F. Stephan, DESY, LCLS Injector Commissioning Workshop, Oct. 9th+11th, 2006 1 P I T Z Photo Injector Test Facility Zeuthen RF Gun Experience at PITZ/FLASH Content: • commissioning the RF gun for FLASH at PITZ: - old setup, emittance measurement technique - optimization strategy, results • developing the electron source for the XFEL: - strategy, new setup - conditioning (strategy) • the water system at PITZ part A: overview
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• important parameters: longitudinal and transverse laser shape, launch phase, solenoid focussing, magnetic field on cathode
• longitudinal and transverse laser shape changes required iterative re-adjustment of all laser parameters slow change rate (improvement: now laser parameters are less dependent)
• solenoid and launch are easy changeable high change rate• Need to define unique measurement conditions in order to compare
measurements from different shift crews
• ~300 emittance measurements have been done for the FLASH gun and ~ 420 measurements for the successor gun without booster cavity.
Optimizing strategy
emittance optimization at PITZtemporal laser profileGaussian → Flat-Top
RF gun gradient42MV/m → 45MV/m
laser transverse profile and spot size on the cathodeemittance scan
• to improve emittance from the gun:– increase acc. gradient at cathode (40 60 MV/m)– reduce rise/fall time of laser pulse to ≤ 2 ps, operate with ~20 ps
FWHM (slice emittance of larger part of bunch small enough + measured projected properties closer to slice properties)
• to conserve small emittance to higher beam energy:– install booster cavity and high energy diagnostics– study emittance evolution after booster and do experimental
optimization of injector parameters (laser, gun, magnets, booster)• side constraints:
– test setup should be as close as possible to real setup (FLASH gun charc. @PITZ without booster, now booster position given byFLASH, different laser systems (stability of temporal pulse shaper ↔user operation))
– remaining extrapolation to be done with simulations– supply spare components, test new developments (laser, cathode)– study XFEL upgrade machine parameter space (bunch, rep rate)
• particle free cleaning and baking of vacuum components helps to reduce conditioning time
• large part of total conditioning time often spent at low peak power(multipacting vacuum) and at high average power (time to stabilize cooling water)
• sweeping solenoid current sometimes helps to overcome conditioning threshold (multipacting) and is needed to have fully conditioned cavity cleaning of full cavity
• conditioning just below vacuum interlock threshold is most efficient, setting of vacuum threshold is important parameter for conditioning time and risk for major breakdowns (PITZ gun3: 10^-8 mbar, BESSY gun: 10^-7 mbar)
• quick photomultiplier interlock can limit RF breakdown • to overcome detuning of cavity after interlock at high average power
RF frequency can be tuned to current cavity resonance tuning was done by hand for BESSY gun needs manpower
• automatic conditioning procedures can run at night and during weekends without manpower
Gun3 was conditioned to full FLASH specification:– up to 3.5 MW RF peak power– up to 900 mirco seconds RF pulse length– RF pulse repetition rate of 10 Hz