MAHALAKSHMI ENGINEERING COLLEGE TIRUCHIRAPALLI - 621213 DEPARTMENT : ECE SUBJECT NAME : OPTICAL COMMUNICATION & NETWORKS SUBJECT CODE : EC 2402 UNIT – III: SOURCES AND DETECTORS PART -A (2 Marks) 1. What are the three requirements of Laser action? 1. Absorption 2. Spontaneous emission 3. stimulated emission. 2. What are the three types of Laser diode structures? 1. Gain indexed guide 2. Positive indexed guide 3. Negative indexed guide 3. What are the fundamental structures of Index guided lasers? 1. buried hetero structure. 2. Selectively diffused construction 3. Varying thickness structure 4. Bent layer configuration. 4. What is the difference between LED and LASER diode? [AUC NOV 2013] LED LASER Incoherent Coherent No optical resonant cavity Optical energy from optical resonant cavity Output radiation has broad spectral width Highly monochromatic No spatial and temporal coherence Spatial and temporal coherence 5. What is the significance of intrinsic layer in PIN diodes? [AUC NOV 2012] • PIN photo detector structure consists of P and N regions separated by a very lightly n-doped intrinsic region. When the photodiode is reverse biased, the intrinsic region of diode is fully depleted of carriers. 6. what are the advantages of LED? [AUC MAY 2012] • Simpler fabrication • Low cost • Reliability • Generally less temperature dependence • Linearity • Simpler drive circuitry EC 2402 OPTICAL COMMUNICATION & NETWORKS – IV/VII - V.SENTHAMIZH SELVAN ASST. PROF/ECE
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MAHALAKSHMI ENGINEERING COLLEGE TIRUCHIRAPALLI - 621213
DEPARTMENT : ECE SUBJECT NAME : OPTICAL COMMUNICATION & NETWORKS SUBJECT CODE : EC 2402 UNIT – III: SOURCES AND DETECTORS
PART -A (2 Marks)
1. What are the three requirements of Laser action? 1. Absorption 2. Spontaneous emission
3. stimulated emission.
2. What are the three types of Laser diode structures? 1. Gain indexed guide 2. Positive indexed guide 3. Negative indexed guide
3. What are the fundamental structures of Index guided lasers? 1. buried hetero structure. 2. Selectively diffused construction 3. Varying thickness structure 4. Bent layer configuration.
4. What is the difference between LED and LASER diode? [AUC NOV 2013] LED LASER Incoherent Coherent No optical resonant cavity Optical energy from optical resonant
cavity Output radiation has broad spectral width
Highly monochromatic
No spatial and temporal coherence Spatial and temporal coherence 5. What is the significance of intrinsic layer in PIN diodes? [AUC NOV 2012]
• PIN photo detector structure consists of P and N regions separated by a very lightly n-doped intrinsic region. When the photodiode is reverse biased, the intrinsic region of diode is fully depleted of carriers.
6. what are the advantages of LED? [AUC MAY 2012] • Simpler fabrication • Low cost • Reliability • Generally less temperature dependence • Linearity • Simpler drive circuitry
7. what are the characteristics that a semiconductor laser diode should possess? [AUC NOV 2011]
• For fiber optical systems, semiconductor laser diodes are used as an
optical source. Because its output radiation is highly monochromatic and the light beam is very directional.
8. What are the properties of photo detector? [AUC NOV 2007]
• High response or sensitivity
• Minimum addition of noise
• Fast response speed
• Long operating life
• Reasonable cost
9. What is avalanche multiplication noise? [AUC NOV 2008]
The shot noise and bulk dark current noise in a photo detector are multiplied by avalanche gain mechanism. These multiplied noise are referred to avalanche multiplication noise.
10. What is dark current noise? [AUC April 2004,MAY2010]
• The dark current noise arises from electrons or holes which are thermally generated in the PN junction of the photo diode. This current continues to flow through the bias circuit of the device when no light is incident on the photodiode.
11. Define detector response time? [AUC MAY2013]
The response time of a photodiode together with its output circuit depends on following three factors.
