SPIE Photomask BACUS 2008 KAGoldberg @ lbl.gov SEMATECH Berkeley Actinic Inspection Tool 1 Advanced Materials Research Center, AMRC, International SEMATECH Manufacturing Initiative, and ISMI are servicemarks of SEMATECH, Inc. SEMATECH, the SEMATECH logo, Advanced Technology Development Facility, ATDF, and the ATDF logo are registered servicemarks of SEMATECH, Inc. All other servicemarks and trademarks are the property of their respective owners. Benchmarking EUV Mask Inspection Beyond 0.25 NA The SEMATECH Berkeley Actinic Inspection Tool A I T An EUV-wavelength mask inspection microscope
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SPIE Photomask BACUS 2008 KAGoldberg @ lbl.gov SEMATECH Berkeley Actinic Inspection Tool 1 Advanced Materials Research Center, AMRC, International SEMATECH.
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SPIE Photomask BACUS 2008KAGoldberg @ lbl.gov SEMATECH Berkeley Actinic Inspection Tool 1Advanced Materials Research Center, AMRC, International SEMATECH Manufacturing Initiative, and ISMI are servicemarks of SEMATECH, Inc. SEMATECH, the SEMATECH logo, Advanced Technology Development Facility, ATDF, and the ATDF logo are registered servicemarks of SEMATECH, Inc. All other servicemarks and trademarks are the property of their respective owners.
LBNL: Kenneth A. Goldberg,Iacopo Mochi, Patrick Naulleau
AMD: Bruno LaFontaine
Samsung: Hakseung Han
SEMATECH: Sungmin Huh
Advanced Materials Research Center, AMRC, International SEMATECH Manufacturing Initiative, and ISMI are servicemarks of SEMATECH, Inc. SEMATECH, the SEMATECH logo, Advanced Technology Development Facility, ATDF, and the ATDF logo are registered servicemarks of SEMATECH, Inc. All other servicemarks and trademarks are the property of their respective owners.
• 1:1 lines intensity-threshold reference.• 10 regions per image through-focus.• LW based on best-focus images.
• through-focus 10x per location.• 10 regions per image.• best focus = highest contrast.• Assume 1:1 lines, calculate a global “best threshold” value. Statistics.
• System stabilityMask lateral shift during z motionaffects illumination and aberrationsImproved Z actuator, -scan method
• Zoneplate and illumination alignmentHow stable and repeatable can we make it?What sorts of feedback are available to correct it?Characterizing aberrations, refining alignment