Process log Status of working Monitor data during EP & Rinsing process Comparison of EP2 iod : 2011/4/19 ~ 4/21 cess : EP1(100μm, 50mA/cm 2 ), Normal 1 st Water Rinsing [90min], Degreasing (FM-20, 2%) [30min], HPR [6 hours] paration :Attachment to jigs kers : M. Sawabe, Kirk, M. Satoh (KEK), K. Nakamura, N. Tasaki, F. Tsukada (Assist Engineering Co. T. Okada (K-VAC), M. Asano, S. Imada, T. Yanagimachi (Nihon Advanced Technol Kirk 1 STF Cavity Group Meeting @2011/4/25 MHI#14 号号号 号号号 2 EP1
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Process log Status of working Monitor data during EP & Rinsing process Comparison of EP2
MHI#14 号機の2回目の EP1. Period : 2011/4/19 ~ 4/21 Process : EP1(100 μ m, 50mA/cm 2 ), Normal 1 st Water Rinsing [90min], Degreasing (FM-20, 2%) [30min], HPR [6 hours] Preparation :Attachment to jigs Workers : M. Sawabe, Kirk, M. Satoh (KEK), - PowerPoint PPT Presentation
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Process log Status of working Monitor data during EP & Rinsing process Comparison of EP2
Period : 2011/4/19 ~ 4/21Process : EP1(100μm, 50mA/cm2), Normal 1st Water Rinsing [90min],
Degreasing (FM-20, 2%) [30min], HPR [6 hours]Preparation :Attachment to jigsWorkers : M. Sawabe, Kirk, M. Satoh (KEK),
K. Nakamura, N. Tasaki, F. Tsukada (Assist Engineering Co.),T. Okada (K-VAC),M. Asano, S. Imada, T. Yanagimachi (Nihon Advanced Technology)
Kirk1STF Cavity Group Meeting
@2011/4/25
MHI#14号機の2回目のEP1
• EP acid (4/20の EP1後のサンプルを使用 )• Nb ingredient : 9.6g/ℓ• HF ingredient : ? g/ℓ (全体 ?g/ℓの 65%が反応に使われる )• Al ingredient : 18mg/ℓ• Current density : ~ 50mA/cm2 (EP1の時は通常の電流密度で行う )
• Cavity surface temperature : <40℃• Control Voltage : 温度と電流密度を見ながら制御• With normal N2 gas flow during extracting EP acid (8ℓ/min)
• 1st water rinsing (1.5hour)• 10min (storing)/3min (flushing)で行う
4/19 9:00 MHI#14 is moved to EP area10:00 Check every flange [O.K.] (polishing HOM at input side)10:05 Attachment of jigs for EP10:30 HPR starts without cavity11:00 Meeting for tomorrow’s working procedure11:20 Set cavity to EP bed with crane11:25 Installation of cathode bar to cavity11:40 Set data logger to cavity (totally 12ch)
Leak check with N2 gas [O.K.]13:15 fin.
STF Cavity Group Meeting @2011/4/25
4/20 8:35 Cavity rotation starts / EP acid flow starts 8:59 EP1 starts10:38 Alarm occurred due to low acid level in reservoir! @36.6μm
Stop current flow and acid flowIt was not recover even after pushing “Reset” button many timesCheck acid level meter in reservoir (dangerous working!)
11:02 EP acid flow restarts11:04 EP1 restarts (Set 65μm)13:58 EP1 stops [5h00m] / Idling rotation (3 rpm / 20min) / Plastic case detachment14:16 Idling rotation stops14:18 EP acid is removed from cavity with N2 gas flow(0.020MPa)14:32 First rinsing with ultra pure water starts16:02 First rinsing with ultra pure water stops [1h30m]16:11 Detachment of restriction jigs / Data logger detached16:25 Un-installation of cathode bar from cavity / washing cathode bar (No black mark)16:35 transferring cavity from EP bed to wagon16:58 Detachment of jigs for EP / Detaching every blind flange of teflon
/ Checking inside cavity (No mark) / Checking teflon surface (No mark)17:06 Shower rinsing @CP area17:15 Attachment of flanges for degreasing17:20 Supplying degreaser into cavity17:27 Degreasing with ultrasonic starts17:57 Degreasing with ultrasonic stops [30min]
Process log ②
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STF Cavity Group Meeting @2011/4/25
4/20 18:00 Detachment of flanges for degreasing18:15 Shower rinsing @CP area18:25 Transferring cavity from wagon on turntable for HPR using crane18:38 Checking tolerance between position of nozzle and center of beam pipe18:40 1st HPR for inside cavity starts19:08 1st HPR for inside cavity stops [0h28]19:10 fin