Planar Transmission Line Planar Transmission Line Technologies Technologies CMB Polarization Technology Workshop NIST/Boulder Edward J. Wollack Observational Cosmology Laboratory Observational Cosmology Laboratory NASA Goddard Space Flight Center NASA Goddard Space Flight Center Greenbelt, Maryland Greenbelt, Maryland
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Planar Transmission Line Technologiescmbpol.uchicago.edu/workshops/technology2008/depot/... · 2008. 9. 21. · Source: R. K Hoffman, “Handbook of Microwave Integrated Circuits,”
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Planar Transmission Line Planar Transmission Line TechnologiesTechnologies
CMB Polarization Technology WorkshopNIST/Boulder
Edward J. Wollack Observational Cosmology LaboratoryObservational Cosmology Laboratory
NASA Goddard Space Flight CenterNASA Goddard Space Flight CenterGreenbelt, MarylandGreenbelt, Maryland
OverviewOverview
Selected Planar Transmission Line TopologiesSelected Planar Transmission Line TopologiesPlanar Transmission Line ApplicationsPlanar Transmission Line ApplicationsExample: Planar Microwave Filters Example: Planar Microwave Filters Component RepeatabilityComponent RepeatabilitySystem Level ConsiderationsSystem Level ConsiderationsTechnical Readiness Level (TRL) Technical Readiness Level (TRL) Future Development MilestonesFuture Development Milestones
Methods to control spurious response and radiationMethods to control spurious response and radiationExtending fundamental propagation mode bandwidth: Extending fundamental propagation mode bandwidth:
Figure 2. Top left: The lumped element model for a 3rd order LC bandpass filter [3,4]. Lower left: The layout for the corresponding SONNET model. Right: The transmittance for the lumped-element model (solid) and the full wave SONNET calculation (dashed).
Figure 1. Upper left: The layout of a resonant stepped impedance filter (GSFC/GATech [2]); Lower left: A lumped element filter with CPW inductors (JPL, [4]); Right: A triplexer (3-element filter bank) connected to a broad band antenna (UC Berkeley, [1]).
Figure 3. FTS Spectra for integrated antenna+filters, from the Berkeley group (Left), and the JPL group (Right). Devices for 90 and 150GHz bands are shown. All spectra are normalized individually. The red curve in the right panel indicates atmospheric transmission at ballooning altitudes.
References:
[1] O’Brient, R. et al., v151, p459, JLTP 2008
[2] U-yen K. et al., v54, i3, p1237, IEEE MTT, 2006.
[3] Goldin, A. et al., v4855, p163, proc. SPIE, 2003
U-Yen, K. and Wollack, E.J., “Compact Planar Microwave Blocking Filter”, 2008, 38th European Microwave Conference, Amsterdam, Netherlands, accepted.
Process RepeatabilityProcess Repeatability
Process Variations:Process Variations:Component GeometriesComponent Geometries
Conductor Thickness and SlopeConductor Thickness and SlopeSubstrate Thickness and EtchSubstrate Thickness and EtchPackaging Effects and VariationsPackaging Effects and Variations
High Material UniformityHigh Material Uniformity……Low Dimensional VariabilityLow Dimensional Variability……
Modeling and Design:Modeling and Design:Circuit Parameter SensitivityCircuit Parameter Sensitivity……Material Parameter KnowledgeMaterial Parameter Knowledge……
Slope
Conductor Thickness
Substrate Over-etch
SEM image of a co-planar waveguide structure
Return loss
Transmission
εr=9.6
εr=7.9
System Level ConsiderationsSystem Level ConsiderationsAdvantages:Advantages:
Compatible with integration on a Compatible with integration on a detector chipdetector chipCan achieve high optical coupling Can achieve high optical coupling efficiencyefficiencyCompact size Compact size Can lead to parts with high Can lead to parts with high repeatability, yield and low process repeatability, yield and low process variation.variation.Does not link frequency and Does not link frequency and angular band definition angular band definition requirementsrequirementsTransmission line thermal Transmission line thermal requirements subdominant to requirements subdominant to detector requirementsdetector requirementsTransmission line loss above gap Transmission line loss above gap frequency limits out of band power frequency limits out of band power Synthesis, modeling, and Synthesis, modeling, and simulation design tools at relatively simulation design tools at relatively mature levelsmature levels