• Transit time of a photo-carriers in the depletion region • The diffusion current of the photo-carriers generated outside the depletion
region. • The RC time constant of a photo diode and its associated circuit.
12. What are the merits of index guided lasers? [AUC MAY 2010]
• Index guided laser supporting only fundamental transverse mode and longitudinal mode is known as single mode laser. Such a device emits a single well collimated beam of light having bell shaped Gaussian intensity profile.
13. Define longitudinal modes. [AUC NOV 20O9]
• Longitudinal modes are associated with the length of the cavity and determine the typical spectrum of the emitted radiation.
14. Define lateral modes. [AUC NOV 2010] • These modes lie in the plane of the pn junction. They depend on the
sidewall preparation and the width of the cavity. • It determines the shape of the lateral profile of the laser beam.
1. Draw the schematic diagram of high radiance surface emitting LED and explain the working in detail? [AUC NOV 2011] Ans: High radiance is obtained by restricting the emission to a small active region within the
device. A well is etched in a substrate (GA As) to avoid the heavy absorption of the emitter
radiation and to accommodate the fiber. These structures have a low thermal impedance in the
active region and hence radiance emission into the fiber. Double hetero structures are used to
get increased efficiency and less optical absorption. The structure of a high radiance etched well
DH (Double Hetero structure) surface emitter which is also known as burros type LED is as
shown in figure (4.5).
This structure emits light in band of 0.8 to 0.9 um wavelength. The plane of the active light
emitting region is made perpendicular to the fiber axis. The fiber is cemented in a well matched
through the substrate of the fiber so that maximum emitted light is coupled to the fiber. Due to
large band gap conjoining area, the internal absorption is less and the reflection coefficient at
the back crystal face is high, hence forward radiance is good. The active area in circle is of
50μm in diameter and up to 2.5μm thick. The emission from this active area is isotropic with
120° half power beam width is used for practical purpose. Isotropic pattern from a surface
emitter is lambert Ian pattern.
The source is equally bright when viewed from any direction but power diminishes as cosΦ
where $ is the angle between viewing direction and to the normal to the surface. Power is down
to 50%, when Φ = 60°, so that the total half power beam width is 120°. The power coupled into a
multimode step index fiber may be estimated from the relationship.
PC =П(1-r)ARD (NA)2 ..(1)
Where, PC = Power coupled into fiber
r = Fresnel reflection coefficient
A = Emission area of source
RD = Radiance of the source
NA = Numerical aperture
Power coupled into the fiber depends on
(i) Distance and alignment between emission area and the fiber.
(ii) Medium between the emitting area and the fiber.
(iii) Emission pattern of SLED
Addition of Epoxy resin in the etched well reduces the refractive index mismatch and increases
the external power efficiency of the device. Hence the power coupled in the double hetero
structure surface emitters are more than Pc(optical power) that is given by equation (1), For
graded index fiber-direct coupling requires the source diameter of about one half the fiber core
diameter.
2. Draw the schematic of edge emitting double hetero junction LED and explain its working in detail? [AUC MAY 2012] Ans: Double Hetero junction Laser If a single p-n junction diode is fabricated from suitable single crystal semiconductor material it
exhibits photo emissive properties. It is known as 'homo junction' p-n diode. However the
emissive properties of a junction diode can be improved considerably by the use of 'hetero
junction'. A hetero junction is an interface between two adjoining crystal semiconductors having
different values of band gap energies. Devices are fabricated with hetero junction are said to
have hetero structures.
They are of two types,
(i) Isotopes such as n-n or p-p type
(ii) Anisotope such as p-n type.
