Large Substrate Stylus Profiler Automation & Ease of Use DektakXTL Delivers!
Large Substrate Stylus Profiler Automation & Ease of Use DektakXTL Delivers!
Outline
1/23/2014 2 Bruker Confidential
• Introductions
• Brief overview of stylus profiler function • Introduction of new and enhanced functionality with
DektakXTL
• Overview of a few applications
• Summary
Introductions Bruker Nano Surfaces Division
1/23/2014 3 Bruker Confidential
• Scanning Probe
Microscopy • 3D Optical
Microscopy • Stylus Profilometry
• Tribology and Mechanical Testing
Introductions Bruker Stylus and Optical Metrology
1/23/2014 4 Bruker Confidential
• Technology Leadership • 60+ Patents • 3 R&D 100 Awards • 6 Photonics Circle of
Excellence Awards
• Manufacturing Excellence
• Lean, six sigma-based process • >100 systems/quarter
capacity • Rapid production ramp
capability
Bruker NSD SOM is part of Bruker Materials (BMAT), a division of Bruker
Introductions Speaker
Matt Novak, Ph.D. Director, Technology and Applications Stylus and Optical Metrology [email protected]
• Joined Bruker 2011 (approaching 3 years)
• Industry experience (~17 years) optical engineering, fabrication and metrology
• Earned Ph.D. working in private sector metrology capital equipment (instrument design/assembly/test)
1/23/2014 5 Bruker Confidential
• Those with need for stylus profilometry on 300mm samples will see capabilities of DektakXTL to meet these needs
• Those looking for quality metrology instruments to monitor steps or traces from nm to µm scales with accuracy and repeatability
• Those who are unfamiliar with stylus
profilometry will gain an understanding of this powerful technique for measurement
• Those already familiar with stylus profilometry – will be introduced to new and enhanced features of DektakXTL
Who Will Benefit? Intended Webinar Audience
1/23/2014 6 Bruker Confidential
• Be aware of capabilities available from Bruker for stylus metrology - 300 mm+ substrates and wafers
• Understand DektakXTL’s advantages and built in functionality which make it a great benefit to users in QA/QC inspection for large panels/300 mm wafers
• Have insights into applications that can be addressed via automation or other easy analysis tools for DektakXTL
Key Value from Webinar After the Presentation You Will…
1/23/2014 7 Bruker Confidential
Outline
1/23/2014 8 Bruker Confidential
• Introductions
• Brief overview of stylus profiler function • Introduction of new and enhanced functionality with
DektakXTL
• Overview of a few applications
• Summary
What is Stylus Profilometry? Tactile 2D metrology
Three main elements • Scan Head • Electronics • PC Interface
• Scan Head • Stylus and LVDT core attached
to tower/bridge • Positioned stably over
mechanical stage (RΘ or XY)
• Electronics • Control force, approach along
z axis
• PC Interface • Acquire primary profile data • Perform analysis
© Copyright Bruker Corporation. All rights reserved
Drawing of main elements of system
What is Stylus Profilometry? Metrology Capabilities for DektakXTL!
Stylus Profilometry Offers…
• Excellent measurement repeatability on steps
• Measure thin film steps below 50Å (5nm)
• Thin transparent films or dissimilar optical characteristics
• Long scan measurements up to 300mm to analyze thin film stress on wafers
• Ease of use (fast, simple, step heights)
• Lower cost, long life, durable and upgradeable relative to other inspection systems
© Copyright Bruker Corporation. All rights reserved
1nm Step Height Measurement
Why Dektak? Dektak - Industry Standard
1/23/2014 11 Bruker Confidential
Outline
1/23/2014 12 Bruker Confidential
• Introductions
• Brief overview of stylus profiler function • Introduction of new and enhanced functionality with
DektakXTL
• Overview of a few applications
• Summary
Dektak XTL Technological Advances Stable Metrology, Easy to Use
13
Designed for QA/QC environments
• Low noise floor achieved with Single-Arch design - increased stability
• Integrated vibration isolation table for most stable metrology
• 300mm encoded XY stage for accessing large sample areas with superior accuracy
• Environmental enclosure - ESD compliant with interlocked door for safe, easy sample loading
• Light tower and alarm allows status observation by operator at a distance
All With Dektak Known Quality Step Height Repeatability Better Than
0.5 nm!
© Copyright Bruker Corporation. All rights reserved
Built-In Vibration Isolation
Ergonomic Design
Wide, Interlocked door for safe and easy sample loading
DXTL-W Configuration
Dektak XTL Configurations Wafer or Panel Platforms Suit Various Needs
Dektak XTL-W 200 & 300mm Wafer Solution
• Vacuum chuck • 300mm Encoded XY Stage • Automated Theta • Dual Cameras
Dektak XTL-P Panel Solution
• 350mm panel fixture • 300mm Encoded XY Stage • Dual Cameras
• Configurations optimized to meet different application requirements
14 © Copyright Bruker Corporation. All rights reserved
Quick & Easy Scan Setup & Review
Double-Click in either live video display to quickly and easily go to sample measurement locations. Streamlines setup for automation as well as discrete measurements
Side View + Top Down Cameras Configurable display - user may swap images, move 2nd view to any corner and resize.
• Setup controls organized in a single window with logical workflow
• Measurement setup is even faster with the new Dual Video Control™
Dektak XTL Features for Ease of Use 300 mm + samples, easy control and setup!
