1 Spin-transfer switching and low-field precession in exchange-biased spin valve nano-pillars M. C. Wu, A. Aziz, D. Morecroft, M. G. Blamire Department of Materials Science, University of Cambridge, Pembroke Street, Cambridge, CB2 3QZ, United Kingdom M. C. Hickey, M. Ali, G. Burnell, B.J. Hickey School of Physics and Astronomy, University of Leeds, Leeds, LS2 9JT, United Kingdom Using a three-dimensional focused-ion beam lithography process we have fabricated nanopillar devices which show spin transfer torque switching at zero external magnetic fields. Under a small in-plane external bias field, a field-dependent peak in the differential resistance versus current is observed similar to that reported in asymmetrical nanopillar devices. This is interpreted as evidence for the low-field excitation of spin waves which in our case is attributed to a spin-scattering asymmetry enhanced by the IrMn exchange bias layer coupled to a relatively thin CoFe fixed layer.
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Spin transfer switching and low-field precession in exchange-biased spin valve nanopillars
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Spin-transfer switching and low-field precession in exchange-biased spin valve
nano-pillars
M. C. Wu, A. Aziz, D. Morecroft, M. G. Blamire
Department of Materials Science, University of Cambridge,
Pembroke Street, Cambridge, CB2 3QZ, United Kingdom
M. C. Hickey, M. Ali, G. Burnell, B.J. Hickey
School of Physics and Astronomy, University of Leeds, Leeds, LS2
9JT, United Kingdom
Using a three-dimensional focused-ion beam lithography process we have fabricated
nanopillar devices which show spin transfer torque switching at zero external
magnetic fields. Under a small in-plane external bias field, a field-dependent peak in
the differential resistance versus current is observed similar to that reported in
asymmetrical nanopillar devices. This is interpreted as evidence for the low-field
excitation of spin waves which in our case is attributed to a spin-scattering
asymmetry enhanced by the IrMn exchange bias layer coupled to a relatively thin
CoFe fixed layer.
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In 1996, Slonczewski and Berger predicted that a spin-polarized current, which is caused to flow
perpendicular to plane between a relatively thick ferromagnetic layer through a non-magnetic layer to a
thin free nanomagnetic layer, could transfer spin momentum from the current to the free layer.1,2
Depending on the direction of the spin current flow, the spin transfer effect can either force the free
layer into parallel (P) or antiparallel (AP) alignment compared with the fixed layer when the spin
transfer torque (STT) is strong enough to overcome the coercive field of the free layer. Furthermore,
when an external magnetic field is applied, the effect of spin transfer can be the excitation of spin-wave
precessional modes in the free layer.3-6
There have been numerous studies which demonstrate the basic
principle of STT switching and spin wave excitation.5-15
Until recently, spin-wave excitation required
the application of large fields (~1 T) to destabilise the AP state of the device, but recently zero-field
spin-wave excitation has been reported in devices in which the spin-transfer torque can destabilise both
the parallel and antiparallel alignment of the ferromagnetic layers.16
This Letter reports similar
behavior in devices for which the necessary spin-scattering asymmetry is enhanced by the use of an
exchange bias layer coupled to a thin fixed layer rather than by making the free and fixed layers from
different materials.
STT has been observed in a number of device geometries, which include mechanical point
contacts,3,6,10,11
lithographically-defined point contacts,4 and lithographically-defined nanopillars.
5,7,8,12-
15 The devices reported here have been fabricated by a simple and reliable procedure based on using 3-
D focused ion beam (FIB) milling.17
Since in this process all the metal layers are deposited in a single
ultra high vacuum cycle, excellent interface cleanliness is achieved. The technique provides a very
reliable one stage process for fabricating nano-pillars for investigating the spin transfer torque effects
in magnetic thin films.
Devices have been fabricated using the following steps. Firstly, thin film heterostructures were
deposited onto thermally oxidized Si substrate in an ultrahigh vacuum sputtering system with the base
pressure below ~5×10-8
mbar. The structure of the multilayered thin film is
Ta(5)/Cu(200)/CoFe(3)/Cu(6)/CoFe(6)/IrMn(10)/Cu(200)/Ta(5) (thickness in nm). The magnetic
properties of the deposited thin film were characterized using vibrating sample magnetometery and
showed a significant exchange bias of ~10 mT. Secondly, using conventional photolithography and Ar
ion milling, the multilayer thin film was patterned into a 4 µm wide track with appropriate current and
voltage leads. All further processing was performed using FIB milling on a custom-built 45o wedge
3
holder, firstly to narrow the optically-defined tracks down to 150 nm and then, to achieve the required
current perpendicular to plane (CPP) geometry, lateral slots were milled as shown in Fig. 1(a). A
micrograph of a completed device is shown in Fig. 1(b).
Transport measurements were performed using a four terminal ac lock-in technique. The dynamic
resistance (dV/dI) of the nano-pillar was measured using an ac current excitation of 200 µA rms at 77
Hz. A dc bias current was simultaneously applied during the dV/dI measurement, with the positive
(negative) direction corresponding to electron flowing from the fixed (free) to the free (fixed) layer.
The dynamic resistance was measured as a function of the magnetic field and dc bias current, with the
in-plane magnetic field applied along the geometric easy axis (long axis of the rectangle). Fig. 2(a)
shows a magnetoresistance (MR) loop with zero bias current for an exchange biased spin valve nano-
pillar with a size of 150 nm by 200 nm. At low fields, a high resistance state is generally observed, and
a field of ~20 mT is required to align the magnetization of the layers and the resistance is a minimum.
Micromagnetic simulations of this device were performed using the three-dimensional Object