The isotope p-p junction has a potential barrier within the structure. The structure is capable of
confining min carriers to small active region called cavity. It effectively reduces the diffusion
3. Obtain the expression for the 3dB modulation bandwidth of LED and discuss the importance of radiative recombination life time? [AUC NOV 2010] Ans: The expression for the 3 dB modulation bandwidth of LED in optical communication may
be obtained in either electrical and optical terms.If we consider the associated electrical circuitry
in an optical fiber communication system to use the electrical definition, where the electrical
signal power has dropped to half of its constant value due to the modulated portion of the optical
signal. Hence, this corresponds to the electrical 3 dB frequency at which the output electrical
power is reduced by 3 dB with respect to the input electrical power. We can also consider the
high frequency 3 dB point, when the optical source operates down to D.C. The expression for
the electrical bandwidth can be obtained from the ratio of the electrical output power to the
electrical input power in decibels and is given as
4. Discuss the major requirements of an optical source for use in optical communication systems? [AUC NOV 2010] Ans: The development of efficient semiconductor optical sources along with low-loss optical
fibers, led to substantial improvements in fiber optic communications. Semiconductor optical
sources have the physical characteristics and performance properties necessary for successful
implementations of fiber optic systems. It is desirable that optical sources must be,
1. Compatible in size to low-loss optical fibers by having a small light emitting which are capable
of launching light into fiber.
2. Launch sufficient optical power into the optical fiber to overcome fiber attenuation and
connection losses allowing for signal detection at the receiver.
3. Emit light at wavelengths that minimize optical fiber loss and dispersion.
4. Optical sources should have a narrow spectral width to minimize dispersion.
5. Allow for direct modulation of optical output power.
Maintain stable operation in changing environmental conditions (such as temperature). Cost less
and be more reliable than electrical devices, permitting fiber optic communication systems to
compete with conventional systems. Semiconductor optical sources suitable for fiber optic
systems range from inexpensive Light Emitting Diodes (LEDs) to more expensive EC 2402 OPTICAL COMMUNICATION & NETWORKS – IV/VII - V.SENTHAMIZH SELVAN ASST. PROF/ECE
semiconductor lasers. Semiconductor LEDs and laser diodes are the principle light sources
used in fiber optics.
Semiconductor sources are designed to operate at wavelengths (i.e., 850 nm, 1300 nm and
1500 nm) that minimize optical fiber absorption and maximum system bandwidth. By designing
an optical source to operate at specific wavelengths, absorption from impurities in the optical
fiber such as hydroxyl ions (OH-) can be minimized. Maximizing system bandwidth involves
designing fibers and sources that minimize chromatic and inter modal dispersion at the intended
operational wavelength.
5. Compare the advantageous and disadvantageous of LED and Explain the key process involved in the LASER operation? [AUC NOV 2013] Ans: 1. Simple Fabrication: There are no mirror facets and is some structures no striped geometry
2. Cost: The simpler construction of LED leas to much reduced cost which is always likely to be
maintained.
3. Reliability The LED does not exhibit catastrophic degradation and has proved to be less sensitive to
gradual degradation than the injection laser.
4. Simpler Drive Circuitry This is due to lower drive currents and reduced temperature dependence which makes
temperature compensation circuits unnecessary.
5. Linearity Ideally, the LED has a linear light output against current characteristics unlike the injection laser.
Disadvantage An LED radiates rather dispersed light, which makes coupling this light into an optical fiber a
problem.
The key processes involved in laser action are as given below.
6. Explain the structure and operation of injection laser diode. [AUC NOV 2011] INJECTION LASER DIODE: Stimulated emission by the recombination of the injected carriers is encouraged in the
semiconductor injection laser by the provision of an optical cavity in the crystal structure in order
to provide feedback of photons. The injection laser has many advantages over other
semiconductor sources. They are
i) High radiance due to amplifying effect of stimulated emission.
ii) Narrow line width of the order of 1nm or less.
iii) Modulation capability in the range of gigahertz.
iv) Relative temporal coherence which allows heterodyne detection.
v) Good spatial coherence, which allows the output to be focused by a lens into a spot
which has greater intensity than the dispersed unfocussed emission.
Early injection lasers had the form of Fabry Perot cavity often fabricated in gallium arsenide.
The basic structure of this homojunction device is shown below.
Fig: Schematic diagram of a GaAs homojunction injection laser with a Fabry Perot cavity. If a PN junction is formed by a single crystal semiconductor material, it is said to be
homojunction laser diode. Generally the homojunction lasers are not used in the
communication applications due to their higher divergence and high threshold current. Further
they produce high dispersion and have low optical confinement.
