Towards roll-to-roll solution processing of OLED devices on an industrial scale Pit Teunissen, Eric Rubingh, Ike de Vries, Guy Bex, Pim Groen, Jeroen van den Brand
Aug 07, 2015
Towards roll-to-roll solution processing of OLED devices on an industrial scale
Pit Teunissen, Eric Rubingh, Ike de Vries, Guy Bex, Pim Groen, Jeroen van den Brand
© Holst Centre
Vision on lighting
© Holst Centre
8,000 €/m2
Rigid glass
Vacuum/litho processes
40-60 % material loss
Glass encapsulation
Rare materials
100 €/m2
Flexible substrates
Direct printing processes
<5% material loss
Thin-film encapsulation
Widely abundant materials
2018 Now
© Holst Centre
Large area flexible electronics
One of the key challenges: How to manufacture these products?
Large quantities and large sizes…
• Roll-to-roll (R2R) manufacturing preferred
Easier to make large quantities at low costs
• To be built on low cost flex foils
Not on polyimide-foil: ~ 50 euro/m2
But on PET-foil: ~ 3 euro/m2
Printing preferred over lithographic patterning
• Easier for roll-to-roll processing
• Fine features without complicated masks
innoLAE 2015 - Pit Teunissen
< 4
© Holst Centre
Schematic of R2R solution processed OLED (ITO free)
1. Printing and sintering of silver grids (anode)
3. Shunting cathode OLEDs by IJP
2. Large area coating
4. R2R Barrier
innoLAE 2015 - Pit Teunissen
< 5
© Holst Centre
• Printing silver: Screen printing - Ink jet
• Baseline Process: Thermal Sintering in furnace at high
temperatures (30 min./<150 oC )
Limited to Tg of polymer foils
Slow and inefficient process
In R2R line with 6 m/min a furnace of 60 m needed
• Photonic Flash Sintering
innoLAE 2015 - Pit Teunissen
1. Printing & Sintering of Silver grids
< 6
© Holst Centre
innoLAE 2015 - Pit Teunissen
Reflector geometry
Fast sintering (50 ms) of
development paste
3 flashes of 10 ms
Ref: Abbel et al., MRS Commun., 2012, 2, 145.
1. Printing & Sintering of Silver grids
• Principle of photonic drying/sintering
Light is absorbed in the printed structures, not substrate
Elliptical reflectors focus the light in narrow lines
High frequency flashing > no stitching effect
Top and bottom illumination
“Off the shelf” lamps and electronics > inexpensive
< 7
© Holst Centre
• Photonic sinter equipment
A good understanding of the sinter behavior of materials is essential
Measuring real-time in-line resistance and temperature necessary
Stage 1: Research tool
Single lamp system
Sintering of lines
In-line measurements
Resistance
Temperature
Inert atmosphere capable
Stage 2: S2S tool
Holst S2S setup & Novacentrix 1300
In-line measurements
Resistance
Temperature
Functionalities beyond photonic sintering only
Stage 3: R2R tool
Up to 6 flash lamps
2 X NIR pre-drying
1 meter footprint
innoLAE 2015 - Pit Teunissen
1. Printing & Sintering of Silver grids
Ref.:Transl. Mater. Res. 2014, 1, 015002
< 8
© Holst Centre
innoLAE 2015 - Pit Teunissen
• Smooth surface is critical for OLED/OPV processing
Conventional pastes have a rough surface
Large risk of direct shorts between anode and cathode
Experimental paste with smooth surface topology developed
Material properties Resistivity: 3-4x bulk Ag @ 190°C, 4-5x bulk Ag @ 160°C
Good adhesion to several types of substrates
Withstands tape test, ethanol wiping and automated cleaning
Conventional paste
DuPont experimental paste Ra = 0.1 µm
Rp = 0.5 µm
Ra = 1.0 µm
Rp = 3.1 µm Cannot be used: Rough surface, short circuit
Smooth surface
1. Printing & Sintering of Silver grids
< 9
© Holst Centre
• Functional OLED devices made with S2S printing
Smooth topology of printed structures
Minimum line widths achievable: 50-70 µm
Low leakage current
Devices show similar IVL curves as devices with evaporated bus bars
innoLAE 2015 - Pit Teunissen
1. Printing & Sintering of Silver grids
3D profile plot of screen printed anode OLED with screen printed anode
< 10
© Holst Centre
innoLAE 2015 - Pit Teunissen
1. Printing & Sintering of Silver grids
Movie: 3 layers aligned R2R screen printing Movie available on you-tube
© Holst Centre
1. Printing and sintering of silver grids (anode)
3. Shunting cathode OLEDs by IJP
2. Large area coating
4. R2R Barrier
innoLAE 2015 - Pit Teunissen
Schematic of R2R solution processed OLED (ITO free)
< 12
© Holst Centre
2. Large area coating (using solution processing)
innoLAE 2015 - Pit Teunissen
• Holst Centre’s Approaches:
Spin coating: simple, no patterning
Ink-jet printing: non-contact, freedom
of design
Homogeneity over large areas needs to be
investigated
Slot-die coating: non-contact, large area blanket coating
R2R slot-die coating line S2S slot-die coater in glove-box
< 13
© Holst Centre
innoLAE 2015 - Pit Teunissen
2. Large area coating (using solution processing)
Intermittent coating stripe coating
• Coating results:
Slot-die coated layers of 100 - 30 nm with
thickness variation of only ± 2 nm
Sequential coating of up to 3 organic layers
on plastic and metal foil proven
• Patterning with slot-die
Post / pre treatment
Laser ablation
Selective wetting/de-wetting
Direct patterning
Intermittent coating
Stripe coating
R2R slot-die coating line
< 14
© Holst Centre
Roll-to-roll multilayer solution coated OLEDs on flexible metal foil
8 cm x 8 cm devices with performance not far from smaller sheet-to-sheet processed OLEDs
Homogeneity 60% @ 1000 cd/m2 mostly limited by transparent electrode conductivity
innoLAE 2015 - Pit Teunissen
© Holst Centre
• Holst Centre multi-coat (2 x slot-die coating) pilot production line
Unique concept where web is never touched on topside essential for Oled production.
