OF CONTENTS
CHAPTER ............................................................................................................ PAGE
1 INTRODUCTION ....................................................................................................1
1.1 Motivation ........................................................................................................1
1.2 Objectives .........................................................................................................5
1.3 Dissertation organization ...................................................................................5
2 BACKGROUND AND LITERATURE REVIEW ....................................................8
2.1 Biosensor ..........................................................................................................8
2.2 Properties of NPs and their applications ............................................................9
2.3 Plasmonic Nanoparticles ................................................................................. 10
2.4 Methods of Nanoparticle Deposition ............................................................... 12
2.5 Plasma ............................................................................................................ 15
2.5.1 Plasma parameters .................................................................................... 18
2.5.2 Cold Atmospheric Plasma ........................................................................ 20
2.5.3 Plasma-Induced Surface Modification ...................................................... 21
2.6 Nanoparticle-based Electrochemical Immunosensing ...................................... 21
3 EXPERIMENTAL PROCEDURE.......................................................................... 24
3.1 Aerosolized deposition and argon plasma assembly......................................... 24
3.1.1 Argon plasma ........................................................................................... 27
3.1.2 Plasma characterization ............................................................................ 28
3.1.3 Plasma treatment and thermal annealing of NPs........................................ 31
3.2 Surface Plasmon Resonance ............................................................................ 31
3.3 Surface charge measurements.......................................................................... 33
3.4 Surface-enhanced Raman spectroscopy ........................................................... 33
3.5 Imaging ........................................................................................................... 36
3.6 Microelectrodes Fabrication ............................................................................ 37
3.7 Electrochemical Immunosensing of cortisol .................................................... 42
3.8 Cyclic Voltammetry ........................................................................................ 43
3.9 Electrochemical Impedance Spectroscopy ....................................................... 44
4 EFFECTS OF COLD ATMOSPHERIC PLASMA TREATMENT ON
MORPHOLOGICAL, AND OPTICAL PROPERTIES OF PLASMONIC
NANOPARTICLES ............................................................................................... 47
4.1 Surface Plasmon Resonance (SPR).................................................................. 47
4.2 SEM Imaging .................................................................................................. 51
4.3 Surface charge measurements.......................................................................... 54
4.4 TEM and AFM imaging .................................................................................. 55
4.5 Mechanism of plasma-induced reduction in AgNP size ................................... 57
4.6 SERS characterization of the plasma-treated and thermally treated AgNP film 63
4.7 Stability of Plasma treated AgNPs film ........................................................... 66
4.8 Mechanism of Plasma Induced reduction in AuNPs size ................................. 67
4.9 SERS characterization of the plasma-treated and thermally treated AuNP film 69
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4.10 Summary of chapter 4 ..................................................................................... 70
5 PLASMA INDUCED ENHANCEMENT IN ELECTROCHEMICAL
PROPERTIES OF PLASMONIC NANOPARTICLES .......................................... 72 5.1 Fabrication of AgNPs and AuNPs modified electrodes .................................... 72
5.2 Surface functionalization of AgNPs and AuNPs based sensors for cortisol
measurement ................................................................................................... 74
5.3 Electrochemical Measurements ....................................................................... 75
5.4 Electrochemical Performance of AgNPs modified electrode ............................ 75
5.5 Electrochemical Performance of AuNPs modified electrode ............................ 78
5.6 Electrochemical detection of cortisol using modified SPCEs ........................... 80
5.7 Summary of chapter 5 ..................................................................................... 86
6 UNDERSTANDING THE RELATION BETWEEN NANOPARTICLE
DISTRIBUTION AND ELECTRODE RESPONSE ............................................... 87 6.1 Methods .......................................................................................................... 88
6.2 Electroactive surface area from the electrochemical response .......................... 89
6.3 Image quantification of AuNPs modified electroactive surface area ................ 90
6.4 TEM images ................................................................................................... 91
6.5 Nanoparticle deposition model ........................................................................ 92
6.6 Electrochemical characterization of AuNPs modified Au Electrode................. 94
6.6.1 CV characterization .................................................................................. 94
6.6.2 EIS characterization ................................................................................. 96
6.7 Inter-Electrode Variability of methods of deposition ....................................... 98
6.8 The relation between the Size of NPs and ESA ............................................. 101
6.9 Cortisol detection using AuNPs modified Au electrodes ................................ 103
6.10 Summary of chapter 6 ................................................................................... 106
7 SUMMARY AND FUTURE WORK ................................................................... 107
7.1 Summary....................................................................................................... 107
7.2 Future Work .................................................................................................. 109
REFERENCES ............................................................................................................ 111
APPENDICES ............................................................................................................. 122
VITA ........................................................................................................................... 128
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LIST OF FIGURES
FIGURE PAGE
Figure 1.1: Illustration of wearable sensors with remote health monitoring system
regenerated with permission[3] ................................................................2
Figure 2.1: Schematic representation of the sensing mechanism of biosensors ............8
Figure 2.2: Properties of NPs and their applications .................................................. 10
Figure 2.3: Schematic representation of various NP deposition techniques ............... 13
Figure 2.4: a) Inkjet-printed, b) drop-casted, c) electrodeposited NPs on SPCE, d)
hydrophobic coating, e)evaporation-induced AuNP film formation, and
f) ultra-thin AuNPs film using filtration technique, adapted from [45],
[46], [49]–[51] ........................................................................................ 14
Figure 2.5: Nanoparticle-based electrochemical immunosensing includes [a), and
b)] Competitive, c) sandwich, and d) NP as an underlying layer and
Ligand-based immunosensing. Adapted From [19] ................................. 22
Figure 3.1: a) Schematic illustration and b) photograph of the experimental set-up
for the deposition of Ag NPs on the substrate. c) Schematic illustration
and d) photograph of the experimental set-up of the cold plasma unit.
e) Ag NPs deposited on a flexible polyimide film. .................................. 26
Figure 3.2: Argon energy level diagram .................................................................... 27
Figure 3.3: Optical emission spectra for Ar plasma. Inset: relative intensity of
the Ar I and Ar II transitions with respect to the relative higher-energy
level. ...................................................................................................... 28
Figure 3.4: Schematic representation of SERS measurement technique, adapted
from[74]. ................................................................................................ 34
Figure 3.5: Layout of the electrode design ................................................................ 38
Figure 3.6: The schematic of a photoresist spin coater set-up, as regenerated from
[77]. ....................................................................................................... 39
Figure 3.7: Fabrication steps for microelectrodes ...................................................... 40
Figure 3.8: Picture of evaporator a) and b) planetary fixture ..................................... 41
Figure 3.9: Schematic of Antibody/DTSP SAM/NPs binding and stepwise
fabrication of cortisol immunosensor ...................................................... 42
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Figure 3.10: Equivalent circuit and Nyquist plot of the biosensor ............................... 45
Figure 4.1: SPR of untreated, 5 mins, 10 mins, and 15 mins a) plasma-treated; b)
thermally treated at 250̊ C and c) thermally treated at 400 ̊C and d)
Blueshift of a), b) and c) shows the blueshift in SPR spectra after the
thermal and plasma treatment. ................................................................ 48
Figure 4.2: a) SPR results of plasma-treated Au NPs and b) Blueshift in SPR after
the plasma treatment ............................................................................... 49
Figure 4.3: SPR and redshift of plasma-treated drop-casted a), c) AgNPs and b), d)
Au NPs ................................................................................................... 50
Figure 4.4: SEM images of AgNP films deposited on silicon substrates a) before
treatment, b) after 15 mins thermal annealing, and c) after 15 mins
plasma treatment. The SEM images processed in ImageJ to identify
nanoparticle boundaries [d), e) and f)]; and Feret’s diameter
distributions [g), h) and i)] corresponding to untreated, thermally
treated and plasma-treated AgNPs. The left shift in the AgNPs size
distribution was attributed to the size reduction after the treatments.
The plasma-treated AgNPs exhibited a more uniform film than other
samples. ................................................................................................. 52
Figure 4.5: SEM images of AuNP films deposited on silicon substrates (a) before
treatment, (b) after 15 mins of plasma treatment. The SEM images
processed in ImageJ to identify nanoparticle boundaries [(c) and (d)];
and Feret’s diameter distributions of (e) untreated and
(f) plasma-treated AuNPs film. ............................................................... 53
Figure 4.6: Zeta potential distribution of (a) untreated and (b) plasma-treated (15
minutes) Ag NPs. The surface charge changes from +25.1 to −25.9 mV
after treatment. ....................................................................................... 54
Figure 4.7: Zeta potential measurements for a) untreated and b) plasma-treated
AuNPs. The surface charge changed from -20.9 mV to -43.9mV. ........... 55
Figure 4.8: TEM images and diffraction patterns (insets) of (a), (c) untreated and
(b), (d) plasma-treated Ag NPs. AFM images of (e) untreated and (f)
plasma-treated Ag NP film; the roughness and texture are shown in the
insets. ..................................................................................................... 57
Figure 4.9: Representation of positively charged AgNPs using BPEI ........................ 58
Figure 4.10: a) Proposed mechanism by which plasma treatment modifies Ag NP
films. The bottom panel b) is the SERS spectra of the untreated and
plasma-treated NPs at 532-nm excitation, which validates the
hypothesis that removal of the BPEI coating and subsequent surface
oxide formation results in the observed size reduction. ........................... 59
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Figure 4.11: Schematic representation of AgNPs surface reaction within the plasma
sheath. .................................................................................................... 61
Figure 4.12: SERS response of R6G on as-deposited and plasma-treated Ag NP
films on a silicon substrate. The R6G response is enhanced until 15
minutes of plasma treatment. It is saturated because of the complete
surface coverage with the oxide layer after 15 mins of the treatment.
The inset in (b) shows the enhancement factor of R6G as a function of
treatment time......................................................................................... 64
Figure 4.13: SERS response of R6G molecules on thermally treated AgNPs at 400֯C . 66
Figure 4.14: SERS response for R6G on 15 mins plasma-treated AgNPs recorded at
a different time interval at room temperature. The samples were stored
at room temperature (25̊C) ...................................................................... 67
Figure 4.15: SERS of a) untreated b) 5 mins plasma-treated c) 10 mins plasma
treated and d) 15 mins plasma-treated AuNPs ......................................... 68
Figure 4.16: SERS of R6G on untreated (Black solid and inset) and 15 mins of
plasma-treated (Blue solid) ..................................................................... 70
Figure 5.1: Schematic illustration of plasma-assisted aerosolized NPs modified
sensor fabrication process and SEM images of morphological changes
during the sensor fabrication. .................................................................. 73
Figure 5.2: Schematic of stepwise fabrication of cortisol sensor ............................... 74
Figure 5.3: Electrochemical response of 5mM [Fe (CN)6]3−/4− using a) CV and
b) EIS of untreated and plasma-treated AgNPs modified electrodes. ....... 76
Figure 5.4: Electrochemical response of 5mM [Fe (CN)6]3−/4− using a) CV and
b) EIS of untreated and plasma-treated AuNPs modified electrodes. ....... 78
Figure 5.5: Evaluation of the power factor of the constant phase element of bare
Au, untreated AuNP modified, and plasma-assisted AuNPs modified
electrodes ............................................................................................... 80
Figure 5.6: EIS responses of I) untreated and III) plasma-assisted a) AgNPs,
b) DTSP SAM/AgNPs, c) Anti-Cab/DTSP SAM/AgNPs,
d) 0.012 µg/dl Cortisol/ Anti-Cab/ DTSP SAM/ AgNPs modified
SPCE; and Linear calibration plot for II) Anti-Cab/DTSP
SAM/untreated AgNPs and II) Anti-Cab/DTSP SAM/plasma-assisted
AgNPs modified SPCE. .......................................................................... 81
Figure 5.7: Reaction scheme for the conversion of PEI primary amines with DSP.
The resulting disulfide bonds are easily cleaved by reducing agents,
regenerated from [112] ........................................................................... 83
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Figure 5.8: EIS responses of I) untreated and III) plasma-assisted a) AuNPs,
b) DTSP SAM/AuNPs, c) Anti-Cab/DTSP SAM/AuNPs,
d) 0.012 µg/dl Cortisol/ Anti-Cab/ DTSP SAM/ AuNPs modified
SPCE; and Linear calibration plot for II) Anti-Cab/DTSP
SAM/untreated AuNPs and II) Anti-Cab/DTSP SAM/plasma-assisted
AuNPs modified SPCE. .......................................................................... 84
Figure 6.1: a) SEM image of AuNPs modified electrode, b) NPs outline detection
using image processing, and c) distribution of the size of NPs. ............... 91
Figure 6.2: TEM images of a) drop-casted, b) aerosolized, and c) plasma-assisted
aerosolized deposited AuNPs of the average size of 20nm. ..................... 91
Figure 6.3: AuNPs deposition model for untreated AuNPs [a, b, c] and plasma
treated AuNPs [d, e, f] for various inter-particel separation distance (S).. 93
Figure 6.4: CV responses of 20nm, 40nm, and 60nm of AuNPs modified electrodes
with a) drop-casting, b) aerosol deposition, and c) plasma-assisted
aerosolized deposition. TEM images of d) drop-casted, e) aerosol
deposition, and f) plasma-assisted aerosolized AuNPs. ........................... 95
Figure 6.5: EIS responses of a) drop-casted, b) aerosolized, and c) plasma-assisted
aerosolized AuNPs modified Au electrodes in 5mM of [Fe (CN)6]3−/4−,
and d) the variation in electron transfer resistance due to the deposition
methods and variation in size of NPs. ..................................................... 97
Figure 6.6: Boxplots of the spread of the distribution of a) ESA and b) ΔE of bare
Au electrodes, drop-casted, aerosolized, and plasma-assisted
aerosolized deposited AuNPs functionalized electrodes. ......................... 98
Figure 6.7: Variation of separation potentials for drop-casted, aerosolized, and
plasma-assisted AuNPs with the size of AuNPs .................................... 100
Figure 6.8: Correlation plot of the size of NPs and ESA for a) drop-casted, b)
aerosolized, and c) plasma-assisted aerosolized NPs modified
electrodes. d) Relative plot of ESA to bare Au electrodes, 20A,40A
and 60A-20nm,40nm and 60nm aerosolized deposited; 20d, 40d, and
60d- 20nm, 40nm, and 60nm drop-casted; 20P, 40P, and 60P- 20nm,
40nm, and 60nm plasma-assisted aerosolized AuNPs modified
electrodes ............................................................................................. 102
Figure 6.9: a) CV shows a stepwise surface modification in 5mM of
[Fe (CN)6]3−/4− and linear calibration plots with the sensitivity of
Anti-Cab/DTSP SAM functionalized on b) bare Au electrode,
c) 20nm, d) 40nm, and e) 60nm of drop-casted; f) 20nm, g) 40nm,
and h) 60nm of aerosolized; and i) 20nm, j) 40nm, and k) 60nm of
plasma-assisted aerosolized AuNPs modified electrodes. ...................... 105
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Figure 7.1: Summarized effects of plasma-assisted NP deposition methods ............ 108
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ABBREVIATIONS AND ACRONYMS
Nanoparticles NPs
Surface Plasmon Resonance SPR
surface-enhanced Raman scattering SERS
Current-Voltage CV
Electrochemical Impedance Spectrometry EIS
Deoxyribonucleic acid DNA
Silver Ag
Silver Nanoparticles AgNPs
Gold Au
Gold Nanoparticles AuNPs
Ultra Violet UV
Cold atmospheric Plasma CAP
Electrostatic Double Layer EDL
Self-Assembled Monolayer SAM
Dithiobis Succinimidyl Propionate DTSP
Argon Ar
Mass Flow controller MFC
Standard Cubic Centimeter per Minute SCCM
Scanning Electron Microscopy SEM
Transmission electron microscopy TEM
Optical Emission Spectroscopy OES
Hydroxyl group OH
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Nitrogen N2
Carbon dioxide CO2
Oxygen O2
Rapid Thermal Processing RTP
Deionized DI
Enhancement Factor EF
Atomic Force microscopy AFM
Reference Electrode RE
Counter Electrode CE
Working Electrode WE
Photoresist PR
Reactive ion etching RIE
Screen Printed Carbon Electrode SPCE
Branched Polyethylenimine BPEI
Silver Oxide AgO
Electrochemical Impedance Spectroscopy EIS
Screen-Printed Carbon Electrodes SPCE
Phosphate Buffer Saline PBS
Ethanolamine EA
Cyclic Voltammetry CV
Electroactive Surface area ESA
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1 INTRODUCTION
1.1 Motivation
The emerging wearable technology has integrated electronics into daily activities. The
awareness about health is growing in a society that leads to the demand in the healthcare
industry. However, it comes with the underlying need for innovations to keep it relevant. The
biosensors market has been expanding during the last decade. It was valued over $20 billion
in 2018[1]. Due to the technological advancements in biosensors, this value is expected to
reach around 80 percent compound annual growth rate in the next few years. The use of
biosensors delivers an innovative, flexible, user-friendly, and end-to-end service to the
modern health care system. Enhancement in technology has led to the awareness about a
healthy lifestyle along with the smart infrastructure, which is accelerating the demand for
wearable biosensors for continuous health monitoring.
There are a few sensors available in the market, such as blood pressure, heartbeat, and
pulse rate sensors. In wearable devices, health-related information is gathered via body-worn
wireless sensors and transmitted to the caregiver via an information gateway, such as a
smartphone, personal computers, and cloud computing. The schematic illustration of
wearable sensors with a health monitoring system has been shown in figure 1.1. Caregivers
can use this information to implement interventions as needed through continuous monitoring.
Hence, the development of biosensors is influencing the point-of-care diagnostics and
positively affects the health care market in forthcoming years.
Though the wearable sensors are advancing in the technology, there is a gap between
wearable devices and biosensors because of challenges in implanting biosensors in wearable
accessories. The performance of biosensors is the reflection of the optimization of their
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attributes, such as selectivity, sensitivity, stability, and reproducibility. The enhancement
in the sensitivity has been achieved by increasing the active surface area using
nanoparticle-functionalized electrodes due to the existence of edges where electric field
intensity is higher[2]. Efforts have been made to improve the performance of the biosensors
with the use of nanoparticles. However, the effective utilization of the properties of
nanoparticles has still lacked information about their behavior under certain conditions, which
hinders the methods of controlling their orientation in specific applications.
Figure 1.1: Illustration of wearable sensors with remote health monitoring system
regenerated with permission[3]
Nanoparticles exhibit higher surface to volume ratio and hence are chemically
reactive and are used as a catalyst in electrochemical sensing. Nanoparticles also play an
important role in optical sensing because of the excitation of the surface electrons.