A heterojunction is an interface between two adjoining single crystal semiconductor
with different band gap energies. Improved carrier confinement and lower threshold current
densities were achieved using heterojunction structures.
For high injection current (e.g. I= 5 Ith ) then ηT ≈ηD, where as for lower currents, I= 2 Ith the total
efficiency is lower and around 15- 25 %.
The external power efficiency of the device ηep in converting electrical input to optical output is
given by
Where P = IV is the dc electrical input power.
Using eqn 6.29 for the total efficiency, we find
7. Explain single mode laser structure. [AUC MAY 2009] Single mode laser structures: i) Buried Heterostructure (BH) Laser: The BH laser is obtained by etching a narrow metal stripe in DH semiconductor
material and effectively burying it in high resistivity, lattice matched n type material with an
appropriate bandgap and low refractive index. This rocess involves growth of double liquid
phase eitaxial (LPE) to give the structure as shown below.
Fig: schematic representation of the structure of GaAs/ Al Ga As buried heterostructure laser
9. Explain detail about PIN photo detector. [AUC MAY 2008] PIN PHOTODETECTOR: The most common semiconductor photo detector is the pin photodiode shown below
Fig: pin photodiode with applied reverse bias
The device structure consists of p and n region separated by a very lightly n doped
intrinsic (i) region. In normal operation a sufficiently large reverse bias voltage is applied across
the device so that the intrinsic region is fully depleted of carriers. That is, the intrinsic n and p
carrier concentrations are negligibly small in comparison with the impurity concentration in this
region.
When an incident photon has an energy greater than or equal to the bandgap energy of
the semiconductor material, the photon can give up its energy and excite an electron from the
valence band to the conduction band. This process generates free electron from the valence
band to the conduction band. This process generates free electron hole pairs which are known
as photocarriers, since they are photon generated carriers as shown below.
Here Ip is the average photocurrent generated by a steady state average optical power P0
incident on the photodetector. The performance of a photodiode is often characterized by the
responsivity R. this is related to the quantum efficiency by
The responsivity falls off rapidly beyond the cutoff wavelength which is shown in following figure.
Fig: comparison of responsivity and quantum efficiency as a function of wavelength for
pin photodiode. 10. Explain detail about Avalanche photo diode. [AUC NOV 2008] AVALANCHE PHOTODIODES: Avalanche photodiodes (APDs) internally multiply the primary signal photocurrent before
it enters the input circuitry of the following amplifier. This increases receiver sensitivity, since the
photocurrent is multiplied before encountering the thermal noise associated with the receiver
circuit.
In order for a carrier multiplication to take place, the photogenerated carriers must
traverse a region where very high electricfield is present. In the high field region a
photogenerated electron or hole can gain enough energy so that it ionizes bound electrons in
the valence band upon colliding with them. This carrier multiplication mechanism is known as
impact ionization. The newly created carriers are also accelerated in the high electric field, thus gaining
enough energy to cause further impact ionization. This phenomenon is the avalanche effect.
A commonly used structure for achieving carrier multiplication with very little excess noise is the
reach through construction shown in the below figure.
Fig: Reach through avalanche photodiode structure
The reach through avalanche photodiode (RAPD) is composed of a high resistivity p type
material deposited as an epitaxial layer on a p+ substrate. A p-type diffusion or ion implant is
then made in the high resistivity material followed by the construction of an n+ layer. This
configuration is referred to as p+ πpn+ reach through structure. The π layer is basically an
intrinsic material that inadvertently has some p doping because of imperfect purification.
The term ‘reach through’ arises from the photodiode operation. When low reverse bias
voltage is applied most of the potential drop is across the pn junction. The depletion layer
widens with increasing bias until a certain voltage is reached at which peak electric field at the
pn junction about 5 to 10 percent below that is needed to cause avalanche breakdown. At this
point the depletion layer just “reaches through” to the nearly intrinsic π region.
The average number of electron hole pairs created by a carrier per unit distance
travelled is called the ionization rate. Most materials exhibit different electron ionization rates α and hole ionization rates β. experimentally obtained values of α and β for five different
semiconductor material are shown in following figure.