Concept makes very efficient use of cleanroom space.
Slot die coating in controlled atmosphere (all coating and drying in
Nitrogen environment if needed).
Closed furnace (class 10 + < 10 ppm O2/H2O)
Possibilities for intermittent slot die (patterning with unique high speed moving slot die).
Class 1000
Class 10 <10 ppm O2
Local Class 100
innoLAE 2015 - Pit Teunissen
2. Large area coating (using solution processing)
< 16
© Holst Centre
Summary: Schematic of R2R solution processed OLED (ITO free)
1. Printing and sintering of silver grids (anode)
3. Shunting cathode OLEDs by IJP
2. Large area coating
4. R2R Barrier
innoLAE 2015 - Pit Teunissen
< 17
© Holst Centre
3. Shunting cathode OLEDs by IJP
innoLAE 2015 - Pit Teunissen
8X8cm OLED with transparent cathode
• OLED Cathode
Conductivity of transparent cathode is limited
Intensity drop of 60% in an 8X8cm OLED
Conductivity can be increased by inkjet printing shunt lines
Intensity drop of 60% Intensity plot
< 18
© Holst Centre
3. Shunting cathode OLEDs by IJP
innoLAE 2015 - Pit Teunissen
• Inkjet printed shunt lines
Necessary due to limited conductivity of transparent cathode
In the example below an Ag np ink was used with ~7% Bulk Ag conductivity at 130°C
Further improvements ongoing using different design
DuPont development ink shows promising results
Ink compatible with device stack
Conductivity of ~20% Bulk Ag at 130°C
8X8cm OLED with transparent cathode and
IJP shunt lines
Intensity drop of 30% Intensity plot
< 19
© Holst Centre
• Movie: R2R Inkjet printing and sintering
Printer: SPG inkjet printer
Print head: Xaar 1001
Print speed: 10 m/min
Sintering module
NIR dryer: 60% power
Photonic sintering:
2 lamps used; 10Hz, 60% intensity
innoLAE 2015 - Pit Teunissen
Movie: R2R Inkjet printing and sintering
3. Shunting cathode OLEDs by IJP
Tool recently upgraded to web-wide
< 20
© Holst Centre
Summary: Schematic of R2R solution processed OLED (ITO free)
1. Printing and sintering of silver grids (anode)
3. Shunting cathode OLEDs by IJP
2. Large area coating
4. R2R Barrier
innoLAE 2015 - Pit Teunissen
< 21
© Holst Centre
4 R2R barrier
• Holst Centre barrier production line
WVTR of the single SiN sampled over 350m length at 60oC and 90%RH for 20 days : Overall WVTR = (5±1)·10-5 g/m2day
In two weeks 2500 m barrier produced
Full barrier stack R2R processed (OCP-SiN-OCP-SiN)
innoLAE 2015 - Pit Teunissen
R2R Barrier production on Holst Centre production line
< 22
© Holst Centre
Conclusion 1. Proven functionality screen printed anode 2. R2R slot die coating used for working OLED devices further work on upscaling and
patterning 3. IJP shunt lines on transparent cathode 4. Holst Centre barrier production line
The research leading to these results has received funding from the European Union Seventh Framework Programme (FP7/2007-2013) under grant agreement no 281027
innoLAE 2015 - Pit Teunissen
< 23
© Holst Centre
Industrial partners from across the value chain
innoLAE 2015 - Pit Teunissen
< 24
Visit us at
www.holstcentre.com