Plasmonic nanostructures such as silver and gold nanoparticles enable amplification of the
scattering signal by electromagnetic and chemical enhancement[4]–[7]. The
electromagnetic enhancement occurs due to the collective oscillation of the free electrons
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on the surface of the NPs, while the chemical enhancement occurs due to the charge transfer
between molecules and the surface[8]. The surface architecture of surface-functionalized
electrodes with nanoparticles impacts on the response of the electrochemical biosensors.
The sensor response depends on the size, shape, and surface attachment of NPs [9]–[11],
as the optical and chemical properties of nanoparticles are dependent on their size and
shape. NP have broad spectra of applications in nanoscale electronics[12]. In most of the
sensing methods, the use of high-density NP causes polydispersity, and different
orientations on the electrode surface conceal the effects of these factors[13], [14].
Moreover, the orientation and tethered patterning of recognition molecules on the electrode
surface is always described using simple sketches, which fail to consider the non-idealities
in target-surface interaction and arrangement. The data obtained in these cases are averaged
over several phenomena that make it problematic to interpret.
Since the NPs are thermodynamically unstable in their free form due to high surface
energy, they tend to agglomerate. The uneven surface coverage, due to the present
deposition techniques, fails to provide the possible effective enhancement in the active
surface area. Furthermore, the commonly used NP deposition techniques for surface
modification are drop-casting, dip coating, spin coating[15], spray coating[16], and
molecular interface such as ligand exchange[17] face a challenge in controlling the NP size
core distribution and the polydispersity on the electrode.
Aerosolized nanoparticle deposition has been a well-known technique these days of
deposition of nanoparticles on the sensor substrates. However, it still fails to keep the
nanoparticles from agglomerating and form the clusters. There are a few techniques that
involve the plasma treatment in the synthesis of nanoparticles; however, there is a lack of
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understanding of the effects of plasma treatment on their morphology, optical, and
electrical properties. Since the electrochemical response depends on the nature of NP
distribution achieved during deposition, the variation in the electrode-electrode baseline
and the active surface area occur; hence, it affects the inter-electrode variability. In the
intent to improve the inter-electrode variability of electrochemical sensors, it is required to
obtain the uniform NP structure, controlled surface electron transfer, and understand the
NP-electrode surface interface.
The motivation of this research is to study the effects of the atmospheric cold plasma
treatment on plasmonic nanoparticles and quantify the NP coverage on the electrode
surface. To obtain the optimized method of nanoparticle deposition, first, there was a need
to understand the effects of plasma on morphology, optical properties, electrical properties,
and surface charge of nanoparticles.
In this research, the plasma-assisted morphological changes[18], optical and
electrical properties enhancement, and surface charge tuning of AgNPs and AuNPs have
been reported. The electroactive surface area was improved using the plasma-assisted
deposition method. The theoretical correlation based on the evaluation of the electroactive
surface area and morphological properties of AgNPs and AuNPs was established. The
nanoparticle deposition with optimization of aerosolized plasma system was carried out to
achieve the desired surface architecture. This deposition was done on the fabricated Au
electrodes on the silicon substrate, and these electrodes were used to detect cortisol.
The proposed technique of plasma-assisted surface charge tuning of NPs in this
research provided the distribution of NPs maintaining the repulsive barrier. The controlled
repulsive barrier led to the formation of a well-organized NP film on the electrode surface.
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It helped in providing the controlled, effective active surface area to enhance the
electrochemical response. The electrodes surface modified with the optimized parameters
have shown closely resembled NP distribution and hence nearly equal electroactive surface
areas. The proposed method has the potential to minimize the inter-electrode variability as
it involves a controlled surface modification process.
1.2 Objectives
i) Characterization of atmospheric plasma set-up and evaluation of its parameters
to understand their role in the deposition process. Optimization of the
deposition process.
ii) Understand the effects of atmospheric plasma treatment on optical,
morphological properties of AgNPs and AuNPs. Study of plasma treatment-
induced change in size, surface roughness, SPR, and SERS signals of Ag and
Au NPs.
iii) CV and EIS Characterization of NPs modified electrodes to investigate the
change in electrochemical performance of plasma-treated electrodes.
iv) Fabrication of microelectrodes using evaporated gold. Characterization of drop-
casted, aerosolized, and plasma-assisted aerosolized NP modified electrodes.
v) Comparison of electroactive surface area and inter-electrode variability of three
different sizes of nanoparticles for the chosen deposition techniques. Cortisol
detection and sensitivity analysis of as-fabricated electrodes.
1.3 Dissertation organization
Chapter 2 consists of a background and literature review. The sensing mechanism of
biosensors, the role of plasmonic NPs in biosensing, and current state-of-the-art of NPs
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6
deposition techniques with their advantages and shortcomings were presented. The theory
of the cold atmospheric plasma and its parameters were also discussed in this chapter. This
chapter was concluded with a description of various types of immunosensors.
Chapter 3 presents the plasma-assisted aerosolized deposition assembly and Ar
plasma characterization. This chapter also describes the methods of characterization, such
as SPR, SERS, surface charge measurement, SEM, and TEM imaging. Microfabrication of
electrodes was also explained with evaporation, photolithography, and lift-off procedures.
The mechanism of the electrochemical immunosensing of cortisol that is used in this work
was described.
Chapter 4 shows the study of the effects of plasma treatment on morphological and
optical properties of AgNPs and AuNPs. The mechanism of plasma-induced size reduction
was explained with SEM, TEM, and AFM characterization along with SERS signals. The
stability study of the plasma-assisted SERS substrate was also discussed.
Chapter 5 includes the study of the comparison of electrochemical properties of
untreated and plasma treatment on AuNPs and AgNPs modified SPCEs. Cortisol detection
using these electrodes were discussed in this chapter.
Chapter 6 presents the results of the electrochemical performances of 20nm, 40nm,
and 60nm of AuNPs modified Au electrodes deposited with drop-casting, aerosol spray,
and plasma-assisted aerosolized techniques. The comparison of CV and EIS responses of
these electrodes was carried out. The inter-electrode variability and correlation of ESA and
the size of NPs for all three methods of deposition were compared. Cortisol detection was
performed using all these electrodes with sensitivity evaluation.
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Chapter 7 summarizes the study of the effects of plasma on NPs and their
applications in optical and electrochemical sensing in this work. Future work and detailed
directions that can be considered to continue this work are also discussed in this chapter.
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8
2 BACKGROUND AND LITERATURE REVIEW
2.1 Biosensor
Biological recognition elements are converted into the signal output using biosensors
to detect the specific analyte. Biosensors consist of an analyte, bio-receptors, recognition
elements, and transducers. There are a few recognition methods that are usually used to
sense the analyte, such as immunosensors, cyto-sensors, geno-sensors, enzyme-based
sensors, and polymer-nanocomposite based sensors[19]. The bio-receptors such as
enzymes, antibodies, DNA, organelle, cells, and micro-organisms are selected based on the
recognition method. The schematic representation of the biosensing mechanism is shown
in figure 2.1.
Figure 2.1: Schematic representation of the sensing mechanism of biosensors
The recognition element captures the molecules of analyte selectively, which leads
to a change in the signal generated by the sensor. This change in the signal is then measured
and converted into the electrochemical, calorimeter, or optical signal using a suitable
transducer. The signal processing unit is added based on the mode of the measurement to
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convert the signal into the readable form. In the process of analyte detection, the possibility
of errors that get added is during sample preparation, due to environmental variations,
during biological binding due to poor affinity, transducer noise and total noise
accumulation in the measurements.
The advantages of decreasing scale in electrochemistry can be attributed to the
enhanced mass transport and allows increased sensitivity towards molecular level analysis.
The presence of NPs attributed to the enlarged electroactive surface area and fast electron
transfer kinetics as compared to bulk electrodes. It is the elementary need to determine the
electroactive surface area of the electro-catalysts during the electrochemical reactions.
However, in most of the studies, it is not considered. Efforts have been made to calculate
the electroactive area using the CV response of modified electrodes [20]. However, there
is a lack of understanding of the effects of the sensing area architecture on the electroactive
surface area. The orientations of elements used to modify the sensing area play an essential
role in the sensor response. NPs have a broad spectrum of applications in nanoscale
electronics[12]. These applications need to have the controlled deposition of NPs from
dispersion onto the electrode surface and understanding of the particle-particle, particle-
surface interactions[21].
2.2 Properties of NPs and their applications
Nanoparticles exhibit unique electrical, optical, chemical, and catalytic properties
and hence, play a vital role in biosensing. As the surface to volume ratio of NPs increases
as their size decreases, this larger surface area enables the solubilization of more
compounds and hence an increase in the dissolution rate. NPs have a high dissolution rate,
and surface to volume ratio that results in the enhancement of solubility and chemical
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reactions. Figure 2.2 shows the various applications of NPs and respective properties that
are used in biosensing.
Figure 2.2: Properties of NPs and their applications
NPs exhibit effective charge transfer in biological activities due to their
physiochemical properties. AgNPs are used in antimicrobials and antibacterial coating.
Also, their high extinction coefficient makes them suitable for fluorescence applications.
The electron band gap increases as the size of semiconductor NPs decreases, which means
more energy is required to excite the electron in NPs. In this case, the light of higher
frequency and lower wavelength would be absorbed; hence NPs are used in solar cells[22].
Magnetic NPs are used in data storage media, magnetic resonance imaging, and drug
delivery[23] as their properties can be modified using magnetic fields.
2.3 Plasmonic Nanoparticles
Plasmonic nanoparticles are the nanoparticles, unlike other materials whose electron
density can couple with wavelengths that are larger than the particle size. Plasmonic
materials are vital for applications such as molecular-level biosensing and nanoscale
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electronics[12]. Plasmonic nanostructures, such as AgNPs and AuNPs, enable the signal
amplification of the sensor through electromagnetic and chemical enhancement[4]–[7].
Being noble NPs, AgNPs and AuNPs provide high stability, simple chemical synthesis,
and tuneable surface functionalization, which make them valuable in the world of
biosensing.
AgNPs are responsible for the electromagnetic enhancement in the biosensing due to
the charge transfer between molecules and the electrode surface[24]. Nanoparticles exhibit
different properties depending on their morphology, e.g., AuNPs have a broad range of
optical spectra depends on their size. Au NPs suspension varies from the dark red color to
dirty yellow color depends on their sizes; hence, they are used in a colorimetric assay[25].
These optical properties are due to the oscillations of free surface electrons, which resonate
at a specific frequency called localized surface plasmon resonance.
Au NPs are most commonly used in electrochemical biosensing to immobilize the
different moieties such as antibodies, enzymes, nucleic acid, biocompatible polymers, or
other bio-receptors as they maintain their activities after immobilization[26], [27]. Such
functionalization of NPs for therapeutic applications has been increasing the application
area in targeting the specificity and increasing the biocompatibility of biosensing. The
morphology of the metal nanoparticles defines the response of a sample, which can be
altered by thermal annealing[28], [29]. The thermal annealing[30]–[32] of NP films leads
to a change in the mean NP diameter due to agglomeration, creating an observable red or
blue shift in the SPRs.
AgNPs have low sintering temperature and high stability, which make their
application area wider in bio-sensing devices, conductive ink, in textiles, and many
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more[33], [34]. Due to the rich electronic and catalytic properties, AuNPs have been used
to detect biomolecules through electrochemical signals[35]. AuNPs are used as labels in
immunosensing, and plasmonic sensing as SPR, and SERS. They display distinct physical
and chemical properties along with easy preparation and superior biocompatibility to
AgNPs, which make them an essential material in biological and chemical detection[36].
AgNPs are an ideal candidate for optical applications[10], [19] because of their high
extinction coefficient, their tunable optical properties through their size and shape, and
surface plasmon resonance (SPR) in the UV–visible region. These properties have been
exploited in applications such as solar energy harvesting, light-emitting diodes, printed
optoelectronic devices, and surface-enhanced Raman scattering (SERS)[8]. SERS is a
powerful analytical tool for sensing a low concentration of molecular biomarkers. SERS
allows amplification of Raman signals by inducing electromagnetic excitation of the
surface plasmons.
Ag NPs tend to form a natural oxide layer on their surface, which affects the
symmetry of the electro-dissolution in electrochemical reactions, SPR and SERS[37]. The
symmetrical partial surface oxidation is acceptable for maintaining the shape of Ag NPs
and their optical response[37].
2.4 Methods of Nanoparticle Deposition
The conventional methods of NP deposition are spin-coating a dispersion[38],
depositing a thin film by sputtering or evaporation, and then annealing to form the thin
film[39], [40]. However, they require more advanced instruments and still do not have
control over size and distribution over the surface. The schematic representation of NP
deposition techniques is as shown in figure 2.3.
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Figure 2.3: Schematic representation of various NP deposition techniques
The NP density varies in the films that are obtained using all these methods. The
drop-casting process provides the liquid media after the deposition, which leads to the
agglomeration of NPs. Cluster formation has been observed in Spin coated NP films[41]
and polydispersity, and insufficient surface coverage in dip coating, spray coating, and
aerosol spray. The ligand tethered NP attachment on the substrate involves the complicated
set-up to modify the ligands and NPs' surface charge and also, clusters, substrate defects,
and orientations of ligands are responsible for forming uneven films[21]. Moreover, the
uncontrolled NPs size can occur in the precursor growth of NPs[25]. The possible defects
in these methods are represented in figure 2.3.
In some of the techniques of NP deposition, such as vacuum evaporation[42] and
electrodeposition[43], the characterization of electrode interfaces is difficult[44]. Also, the
substrates being treated using these techniques must be tolerant of the elevated
temperatures and vacuum set-up.
Some of the commercially available inkjet printed [45], and electrodeposited[46]
electrodes also show the uneven and uncontrolled NP distribution. It is hard to control the
size of NPs in these cases. Plasma-assisted synthesis techniques of NPs have become a
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focus research area of material science and nanotechnology[47]. However, it lacks the
understanding of the plasma-induced modifications of NPs properties. Moreover, the
plasma synthesis processes used to control NP size are highly complex[48].
Figure 2.4 shows the NP distribution obtained using inkjet printing, drop-casting,
electrodeposition, hydrophobic coating, evaporation, and free-standing ultrathin film
formation using the filtration method.
Figure 2.4: a) Inkjet-printed, b) drop-casted, c) electrodeposited NPs on SPCE, d)
hydrophobic coating, e)evaporation-induced AuNP film formation, and f) ultra-thin
AuNPs film using filtration technique, adapted from [45], [46], [49]–[51]
The films formed using these techniques involve coalescence and agglomeration of NPs.
The recorded variability of NP inkjet-printed electrodes is 6%, of electrodes modified with
the electrodeposition method is around 5%, and that of drop cast NP deposited electrodes
is 10%. The molecular interface for the NP deposition also has limitations in controlling
the orientations of ligands on the surface. The surface roughness and defects can cause
random orientations and disturbed NP patterning.
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Microwave monitored AgNPs sintering at higher temperatures for SERS
enhancement has shown the amplification factor up to 108[52]. However, this method
forms clusters of NPs as a function of temperature. Plasma-assisted synthesis of NPs has
emerged as an essential research area of material science and nanotechnology[47].
Moreover, the plasma synthesis processes used to control NP size are highly complex[48].
In this research, a novel and simple approach of cold atmospheric plasma (CAP)
treatment was proposed to provide energy to the AgNPs substrate, similar to that provided
in thermal annealing but at room temperature. AgNPs on substrates by injecting aerosol in
flowing argon gas were deposited and then treated them with a low-temperature
atmospheric plasma jet. The aerosolized NP deposition assembly and plasma set-up are
derived from our previous work[53] and that of Dey et al.[54] with a few modifications.
The plasma technique used by Khan et al.[55] involves pulsed laser deposition and a
comparatively complex experimental assembly. By contrast, the set-up used in this work
contains a simple nebulizer to create NP aerosol for the deposition.
The NPs total potential is a function of their separation distance, and the interparticle
distance depends on the Van der Waals force, Electrostatic double layer (EDL), and
electrosteric interactions[56]. Based on the Van der Waals attraction or repulsion force, the
agglomeration and dispersion occur, respectively. The charged surface of NPs adsorbed
opposite charged ions in the stern potential region and formed the EDL.
2.5 Plasma
Plasma is energetically the fourth state of matter, which contains charged and neutral
particles. The particle (except electrons) energy in the plasma varies from 1 eV to 10 eV,
which is equivalent to the range, 104 K to 105 K, respectively. Plasma is referred to as gas
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discharges, and it can be produced by passing an electrical discharge through the gas.
According to the kinetic theory of gases[57], in ordinary neutral gas, only gravitational
forces act, which are negligible. Particles in the gas stream travel in straight lines with a
distribution of velocities. They collide with each other and with the wall of the container
during their journey. This collision defines the motion of the particles called a random
Brownian motion.
The cross-section for collision ‘a’ and mean free path λ,
a = πr2 (2.1)
Where, r - radius of particles as rigid spheres
d - density
𝜆 =1
𝑎𝑑 (2.2)
The average number of collisions per second (frequency of the collision) v can be
expressed as equation 2.3.
v = V/λ (2.3)
Where, V - the average velocity of the molecules in the gas.
From equation 2.3, the mean time between collisions can be expressed as,
t =1
v=
λ
𝑉, 𝑉 = (
kT
M)
1
2 (2.4)
Where, t - mean time between collisions
k - Boltzmann constant
T - Temperature
M - Mass of a molecule
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λ ∝1
p, λ = ct/p (2.5)
Where, ct - Constant depending on the gas
p - gas pressure
The larger is pressure, the smaller the mean free path of the collision that results in
the larger energy provided to the particles due to collision. In plasma, the motion collision
of the particles forms the positive and negative electric charges in small confined areas,
where these charges create long-range coulombic fields. It affects the motion of the
particles that are some distance from the charge concentrations.
A charged particle in a plasma moves along a path of the electric field. The overall
interaction of the particles in the plasma gives the characteristic collective behavior, and
each parameter defines the nature of the plasma stream. The collision-less plasma can be
created by keeping the pressure of the system low as it leads to a smaller number of
collisions and stronger long-ranges electromagnetic forces. Local concentrations of
charges in plasma are confined to volumes of small dimensions, λD, which is a
characteristic dimension of the plasma, called the Debye length.
For plasma to be stable, the dimensions of the system should be several orders of
magnitude larger than the Debye length. In order of tens of micrometers outside of these
small volumes, the charge density of ions is approximately equal to the density of electrons,
which makes the plasma electrically neutral. Due to the higher mobility of electrons, they
act faster to cancel the charge present in the plasma created by the applied electric field
than ions. This response is called Debye shielding, which gives plasma its quasi-neutrality.
Hence, the applied electrical potential develops mostly near the surfaces, over a distance
called the Debye length.
