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PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, COATING, AND THRUST Francis F. Chen, UCLA Low Temperature Plasma Teleseminar, June 14, 2013; originally prepared for (but not given at): 2013 Workshop on Radiofrequency Discharges, La Badine, La Presqu’ile de Giens, France, 29-31 May 2013
41

PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

May 17, 2022

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Page 1: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

PERMANENT-MAGNET

HELICON SOURCES FOR

ETCHING, COATING, AND THRUST

Francis F. Chen, UCLA

Low Temperature Plasma Teleseminar, June 14, 2013; originally prepared for (but not given at):2013 Workshop on Radiofrequency Discharges, La Badine, La Presqu’ile de Giens, France, 29-31 May 2013

Page 2: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Helicons are RF plasmas in a magnetic field

UCLA

Prf % 200 16% 400 21% 600 35% 800 38% 1000 42%

Density increase over ICP

Page 3: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Helicon sources usually use heavy magnets

UCLA

The MØRI source of Plasma Materials Technologies, Inc.

Page 4: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

Size of the MØRI source

Page 5: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

The source has been simplified to this

This uses a commercially available 2 x 4 x 0.5 inch

NeFeB magnet

The discharge is 5 cmhigh and 5 cm in diameter

Page 6: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

How did we get here?

D. Arnush, Phys. Plasmas 7, 3042 (2000).

First, the HELIC code of Arnush

Page 7: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Examples of HELIC results: Pr , Pz

UCLA

0

1000

2000

3000

4000

5000

0.000 0.005 0.010 0.015 0.020 0.025r (m)

P(r)

(a

rb.)

2.5E+114.0E+116.3E+111.0E+12

n (cm-3)

0

1

2

3

4

5

6

0 5 10 15 20 25 30z (cm)

P(z)

1.6E+122.5E+124.0E+126.3E+121.0E+13

13 MHz, 80G

Page 8: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Most important, RnB: power deposition

UCLA

Page 9: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

RnB results organized in matrices

UCLA

100W

300W

500W

D = 7.4" D = 11" D = 13"

Folder Folder Folder

1 mTorr, ei = -1D = 0

Folder

Folder Folder Folder

FolderD13W100 D0W100

Folder

D7W100Folder

D11W100Folder

D0W500

D7W300 D11W300 D13W300 D0W300

D7W500 D11W500 D13W500Folder

conductor

insulator

1 mTorr 10 mTorr

Folder FolderP1cond P10cond

D = 0, 300W

Folder FolderP1ins P10ins

Matrix A: B-field Matrix C: pressure

Similar matrices for tube size determined the tube design.

After that, there are matices for the experimental results.

Page 10: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Optimized discharge tube: 5 x 5 cm

UCLA

1. Diameter: 2 inches

2. Height: 2 inches

3. Aluminum top

4. Material: quartz

5. “Skirt” to prevent eddy currents canceling the antenna current

5.1 cm10 cm

5 cmANTENNA

GAS INLET (optional)

The antenna is a simple loop, 3 turns for 13 MHz, 1 turn for 27 MHz. The antenna must be as close to the exit aperture as possible.

Antenna: 1/8” diam tube, water-cooled

Page 11: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Design of matching circuit (1)

UCLA

N loads

Z2 - short cables

Distributor

12

Z1 - long cable

Matching ckt.(standard)

12

Matching ckt.(alternate)

12

Page 12: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Design of 50 matching circuit (2)

UCLA

Let the load be RL + jXL :

R and X have first to be transformed by cable length

k = R0C, R0 = 50

Page 13: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Forbidden regions of L, R, and Z (N = 8)

UCLA

0

500

1000

1500

2000

0.5 1.5 2.5 3.5 4.5R (ohms)

C (p

F)

C1(S)C2(S)

0

200

400

600

800

1000

1200

1400

1600

0 50 100 150 200Z2 (cm)

C (p

F)

C1(S)C2(S)