• Flexible setup • COR saved to recipe for specific parts • COR taught for each sample type
• CMP for different samples – check center for different sizes
Set-up is easy! • Place Wafer on vacuum chuck • Drive to edge or feature • GUI automatically rotates theta a
predetermined number of times to set the COR
• Prompts for operator to drive the stage to align sample between moves make set up straightforward
1/23/2014 16
Dektak XTL Features for Ease of Use Center of Rotation Wizard
• Select 2 points • Software automatically
aligns points to the scan stage for easy measurement
1/23/2014 17 Bruker Confidential
Dektak XTL Features for Ease of Use Make Horizontal Wizard
• Point and click to teach 2D SCAN start location and length with a single mouse click and release
• Use “flexible rectangle” to draw box around area to map
• Single mouse click and release to scan and capture primary profile
1/23/2014 18 Bruker Confidential
Dektak XTL Features for Ease of Use Teach Scan Length and Area Wizards
Automation Programming Enhanced Features for QA/QC Data Tracking Over 300mm Wafers
• Wafer Setup, orientation
• Link unique Vision recipes to sites
• Program detailed measurement locations via automation editor
• Prompt Vision to run a user defined executable after automation – correlation, export data
1/23/2014 19 Bruker Confidential
Automation Programming Enhanced Features for QA/QC Data Tracking Over 300mm XY, Multiple Sites
• Teach automation program? Screen shot?
• Unique measurement site names
• Site Naming
• Log site names to database for reference
• Link unique Vision recipes to sites and import positions via stage automation file
• Program Load/Unload theta Positions
1/23/2014 20 Bruker Confidential
Automated Pattern Alignment Repeatedly, Reliably ID Metrology Features over 300mm Stage Travel in XY – Supports Fiducial Search in XY or RΘ
1/23/2014 21 Bruker Confidential
Production Interface Intuitive, Push Button GUI for Streamlined Use
1/23/2014 22 Bruker Confidential
Production Interface DektakXTL Software Features for Easy Operation
Production Interface • Standard with V5.5 • Password protected • No ability to modify Vision or
Automation recipes • Operator is limited to loading and
executing Vision measurement and automation recipes
• Operator has the ability to drive the stage for manual fiducial alignment or manually driving the stage to measurement sites
Advanced Production Interface • Optional software package • Expands on Production Interface • Customizable Workflow - add any
number of processes prior to measurement sequence with operator prompts and instructions
• Data Entry Fields - prompt operator to enter process specific information
• Recipe Mapping - automatically map and load a recipe based on information entered in the data entry fields
1/23/2014 23 Bruker Confidential
Outline
1/23/2014 24 Bruker Confidential
• Introductions
• Brief overview of stylus profiler function • Introduction of new and enhanced functionality with
DektakXTL
• Overview of a few applications
• Summary
General Film + Step Applications Wafer etch depths, film steps, others..
• Microelectronics and Semiconductor devices
• Thin film coatings on glass for buildings, automobiles or aircraft
• UV or hardness coatings on eye glasses or sun glasses
• Decorative coatings on faucets and fixtures (gold plating or other precious metals)
• Paint coatings and ink thickness and finishes
• Pressure sensors for automotive or aerospace applications
25 © Copyright Bruker Corporation. All rights reserved
• Inspection of conductive streets
• Monitoring deposition process of thin film
• Laser scribing control and monitoring
• Thin film stress measurements
Flexible Solar Cell 3D Map of Silver Trace
Mono & Poly Crystalline Cells
26 © Copyright Bruker Corporation. All rights reserved
General Solar PV-Cell Applications Larger Panels on DektakXTL
Large Sample DektakXTL Applications
• Wafer Applications • Step Height for deposited thin films
(Metal Oxides, Dielectrics) • Step Height for Resists (Soft film
materials) • Etching Rate Determinations • CMP (Chemical Mechanical
Planarization) • Erosion, Dishing and Bow
• ROA
• Large Substrate Applications • Printed circuit boards
• Bumps, step height
• Window coatings • Wafer masks • Wafer chuck coatings • Polishing pads
• Glass Substrate Applications • Step Height measurement for LCD R&D • Touch Panel coating film thickness
measurements • Thin film measurements for solar coatings
1/23/2014 27 Bruker Confidential
Monitoring Thin Film Stress 300 mm Scans on DektakXTL
• Stress causes bowing or warping of substrate leading to de-lamination of layers, cracking or lithography problems
• DektakXTL enables up to 300mm scans before and after deposition to compare wafer bow caused by thin film stress
• DektakXTL software computes tensile and compressive stress, using Stoney’s equation, in MPa
28 © Copyright Bruker Corporation. All rights reserved
CMP Application Example Roll Off Amount (ROA) Monitoring
1. Scan 2. Scan stitching 3. 3D Mapping 4. New! Radial Mapping
1/23/2014 29
Roll Off Amount (ROA)
Wafer Edge
Front Bevel
Distance from Edge 0.5mm or 1mm
3mm
5mm
Semi Recommended Method M77
Can assist development of stable ROA process for CMP
ROA Measurement and Analysis DektakXTL Automation Enables According to SEMI M77
1/23/2014 30
Roll Off Amount (ROA)
Wafer Edge
Front Bevel
Distance from Edge 0.5mm or 1mm
3mm
5mm
Measure according to Semi M77 Standard • Use Step Detection to find wafer edge – Easy and automatic! • Set level points at -5mm and -3mm from wafer edge • Measure step height from -3mm to -0.5mm or -1.0mm from wafer
edge • Set measurement locations via automation
Outline
1/23/2014 31 Bruker Confidential
• Introductions
• Brief overview of stylus profiler function • Introduction of new and enhanced functionality with
DektakXTL
• Overview of a few applications
• Summary
Summary
1/23/2014 32 Bruker Confidential
• Introduction to BNS – SOM
• Brief overview of stylus profilers and function • Introduction of new and enhanced functionality with
DektakXTL for large sample setup and ease of use
• Overview of a few applications
• Questions?
© Copyright Bruker Corporation. All rights reserved.
www.bruker.com