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𝜆𝐷 = (Ɛ0𝑘𝑇𝑒
𝑛𝑒 𝑒2 )
1
2 (2.6)
Where, Ɛ0 - the permittivity of the free space
e - the charge of the electron
Plasma is obtained when the required amount of energy, higher than the ionization
energy, is added to atoms of gas that cause ionization and production of ions and electrons.
Parallel to the ionization, the opposite process of recombination occurs to form neutral
atoms or molecules. Plasma is excited and sustained by providing gas, electromagnetic
energy in different forms, such as microwave, radiofrequency, and direct current.
2.5.1 Plasma parameters
As electrons make up the largest number of particles in the system, they transfer the
energy through collisions to the molecules of the gas. It causes the ionization and
dissociation of the gas molecules. Similarly, the ions absorb energy and cause chemical
reactions after collisions with the molecules. The motions of the plasma particles, which
induce the collisions, are of two types, elastic and inelastic. An elastic collision occurs
between electrons and heavy targets with negligible energy transfer and does not lead to
the excitation of the target. However, in an inelastic collision, the target goes to an excited
state, with the maximum amount of energy transfer.
Energy transfer Wtr = (2me
M) W (2.7)
Where, Wtr - Energy transfer from electrons to heavy targets
me - Mass of the electron
M - Mass of the heavy particle
W - Energy of the electron
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For an elastic collision of an electron with an argon atom, the fraction of transferred energy
is, Wtr
W~
1
40,000.
The electrons absorb energy through acceleration when the electric field is applied,
and transfer the same amount of energy by inelastic collisions with the neutral gas
molecules. The fraction of this transferred energy can be expressed as,
Wtr
W=
M
M+m (2.8)
Where, m- The mass of particle losing energy
In an inelastic collision, electrons transfer almost all their energy to a heavy particle
(m= me << M), creating an energetic plasma species. These are the particles responsible
for the creation and of sustained downstream plasma.
Energy transfer through inelastic collisions varies from 0.1 eV to more than 10 eV.
The energy required for excitation of molecules is less than 0.1eV, and ionization is more
than 10 eV. The density of the charged particles in the plasma is defined by the degree of
ionization of the gas. The degree of ionization, α defines as,
α= ni/n (2.9)
Where, ni - the number of ionized particles
n - the total number of particles present in the plasma
The critical ionization 𝑎𝑐~ 1.73𝑥1012 𝑎 𝑇𝑒2.
If α>>> ac, the charged particles behave as in a fully ionized gas.
Hence, to obtain stable atmospheric plasma, the energy should be less than the critical
ionization.
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2.5.2 Cold Atmospheric Plasma
Typically, the parameters and the range of their default values for the cold plasma
are as follows,
Electron Temperature, Te~ 1 eV, Electron density, ne ~ 1010 /cm-3, Debye Length, λD = 74
µm.
𝜆𝐷 = 6.93 ( 𝑇𝑒(°k)
𝑛𝑒 (𝑐𝑚−3)) (2.10)
Debye length depends on the electron temperature, the energy of the electrons which
get excited and responsible for collisional energy transfer, and electron density (ne).
The energy associated with the plasma is given by,
W = (3
2) (k𝑇𝑒) (2.11)
When the electric field is applied to the gas system, an electron multiplication process
takes place, which can be characterized by a macroscopic coefficient, aT that represents the
mean number of ion-electron pairs formed along a path of 1 cm. The coefficient, aT, is
called the first Townsend coefficient and is dependent on the electric field (E), the pressure
(P), and the nature of the gas as well, which helps in designing the plasma system.
When the applied voltage is low, the current produced by the collection of the
available free charges is negligibly small. When the applied voltage reaches a specific
threshold value, ions get accelerated and hit the cathode with their energy, which causes
the emission of the secondary electrons. The secondary electrons contribute to the
formation of more ions by collisions with the neutral particles of the gas. These ions also
are accelerated towards the cathode and produce more electrons and more ions.
Simultaneously, electrons created by ionizing collisions and by secondary processes are
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removed from the plasma by drift and diffusion to the walls of the gas system, by
recombination with positive ions, and in certain gases, by the formation of negative ions.
2.5.3 Plasma-Induced Surface Modification
When the surface comes in contact with the plasma, the electrons and ions recombine
and are lost from the plasma system after reaching the substrate surface, which has to be
modified. Electrons, due to the thermal velocities, reach the surface faster than the ions by
leaving the plasma with a positive charge. Thus, the surface achieves a negative potential
relative to the plasma. The Debye Shielding effect induces the potential developed between
the surface and the plasma that is enclosed to a layer of the number of Debye lengths. This
layer is called a plasma sheath that affects the penetration and repulsion of the electrons
through it. The sheath potential is given by[57].
For the planar surface:
Vs = (k𝑇𝑒
2e) ln (
me
2.3∗mi) (2.12)
Where, Vs - sheath potential
mi - a mass of the ion
The thickness of the plasma sheath is the thickness of the region where the electron
density is negligible and where the potential drop Vs occurs. It depends on the collisional
mean free path in the plasma and is affected by external biases applied to the surface.
2.6 Nanoparticle-based Electrochemical Immunosensing
Due to the rich electronic and catalytic properties, plasmonic NPs have been used to
detect biomolecules through electrochemical signals[35]. Although direct detection of
biomarkers using conventional electrochemical reactions is possible, various methods have
been successfully adapted where nanocomposites boost the sensitivity of biosensors.
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Electrochemical sensing involves a transducer which converts the biochemical signal into
an electrical signal.
There are various methods available to detect the analyte using electrochemical
immunosensing, including competitive, sandwich, and labeled immunoassay[19], [58].
Nanoparticles are used as labels, or as an underlying layer to bind biorecognition elements
for biosensing. In some cases, ligands such as Self Assembled Monolayer (SAM) are used
for binding, and in some methods, they are used to increase the electroactive surface area.
Figure 2.5 shows various techniques that involve NPs in immunosensing. Due to the strong
affinity of Au surface with amino groups and mercapto groups, AuNPs facilitate the
conjugation of biological ligands[59].
AgNPs provide improved electrochemical signals and can be oxidized easily; hence
they are suitable in the detection of tags in electrochemical sensing. However, they are
unstable and hard to functionalize. Also, most importantly, they have less biocompatibility
than AuNPs, which limits their application area in immunosening[19], [60].
Figure 2.5: Nanoparticle-based electrochemical immunosensing includes [a), and b)]
Competitive, c) sandwich, and d) NP as an underlying layer and Ligand-based
immunosensing. Adapted From [19]
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As nanoparticles serve as a fundamental layer in the fabrication of biosensors and
further layers of bio-receptors are attached to them, it is necessary to achieve a uniform
film on the sensing area.
In this work, the ligand-based electrochemical immunosensors have been fabricated
for the detection of cortisol with DTSP SAM to bind cortisol antibodies to the NP surface.
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3 EXPERIMENTAL PROCEDURE
In this work, the aerosolized deposition system combined with the cold atmospheric
plasma system using Argon gas has been designed and developed considering all the
parameters that are described in chapter 2. The designed plasma system has been used to
control the NP surface charge to obtain comparatively dispersed NP placement on the
electrode surface than drop-casting and aerosol spray methods. Zeta-potential
measurements were carried out to analyze the surface charge on NPs during deposition.
Based on the DLVO model[21], the force of Van der Waals attraction and the Electrostatic
double layer is dependent on average particle size, the distance between interacting
surfaces, absolute temperature, stern layer thickness, and zeta potential. The experimental
assembly for aerosolized deposition with surface charge tuning with plasma has been
developed in this work.
3.1 Aerosolized deposition and argon plasma assembly
Figure 3.1 shows the experimental set-ups used for NP deposition (Figure 3.1a and
3.1b) and plasma treatment (Figure 3.1c and 3.1d). For NP deposition, an ultrasonic
nebulizer was used to create an aerosol of the NP solution. The nebulizer was connected to
a quartz tube to provide a desired path to the aerosol. The ultrasonic nebulizer was modified
to have one inlet for Argon (Ar) gas and one outlet, which was connected to the quartz
tube, with an outer diameter of 6 mm and an inner diameter of 3mm.
A glass capillary with a 1-mm inner diameter was inserted into the quartz tube
(Technical Glass Products, Ohio). Another Ar inlet was connected to the midway point of
the quartz tube and was controlled by a mass flow controller (MFC). Teflon tape (Everflow
Supplies) was used as a moisture blocker between the quartz tube and glass capillary
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(placed in front of the MFC outlet) to absorb the excess moisture created from the aerosol
in the path before deposition.
A high-voltage supply (variable output of 1–20 kV; variable frequency of 20–60
kHz; current of 20–30 mA) to generate the plasma (Figure 3.1c and 3.1d), was connected
to two electrodes made from copper rings on the quartz tube. These tubular copper
electrodes were placed 1 cm apart. The MFC-controlled Ar gas flow was supplied to the
quartz tube to produce a stable Ar cold plasma.
The Ar flow rate was set using a gas flow controller at 2 L/minute. The external
power supply was used to deliver sinusoidal power (~10 kV, ~30 kHz) to the electrodes.
The high-voltage supply was turned on, and the impedance was adjusted in such a
way that the voltage and variable frequency reached a point where the downstream plasma
became stable. The voltage supply and gas flow were turned off after treatment.
biPolyethylenimine (BPEI)-functionalized Ag NPs and Citrate capped Au NPs of an
average size of 10 nm were purchased from Sigma-Aldrich and used to make a 0.02 mg/ml
solution in deionized water. The NPs solution was poured into the nebulizer to create the
aerosol.
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Figure 3.1: a) Schematic illustration and b) photograph of the experimental set-up for the
deposition of Ag NPs on the substrate. c) Schematic illustration and d) photograph of the
experimental set-up of the cold plasma unit. e) Ag NPs deposited on a flexible polyimide
film[61].
The stream of Ar gas of ~15 SCCM was supplied to the inlet of the nebulizer. NPs
aerosol was carried along the path through the quartz tube and capillary through the stream
of Ar. The Ar gas supplied to the midway of the quartz tube regulated the flow of the NPs
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for film deposition as required. The concentrated NPs were carried through the capillary.
They were deposited on the quartz slides for SPR detection, on silicon for the scanning
electron microscopy (SEM), and SERS characterization, and on the copper grids for the
transmission electron microscopy (TEM).
3.1.1 Argon plasma
Ar atomic structure: Ar has its atomic number- 18 and atomic mass- 39.948. It has
the electron distribution in its atomic structure as 1s2 2s2 2p6 3s2 3p6[62]. The energy
associated with each of the energy levels in the atom can be calculated as:
𝐸𝑛 = −13.6 𝑍/𝑛2 eV (3.1)
Where, n- number of the shell the electron present
Z- atomic number
The energy level diagram for the Argon atom is shown in figure 3.2.
Figure 3.2: Argon energy level diagram
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3.1.2 Plasma characterization
The free electrons are present in 3p- 3p, 4s levels of the Ar atom. The electron
transition mostly takes place between 4p and 4s atomic states. The applied external
potential acts on the neutral gas when applied, the electrons get energies by absorbing the
energy. The electrons then, due to collisions with other molecules, generate the ions and
then ions due to the collision with other molecules, generate the secondary electrons. The
current gets generated proportion to the applied electric field and electron-ion interactions.
The Argon plasma generated was diagnosed by using Optical Emission Spectroscopy
(OES). The electrons emit energy when they make transitions between different energy
levels in the atom. The transitions can be analyzed by obtaining the radiated emission
energy from the electrons at different wavelengths. The optical emission spectrum was
recorded for the Ar gas CAP, as shown in figure 3.3.
Figure 3.3: Optical emission spectra for Ar plasma. Inset: relative intensity of the Ar I
and Ar II transitions with respect to the relative higher-energy level[53].
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An optical emission spectrometer (Ocean Optics, HR2000+ES) was used to obtain
the intensity counts for the downstream plasma[63]. As the Ar plasma falls under the
visible spectra, the range of the wavelength at which we get the intensities of the radiated
energy is as shown in figure 3.3. From the OES of the Ar gas plasma, the intensities for
various transitions were detected. The ArI refers to the transition from 4p to 4s and ArII to
4d to 4p. The intensities for the Ar transitions were also measured[64] as,
Table 1. Ar Intensities and corresponding parameters
Wavelength I A (x107) E1 E2 G
695.3 Ar I 1.41E+04 0.63 11.54 13.32 3
705.5 Ar II 3.82E+03 0.38 11.54 13.3 5
725.9 Ar I 3.02E+03 0.18 11.62 13.32 3
750.8 Ar I 2.88E+03 4.45 11.82 13.27 1
762.2 Ar I 1.37E+04 2.45 11.54 13.15 3
772 Ar I 9.05E+03 0.51 11.54 13.15 3
801.2 Ar I 2.03E+03 0.92 11.54 13.09 5
811.2 Ar I 3.94E+03 3.31 11.54 13.07 7
826 Ar I 3.88E+03 1.53 11.83 13.32 3
842 Ar I 1.65E+03 2.15 11.62 13.09 5
852 Ar I 4.57E+02 1.39 11.82 13.28 3
912 Ar I 1324 1.89 11.54 12.90 3
Some of the intensities other than Ar were also identified such as,
At, 307.7 nm, 281.2 of OH; at 336.2 nm, 214.2 of N2; at 356.2 nm, 186.2 of CO2; at 776.2
nm, 804.6 of O2; at 921.2 nm, 248.2 of O2.
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The relative intensities were plotted against relative higher-level energies for the
respective transitions using the ratio method[65], as shown in the inset of Figure 3.3; the
relationship is given in Equation 1[66]:
ln (𝐼₁
𝐼₂) = −
𝐸₁−𝐸₂
𝑘𝑇+ ln (
𝐴₁𝑔₂ 𝜆₂
𝐴₂𝑔₂ 𝜆₁) (3.2)
Where, A - the transition probability
g - the statistical weight of the electron
λ - the wavelength associated with the transition
E - the higher-level energy for the transition
k - the Boltzmann constant
T - electron temperature
The relationship between the relative intensities and relative energies was plotted to
validate the above result. The slope of the fitted plot was calculated, as shown in the inset
of Figure 3.3, and the electron temperature was found to be T = 1.08 eV. Using the Saha–
Boltzmann method[67], [68], the electron density, ne, was calculated as:
𝑛𝑒 = 6.04𝑥1021𝑥 (𝐼₁
𝐼₂) 𝑥(𝑇)
3
2 𝑒 (𝑥𝑧−𝐸₁−𝐸₂
𝑘𝑇) (3.3)
Where, (2 𝜋𝑚𝑒𝐾
ℎ3)
3
2= 6.04 × 1021
xz - the ionization potential of Ar (assumed to be 15 eV)[69].
The electron density, 𝑛𝑒 = 1.9𝑥1011 cm-3, is the number of electrons that were
energized and excited into an ionized state.
The NPs were deposited on quartz and silicon substrates and then were treated with
plasma. Similarly, the deposited NPs were annealed thermally to compare the results
obtained with the proposed technique.
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3.1.3 Plasma treatment and thermal annealing of NPs
Samples for SPR were prepared by depositing Ag, Au NPs on quartz slides followed
by plasma treatment for 5, 10, or 15 minutes. For comparison between the plasma-treated
and thermally annealed substrates, sets of as-deposited slides were annealed using rapid
thermal processing (RTP) for the same duration at 250 and 400 °C in an Ar/O2
environment. The thermal energy for the gas at 400 °C was 0.058 eV, which was obtained
from the temperature of the gas used in RTP.
The characterization of optical properties of thermally and plasma-treated NPs was
carried out using SPR, and SERS.
3.2 Surface Plasmon Resonance
SPR occurs due to the excitation of conducting electron cloud present on the surface
of plasmonic NPs. In this technique, the free electrons get excited by incident polarized
light, and their collective oscillation is detected[70]. The interaction of electromagnetic
waves with the conducting electrons on the NP surface attributes to SPR, which leads to
strong scattering and absorption. SPR signals were measured for all samples using a UV–
visible spectrometer (Thermo Fisher, Evolution 300). The SPR absorbance peak depends
on the size, shape, and assembly of the metal nanoparticles and can be expressed as[71]–
[74],
𝐴 (𝐴𝑏𝑠𝑜𝑟𝑏𝑎𝑛𝑐𝑒) = Ɛ 𝐶 (3.4)
Where, Ɛ - extinction coefficient
C - Concentration of a solution
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When a beam of light passes through the glass slab of the sample, some amount of it
gets scattered and transmitted when the remaining gets absorbed. Hence, the absorbance is
a measure of the density of NPs deposited on the substrate by experimental set-up.
The above equation can be rewritten in terms of particle density as,
𝐴 ∝ (𝑅2) 𝑁 (3.5)
Where, R - Radius of a spherical particles
N - Number of particles per unit area
Also, the position of UV Spectra Peak can be evaluated as,
𝑑 = 𝑙𝑛 (𝜆𝑠𝑝𝑟 – 𝜆0)/ 𝐿2 (3.6)
Where, d - particle size (diameter)
λspr - position of the absorbance peak
As the position of the absorbance peak depends on the particle diameter, change in
particle size accounts for a shift in the UV visual spectra towards blue range or red range,
depends upon the positive or negative change in the size. Due to the surface to volume
ratio increment in NPs, the number of scattering electrons at the surface increases. This
phenomenon leads to the reducing lifetime of the oscillation and hence increase the spectral
width. The LSPR (Localized Surface Plasmon Resonance) occurs at a specific wavelength
of the incident light. When the source of this wavelength is used to excite the molecules in
SERS, the signal enhances, while the respective SPR signal would be blank. Hence, these
two methods are not interchangeable. The collected signal in SPR passes through the set
of monochromators to separate the intensities. These intensities are plotted as a function of
wavelength.
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3.3 Surface charge measurements
The electric charge on the NP surface after plasma treatment was analyzed by
performing zeta potential measurements using a particle zetasizer (Malvern Instruments).
Measurements were made from a solution of NPs and averaged before and after treatment
in the liquid. Also, the NPs were deposited on the silicon substrates and treated as described
in section 3.1.3 and then scraped out from the substrate, and the suspension was prepared
in DI water. The zeta potential of the suspension was recorded immediately after the
treatment. The readings were taken for 15 runs and were averaged for five different
samples.
3.4 Surface-enhanced Raman spectroscopy
Raman signals are inherently weak; the method to amplify weak Raman signals is to
employ surface-enhanced Raman scattering (SERS). SERS uses nanoscale roughened
surfaces typically made of Au or Ag NPs. Laser excitation of these roughened metal
nanostructures resonantly drives the surface charges creating a highly localized
(plasmonic) light field. When a molecule is absorbed onto the enhanced field at the surface,
a significant enhancement in the Raman signal can be observed. R6G was used in this
work, as it has been used extensively as a model dye for SERS characterization. It is an
extremely strong fluorophore when excited by visible radiation.