0

200

400

600

800

0 0.5 1L (H)

C2

(pF)

86421

N

0

500

1000

1500

2000

0 0.5 1 1.5 2 2.5L (H)

C1

(pF)

86421

N

Page 14: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Instead, we can use annular PMs

UCLA

-16

-14

-12

-10

-8

-6

-4

-2

0

2

4

6

8

-10 -8 -6 -4 -2 0 2 4 6 8 10

NdFeB ring magnet3” ID, 5” OD, 1” high

Stagnation point

Put plasma here

or here, to adjust B-field

The far-field is fairly uniform

PM Permanent magnet

Page 15: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Experimental chamber

UCLA

Gate Valve

To Turbo Pump

PUMP BAFFLE AND GROUND PLANE

WALL MAGNETS

Port 1

Port 3

Port 2

38

46

6.8

16.9

27.2

19 cm

Langmuir probes at three ports

The magnet height is set for optimum B-field

Page 16: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

Optimization of the B-field

Peak density in Port 2 vs. B and Prf @ 27 MHz

30-60 G is best

Page 17: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

Typical scan of “Low-field peak”

Page 18: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

Density of ejected plasma

0

1

2

3

4

5

-25 -20 -15 -10 -5 0 5 10 15 20 25r (cm)

n (1

011

/cm

3 )

n11, 65Gn11, 280G

0.0

0.5

1.0

1.5

2.0

2.5

3.0

3.5

4.0

4.5

-20 -10 0 10 20r (cm)

n (1

011

cm

-3)

6.816.927.2

62 G, 400Wcm below source

Gate Valve

To Turbo Pump

PUMP BAFFLE AND GROUND PLANE

WALL MAGNETS

Port 1

Port 3

Port 2

38

46

6.8

16.9

27.2

19 cm

Page 19: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Vertical probe for inside plasma

UCLA

PERMANENT MAGNET

GAS FEED

HEIGHT ADJUSTMENT

LANGMUIR PROBE

Page 20: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

0

2

4

6

8

10

12

14

16

0 2 4 6 8 10 12z (cm)

n 11

Jan. 4 w. Mk2Jan. 5 w. ESPion

Bottom of tube

400W, 62G

Horiz. Probe point

0

4

8

12

16

0 2 4 6 8 10 12z (cm)

n 11

400W, 13.56 MHz, 15 mTorr

Axial density profile inside the tube

Density inside the tube is low (<1013 cm-3) because plasma is efficiently ejected.

Page 21: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

Downstream density: 6 x 1011 cm-3

0

1

2

3

4

5

6

7

0 200 400 600 800 1000 1200Prf (W)

n (1

011 c

m-3

)

HeliconICP

15 mTorrPort 2

Prf % 200 16% 400 21% 600 35% 800 38% 1000 42%

Density increaseover ICP

Page 22: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

Port 2 density is higher at 13 MHz

0

1

2

3

4

5

6

7

8

9

0 200 400 600 800 1000 1200Prf (W)

n (1

011 c

m-3

) 13 MHz

27 MHz

Port 2

This was a surprise and is contrary to theory.

Page 23: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Cause and location of the “double layer”

1/20½ , /s sn n e

1/2 2( / ) ½ ½is s e is is ev c KT M W Mv KT

20 0 0/ / ( / )B B n n r r

F.F. Chen, Phys. Plasmas 13, 034502 (2006)

n

xs x

ne = ni = n

PLASMA

SHEATH

ni

ne

+

ns

PRESHEATH

v = cs

0 , where e /e en n e V KT Maxwellian electrons

Bohm sheath criterion

1/40/ 1.28r r e

A sheath must form here

Single layer forms where r has increased 28%

Page 24: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

Where a diffuse “double layer” would occur

0

50

100

150

200

250

5 10 15 20 25 30z (cm)

B (G

)

Approx. location of "double layer"

