PHYSICAL VAPOR DEPOSITION and ION BEAM MILLING
PHYSICAL VAPOR DEPOSITION and ION BEAM MILLING
NANOQUEST I
Up to 22cm D.C. or R.F. Ion Source
Load-lock accommodates up to 4” wafers Retractable SIMS
End-point Detector
SiO2 Passivation by R.F. Sputtering
D.C., A.C., or R.F. Magnetron Sputtering
4cm R.F. Ion Source for IBS with Target Indexer
Direct Water-cooled Stage
Fully customizable, compact platform for ion beam processes
NANOQUEST ION BEAM ETCH
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OPTIONS INCLUDE:• Ion Beam Sputtering• Magnetron Sputtering• In-situ Camera• S.I.M.S. End-point Detection• Load-lock accommodates up to 8” wafers
FEATURES• 22 or 36 cm RF ICP
Ion Source• Up to 3×6”
Planetary• S.I.M.S. End-point
Detection• Load-lock up to 8”
wafers
NANOQUEST II
NANOQUEST III
Ion Beam Etch platform for wafers up to 8”
Multi-substrate ion milling system with next-gen RF ICP ion source.
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NANOCHROME™ I
NANOCHROME™ II
Thin Film Deposition System
Thin Film Deposition System
PROCESS• Ion Beam Assisted Deposition• e-Beam Evaporation• Thermal Evaporation• Magnetron Sputtering• Co-Evaporation• Reactive growth
FEATURES• Ion source for Assist,
Reactive Operation and Pre-cleaning
• IR lamps for substrate pre-heating• Customized substrate holder• Load-lock option
NANOCHROME™ PHYSICAL VAPOR
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NANOCHROME™ IV PARMS Advanced Plasma Deposition
The New Nanochrome™ IV (PARMS) produces dielectric thin film layers by advanced plasma deposition. The new Nanochrome™ IV (PARMS) is designed to produce high quality oxide and nitride films. Shift-free, hard coatings are used to produce complex interference filters. Our ultra-stable deposition process with optical monitoring through the substrate has been proven in daily production environments.
Oxides that have been produced in the NC-IV, from metal targets, include Tantalum, Niobium, Titanium, Aluminum, Zirconium and Silicon. The films are suitable for the
UV, VIS NIR, SWIR, and MWIR ranges. It can also produce transparent conductive AZO.
The Intlvac PARMS is a cost effective alternative to Ion Beam Sputtering, out-producing IBS on a daily basis.
DEPOSITION
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PICO PVD & ION BEAM ETCH
NANOCHROME™ PICO
NANOQUEST PICO
The low cost and small footprint of the Nanochrome™ Pico make it ideal for working with small substrates that are irregular in shape and difficult to mount.
Designed for variable angle etching with continuous rotation and cooling of small wafer pieces using inert gas. The low cost and small footprint of the NQ Pico make it ideal when working with 1×1” dies or other small substrates, up to 4” wafers.
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This production machine is designed to produce a single or multilayer fully symmetrical metal coating on ends, or mid spans, of optical fibers. Window coating can also be achieved. The system uses a low energy plasma pre-clean to ensure adhesion by removing residual hydrocarbon and water vapour contamination. The coating chamber has an array of sputter cathodes allowing for different metal and multilayer combinations.
NANOCHROME™ I LONG THROW EVAPORATOR
FIBER METALIZATION SYSTEM
The Long Throw Evaporator is designed for “lift off” processes providing a high level of automatically or manually con-trolled deposition of materials.
Applications: • Indium-Bump bonding for fabrication
of focal plane arrays.• Ohmic contacts for III-V and II-VI
materials with diffusion barriers
Optional features:• Double axis planetary motion• Cooling to -70°C• Low energy pre-cleaning in an
automated load lock
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Intlvac Thin Film has a long-standing commitment to quality and excellence in the optical coating industry. Our goal is to deliver value-added solutions that exceed expectations. Research and development play a major role in our technology’s edge in the market.
PROVIDING LEADING-EDGE TECHNOLOGY SOLUTIONS
Intlvac Thin Film600-1401 Duff Drive, Fort Collins, CO USA 80524
800.959.5517 • int lvac.com
PECVD DIAMOND LIKE CARBONSUBSTRATES FOR DLCIR Optics: • Silicon, GermaniumPlastics: • Ultem, Polycarbonate, Polyimide, PEEKGlass: • Crown Glass, UVFS, SF11, SapphireMetals: • Aluminum, Copper, High-carbon Steel.
APPLICATIONSOpticsDLC coating acts as a single-layer anti-reflection coating for high index substrates and it provides wear & chemical resistance for optical elements used in harsh environments.
Bio-engineeringDLC provides advantages of bio-compatibility, wear resistance, and diffusion resistance.
Mechanical EngineeringDLC provides wear & corrosion resistance, low friction, and good thermal conductivity.
11/2016