SERS involves sample illumination using a laser beam. The electromagnetic
radiation from the illuminated sample is collected and dispersed onto a detector, as shown
in figure 3.4. This scattered photon shifts to a different energy level and, therefore, at a
different frequency. This energy difference is equal to that between the initial and final
states of the molecule. If the final state is higher in energy than the initial state, the scattered
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photon shifts to a lower energy level so that the total energy remains the same. This shift
in frequency is called the Stokes shift; similarly, if the final state is lower in energy, the
scattered photon shifts to a higher frequency, which is called an anti-Stokes shift, or upshift,
as shown in figure 3.4.
Figure 3.4: Schematic representation of SERS measurement technique, adapted
from[75].
Raman shifts are typically reported in wavenumber, which have units of inverse
length, as this value is directly related to energy. The shift in the Raman spectrum can be
calculated as follows,
𝛥𝑣 = (1
𝜆0) − (
1
𝜆1) (3.7)
Where Δv is the Raman shift expressed in wavenumber, λ0 is the excitation wavelength,
and λ1 is the Raman spectrum wavelength. It is expressed with cm−1.
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The SERS signals of the samples were recorded using a LabRAM HR spectrometer.
The intensities were recorded at 30 selected points and then averaged. The spectral position
was calibrated at the 520.5 cm−1 peak of Si/SiO2. Signals were recorded at 532-nm
excitation wavelength with a 5 µm diameter of the region under the laser beam. Gaussian–
Lorentzian peak detection was used after subtracting the noise from the signal in 15
acquisitions. NPs were deposited on silicon substrates, and the SERS signal for R6G was
measured with and without plasma treatment. R6G (Sigma Aldrich) was diluted to 5 µM
and placed directly on the untreated and treated NP films. A 10-µl probe solution was used
to create a drop on the substrates. This drop was spread into the circle with a 4-mm
diameter.
The peak intensities of the R6G directly on the bare silicon substrate were detected
after spreading it in a 4-mm-diameter circle and letting it dry to calculate the enhancement
factor. The EF for the recorded signals was calculated based on the methods used in Meyer
et al.[76] and Li et al.[77]. The enhancement factor can be calculated as,
𝐸𝐹 = (𝐼𝑆𝐸𝑅𝑆 /𝑁𝑆𝐸𝑅𝑆)/(𝐼𝑁𝑅𝑆/𝑁𝑁𝑅𝑆) (3.8)
𝑁𝑆𝐸𝑅𝑆 = 𝑁𝐴 𝑛𝑆𝐼𝑟𝑟/𝑆𝑑𝑖𝑓 (3.9)
𝑁𝑁𝑅𝑆 = 𝑑 𝑆𝐼𝑟𝑟 𝑁𝐴ℎ/𝑀 (3.10)
Where, ISERS and INRS- The peak intensities of the SERS (Surface Enhanced Raman
Scattering) and NRS (Normal Raman Scattering), respectively.
NSERS and NNRS correspond to the number of probe molecules excited in the
SERS and NRS tests.
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NA refers to the Avogadro's constant, n correspond to the molar quantity of
the probe molecule (5μM)
SIrr - The irradiation area under the laser beam (5μm)
Sdif - The diffusion area of the substance to be tested on the substrate. For
10μL of volume and 4mm circle of the drop of R6G, the diffusion area is
50.24mm3)
d - The packing density of R6G molecules in the surface of the substrate
h - The laser confocal depth (26μm)
M - The molecule weight of R6G (479).
3.5 Imaging
The aerosolized Au and Ag NPs were deposited with thermal and plasma treatment
onto silicon substrates for SEM imaging (JOEL, SEM 7000l) at an operating voltage of 20
kV and with a 9-μA probe current. The SEM images were processed using ImageJ software
to obtain the Feret diameter distribution of the untreated and treated NPs. The TEM images
of the Ag NPs were captured using a Philips CM200 TEM at a 200-kV excitation voltage.
Atomic force microscopy (AFM) images were recorded for samples prepared on
silicon substrates using AFM WORKSHOP TT, and the results were processed using
Gwyddion software tools. AFM is usually used to measure the topography and surface
roughness. It records the deflection and oscillation amplitude of the beam as the tip of
cantilever moves along the surface to scan. The cantilever was used in this project was in
vibrating mode. The surface roughness and texture of the untreated and plasma-treated
samples were plotted.
The electrode response for closely placed NPs deposition by avoiding interparticle
attraction using the designed deposition system has been statistically analyzed. The NP
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distribution using drop-casting, aerosolized, and plasma-assisted aerosolized NP
deposition were compared. Plasma tunes the surface charge of NPs during deposition on
microelectrodes that were fabricated, as described in section 3.6. The effects of these
methods on the electroactive surface area and inter-electrode variability have been
compared.
3.6 Microelectrodes Fabrication
The microelectrodes were fabricated using photolithography patterning on silicon
substrates, followed by evaporated Au deposition. The electrode was designed to use for
three-electrode electrochemical systems by considering the standard proportions using
LayoutEditor, as shown in figure 3.5.
Two layers of the fabrication were performed for gold evaporated reference (RE),
counter (CE), and working electrodes (WE), an insulation layer on top to make a microwell
to limit the electrolyte during electrochemical measurements. The photomask of the design
shown in figure 3.5 was made using Heidelberg uPG-101 mask maker.
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Figure 3.5: Layout of the electrode design
The standard procedures of photolithography, physical evaporation, and lift-off were
performed to fabricate the electrodes on silicon (Si) wafers. The process flow of
photolithography, metal deposition, lift-off is shown in figure 3.7. The silicon wafers must
undergo a standard cleaning to begin the patterning process. The silicon wafers were
cleaned with Acetone for 2 minutes, Isopropyl alcohol for 1 minute to rinse off the acetone
residues, and deionized (DI) water for 5 minutes, followed by drying with dry air.
The spin coater is used to apply PR layers onto the wafer due to the resulting high
uniformity of the coatings. When a wafer is to be spin-coated, it is first placed on the
rotating panel where the vacuum chuck secures it into place. The photoresist is then
dispensed onto the wafer as it rotates. Figure 3.6 shows the schematic of the spin coating
technique.
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Figure 3.6: The schematic of a photoresist spin coater set-up, as regenerated from[78].
Photoresist AZ5214E, which is an image reversal photoresist, was used to coat the
silicon wafer using a spin coater. The wafer thickness and type of orientation are considered
when deciding the parameters that should be used to spin coat photoresist onto a wafer.
In this project, AZ5214E was used as a positive photoresist for patterning on the Si
wafers. The optimized parameters for spin coating were used. The rotating speed was set
to 500rpm for 10 sec with the ramp of 100rpm/sec. It was then switched to 4000 rpm for
40 sec with the ramp of 1000rpm/sec to obtain a thickness of 1.40µm[79].
Moving on from the coating step, the next part of the backside patterning is the
exposure and development of the wafer. The coated wafer was baked at 110̊C for 1 min,
followed by exposure to 17mJ/cm2 UV intensity of OAI mask aligner for 6 sec. The PR
was used as a positive PR; the regions on the wafers that had not been exposed to UV light
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became insoluble in the developer. The exposed region was removed for further deposition
of the metal films.
Figure 3.7: Fabrication steps for microelectrodes
The exposed wafer was developed in AZ 400k developer with a 1:4 ratio of developer
and deionized water. The developed wafers were treated using reactive ion etching (RIE)
to descum the unwanted material deposited on the wafers during the process.
RIE was first conditioned using O2 gas at 100 watts, 400mTorr for 100 sec. The
physical evaporation of chromium (Cr) of the thickness of 20nm and gold (Au) of the
thickness of 100nm was done using an E-beam evaporator.
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Figure 3.8: Picture of evaporator a) and b) planetary fixture
E-beam evaporator is a physical vapor evaporation technique, used for the thin film
deposition. E-beam is focused on the crucible of the material, which has to be deposited on
the wafer by keeping the substrate planetary fixture rotating to obtain the uniform
deposition on the wafer. The deposition was done on the entire surface of the wafers, as
shown in the process flow in figure 3.7. The Cr/Au deposited wafers were kept in acetone
overnight for lift-off to remove the PR from the masked regions.
These deposited films on silicon were used as three electrodes and contact pads for
connection purposes. Figure 3.8 shows the picture of the E-beam evaporator with the dome
on which the substrates were attached. The average thickness of the metal deposition was
measured using the Dektak profilometer as 115.6nm. The microwells on the circular area,
which covers the CE, RE, and WE, as shown in figure 3.5, were created using PR on the
fabricated electrodes.
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Also, the electrodes prepared with these methods were used to detect cortisol using
ligand-antibody-based electrochemical immunosensing.
3.7 Electrochemical Immunosensing of cortisol
The electrochemical immunosensor composed of AgNPs and AuNPs on the activated
SPCE and gold microelectrodes surface as a current collector, along with biotin-conjugated
cortisol antibody covalently cross-linked on the surface of the nanoparticles using DTSP.
The sulfur binding of DTSP is attached to the surface of AgNPs and AuNPs. Further, the
amine group of the antibodies binds to the DTSP ligand, as shown in figure 3.9. This self-
assembled monolayer (SAM) of antibody on the nano-substrate provides irreversible
binding sites for the cortisol present in any given sample. This irreversible binding of the
protein structures limits ion transport to the sensor surface (Figure 3.9).
Figure 3.9: Schematic of Antibody/DTSP SAM/NPs binding and stepwise fabrication of
cortisol immunosensor
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In this sensing approach, the electroactive species (ions) on the sensor surface is
proportional to the cortisol concentration. By quantifying the electroactive species
concentration interacting on the sensor surface, the amount of cortisol concentration can
be determined.
The electroactive probe used was Fe2+/3+ ion, and its change in concentrations on the
electrode surface was monitored through its oxidation reaction given in equation 3.11.
Fe2+ + e- Fe3+ (3.11)
For electrochemical measurements, a voltammogram was used for monitoring
oxidation peak current (Ipa) of Fe2+ oxidation E0 in the potential window 0 to 0.5 V.
In this approach, the electron transfer is generated in the electrolyte, [Fe (CN)6]3−/4−
is blocked during the surface modification. Further, the binding of cortisol molecules with
Antibodies prevents the electron transfer from the electrolyte to the electrode surface. This
blocking leads to a reduction in the redox current. This current is proportional to the
molecules getting attached to the antibodies. Hence, the resultant current is correlated to
the concentration of the cortisol present.
3.8 Cyclic Voltammetry
Cyclic voltammetry is an electrochemical tool in biosensing, which is used to analyze
oxidized and reduced species[80]. The binding of antigen and antibodies is estimated as a
function of the redox current in the electrolyte. In CV, a varying potential range is applied
to the three-electrode system, and the corresponding current is recorded.
The oxidation peak and the reduction peak response can be explained using the
Nernst equation. This equation shows the proportionality of the potential of an
electrochemical cell (E) to the standard potential of a species (E0). The relative activities
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of the oxidized (Ox) and reduced (Red) analyte in the system at equilibrium is given as
equation 3.12.
𝐸 = 𝐸0 + 𝑅𝑇
𝑛𝐹ln
(𝑂𝑥)
(𝑅𝑒𝑑) (3.12)
Where, R - universal gas constant
F - Faraday’s constant
n - the number of electrons
T - temperature
A one-electron reduction system in [Fe (CN)6]3−/4−, the Nernst equation can be
rewritten as equation 3.12 to replace the activities with their concentrations. The standard
potential can be substituted with formal potential E0’ and n is equal to 1.
𝐸 = 𝐸0′ + 2.3026 𝑅𝑇
𝐹 𝑙𝑜𝑔10
[𝐹𝑒3+]
[𝐹𝑒2+] (3.13)
This equation can be modified to predict the change in the system proportional to the
concentration of the chemical species and the electrode potential. In the three-electrode
system, the voltage is applied between RE and WE to measure the current from CE to RE.
The system maintains its equilibrium by providing the current from counter to reference to
regulate the voltage drop across working and reference electrodes. This phenomenon can
be utilized for biosensing where the surface of the electrode is functionalized with detecting
molecules, such as an enzyme, antibodies, DNA, aptamers, and many more.
3.9 Electrochemical Impedance Spectroscopy
This method of characterization of chemical processes in terms of electrical
measurements. This tool exploits Faraday’s law,
𝑄 = 𝑛 𝑧 𝐹 (3.14)
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Where, Q - charge passing through a cell
n - the amount of substance
F - the Faraday’s constant
z - the number of electrons needed per conversion
The connection can be established with [Fe (CN)6]3−/4− in this work to measure the
electrochemical impedance of the three-electrode system using fabricated electrodes.
It measures the impedance of the electrochemical cell to an applied potential, which
depends on the frequency. The complex response of the system usually interpreted from
the Nyquist plot. The equivalent circuit (Randle’s circuit) for the biosensor is shown in
figure 3.10 with the equivalent Nyquist plot.
Figure 3.10: Equivalent circuit and Nyquist plot of the biosensor
The semicircle in the Nyquist plot represents the parallel combination of electron
transfer resistance (Rct) and double-layer capacitance (Cdl) in Randle’s equivalent
circuit[81]. The linear portion is due to Warburg impedance (Zw), indicates the ion
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exchange/diffusion in the electrolyte of the cell. It is used to characterize the surface
architecture in the functionalization process of the electrodes.
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4 EFFECTS OF COLD ATMOSPHERIC PLASMA TREATMENT ON
MORPHOLOGICAL, AND OPTICAL PROPERTIES OF PLASMONIC
NANOPARTICLES
The use of plasma processes in nanomaterial synthesis is limited by a lack of
understanding of the effects of plasma treatment on their morphology and other properties.
Here, the impact of atmospheric plasma treatment on the morphology and optical properties
of Ag and Au NPs have been studied. In this work, the analysis of AgNP and AuNP
morphology and their correlating optical properties have been explored.
The aerosol injection technique that has been discussed in chapter 3 was used to
deposit well-dispersed AgNP films, and these films were treated by CAP. The size
reduction observed due to the surface plasma treatment of AgNPs was caused by the
symmetric partial oxidation. These deposited films were used as SERS substrate to detect
R6G peaks.
The intensity of the SERS signal of R6G from plasma-treated AgNP substrate was
~120 times as high as that of the untreated substrate, and that of AuNPs was ~95 times as
high. This enhancement is attributed to the surface roughness, presence of nanogaps, and
size reduction after the treatment of NPs on the substrates. The morphological changes are
explained by a redox reaction induced by the energy and concentration of reactive species
in the CAP environment. This surface reaction accounts for the difference in the effective
electric charge on NPs surface that was quantified using zeta potential measurements.
4.1 Surface Plasmon Resonance (SPR)
The SPR absorption peaks of the untreated and thermally or plasma-treated Ag NPs
films deposited on quartz substrates are shown in Figure 4.1a, 4.1b, and 4.1c. The SPR
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peak of the untreated substrates was observed at 426 nm, which was blueshifted to 415,
393, and 361 nm, after plasma treatment for 5, 10, and 15 minutes, respectively.
Figure 4.1: SPR of untreated, 5 mins, 10 mins, and 15 mins a) plasma-treated; b)
thermally treated at 250̊ C and c) thermally treated at 400 ̊C and d) Blueshift of a), b) and
c) shows the blueshift in SPR spectra after the thermal and plasma treatment[82].
Thermal annealing resulted in a blueshift of 7, 17, and 25 nm at 250°C, and 9, 28,
and 45 nm at 400°C at 5, 10, and 15 minutes, respectively. After 15 minutes, no significant
peak shift was observed for thermal annealing. Moreover, the strength of the SPR
absorbance was reduced for the treated samples. An almost linear plot of the blueshift after
plasma or thermal treatment is shown in Figure 4.1d, where the plasma treatment resulted
in a similar resonance response to thermal annealing. From Figure 4.1d, we note that there
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was a more significant shift in the SPR peak for plasma treatment than for thermal
annealing for the same duration of the process.
The blue shift and the reduced intensity of the SPR peak in figure 4.2 suggest that
plasma treatment reduced the size of the NPs and increased the distance between adjacent
particles[83], [84]. Because of the size reduction, the surface-to-volume ratio increased.
This increase led to the rise in the number of scattering electrons at the NP surface, which
is responsible for the reduced lifetime of the oscillations and increased spectral width[85].
Similar experiments were performed on Au NPs deposited quartz substrates. The
results are as shown in figure 4.2. The absorbance was decreased as the Au NPs were
treated with the plasma. The blueshift of 5nm, 40nm, and 55 nm was observed after 5 mins,
10 mins, and 15 mins of the plasma treatment, respectively.
Figure 4.2: a) SPR results of plasma-treated Au NPs and b) Blueshift in SPR after the
plasma treatment
Our results differ from those of studies that use sintering processes of drop-casted
NPs[48], [86], because of the deposition technique. After aerosol deposition, the lack of
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liquid media prohibits NP migration and agglomeration. Besides, the process is
independent of the substrate and takes place at a low temperature. Hence, it allows NPs to
be processed individually, which contributes to the size reduction and blue shift in the SPR
signal. To confirm this statement[21], we repeated the experiments using drop-casting as
the deposition method; this led to coalescence and a redshift in the SPR signal. The results
for the plasma-treated drop-casted NPs are as shown in figure 4.3.
Figure 4.3: SPR and redshift of plasma-treated drop-casted a), c) AgNPs and b), d) Au
NPs
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The redshift in plasma-treated drop-casted AgNPs and AuNPs supports the
coalescence phenomena. The SPR of AgNPs was shifted from 8nm for 5 mins, 68nm for
10 mins, and 79 nm for 15 mins of the treatment. The redshift in plasma-treated drop-casted
AuNPs was 8nm for 5 mins, 28nm for 10mins, and 60nm for 15mins of the treatment.
Hence, as the plasma-assisted deposition method maintains the interparticle distance, it
differs from other techniques.
4.2 SEM Imaging
The AgNPs were deposited on silicon substrates using the same deposition
conditions applied for the SPR study. The substrates were then thermally annealed at
400 ℃ or plasma-treated for 15 minutes. Figure 4.4a, 4.4b, and 4.4c show the SEM images
of the untreated, thermally annealed, and plasma-treated samples, respectively. The size of
the NPs was reduced, and the NPs were well dispersed after both treatments. The SEM
images were processed in ImageJ to identify the NP boundaries (Figures 4.4d, 4.4e, and
4.4f) and to determine their Feret’s diameter (Figures 4.4g, 4.4h, and 4.4i).