DisadvantagesDisadvantages::Geometries and materials can Geometries and materials can require tighter and greater control require tighter and greater control over process tolerances (relative to over process tolerances (relative to their quasitheir quasi--optical counterparts) to optical counterparts) to insure desired operational insure desired operational performance performance Care must be taken in the overall Care must be taken in the overall design not to allow supporting design not to allow supporting circuitry to drive sensor fabrication circuitry to drive sensor fabrication and test complexity/riskand test complexity/riskEach singleEach single--mode transmission mode transmission line channel experiences an line channel experiences an independent filter which must be independent filter which must be characterized in flightcharacterized in flightPolarimeter implementations Polarimeter implementations which use different filters to form which use different filters to form StokesStokes--Q need wellQ need well--matched matched response to minimize relative response to minimize relative calibration and foreground errorscalibration and foreground errorsCryogenic array characterization Cryogenic array characterization and screening capabilities presently and screening capabilities presently at relatively low level of maturityat relatively low level of maturity
Prototype variants on the required passive circuit elements to Prototype variants on the required passive circuit elements to support CMB polarization science requirements have or will reachsupport CMB polarization science requirements have or will reachTRL ~ 5 under the on going funding cycle. Examples include:TRL ~ 5 under the on going funding cycle. Examples include:
BandBand--Pass FiltersPass FiltersBolometer to Antenna Thermal Breaks Bolometer to Antenna Thermal Breaks Superconducting Transmission LinesSuperconducting Transmission LinesNormal Metal Absorber Structures and TerminationsNormal Metal Absorber Structures and TerminationsPower CombinersPower CombinersThermal Blocking Filters / Bias ChokesThermal Blocking Filters / Bias ChokesOtherOther……
Continued support in this area will be required to produce high Continued support in this area will be required to produce high optical efficiency sensors and field representative devices in foptical efficiency sensors and field representative devices in fully ully integrated systems. integrated systems. Further design and fabrication iterations will also be required Further design and fabrication iterations will also be required to to validate large numbers fully testable structures with acceptablevalidate large numbers fully testable structures with acceptablelevels of yield and reliability for levels of yield and reliability for spacebornespaceborne applications.... applications....
Future Development MilestonesFuture Development Milestones
So are we ready? Is what we have built what we want?So are we ready? Is what we have built what we want?Production of highest efficiency pixels possible is the key to Production of highest efficiency pixels possible is the key to controlling instrument cost and mission riskcontrolling instrument cost and mission risk within allocated within allocated resources (e.g., design focal plane area, cooling power, resources (e.g., design focal plane area, cooling power, massmass……))Demonstrated filter efficiencies for example are arguably an Demonstrated filter efficiencies for example are arguably an excellent start, however, from a systems perspective one excellent start, however, from a systems perspective one might inquiremight inquire……
Where did the remaining power go?Where did the remaining power go?What is a reasonable target for the filter performance?What is a reasonable target for the filter performance?Given an acceptable target Given an acceptable target –– what design margins are required to what design margins are required to realistically meet the desired instrument sensitivity with this realistically meet the desired instrument sensitivity with this approach?approach?
Planar Circuits: Loss MechanismsPlanar Circuits: Loss Mechanisms
Material Selection and Fabrication:• Material parameters : εr μr σ• Physical Dimensions and Tolerances• Realizable Topologies
• Number of layers• Apertures, Air Bridges, Vias, etc.• Dimensional Tolerances
Material Selection and Fabrication:Material Selection and Fabrication:• Material parameters : εr μr σ• Physical Dimensions and Tolerances• Realizable Topologies
• Number of layers• Apertures, Air Bridges, Vias, etc.• Dimensional Tolerances
Design and Synthesis:• Extract Circuit Elements
• Impedance Contrast• Propagation Constant
• Transmission Line Model• Full-wave Analysis
Design and Synthesis:Design and Synthesis:• Extract Circuit Elements
• Impedance Contrast• Propagation Constant
• Transmission Line Model• Full-wave Analysis
Circuit Validation:• Compare Models with
Observation• Reliability/Life Testing
Circuit Validation:Circuit Validation:• Compare Models with