Page 25: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Ion energy distribution by Impedans SEMion

UCLA

Page 26: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

IEDFs vs. Prf in Port 1

UCLA

0E+00

5E-07

1E-06

2E-06

2E-06

0 5 10 15 20 25 30V

IED

F

600W500W400W400W repeat300W200W100W

Vs

Page 27: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Conditions at Port 1 (r = 0) at 400W

UCLA

0

1

2

3

4

5

6

-20 -10 0 10 20r (cm)

n (1

011 c

m-3

)

Port 1400W

Te (eV)

n11

0

1

2

3

4

5

6

7

-100 -80 -60 -40 -20 0 20V

I2 (mA

)2

Ii squaredIi squared (OML)

0.01

0.1

1

10

100

-5 0 5 10 15 20V

I e (m

A)

IeIe(fit)Ie (0)

Te eVs iVs n11

2.14 15.9 27 4.21

Plasma potential

Page 28: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Mach probe (in Port 2)

UCLA

1 ln 0.75ln

( 1.34)

flow up up

s down down

v I Ic K I IK

Hutchinson:

Result:

0.14f

s

vc

0 .1 4f

s

vc

This seems very low. It should be much higher in Port 1

Page 29: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

HELICON ARRAY SOURCES

SUBSTRATE

TO PUMP

DISTRIBUTOR

MEDUSA MEDUSA 1

Page 30: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

The Medusa 2 large-area array

UCLA

Page 31: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

An array source for roll-to-roll processing

UCLA

Probe ports

Aluminum sheetHeight can be adjusted electrically if desired

The source requires only 6” of vertical space above the process chamber. Two of 8 tubes are shown.

Z1Z2

Page 32: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

65"

21"

7"

7"

7"

7"29"

3.5"

12"7"

3/4” aluminum

Endplates: gas feed and probe port at each end.

Tubes set in deeply (½ inch)

1/2" aluminum

Top view of Medusa 2

Possible positions shown for 8 tubes.

Substrate motion

Page 33: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Two arrangements of the array

Staggered array

Covers large area uniformly for substrates moving in the y-direction

165 cm

53.3 cm

17.8

17.8

17.8

35.6 cm

x

y

165 cm

53.3 cm

17.8

17.8

17.8

x

yTop view 17.8 Compact array

Gives higher density, but uniformity suffers from

end effects.

Page 34: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Operation with cables and wooden magnet tray

It’s best to have at least 3200W (400W per tube) to get all tubes lit equally.

Page 35: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Details of distributor and discharge tube

UCLA

The top gas feed did not improve operation.

Page 36: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

A rectangular 50 transmission line

50- line with ¼” diam Cu pipe for cooled center conductor

Page 37: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Operation with rectangular transmission line

Page 38: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Radial profile at Z2 across rows

0

0.5

1

1.5

2

2.5

3

3.5

-25 -20 -15 -10 -5 0 5 10 15 20 25r (cm)

n (1

011 c

m-3

) nKTe

Page 39: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Density profiles with staggered array

Staggered configuration, 2kW

Bottom probe array

0

1

2

3

4

5

-8 -6 -4 -2 0 2 4 6 8 10 12 14 16x (in.)

n (1

011 c

m-3

)

-3.503.5

Staggered, 2kW, D=7", 20mTorr

y (in.)

Argon

Page 40: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

UCLA

Density profiles with compact array

Compact configuration, 3kW

Bottom probe array

0

2

4

6

8

10

-8 -6 -4 -2 0 2 4 6 8 10 12 14 16x (in.)

n (1

011 c

m-3

)

3.5-03.5

Compact, 3kW, D=7", 20mTorr

y (in)

Data by Humberto Torreblanca, Ph.D. thesis, UCLA, 2008.

Page 41: PERMANENT-MAGNET HELICON SOURCES FOR ETCHING, …

Plans for an 8-tube array for round substrates

UCLA

Distributor

No center tube is necessary!