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Figure 4.4: SEM images of AgNP films deposited on silicon substrates a) before
treatment, b) after 15 mins thermal annealing, and c) after 15 mins plasma treatment. The
SEM images processed in ImageJ to identify nanoparticle boundaries [d), e) and f)]; and
Feret’s diameter distributions [g), h) and i)] corresponding to untreated, thermally treated
and plasma-treated AgNPs. The left shift in the AgNPs size distribution was attributed to
the size reduction after the treatments. The plasma-treated AgNPs exhibited a more
uniform film than other samples[82].
Untreated NPs have an average Feret’s diameter of ~15 nm with the largest particle
size of 44 nm because of NP agglomeration during deposition. After thermal annealing,
the mean Feret’s diameter was reduced to 6 nm, with the diameter of most particles falling
in the range of 5–7 nm. Similarly, for the plasma-treated sample, the particle distribution
was further narrowed with a mean diameter of 5 nm. The SEM images were captured for
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AuNPs deposited untreated and 15 mins of plasma-treated samples that can be seen in
figure 4.5. The comparatively uniform NPs films were observed, similar to AgNPs films.
Figure 4.5: SEM images of AuNP films deposited on silicon substrates (a) before
treatment, (b) after 15 mins of plasma treatment. The SEM images processed in ImageJ to
identify nanoparticle boundaries [(c) and (d)]; and Feret’s diameter distributions of (e)
untreated and (f) plasma-treated AuNPs film.
The Feret’s diameter distribution after plasma treatment was narrowed down to the
average diameter of ~7nm. The distribution of plasma-treated AuNPs was broader than that
of AgNPs film, as shown in figure 4.5i and 4.5f. The further mechanism of plasma-induced
size reduction of Au and Ag NPs has been studied in the next sections.
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4.3 Surface charge measurements
Figure 4.6: Zeta potential distribution of (a) untreated and (b) plasma-treated (15
minutes) Ag NPs. The surface charge changes from +25.1 to −25.9 mV after
treatment[82].
The zeta potential changed from +25.1 ± 4 mV of the untreated sample to −25.9 ± 6
mV after 15 minutes of plasma treatment, as shown in Figure 4.6. The magnitude of the
zeta potential defines NP stability due to interparticle electrostatic repulsion. The high
magnitude of the untreated Ag NPs is due to the BPEI coating, which imparts a positive
charge. Similarly, the high magnitude after the treatment (with reversed polarity) ensures
the NPs remain stably dispersed. The observed change in the zeta potential and the possible
mechanism behind it has been discussed in section 4.5.
Zeta potential measurements were repeated for AuNPs before and after plasma
treatment, as shown in figure 4.7. The AuNPs have citrate capping on them as a
stabilization agent, and that gives NPs a negative zeta potential[87].
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Figure 4.7: Zeta potential measurements for a) untreated and b) plasma-treated AuNPs.
The surface charge changed from -20.9 mV to -43.9mV.
Zeta potential of untreated AuNPs was recorded as -20.9mV and that of plasma-
treated AuNPs as -43.9mV.
4.4 TEM and AFM imaging
Figure 4.8a and 4.8b show the TEM images of untreated and plasma-treated Ag NP
samples prepared on copper grids. The untreated NPs were agglomerated, but the plasma-
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treated NPs were well organized and dispersed. The NP size was reduced after the plasma
treatment and a surface oxide formed (Figure 4.8b). The diffraction pattern that is shown
in Figure 4.8(insets) reveals that the untreated NP film was polycrystalline with various
diffraction rings.
The diffraction pattern of the NP film tended towards single crystallinity because of
the un-piling of NPs as a result of plasma treatment. The surface roughness was quantified
for untreated and plasma-treated (15 minutes) Ag NPs, as shown in the inset of Figure 4.8c.
The plots of the roughness of untreated and treated samples show the increase in the
amplitude and the number of peaks after treatment for the same projected area. The
topology of the selected area (indicated by the white arrow) for the untreated sample is
shown in the inset of Figure 4.8d.
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Figure 4.8: TEM images and diffraction patterns (insets) of (a), (c) untreated and (b), (d)
plasma-treated Ag NPs. AFM images of (e) untreated and (f) plasma-treated Ag NP film;
the roughness and texture are shown in the insets[82].
The untreated sample shows a smooth topology, and the treated sample shows a
rough surface. The mean roughness changed from 1.12 to 1.4 nm, and the route mean
square roughness changed from 2.2 to 3.2 nm.
4.5 Mechanism of plasma-induced reduction in AgNP size
Our proposed mechanism of Ag NP surface modification due to the plasma treatment
is presented in Figure 4.10. The BPEI coating on the NPs provides electrosteric repulsion
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between particles and prevents agglomeration[88]. Because the BPEI electrosteric
stabilization involves electrostatic and steric bonding between the particle and polymer,
NPs acquires a positive surface charge[89] (as confirmed by zeta potential measurement in
Section 4.3). Figure 4.9 shows the structure of BPEI and positively charged AgNPs
formation using BPEI coating.
Figure 4.9: Representation of positively charged AgNPs using BPEI
Negatively charged ions are adsorbed on the surface of positively charged NPs in the
Stern potential region to form an electric double layer (EDL)[90]. It is believed that as the
thermal annealing process starts, the EDL that is built around the surface of the NPs breaks
and leaves a net positive surface charge. Because the BPEI coating has a flashpoint at 110
℃, the NP–polymer electrosteric bonds are broken by further annealing at 250 and
400 ℃[90].
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Figure 4.10: a) Proposed mechanism by which plasma treatment modifies Ag NP films.
The bottom panel b) is the SERS spectra of the untreated and plasma-treated NPs at 532-
nm excitation, which validates the hypothesis that removal of the BPEI coating and
subsequent surface oxide formation results in the observed size reduction[82].
In the case of plasma treatment, the energetic electrons (average energy ~1 eV)
provide enough energy to break the weak bonds between the BPEI polymer and the surface
of the NPs[91]. The Raman spectrum in Figure 4.10b shows intense peaks at 123.8 and
142.2 cm−1 attributed to the vibrational mode of the Ag lattice[92]. These peaks are
enhanced after plasma treatment, which validates our hypothesis that the coating is
removed from the NP surface during treatment.
The Raman spectrum shows an intense band of amine bending at 1600 cm−1, which
can be observed after 5 minutes of plasma treatment owing to the breaking of the amine
group of the BPEI coating from the NP surface[93]. The shift of this band to 1555 cm−1
attributed to the protonation of an amino group of PEI. Also, the bands at 1442 cm−1 and
1062 cm−1 are of the amine group of PEI. The Raman peaks at 791 cm−1 and 885 cm−1 are
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due to vibrations of the ethylene groups present[93]. The band at 942 cm−1 was enhanced
after plasma treatment until 15 minutes, which indicates the breaking of BPEI bonding and
removal of the coating from the NP surface. After 15 minutes, the intensity of this band
decreased owing to the formation of the surface oxide layer.
The SERS of BPEI is very weak at 532 nm excitation; hence, this excitation
wavelength was used to detect R6G peaks (as shown in Section 3.5) to study the structural
changes of the surface of the Ag NPs. Further, a new EDL is formed owing to the ions and
electrons present in the downstream plasma. For the CAP set-up used in this work, the
Debye length is ~ 75 µm[94]. Therefore, the potential developed between the surface and
the plasma is confined in the plasma sheath. It is much larger than the EDL formed on the
NP surface, as shown in figure 4.11. In the case of plasma treatment, the energetic (In cold
plasma, Te>Ti, which is the energy of electrons is higher than the ions present in the plasma)
electrons (average energy ~1 eV) provide enough energy to break the weak bonds between
the BPEI polymer and the surface of the NPs.
The electrons present in the plasma environment recombined with the surface charge
in the EDL, and then EDL broke. The surface redox reaction within the plasma shield is
shown in figure 4.11.
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Figure 4.11: Schematic representation of AgNPs surface reaction within the plasma
sheath.
In the case of plasma treatment, the energetic (In cold plasma, Te>Ti, which is the
energy of electrons is higher than the ions present in the plasma) electrons (average energy
~1 eV) provide enough energy to break the weak bonds between the BPEI polymer and
the surface of the NPs.
The energy provided by plasma treatment was sufficient to keep the surfaces of the
NPs separated by distances equal to the repulsive barrier. The plasma-treated NPs formed
an organized NP film on the substrate as they settled during deposition, under attractive
Van der Waals forces. Although some positive surface charges on Ag NPs are nullified by
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electrons, Ag+ also combines with the reactive oxygen species present in the plasma to
form AgO and Ag2O on the surface. Some Ag+ ions are also reduced by the plasma
electrons.
The Raman spectra in Figure 4.10 show a sharp peak at 240 cm−1, which is attributed
to the stretching of Ag–O bonds as the reactive oxygen species present in the plasma
environment (as shown in chapter 3) react with the surface of the Ag NPs[95]. The peaks
at 217 cm−1, 300 cm−1, and 490 cm−1 are due to O2 anions in the AgO and AgO2 lattice.
This phenomenon is evidenced by the formation of an oxide layer on the NP surface[92],
[96].
The low intensities of all these peaks show the partial oxide formation until 15
minutes of the treatment. After 15 minutes, higher intensities were observed, which are
attributed to asymmetric oxide layer formation on almost the entire NP surface. The ratio
of intensities of the Ag lattice vibrations at 123.8 cm−1 and 142.2 cm−1 to AgO at 240 cm−1
increased after 20 minutes of plasma treatment, indicating a higher coverage of the oxide
layer. Hence, changes in morphology and optical properties were observed until 15 minutes
of treatment.
The lower intensity of the SPR absorbance peak after plasma treatment, as shown in
Figure 4.1, can also be explained as a consequence of the decrease in the net positive charge
on the Ag NP surface after treatment[97]. The reduction in the NP size is also due to the
surface oxide layer. The negative charge density developed on the NPs is desorbed when
plasma species provide the appropriate activation energy leading to the sublimation of the
surface oxide[98].
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The minimum energy required to decompose the Ag2O layer is 1.25 eV, and the
reduction potential of Ag+ is 0.8 V[99]. The average electron energy in the downstream
plasma is 1 eV (see chapter 3), which is sufficient to remove the BPEI coating, form a
surface oxide, change the surface charge, and ultimately reduce the particle size. However,
the plasma energy is slightly lower than that required for decomposition of the Ag2O oxide
layer formed after 20 minutes of treatment, as shown in the Raman spectra in Figure 4.10.
4.6 SERS characterization of the plasma-treated and thermally treated AgNP film
Figures 4.12a and 4.12b show the SERS signals for R6G on the untreated sample and
after plasma treatment for 3, 5, 10, 15, 20, and 25 minutes. Prominent R6G peaks were
detected at 612 cm-1, 772 cm-1, 930 cm-1, 1084 cm-1, 1127 cm-1, 1187 cm-1, 1310 cm-1, 1364
cm-1, 1419 cm-1, 1507 cm-1, 1575 cm-1, and 1648 cm−1 for the untreated and plasma-treated
samples. The spectra also show additional peaks at 658 cm-1, 1084 cm-1, 1127 cm-1, 1275
cm-1, and 1595 cm−1 for the plasma-treated samples.
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Figure 4.12: SERS response of R6G on as-deposited and plasma-treated Ag NP films
on a silicon substrate. The R6G response is enhanced until 15 minutes of plasma
treatment. It is saturated because of the complete surface coverage with the oxide layer
after 15 mins of the treatment. The inset in (b) shows the enhancement factor of R6G as a
function of treatment time[82].
The spectra for samples treated from 3 to 15 minutes showed the sharpest lower-
intensity peaks. These peaks were suppressed in the untreated sample. Moreover, the
SERS signal at 1364 cm−1 after 15 minutes of treatment was ~120 times as high as that of
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the untreated film. The SERS enhancement shows the promising improvement of SERS
performance of plasma-treated Ag NP films.
The uneven redox reaction occurring on the NP surface, leading to the increased
surface roughness and hotspots created at nanogaps[100], also contributed to the SERS
enhancement. The untreated NPs agglomerated, resulting in lower SERS enhancement than
for the plasma-treated samples[100]. The inset of Figure 4.12b shows the change in
intensities of the SERS peaks for the untreated and treated samples.
The EF was calculated for the R6G peak at 612 cm−1 as 7.8 × 1014, and for 1364 cm−1
was calculated as 3.4 × 1014 for 15 minutes of plasma treatment. The EF was reduced after
20 minutes of treatment because of asymmetric or entire surface oxidation, as described in
Section 4.5. The enhancement in the Raman peaks of the R6G signal until 15 minutes of
plasma treatment with a subsequent decay validate the mechanism discussed in Section
4.5.
The thermally treated AgNPs at 400ͦC are compared with the plasma-treated. The
slight SERS enhancement (of ~ 5 folds) was observed after the treatment, but the intensity
of SERS peaks of R6G was not enhanced after further treatment, as shown in figure 4.13.
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The enhanced intensities R6G peaks after the treatment were observed to be almost
stable until 15 mins of thermal treatment, and after 20 mins, they have decreased. The
distinct peaks of R6G were observed even after 25 mins of the treatment. However, in
plasma treatment, the intensities were enhanced up to ~120 folds, and after 20 mins of
treatment, no distinct peaks were observed.
4.7 Stability of Plasma treated AgNPs film
The stability studies were performed for 15 mins of plasma-treated Ag NPs film and
the system found stable for around 96 hours (4 days), as shown in figure 4.14. A total of 5
silicon samples with plasma-treated NPs deposition were fabricated, and SERS signals for
R6G were recorded at the time, and the response was averaged out. The signal decayed
gradually after 96 hours after the treatment.
Figure 4.13: SERS response of R6G molecules on thermally treated AgNPs at 400֯C
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Figure 4.14: SERS response for R6G on 15 mins plasma-treated AgNPs recorded at a
different time interval at room temperature. The samples were stored at room temperature
(25̊C)
The results found that the plasma-treated AgNPs films were stable for 4 days and
hence have the potential to serve as efficient SERS substrates.
4.8 Mechanism of Plasma Induced reduction in AuNPs size
SERS responses of citrate capped AuNPs before and after plasma treatment were
recorded, as shown in figure 4.15. SERS signal for untreated AuNPs is shown in figure
4.15a.
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Figure 4.15: SERS of a) untreated b) 5 mins plasma-treated c) 10 mins plasma treated
and d) 15 mins plasma-treated AuNPs
Broad Raman peaks of citrate capping were identified at 770cm-1 and 850cm-1 in
untreated AuNPs[101]. The intensity of these Raman peaks was decreased after the plasma
treatment. The prominent Raman peaks at 718.3 cm-1, 899 cm-1, 1164 cm-1, 1220 cm-1,
1565 cm-1, and 1674 cm-1 are associated with AuNPs and increased intensity of which
attributes to the removal of citrate from the surface[102], [103].
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Based on the literature, the energy required to break the bonding between citrate
capping and AuNPs surface is 9kCal/mole, which is 0.387eV[104]. Hence, plasma
treatment could easily break this bond. Further plasma treatment induced redox reaction
on the surface of AuNPs, which can be seen in figure 4.15c and 4.15d, where Au-Ox peaks
at 491 cm-1 and 635 cm-1 to 677 cm-1 are present[105]. Raman peak at 590 cm-1 in figure
4.15d is attributed to the surface oxide species[106].
The reduction in the size of AuNPs due to the plasma treatment occurred as a result
of the removal of citrate capping and partial surface oxide formation. The energy required
for the Au oxidation reaction to happen is 1.42V[106], which is more than that needed for
AgO formation. However, the energy that is provided in plasma treatment is around 1eV,
which explains the broader size distribution and a comparatively smaller change in size
than AgNPs and partial surface oxide formation.
4.9 SERS characterization of the plasma-treated and thermally treated AuNP film
SERS responses of R6G were recorded on untreated and plasma-treated AuNPs films
to study the plasma-induced enhancement of optical properties of AuNPs, as shown in
figure 4.16. Prominent R6G peaks were detected at 612 cm−1, 658 cm−1, 772 cm−1, 930
cm−1, 1084 cm−1, 1127 cm−1, 1187 cm−1, 1275 cm−1, 1310 cm−1, 1364 cm−1, 1419 cm−1,
1507 cm−1, 1575 cm−1, 1595 cm−1, and 1648 cm−1 for the untreated and plasma-treated
samples.
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Figure 4.16: SERS of R6G on untreated (Black solid and inset) and 15 mins of plasma-
treated (Blue solid)
The intensity of peak at 1364 cm−1 was 1367 a.u., and it has been enhanced to
1.278x105 a.u., which is ~95 folds enhancement. The optical properties of AuNPs have
been improved after the plasma treatment due to the nanogaps present in AuNPs films,
removal of citrate capping, and size reduction.
4.10 Summary of chapter 4
In this work, the effects of low-temperature atmospheric plasma treatment of AgNP
and AuNP films were studied. The SEM and TEM imaging showed the reduction of the
nanoparticle size and well-dispersed film formation without any agglomeration after the
plasma treatment. The similar effects as of thermal annealing were achieved by the plasma
treatment at room temperature without processing the substrate at elevated temperature.
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The novel redox reaction, which results in the morphological changes in the AgNPs,
and AuNPs were found to be induced by the plasma treatment. The reactive oxygen species
in the plasma oxidized the outer surface layer of AgNPs and AuNPs. Plasma treated NPs
were well dispersed and had an uneven surface roughness, which provided unique features
for their use as ideal SERS substrates. The results obtained for the plasma treatment at
room temperature are comparable to the thermal treatment at higher temperatures. This
unique property can be used for processing metal nanoparticles at room temperatures for
designing sensitive SERS substrates on flexible materials such as polymers, papers, and
textiles. The surface charge tuning of AgNPs and AuNPs using the adapted plasma
treatment can be used in the electrochemical sensing as it increases the activity and affinity
towards the specific charged molecules.
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5 PLASMA INDUCED ENHANCEMENT IN ELECTROCHEMICAL PROPERTIES
OF PLASMONIC NANOPARTICLES
This chapter presents the study of plasma-induced enhancement of electrical
properties of Ag and Au NPs at room temperature. In this work, the enhancement in the
electrochemical performance of AgNPs and AuNPs due to plasma-assisted electrode
surface modification is demonstrated. The distribution of plasma-assisted aerosolized
deposited NPs in the previous section showed the promising architecture for surface
modification of the electrochemical sensor. The uniform film formation after the
aerosolized plasma-assisted deposition has improved the electrochemical sensing, which is
validated by detecting the cortisol molecules. Cortisol is a vital stress hormone, and its
level in many physiological functions such as fat mobilization for metabolism, immune
suppression, cardiovascular disease, autoimmune disorders, infectious diseases, and mental
illness makes it an essential biomarker in health-monitoring[107]. The enhancement in
electrochemical properties induced by plasma treatment was studied by analyzing CV, and
electrochemical impedance spectroscopy (EIS) of untreated and plasma-treated NPs
surface-modified electrodes.
5.1 Fabrication of AgNPs and AuNPs modified electrodes
The Zensor SPCEs from eDAQ were used to deposit AgNPs and AuNPs films using
drop-casting (untreated) and the experimental set-up described in chapter 3. SPCEs were
polished with 0.3 microns of alumina powder, applying circular motions on the polish
paper to smoothen the surface before NPs depositions. This deposition was confined to the
working electrode surface of SPCE. The Ag and AuNPs were deposited on SPCE with
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drop-casting, and plasma-assisted aerosolized NPs method for 5 mins by placing the
electrode below the plasma assembly, as shown in figure 5.1.
The SEM images of untreated SPCE with drop-casted NPs and aerosolized plasma-
assisted deposited NPs are shown in figure 5.1. A comparatively uniform NP distribution
is seen as drop-casted NPs.
Figure 5.1: Schematic illustration of plasma-assisted aerosolized NPs modified sensor
fabrication process and SEM images of morphological changes during the sensor
fabrication.
CV of these NPs modified electrodes were recorded for 10 μl Phosphate Buffer
Saline (PBS) (pH 7.4) containing 5 mM [Fe (CN)6]3-/4− to compare the electrochemical
properties.
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5.2 Surface functionalization of AgNPs and AuNPs based sensors for cortisol
measurement
DTSP, Sodium Borohydride, a monoclonal antibody (Anti-Cab), and cortisol were
purchased from Sigma-Aldrich. For further fabrication of DTSP SAM, antibody, and
cortisol detection, the established protocol from Khalid et al. [108] was used. PBS of pH
7.4 was prepared for this work, as it is suitable to presume higher biological activities
during electrochemical immunosensing[59]. Figure 5.2 shows the stepwise fabrication of
the cortisol sensor.
Figure 5.2: Schematic of stepwise fabrication of cortisol sensor
The binding of DTSP towards plasma-treated AuNPs and AgNPs was possible due
to the direct Sulphur bond with Ag and Au surface. The surface of Au NPs has citrate
capping, DTSP replaces citrate capping, and then antibodies bind with DTSP. DTSP was
reduced using Sodium Borohydride, the solution of which was prepared in DI water. The
NPs modified electrodes were then modified with DTSP-SAM fabrication by immersing
electrodes in the 2mg/mL solution of DTSP in acetone for 2 hours. Electrodes were cleaned
with acetone and DI water to remove the unbounded DTSP from the surface of the
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electrodes. Anti-Cab were then immobilized to form a bonding of its amino group with a
succinimidyl group of DTSP. The Ant-Cab/SAM/NPs modified electrodes were incubated
at room temperature for 2hours, followed by rinsing with PBS. Ethanolamine (EA) was
used as a blocking agent to block the nonbinding sites by incubating electrodes for 10 mins.
EA/Anti-Cab/SAM/NPs electrodes were then washed with PBS.
5.3 Electrochemical Measurements
The electrochemical measurements were conducted using a CHI 1230 analyzer using
surface-modified Zensor SPCEs to compare the electrochemical response of untreated and
plasma-treated Ag and AuNPs. 5mM Ferro/Ferricyanide K3[Fe (CN)6])/ K4[Fe (CN)6] (1:1,
5 mM) was prepared in a Phosphate buffer solution (pH-7.4) (PBS). The cyclic
voltammograms (CV) were obtained from a 5µl of K3[Fe (CN)6])/ K4[Fe (CN)6] at
50mV/sec scan rate. The standard cortisol solutions of 0.012 µg/dl, 0.037 µg/dl,
0.111µg/dl, 0.333 µg/dl and 1 µg/dl were prepared with Hydrocortisone-H0888 (cortisol)
that was purchased from Sigma Aldrich. The cyclic voltammograms were recorded after
adding 5ul of the different concentrations between -1 V to +1 V potential swing to detect
the corresponding oxidation and reduction current values using CHI 1230. The
Electrochemical Impedance Spectroscopy (EIS) was carried out for untreated and plasma-
treated AgNPs, AuNPs, and SAM/Antibody modified electrodes using Metrohm Autolab
analyzer in 5mM [Fe (CN)6]3−/4− containing 0.1M KCl solutions.
5.4 Electrochemical Performance of AgNPs modified electrode
The electrochemical performance of untreated and plasma-treated AgNPs modified
electrodes in 5mM K3[Fe (CN)6])/ K4[Fe (CN)6] (1:1) is shown in CV curves in figure 5.3.
As the redox reaction of [Fe (CN)6]3−/4− are quasi reversible, it was used to characterize the
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electrochemical properties of modified SPCEs[109]. The oxidation and reduction current
peak values of untreated AgNPs were lower as compared to that of plasma-treated AgNPs
functionalized SPCEs.
Figure 5.3: Electrochemical response of 5mM [Fe (CN)6]3−/4− using a) CV and b) EIS of
untreated and plasma-treated AgNPs modified electrodes.
The peak oxidation current, Ipa for plasma-treated AgNPs modified electrode, is
increased by 16.78%. This increase in peak current corresponds to the increase in the
electroactive surface area after the plasma treatment.
The formal potential of the Fe2+/3+ redox reaction was observed at E0’ 0.369 V. The
oxidation peak potential was observed for untreated AgNPs modified electrode at Epa
0.202 V and for plasma-treated AgNPs modified electrode at 0.052 V. The redox peaks for
untreated AgNPs modified electrodes were obtained at 0.202V and 0.016V. They were
shifted for plasma-treated AgNPs modified SPCEs to 0.047V and -0.094V, respectively.
This reduction in the difference of oxidization and reduction peaks showed that the rate of
electron transfer is increased.
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The increase in the oxidation peak signifies the increase in the active sites on the
plane of the working electrode. The uniform NP film on the electrode surface enables an
increased conductivity of the electrode. The untreated AgNPs modified SPCE showed a
prominent oxidation peak for Ag (Ag0 to Ag+) at 0.047V[110]. However, the shift and
suppressed Ag peak at -0.093V for plasma-treated AgNPs showed a smaller amount of
energy required to oxidize AgNPs as they were partially oxidized. The result indicates that
the current peak was enhanced because of plasma treatment. This electrochemical activity
enhancement of AgNPs is a result of the improved effective AgNPs sites formed on the
surface area of electrodes[111], [112].
Nyquist plots were used to analyze the EIS data, as shown in figure 5.3b with the
Randles equivalent circuit inset. The analyzed results provide the information on the
impedance changes of the electrode surface as the modification was carried out. The
semicircle observed in the plot is due to the parallel combination of electron transfer
resistance (Rct) and double-layer capacitance (Cdl), suggesting that the bare (black) and
AgNPs modified SPCEs (red) have a low conductive nature, which opposes the interfacial
charge transfer[81]. The linear portion, due to Warburg impedance (Zw), indicates the ion
exchange/diffusion in the electrolyte. The decrease in the diameter of the semicircle in
AgNPs and plasma-treated AgNPs indicates the higher conductivity and accelerated
electron transfer between the electrode surface and [Fe (CN)6]3−/4− than the bare electrode.
The increase in the electrochemical response was observed after the deposition of AgNPs
and plasma-treated AgNPs on SPCE. Rct of bare SPCE is ~ 0.25MΩ, of AgNPs, modified
SPCE is 4kΩ, and that of plasma-treated AgNPs modified SPCE is 1.2kΩ. The plasma-
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treated AgNPs modified electrode has the lowest and hence exhibit the highest conductivity
as compared to other electrodes.
5.5 Electrochemical Performance of AuNPs modified electrode
Figure 5.4 shows the electrochemical response of bare (black), AuNPs modified
SPCE (red), and plasma-treated AuNPs modified SPCE (blue).
Figure 5.4: Electrochemical response of 5mM [Fe (CN)6]3−/4− using a) CV and b) EIS of
untreated and plasma-treated AuNPs modified electrodes.
The peak oxidation current of 5mM of [Fe (CN)6]3−/4− for bare SPCE was observed
as 45µA, for untreated AuNPs modified SPCE as 49.5 µA, and that of for the plasma-
treated AuNPs modified SPCE as 64µA. This 29.3% of the increase in current attributed
to the enhancement in electrochemical properties of electrodes prepared by the plasma-
assisted NP deposition method. Moreover, it shows that improvement in the electroactive
surface area occurred due to plasma.
The separation potential of oxidation and reduction peaks was observed to be
decreased after the modification of SPCE. The separation potential for untreated AuNPs
modified SPCE is 0.577V, and it has been reduced to 0.173V for plasma-treated AuNPs
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modified SPCE. Similar to AgNPs, the CV showed an increase in the rate of reaction for
plasma-treated AuNPs.
Based on the EIS response of the same electrodes, as shown in figure 5.4, the radius
of the semicircle was reduced after the modification of SPCE. The value of Rct in the
equivalent Randle’s circuit was reduced from 0.23MΩ for bare SPCE to 8kΩ for untreated
AuNPs modified SPCE, and it was reduced to 280 Ω for plasma-assisted AuNPs modified
SPCE. The plasma-treated AuNPs modified SPCE has the lowest Rct, which is signified
for the highest conductivity.
The double-layer capacitor (Cdl) for the bare Au electrode was calculated as 16.7nF,
for AuNPs modified electrode, its 9.2μF, and for plasma-treated AuNPs modified
electrode, its 25 μF. The increase in the value of Cdl indicates the increase in charge transfer.
Due to the induced NPs on the surface of the electrodes, the active sites were increased. It
has led to the improved charge transfer and decreased in the impedance. Hence, at higher
frequencies, the value of the capacitor increased, and the capacitance was decreased.
The Constant phase element (CPE) is an imperfect capacitance, and it can be calculated as,
1 / Z = Y = Q° ( j ω)n (5.1)
where Q° has the numerical value of the admittance (1/ |Z|) at ω =1 rad/s. The units of Q°
are S·sn. The value of ‘n’ for the double layer capacitor is '1'. The logarithmic values of
imaginary parts were plotted against corresponding frequencies to find out the value of 'n'
for the above EIS responses[113], the slope of which gave the value of 'n,' as in figure 5.5.
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Figure 5.5: Evaluation of the power factor of the constant phase element of bare Au,
untreated AuNP modified, and plasma-assisted AuNPs modified electrodes
The value of the slope decreased after modification of electrodes with AuNPs, and
it decreased further for plasma-assisted AuNPs modified electrodes. The decrease in the
n attributed to the decrease in the phase and hence, the impedance. The impedance was
decreased for modified electrodes as the charge transfer increased. The value of
impedance is lowest for plasma-assisted AuNPs modified electrode.
5.6 Electrochemical detection of cortisol using modified SPCEs
Cortisol sensors using DTSP SAM and cortisol antibodies were fabricated as
described in section 5.2. EIS responses of each step of fabrication on AgNPs modified
SPCEs were recorded, as shown in figure 5.6. Figure 5.6 I a represents EIS of untreated
AgNPs and figure 5.6 I b, c and d are DTSP SAM/ untreated AgNPs, Anti-Cab/DTSP
SAM/untreated AgNPs and 0.012 µg/dl of cortisol/ Anti-Cab/DTSP SAM/untreated
AgNPs.
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Figure 5.6: EIS responses of I) untreated and III) plasma-assisted a) AgNPs, b) DTSP
SAM/AgNPs, c) Anti-Cab/DTSP SAM/AgNPs, d) 0.012 µg/dl Cortisol/ Anti-Cab/ DTSP
SAM/ AgNPs modified SPCE; and Linear calibration plot for II) Anti-Cab/DTSP
SAM/untreated AgNPs and II) Anti-Cab/DTSP SAM/plasma-assisted AgNPs modified
SPCE.
Rct of EIS for each step of fabrication has increased. This increase associated with
the resistance to the electron transfer in the electrolyte induced by the surface-modified
layers.
The peak current decreased as the concentration of the cortisol increases and showed
the linear relationship between the cortisol concentration and electroactive species surface
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coverage. The sensitivity of the cortisol sensor on untreated AgNPs is calculated as
6.08x10-6 A/(µg/dl).
Similarly, EIS response for the cortisol sensor using plasma-assisted AgNPs is shown
in figure 5.6 III. The increase in the radius of the semicircle was observed after each step
of the surface modification. EIS response of plasma-assisted sensor has shown more
prominent results as compared to the untreated sensor as broad semicircles were seen in
the sensor with untreated AgNPs. As the fabrication goes on, the surface blocks the electron
probe; hence an increase in the Rct is a validation of a fabrication process in plasma-assisted
AgNPs modified SPCE.
The weak binding of DTSP SAM on untreated AgNPs was indicated by the weak
EIS response for untreated AgNPs. Untreated AgNPs have BPEI coating on their surface,
and it was assumed that binding was taking place between the amine group of BPEI and
DTSP, as shown in figure 5.7[114]. Further, the sulfur bound with the AgNPs surface in
the presence of NaBH4. However, as BPEI coating is thick and binding of AgNPs surface
with DTSP is through its layer, weak affinity of surface modification results in the weak
response.
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Figure 5.7: Reaction scheme for the conversion of PEI primary amines with DSP. The
resulting disulfide bonds are easily cleaved by reducing agents, regenerated from [114]
The linearity of the calibration curve of the cortisol sensor on plasma-assisted AgNPs
modified SPCE was increased with the sensitivity of 6.32x10-6 A/(µg/dl). The standard
deviation has also been decreased in plasma-assisted AgNPs modified SPCE.
Furthermore, the cortisol sensor fabrication was done on AuNPs modified SPCE, and
plasma-assisted AuNPs modified SPCEs. The EIS response after each step of surface
modification is shown in figure 5.8. The sequential increase in the Rct with every stage of
surface architecture alteration shows the absorption of DTSP SAM and antibodies on the
NPs sites provided on modified SPCEs.
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Figure 5.8: EIS responses of I) untreated and III) plasma-assisted a) AuNPs, b) DTSP
SAM/AuNPs, c) Anti-Cab/DTSP SAM/AuNPs, d) 0.012 µg/dl Cortisol/ Anti-Cab/ DTSP
SAM/ AuNPs modified SPCE; and Linear calibration plot for II) Anti-Cab/DTSP
SAM/untreated AuNPs and II) Anti-Cab/DTSP SAM/plasma-assisted AuNPs modified
SPCE.
The Rct was strengthened from 8kΩ to 13kΩ for DTSP SAM on untreated AuNPs. It
was further increased to 15kΩ for the Anti-Cab/DTSP SAM/untreated AuNPs
functionalized electrode. Rct is 17kΩ for 0.012µg/dl of cortisol/Anti-Cab/DTSP
SAM/untreated AuNPs modified SPCE. The linear regression curve for various
concentrations of cortisol is shown in figure 5.8 II.
The sensitivity of Anti-Cab/DTSP SAM/untreated AuNPs modified SPCE was found
as 9.38x10-6 A/(µg/dl). In case of the cortisol sensors that were fabricated on plasma-
assisted AuNPs modified SPCE, Rct was 300Ω for plasma-assisted AuNPs, 10kΩ for
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DTSP SAM/plasma-assisted AuNPs, 21kΩ for Anti-Cab/DTSP SAM/plasma-assisted
AuNPs, and 30kΩ for 0.012 µg/dl of cortisol/Anti-Cab/DTSP SAM/plasma-assisted
AuNPs modified SPCE.
From figure 5.8 IV of the response of the concentration of cortisol, the sensitivity of
Anti-Cab/DTSP SAM/plasma-assisted AuNPs modified SPCE was evaluated as 1.138x10-
5A/(µg/dl) with improved linearity. The responses of plasma-assisted AuNPs in the
fabrication of the cortisol sensor have shown promising results, which can be used to
enhance the detection. An active surface alteration for cortisol sensors on AuNPs was
observed due to the replacement of citrate capping with the thiol group of DTSP, which
has a strong affinity towards the surface of AuNPs[115], [116]. Also, this binding took
place directly on the surface on AuNPs, unlike AgNPs, as explained before. Moreover, the
ultrathin layer of citrate and ionic interaction of AuNPs with antibodies resulted in efficient
detection.
After the NPs are treated with the plasma, the oxygen species present react with them
to form a surface oxide, and the size of NPs gets decreased. Ultimately, it increased the
surface energy of NPs to enhance the electrochemical properties. The particles then
arranged themselves to provide better surface coverage. Therefore, the study confirmed the
effective cortisol detection using the plasma-treated NPs modified SPCE.
The plasma-assisted AuNPs showing more enhanced sensitivity towards the cortisol
molecules than the others, proved the added surface excitation to NPs by plasma treatment.
The effective detection of cortisol was observed for AuNPs than AgNPs due to the weak
binding of SAM and antibodies on the AgNPs surface. Hence, further studies were carried
out with the same protocol of cortisol sensor fabrication that was used using AuNPs.
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5.7 Summary of chapter 5
AuNPs and AgNPs deposition using plasma treatment is successfully demonstrated
at room temperature. The CV and EIS results showed the enhancement in the electrical
conductivity in plasma-treated NPs modified electrodes. The plasma treatment induced the
increase in the electrical sensitivity of the modified electrodes, which was suitable for
effective electrochemical detection. Besides, this method offers the approach in sensor
fabrication towards improvising the biomolecule detection. The desired material deposition
and plasma treatment can be achieved on the flexible substrates for various applications as
electrochemical sensors, supercapacitors, batteries, and POC systems.
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6 UNDERSTANDING THE RELATION BETWEEN NANOPARTICLE
DISTRIBUTION AND ELECTRODE RESPONSE
Surface architecture-based electrochemical biosensors work on a complex structure
that is created to capture probes. A small defect in the architecture can cause an error in
probe-target interaction. In such electrochemical sensors, the primary assumption that is
made is that the sensor has an ideal architecture. Nevertheless, these sensors drive in the
detection of analytes as the focus is on the probe-target interaction. The underlying surface
properties due to the resultant architecture are yet to be considered while analyzing the
detection phenomenon. Hence, the assessment of the dependence of the sensing process on
the non-idealities present is required to achieve reliable measurements.
Considering NPs as a fundamental layer in surface modification, this work focuses
on the NP distribution on the sensing surface. In this work, the correlation of NP
distribution with electroactive surface area, separation potential of oxidation and reduction
peak, and size of NPs are achieved. Three methods of deposition of three different sizes
of AuNPs as 20nm, 40nm, and 60nm were chosen as drop-casting, aerosol deposition, and
plasma-assisted aerosolized deposition.
In this work, evaporated Au electrodes are fabricated on a silicon substrate, as
described in chapter 3. The enhancement in the sensitivity of biosensors to improve their
performance has been achieved by increasing the active surface area using nanoparticle
(NP)-functionalized electrodes as they exhibit higher electric field intensities [2]. Based on
the previous results, plasma-assisted NP functionalized electrodes displayed higher
electrochemical performance. This improved electrochemical response is due to plasma-
assisted surface activation of NPs. However, as the improved NP coverage was observed
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in plasma-assisted NP deposition, this might also be the reason for the enhancement of the
electrochemical properties, electroactive surface area, and sensitivity.
The sensor response depends on the size, shape, and surface attachment of
nanoparticles [9]–[11]. In most of the sensing methods, the use of high-density NP causes
polydispersity, and defects due to orientation on the electrode surface that conceal the
efficacy of these factors in biosensing[13], [14]. In the intent to achieve a more reliable
surface structure, Au electrodes were fabricated using photolithography, RIE, and
evaporation techniques. The surface roughness and effective surface area in SPCEs depend
on the polishing process and hence vary from the electrode to electrode. Though defects
are still present in the microfabrication process, the surface was assumed to be less distinct
than other electrodes because of the bulk processing.
The inter-electrode variation of fabricated electrodes without any surface
modification has also been taken into consideration in this work. These NP functionalized
electrodes were then modified using DTSP SAM and cortisol antibodies to make them
selective towards cortisol molecules. The stepwise NP surface functionalization using
SAM and antibodies has been described in chapter 5. The enhancement in the ESA and
sensitivity was observed for plasma-assisted AuNPs functionalized electrodes.
6.1 Methods
Gold electrodes on Si/SiO2 substrate are fabricated using the evaporation technique,
as explained in chapter 3. Au NPs of an average size of 20 nm, 40nm, and 60nm were
purchased from Sigma Aldrich. AuNPs were then deposited on fabricated electrodes using
drop-casting, aerosolized, and plasma-assisted aerosolized deposition[53]. These methods
of deposition have been explained in chapter 3. Cyclic voltammetry responses of Au
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electrodes with and without surface modification were recorded using a CHI1023
Instrument. These results were obtained using a cyclic voltammogram obtained in 5mM
[Fe (CN)6]3−/4−. 5mM Ferro/Ferricyanide K3[Fe (CN)6])/ K4[Fe (CN)6] (1:1, 5 mM) was
prepared in a Phosphate buffer solution (pH-7.4) (PBS). CV curves were obtained from a
3µl of K3[Fe (CN)6])/ K4[Fe (CN)6] at 50mV/sec scan rate.
The standard cortisol solutions of 0.012 µg/dl, 0.037 µg/dl, 0.111µg/dl, 0.333 µg/dl
and 1 µg/dl were prepared with Hydrocortisone-H0888 (cortisol) that was purchased from
Sigma Aldrich. CV curves were recorded after adding 3µl of the different concentrations
between -1 V to +1 V potential swing to detect the corresponding oxidation and reduction
of current values using CHI 1230. EIS responses were carried out for AuNPs modified
electrodes using Metrohm Autolab analyzer in 5mM [Fe (CN)6]3−/4− containing 0.1M KCl
solutions.
6.2 Electroactive surface area from the electrochemical response
ESA of the three-electrode electrochemical cell can be calculated using its CV
response. Using Randles and Sevcik equation electrochemical characterization of [Fe
(CN)6]3−/4− oxidation reaction can be done on the working electrode as the oxidation of [Fe
(CN)6]3−/4− has good reversibility[117].
[Fe (CN)6]4− Oxidation [Fe (CN)6]
3− (6.1)
The oxidation reaction is controlled by the diffusion of Ferrocyanide ions. Hence,
the peak current obtained from this reaction is proportional to the electroactive surface area
of the working electrode. This proportionality can be evaluated from Randles and Sevcik
equation as[118],
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𝐼𝑝 = 268600 𝑛3/2𝐷1/2𝐶𝑉1/2𝐴 (6.2)
Where, Ip - the peak oxidation current in A
n - the number of electrons transferred in the redox reaction
A - the electroactive surface area in cm2
D - the diffusion coefficient
C - the concentration in mol/cm3
V - the scan rate in V/sec.
Here, n=1, D=7.20x10-6 for Ferrocyanide, C=5x10-6 mol/cm3 as 5mM of [Fe
(CN)6]3−/4−, and V=0.1V/sec. In this work, the peak current was obtained from the CV
response. Hence, the ESA can be evaluated as,
𝐴 = 877.51 𝐼𝑝 cm2 (6.3)
ESA for the electrodes with and without surface modification was calculated to
establish the correlation between the deposition method, size of NPs, and ESA.
6.3 Image quantification of AuNPs modified electroactive surface area
The particle density and their size distribution were quantified using SEM and TEM
image analysis. Real surface area can be evaluated using image processing as follows.
The average number density of AuNPs ρ was estimated by dividing the particle
number that was found using software ImageJ by the image area, as shown in figure 6.1.
The average diameter of AuNPs was used to calculate the area of AuNPs as AAuNP = 4π r2.
Ageo is the geometrical area of the working electrode. The surface area is estimated as[119],
A= ρ AAuNP Ageo cm2 (6.4)
The geometric area of the Au electrode without surface modification is calculated as
Ageo is 0.0335cm2 of a working area.
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Figure 6.1: a) SEM image of AuNPs modified electrode, b) NPs outline detection using
image processing, and c) distribution of the size of NPs.
From the image quantification, ρ= 1.12x1011 AuNPs/cm2, and AAuNP = 8.04x10-12
cm2/AuNPs, and therefore, an effective surface area that was calculated theoretically is,
A= 0.028 cm2.
6.4 TEM images
TEM images of 20nm AuNPs deposited by drop-casting, aerosol, and plasma-
assisted aerosol are shown in figure 6.2 a, b, and c, respectively.
Figure 6.2: TEM images of a) drop-casted, b) aerosolized, and c) plasma-assisted
aerosolized deposited AuNPs of the average size of 20nm.
From TEM images, it can be seen that the distribution of NPs varies drastically for
the deposition methods. In drop-casted AuNPs, agglomeration was observed, where for
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aerosolized deposition, partial surface coverage was seen. This random arrangement of
NPs made the quantification of particle density using image processing difficult. However,
in plasma-assisted AuNPs deposition, the comparatively uniform monolayer of NPs with
size reduction was observed. The phenomenon of plasma-induced size reduction of NPs
has been explained in chapter 4.
The electrodes were functionalized with 20nm, 40nm, and 60nm sized AuNPs to
analyze the effects of the surface coverage obtained using drop-casting, aerosol deposition,
and plasma-assisted aerosolized deposition methods.
6.5 Nanoparticle deposition model
The Nanoparticle deposition depends on the EDL force of repulsion between the two
adjacent particles. The arrangement obtained after the deposition depends on this repulsive
barrier. The interparticle EDL interaction is given by the equation 6.5,
𝑊𝐸𝐷𝐿 = 2𝜋 𝑟 Ԑ0 Ԑ𝑟 ᴪ𝑝2
𝑒𝑥𝑝(−𝑘 𝑆) (6.5)
Where, WEDL - Electrostatic double layer
S - Inter-particle distance (Center to center)
ψp - diffuse potential (zeta potential)
Ԑr - the relative permittivity of the medium
r - the radius of the particles
k - the inverse Debye screening length
The probability of finding a particle next to another particle at distance S is,
𝑃𝑝 = 𝑒𝑥𝑝(𝑊𝐸𝐷𝐿/𝑘𝐵𝑇) (6.6)
Where, kB - Boltzmann's constant
T - the absolute temperature
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Based on the zeta potential and NPs size measurements, the probability of having the
adjacent particle at the separation distance was plotted for untreated (aerosolized
deposition) and plasma-assisted deposition, as shown in Figure 6.3, considering the
extended RSA model of NPs deposition. The separation distance was varied to analyze the
probability of having the agglomeration.
Figure 6.3: AuNPs deposition model for untreated AuNPs [a, b, c] and plasma treated
AuNPs [d, e, f] for various inter-particel separation distance (S).
The plots showed that the probability of having the next particle at 7nm for NPs
10nm of the radius is 96%, which implied the probability of having the agglomeration. The
probability decreased as the size of NPs increased. However, the overall range of
probability is between 86-96%. The further increase in the probability with the increase in
the separation distance implies the definite presence of the particle at the specific separation
distance. In the plasma-assisted deposition, the probability of having the adjacent particle
at distance 7nm, for NPs of 10nm of the radius is 78%, 20nm of the radius is 65%, and 30
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nm of the radius is 48%. The probability increased as the separation distance increased but
not as compared to that of untreated deposition. Hence, the probability of having
agglomerated NP arrangement is lower in plasma-assisted deposition than that of the
aerosolized untreated NPs deposition. Based on the Images, zeta potential results, and this
model, it is proved that the arrangement we get for the plasma-treated NP deposition is
uniform with keeping the separation distance.
6.6 Electrochemical characterization of AuNPs modified Au Electrode
6.6.1 CV characterization
AuNPs of the average size of 20nm, 40nm, and 60nm were deposited on the Au
electrode and CV responses of these electrodes in 5mM of [Fe (CN)6]3−/4− were compared
for drop-casted, aerosol deposition, and plasma-assisted aerosolized deposition of AuNPs.
Figure 6.4a showed the averaged CV response for 20nm, 40nm, and 60nm of AuNPs
modified electrodes using drop-casting.
The peak current was increased after 20nm of NPs deposition, as can be seen in figure
6.4b. This increase in peak current was evaluated as 9% of that of the bare electrode.
Further, it was reduced to 0.5%, and then it was increased by 18.5% of the bare electrode
for 40nm and 60nm of NPs, respectively. In the aerosolized deposition, the enhancement
in the peak current with the change in the NPs size was 15.3%, 12.5%, and 7.6% of bare
electrodes. However, for plasma-assisted aerosolized deposition, it was observed as 94%,
41.5%, and 30% of that of the bare electrode. The enhancement factor that was obtained in
plasma-assisted NPs modified electrodes showed the pattern of increase in ESA for 20nm,
40nm, and 60nm AuNPs modified electrodes. There is no such pattern observed in the
drop-casted, and the smaller enhancement was observed in aerosolized deposition than the
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electrodes prepared by plasma-assisted deposition. The increase in peak current
corresponds to the increase in ESA, as expressed in equation 6.2.
Figure 6.4: CV responses of 20nm, 40nm, and 60nm of AuNPs modified electrodes with
a) drop-casting, b) aerosol deposition, and c) plasma-assisted aerosolized deposition.
TEM images of d) drop-casted, e) aerosol deposition, and f) plasma-assisted aerosolized
AuNPs.
Hence, the consistent increase in ESA was observed in the electrodes with plasma-
assisted deposition of AuNPs, whereas the random increase and decrease in ESA were
observed in the drop-casted deposition. In the aerosolized deposition, the ESA was
decreased as the size of NPs increased.
The separation of oxidation and reduction peak, ΔE in the CV response, was
observed as 0.45V for 20nm, 0.37V for 40nm, and 0.508V for 60nm drop-casted AuNPs
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modified electrodes. This ΔE was reduced to 0.242V for 20nm, 0.38V for 40nm, and
0.428V for 60nm for aerosolized AuNPs modified electrodes. ΔE was improved to 0.221V
for 20nm, 0.30V for 40nm, and 0.287 for 60nm for plasma-assisted electrodes.
This decrease in separation between Faradaic peak potential after the NP deposition
is attributed to the facilitation of the electron transfer reaction, kinetic, and thermodynamic
at the electrode surface[79]. To establish the correlation between the size, ESA, and ΔE of
NPs modified electrodes, 15 electrodes for each method and size were fabricated.
6.6.2 EIS characterization
EIS responses of AuNPs modified electrodes are shown in figure 6.5. The semicircle
of EIS decreased for the NP modified electrodes, which suggested the increase in the
electrochemical activities due to the presence of NPs on the electrode surface. This increase
in the conductivity also indicates that the ESA of the electrodes was increased after NP
deposition.
The value of electron transfer resistance for the bare Au electrode is 40 kΩ, as seen
in figure 6.5. In drop-casted electrodes, the value of Rct varies as the size of NPs varies. Rct
for 20nm of AuNPs is 22kΩ, for 40nm 28.5kΩ, and 60nm is 19kΩ. Since the distribution
of NPs that was obtained using drop-casting has no control over the resultant film
formation on the electrode, this variation occurred. Similarly, the average deviation of the
value of Rct for aerosolized AuNPs deposited electrodes was 6kΩ, and that of for the
plasma-assisted AuNPs was reduced to 0.6kΩ. The variation of Rct confirmed the effects
of the deposition method and NP size variation on the conductivity of the electrodes.
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Figure 6.5: EIS responses of a) drop-casted, b) aerosolized, and c) plasma-assisted
aerosolized AuNPs modified Au electrodes in 5mM of [Fe (CN)6]3−/4−, and d) the
variation in electron transfer resistance due to the deposition methods and variation in
size of NPs.
Considering the ideal distribution of NPs on the confined surface area, ESA should
vary as the size of NPs, as based on the theoretical calculations, when the size of NPs
increases, the density per unit area decreases to achieve the monolayer of NPs. Hence,
plasma-assisted distribution showed promising results in enhancing the effective ESA of
the electrodes.
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6.7 Inter-Electrode Variability of methods of deposition
ESA and ΔE for 15 electrodes of each size for three deposition methods were
quantified and compared, as shown in figure 6.6.
Figure 6.6: Boxplots of the spread of the distribution of a) ESA and b) ΔE of bare Au
electrodes, drop-casted, aerosolized, and plasma-assisted aerosolized deposited AuNPs
functionalized electrodes.
The quantification of the spread of ESA in bare Au electrodes showed the median
ESA at 0.012cm2, and the spread is between 0.0085 cm2 and 0.018 cm2. It showed that the
ESA for bare electrodes is less than the theoretical value. Though the controlled
microfabrication process was used, the inter-electrode variability was observed. This
variability might be due to the surface defects present on the electrodes.
The boxplot of drop-casted AuNPs modified Au electrodes has a median value of
ESA at 0.0165 cm2, which validated the increase in ESA after AuNPs deposition. However,
the spread of this plot was from 0.006 cm2 to 0.028 cm2. Therefore, though there was an
increase in the ESA after drop-casting, the inter-electrode variability was also increased.
Simultaneously, the median value of ESA for aerosolized deposition was noticed at 0.0165
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cm2, which was the same as drop-casted electrodes. However, the spread of aerosolized
deposited AuNPs electrodes was between 0.012 cm2 and 0.022 cm2, which was narrower
than the drop-casted one; therefore, it improved the inter-electrode variability. Plasma-
assisted AuNPs modified electrodes displayed a median value of ESA at 0.02 cm2, and the
spread was observed between 0.019 cm2 and 0.021 cm2. Hence, improved inter-electrode
variability and ESA were observed for plasma-assisted AuNPs deposited electrodes.
The spread of ΔE for bare Au electrodes lay between 0.42mV to 0.93mV with a
median value of 0.8mV. It varies from 0.23mV to 0.7 mV with a median value at 0.5mV
for drop-casted, from 0.22mV to 0.48mV with a median value at 0.35mV for aerosolized,
and from 0.25mV to 0.3mV with a median at 0.27mV for plasma-assisted AuNPs modified
Au electrodes. The variability was improved after plasma-assisted deposition, and the
decrease in ΔE indicated the potential of this method.
The architecture of the bare electrode for 20, 40, and 60nm was different as separate
electrodes were used. Hence, the architecture variation for bare added up with the variation
due to plasma-assisted 60nm NP modified electrode. The separation potential for a set of
15 electrodes for different sizes of AuNPs is plotted in figure 6.7. It shows the increase in
the separation potential with an increase in the size of NPs.
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Figure 6.7: Variation of separation potentials for drop-casted, aerosolized, and plasma-
assisted AuNPs with the size of AuNPs
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The boxplot showed the variability and spread of the separation potential for plasma-
assisted 20, 40, and 60nm AuNPs modified electrodes. The spread was decreased the
plasma-assisted electrodes as compared to that of drop-casted and the aerosolized
deposition. The pattern can be seen in the change in ΔE in AuNPs modified electrodes with
the plasma-assisted deposition.
6.8 The relation between the Size of NPs and ESA
In the efforts to establish the correlation between the size of NPs and ESA of
respective modified electrodes, the size of NPs was plotted against ESA for all three
methods, as shown in figure 6.8.
The relation between the size of NPs (d) and ESA for drop-casted electrodes is shown
in figure 6.8a as
d= -0.64 ESA, which shows a low negative correlation. The lower negative
correlation that was obtained for the aerosolized deposition method is d= -0.39 ESA. Also,
the range of variation in the ESA is between 0.0095 cm2 to 0.03 cm2 for drop-casted
deposition.
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Figure 6.8: Correlation plot of the size of NPs and ESA for a) drop-casted, b)
aerosolized, and c) plasma-assisted aerosolized NPs modified electrodes. d) Relative plot
of ESA to bare Au electrodes, 20A,40Aand 60A-20nm,40nm and 60nm aerosolized
deposited; 20d, 40d, and 60d- 20nm, 40nm, and 60nm drop-casted; 20P, 40P, and 60P-
20nm, 40nm, and 60nm plasma-assisted aerosolized AuNPs modified electrodes
For aerosolized deposition, this range of variation was narrowed down from 0.01 cm2
to 0.022 cm2. It was further narrowed down from 0.018 cm2 to 0.0215 cm2 for the plasma-
assisted deposition.
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The strong positive correlation, as expressed in equation 6.5, was achieved for the
plasma-assisted deposition method, which shows that with the increase in size, the ESA
increases.
𝑑 = 0.83 𝐸𝑆𝐴 (6.7)
However, the increase in ESA with the size of NPs was ~4% of the mean value,
which is due to more surface coverage with larger NPs. Plasma -assisted AuNPs modified
electrodes showed a strong correlation with smaller variations in overall ESA with the
change in the size of AuNPs. This variation occurred, possibly with the interparticle
distance variation due to the plasma-induced size reduction, as discussed in chapter 4.
Hence, to study the variation of ESA for the same size of NPs, the size of the NP was kept
constant, and the deposition method varied.
The dot plot of ESA against various sizes of NPs for all three methods is shown in
figure 6.8d. It can be seen that ESA for plasma-assisted NPs of 20nm, 40nm, and 60nm
overlapped and showed almost negligible variation, while other methods showed
substantial variation in ESA. Hence, the inter-electrode variability was improved using
plasma-assisted AuNPs deposition on electrodes by achieving nearly equal ESA.
6.9 Cortisol detection using AuNPs modified Au electrodes
The surface of bare Au electrodes, drop-casted, aerosolized, and plasma-assisted
aerosolized AuNPs modified electrodes using DTSP SAM, and cortisol antibodies were
functionalized, as explained in chapter 5. The decrease in the oxidation peak current in the
CV in figure 6.9a is a validation of the stepwise modification of surface architecture using
DTSP SAM and antibodies.
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The linear calibration for the bare Au electrode is shown in figure 6.9b, which shows
the sensitivity of 5.55x10-7A/(µg/dl). The calibration plots for different concentrations of
cortisol for the electrodes modified with all three deposition methods with 20nm, 40nm,
and 60nm of AuNPs are shown in figure 6.9c, 6.9d, 6.9e, 6.9f, 6.9g, 6.9h, 6.9i, 6.9j, and
6.9k.
The sensitivity of the cortisol sensor was increased to 1.41x10-6A/(µg/dl), 1.56 x10-
6A/(µg/dl), and 2.104 x10-6A/(µg/dl) for 20nm, 40nm and 60nm of sensor fabricated with
drop-casted AuNPs modified electrodes respectively. It was further improved to 2.41 x10-
6A/(µg/dl), 2.15 x10-6A/(µg/dl), and 2.37 x10-6A/(µg/dl) for cortisol sensor with 20nm,
40nm, and 60nm of aerosolized AuNPs functionalized electrodes respectively.
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Figure 6.9: a) CV shows a stepwise surface modification in 5mM of [Fe (CN)6]3−/4− and
linear calibration plots with the sensitivity of Anti-Cab/DTSP SAM functionalized on b)
bare Au electrode, c) 20nm, d) 40nm, and e) 60nm of drop-casted; f) 20nm, g) 40nm, and
h) 60nm of aerosolized; and i) 20nm, j) 40nm, and k) 60nm of plasma-assisted
aerosolized AuNPs modified electrodes.
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Furthermore, the sensitivity of plasma-assisted aerosolized AuNPs modified
electrodes was enhanced to 3.49 x10-6A/(µg/dl), 2.56 x10-6A/(µg/dl), and 2.45 x10-6
A/(µg/dl) corresponding to 20nm, 40nm, and 60nm.
The enhancement in the linearity and sensitivity of the response of the cortisol sensor
in plasma-assisted electrodes was a result of controlled ESA and hence controlled binding
sites as compared to other methods.
6.10 Summary of chapter 6
The peak current in electrochemical responses has been enhanced after the deposition
of Au NPs. The decrease in separation between Faradaic peak potential after the NP
deposition validates the higher electron transfer at the electrode surface for plasma-assisted
AuNPs deposited electrodes. The enhancement in the overall response of the electrode and
the active surface area was achieved with comparatively even distribution of nanoparticles
during plasma-assisted aerosolized deposition.
The NPs were sonicated properly during deposition using nebulizer in the assembly,
and the plasma provided the surface excitation and surface charge tuning during plasma-
assisted deposition. The promising results shown in this work have improved the variability
of the sensors by quantifying the NP coverage on the electrode surface. The supervised
interparticle and NP-electrode interaction helps improve biosensing as demonstrated in this
work by achieving the desired surface architecture during optimization of the sensing
process. This work would make the data interpretation more reliable.
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7 SUMMARY AND FUTURE WORK
7.1 Summary
In summary, a novel technique of plasma-assisted NPs deposition, which could
maintain the inter-particle repulsive barrier to obtain the uniform monolayer of NPs was
reported. This barrier was achieved due to the sonication NPs during deposition using
nebulizer in assembly and providing the plasma for surface excitation and surface charge
tuning of NPs during plasma-assisted deposition.
The NP films obtained from the plasma treatment at room temperature are
comparable to the thermal treatment at higher temperatures. This unique property can be
used for processing metal nanoparticles at room temperatures for designing sensitive SERS
substrates on flexible materials such as polymers, papers, and textiles. The intensity of the
SERS signal of R6G from plasma-treated AgNPs substrate was ~120 times as high as that
of the untreated substrate, and that of AuNPs was ~95 times. However, the enhancement
in thermal annealed NPs SERS substrate was ~7 folds.
The significant enhancement in plasma-assisted SERS substrate is attributed to the
surface roughness, presence of the nanogaps, and size reduction after the treatment of
nanoparticles on the substrates. These surface modifications due to the atmospheric plasma
of plasmonic NPs were studied, and the decrease in the size of NPs was quantified through
SEM, TEM, and AFM imaging. The summarized study of the effects of the plasma
treatment on the NPs is shown in figure 7.1.
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Figure 7.1: Summarized effects of plasma-assisted NP deposition methods
Analytical modeling of the effects of plasma on optical and electrochemical
performances of electrodes that were made by the proposed method was done to establish
a relation between deposition parameters and the response of the electrodes. The surface
charge tuning of NPs induced by the plasma and its mechanism was studied using SERS
signals captured after each step of the plasma. The microelectrodes were fabricated using
photolithography, Cr/Au evaporation, and lift-off techniques.
The enhancement in electrochemical properties induced by plasma treatment was
studied by analyzing the CV and EIS of untreated and plasma-treated NPs surface-modified
electrodes. A comparative study of electrochemical performances of microelectrodes
functionalized with 20nm, 40nm, and 60nm AuNPs was performed. Improved
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electrochemical properties with enhancements in the electroactive surface area and charge
transfer were reported in plasma-assisted NPs modified electrodes.
The inter-electrode variability of electrodes with each combination of deposition
methods and the size of NPs was evaluated. The improved inter-electrode variability was
achieved. These electrodes were used to detect cortisol, and the enhancement in the
sensitivity was achieved in plasma-assisted NPs modified electrodes. The surface charge
tuning of AgNPs and AuNPs using the adapted plasma treatment can be used in the
electrochemical sensing as it increases the activity and affinity towards the specific charged
molecules.
7.2 Future Work
The plasma-assisted deposition techniques have become the area of interest in
nanotechnology. However, this field contained a lack of knowledge regarding the effects
of plasma on the morphology, optical, and electrical properties of NPs. In this work, the
plasma-induced modification of the properties of NPs was studied. The relation between
the NPs distribution and the response of their functionalized electrode was also established.
However, with regard to continuing the current work, the following points should be taken
into consideration:
1. The preliminary work in understanding the mechanism of plasma-induced
excitation in AuNPs and AuNPs has been done. A similar mechanism for other NPs
than plasmonic like oxide and polymer NPs would be interesting to explore.
2. The morphological and optical effects of plasma treatment on non-spherical
particles such as stars, rods, are worth being studied. The energy optimization can
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be done for different substrates like polymers, papers, textiles, as this work has been
performed on silicon, quartz, and thin-film metal.
3. The comparison of plasma treatment with thermal annealing promises to achieve
similar effects at room temperature. The energy comparison in the two processes
can be made to match their impacts on the substrate modifications.
4. The findings that SERS measurement becomes ineffective after long plasma
treatment due to Ag-oxide formation on the AgNP after 20min, which damps the
signal, is a significant result, which shows the limitation of the current plasma
process. This behavior can be considered further for other NPs to obtain their point
of saturation.
5. The preliminary relation between the size of NPs and ESA for deposition methods
has been established in this work. The dataset of 15 of each variation was used
towards the lowest requirement to build a correlation. However, to achieve a strong
correlation with the optimized system, a larger dataset is recommended.
6. The study of NPs arrays by varying the duration of the treatment has yet to be done
considering the inter-particle distance. The mapping of NPs can be used to build a
prediction model, from which the real physical area of the NP deposited electrode
can be evaluated and related to the ESA.
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APPENDICES
I The binding force between the nanoparticles and the surface:
The Van der Waals force of attraction between the particles and the substrate,
𝑊𝑉𝑑𝑊 = −𝐴𝑟/6𝐷
Where A- The Hamaker constant (the number densities of the two interacting particles
and the magnitude of this constant implies the strength of the WvdW force between a
particle and a substrate.)
.
From the literature, the Hamaker constant is, A= 1.5 × 10−20 J.
D is the distance between the particle and substrate and
r = 10 nm the particle radius.
- WvdW = −Ar/6D
- W2=((-1.5e-20 r)/6 r);
- Pp=exp(-Wvdw/(1.6e-19)) = 1;
As D=r (the distance between the center of the particle and the substrate), the force of
attraction between particles and substrate is strong. 'Pp' is the probability of having a
secure binding between the particle and the substrate. Also, from the extended RSA
model shown in the figure below, it can be seen that as D decreases, the WvdW tends to
increase drastically.
Page 142
123
Figure: RSA model of NPs deposition, regenerated from [21].
II EIS of bare and NPs modified Electrodes (data of Figures 5.3b and 5.4b)
EIS Bare AgNP AgNPP AuNP AuNPP Z' Z" Z' Z" Z" Z' Z" Z' Z"
7258.9
45
213.65
83
9549.8
27
5.18190
5
10.580
03
0.2494
99
8630.6
74
8630.7
96
183.96
26
7258.9
44
213.64
75
9549.8
43
5.34690
3
10.724
64
0.3157
56
8630.6
73
8630.7
95
183.91
93
7258.9
42
213.63
38
9549.8
62
5.55322
9
10.905
47
0.3997
79
8630.6
72
8630.7
94
183.86
44
7258.9
4
213.61
65
9549.8
87
5.81176
5
11.132
06
0.5065
46
8630.6
7
8630.7
92
183.79
48
7258.9
37
213.59
47
9549.9
17
6.13234
9
11.413
03
0.6407
88
8630.6
68
8630.7
9
183.70
75
7258.9
33
213.56
7
9549.9
56
6.53475
2
11.765
71
0.8116
3
8630.6
65
8630.7
87
183.59
66
7258.9
28
213.53
19
9550.0
04
7.03856
8
12.207
27
1.0284
83
8630.6
62
8630.7
84
183.45
62
7258.9
22
213.48
8
9550.0
63
7.66200
1
12.753
66
1.3004
76
8630.6
58
8630.7
8
183.28
08
Page 143
124
7258.9
14
213.43
16
9550.1
38
8.45379
2
13.447
61
1.6505
82
8630.6
52
8630.7
75
183.05
6
7258.9
05
213.36
13
9550.2
31
9.43089
3
14.303
98
2.0883
6
8630.6
46
8630.7
68
182.77
65
7258.8
93
213.27
29
9550.3
47
10.6483
3
15.370
99
2.6408
52
8630.6
37
8630.7
6
182.42
64
7258.8
78
213.16
14
9550.4
92
12.1732
2
16.707
48
3.3415
65
8630.6
27
8630.7
49
181.98
64
7258.8
58
213.02
04
9550.6
75 14.0913
18.388
61
4.2336
98
8630.6
14
8630.7
36
181.43
3
7258.8
34
212.84
43
9550.9
02
16.4795
4
20.481
89
5.3574
75
8630.5
97
8630.7
2
180.74
64
7258.8
04
212.62
32
9551.1
88
19.4762
7
23.108
65
6.7831
14
8630.5
77
8630.6
99
179.89
25
7258.7
67
212.34
79
9551.5
44
23.2219
9
26.392
22
8.5833
24
8630.5
52
8630.6
74
178.84
13
7258.7
2
212.00
27
9551.9
96
27.9581
8
30.544
71
10.880
84
8630.5
21
8630.6
44
177.54
35
7258.6
63
211.58
37
9552.5
51
33.7907
3
35.659
71
13.733
34
8630.4
85
8630.6
07
176.00
06
7258.5
9
211.05
21
9553.2
73
41.3612
4
42.301
64
17.461
54
8630.4
4
8630.5
62
174.09
77
7258.5
04
210.41
61
9554.1
67
50.7295
8
50.526
49
22.100
28
8630.3
88
8630.5
1
171.90
96
7258.4
209.65
34
9555.2
94
62.5119
9
60.882
05
27.956
12
8630.3
3
8630.4
51
169.43
05
7258.2
77
208.75
36
9556.7
19
77.3746
6
73.967
45
35.357
17
8630.2
67
8630.3
87
166.74
77
7258.1
35
207.70
78
9558.5
48 96.3629
90.730
78
44.813
95
8630.2
06
8630.3
23
164.04
85
7257.9
78
206.55
63
9560.8
71
120.321
6
111.97
19
56.728
33
8630.1
56
8630.2
69
161.80
67
7257.8
15
205.35
84
9563.8
67
150.889
5
139.24
75
71.888
41
8630.1
4
8630.2
46
160.81
32
7257.6
68
204.28
04
9567.6
9 189.281
173.83
19
90.869
89
8630.1
91
8630.2
86
162.49
09
7257.5
73
203.58
33
9572.7
25
238.674
6
218.94
05
115.23
2
8630.3
74
8630.4
5
169.38
6
7257.6
03
203.80
36
9579.2
92
300.999
1
276.92
98
145.94
53
8630.7
91
8630.8
36
185.65
81
7257.8
81
205.84
2
9587.9
74 379.88
352.07
09
184.85
19
8631.6
18
8631.6
12
218.41
46
7258.6
14
211.22
34
9599.5
25
479.000
4
449.23
03
233.96
31
8633.1
33
8633.0
42
279.06
11
7260.1
27
222.33
75
9614.8
72
601.296
9
573.07
43
295.23
76
8635.7
58
8635.5
37
385.36
42
Page 144
125
7263.0
4
243.72
9
9636.0
56
754.700
4
733.42
76
373.72
14
8640.3
03
8639.8
83
570.12
97
7268.2
64
282.08
46
9665.1
22
941.895
3
932.50
55
472.39
06
8647.8
91
8647.1
89
872.44
99
7277.3
45
348.70
83
9705.5
91
1171.38
5
1173.8
08
596.66
49
8660.4
03
8659.3
26
1343.3
07
7292.8
99
462.59
17
9762.9
88
1457.24
7
1464.2
27
753.92
63
8680.9
4
8679.3
97
2020.9
64
7318.8
01
651.14
43
9844.2
54
1809.42
8
1813.5
66
949.84
92
8713.8
77
8711.7
97
2859.3
67
7360.9
38
953.46
7
9959.1
96
2233.99
1
2238.7
1
1190.4
72
8765.5
54
8762.8
47
3720.5
35
7431.4
01
1441.8
61
10128.
94 2774.64
2774.9
9
1493.9
65
8848.6
62
8844.9
17
4567.4
93
7541.1
62
2148.3
09
10365.
75
3554.33
1
3407.5
52
1850.0
16
8972.4
78
8966.1
57
5528.0
06
7717.9
68
3130.7
21
10710.
96
5337.65
8
4159.6
35
2278.7
14
9161.4
25
9147.1
95
7107.7
81
8004.7
04
4344.5
44
11219.
89
11230.5
2
5069.1
69
2786.7
38
9447.2
54
9409.4
2
9892.4
07
8442.1
71
5554.3
58
11928.
24
31202.4
6
6392.3
48
3339.0
47
9846.3
81
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44
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6
9110.3
49
6692.5
13
12916.
11
96455.9
9
9579.9
04
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91
10392.
05
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44
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86
10085.
88
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79
14230.
4
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2
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66
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79
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52
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17
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14
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06
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21
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09
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2
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21
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36
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22
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37
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63
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Page 145
126
31263.
49
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94
III Separation Potential (data of figure 6.7):
ΔE (Size of NPs) Bare Au Drop-casted Aerosolized Plasma-assisted
20 0.45 0.238 0.28 2.29E-01
20 0.534 0.268 0.245 2.62E-01
20 0.545 0.251 0.24 2.23E-01
20 0.521 0.498 0.22 2.23E-01
ΔE (Size of NPs) Bare Au Drop-casted Aerosolized Plasma-assisted
40 0.545 0.4 0.475 2.73E-01
40 0.433 0.337 0.375 2.67E-01
40 0.459 0.569 0.352 3.05E-01
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127
ΔE (Size of NPs) Bare Au Drop-casted Aerosolized Plasma-assisted
60 0.526 0.518 0.39 3.25E-01
60 0.567 0.504 4.41E-01 3.21E-01
60 0.515 0.58 3.20E-01 3.00E-01
IV Peak oxidation current for modified electrodes (data of figure 6.4d)
Drop-casted (Ip)
Aerosolized (Ip)
Plasma-assisted (Ip)
1.97E-05 1.93E-05 1.88E-05
2.16E-05 2.23E-05 2.79E-05
1.98E-05 2.13E-05 2.59E-05
2.33E-05 2.06E-05 2.39E-05
Page 147
128
VITA
APURVA SONAWANE
Born, Maharashtra, India
2006-2010 B.E., Electronics
University of Pune
Maharashtra, India
2015-2016 M.S., Electrical Engineering
Florida International University
Miami, Florida
Jan 2016- Nov 2016 Computer Support Specialist
Florida International University
Miami, Florida
2017 -2020 Doctoral Candidate
Florida International University
Miami, Florida
2017-2018 Teaching Assistant
Florida International University
Miami, Florida
2019-2020 System Engineer Intern
Engineering Resources Group., Inc.
Pembroke Pines, Florida
PUBLICATIONS AND PRESENTATIONS
1. A. Sonawane, P. Manickam, S. Bhansali, 2019. Stability of enzymatic biosensors
for wearable applications. IEEE Reviews in Biomedical Engineering 10, 174-186
2. A. Sonawane, M. Mujawar, S. Bhansali, 2019. Atmospheric Plasma Treatment
Enhances the Biosensing Properties of Graphene Oxide-Silver Nanoparticle
Composite. Journal of The Electrochemical Society 166 (9) B3084-B3090
3. P Manickam, V Kanagavel, A Sonawane, SP Thipperudraswamy, A Sonawane
Electrochemical Systems for Healthcare Applications. Bioelectrochemical
Interface Engineering, 385-409.
Page 148
129
4. A. Sonawane, M Mujawar, S. Bhansali, 2019. Cold Atmospheric Plasma
Annealing of Plasmonic Silver Nanoparticles. ECS Transactions 88 (1), 197-201
5. SK Pasha, M Mujawar, A Sonawane, S Bhansali Thin Film FETs on Flexible
Substrates: a Case for Biosensing Application. Meeting Abstracts, 145-145.
6. A Sonawane, M Mujawar, S Bhansali, 2020. Plasma Assisted Control of
Nanoparticle Distribution for Enhancing the Electrochemical Activity of
Electrodes. 237th ECS Meeting with the 18th International Meeting.
7. A Sonawane, M Mujawar, S Bhansali, 2020. Effects of Cold Atmospheric Plasma
Treatment on the Morphological and Optical Properties of Plasmonic Silver
Nanoparticles. Nanotechnology 31 365706 (11pp).
8. A Sonawane, S Nasim, P Shah, M Mujawar, S Ramaswamy, G Urizar, P
Manickam, S Bhansali 2020. Detection of salivary cortisol using Zinc Oxide and
Copper porphyrin composite using electrodeposition and plasma-assisted
deposition. ECS Journal of Solid State Science and Technology. (Accepted
manuscript).
9. A Sonawane, M Mujawar, P Manickam, S Bhansali, Plasma-Induced Enhancement
in Electronic Properties of Gold Nanoparticles: Application in electrochemical
biosensing of cortisol Applied Surface Science (Submitted manuscript)