PUBLIC Copyright © 2018 Rockwell Automation, Inc. All Rights Reserved. 1 L16 - Model Predictive Control Within the Logix Controller Lab Optimization in the Logix Chassis For Easy Deployment
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Copyright © 2018 Rockwell Automation, Inc. All Rights Reserved. 1
L16 - Model Predictive Control Within the Logix Controller Lab
Optimization in the Logix Chassis For Easy Deployment
PUBLIC Copyright © 2018 Rockwell Automation, Inc. All Rights Reserved. 2
Agenda
Course Feedback
Lab Overview – Go!
What is Model Predictive Control?
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What Makes MPC Different
We do this because it makes processors money:Higher production, yields, efficiency and product quality
SINGLE INPUT - SINGLE OUTPUT CONTROLLER
PID MPC
CONTROL BASED ON CURRENT ERROR
POOR ABILITY TO HANDLE PROCESS DELAYS, & NON-LINEARITIES
POOR ABILITY TO HANDLE DIFFERENT TYPES OF DISTURBANCES AND SETPOINT SIGNAL FORMS
POOR ABILITY TO HANDLE CONSTRAINTS
MULTIPLE INPUT - MULTIPLE OUTPUT CONTROLLERA centralized approach. All variables are simultaneously considered
PREDICTIVE CONTROLController action based on current and anticipated future PV deviations from target
COMPENSATES FOR PROCESS DELAYS & NON-LINEARITIES
OPTIMAL CONTROL FOR ALL TYPES OF DISTURBANCESAND SETPOINT SIGNAL FORMS
PREDICTIVE HANDLING OF CONSTRAINTS
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MPC Opportunities
Coating oven Distillation column Compressor Chemical reactor Boiler Furnace Dryer Drilling rig and many more
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Making Control Scheme Smarter
6
M
PID left in the scheme or direct output control
M
Trad
ition
al C
ontr
ol A
rchi
tect
ure
Easier to design and maintain
Arch
itect
ure
with
MPC
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now
CV
MV
∆MV
1 Horizon
CVSP
MVSP
0
How a Receding Horizon Works
measuredcalculated (predicted)calculated and sent out as MV
CVConstraints
CV MVProcess
ControllerModel
CV predictionMV prediction
MPC
Setpoints
( )
( )
( )∑
∑
∑
−
=
−
=
=
∆+
−+
−=
1
0
2
1
0
2
1
2
)(
)()(
)()(
Horizon
kMoveSupp
Horizon
kSPCoef
Horizon
kSPCoef
kMVMV
kMVkMVMV
kCVkCVCVJ
The Task: Minimize J by calculating MV over the Horizon
0
1 Horizon0
Horizon0 1
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PID Versus MPC Variables
CVCVSP
MVSP
DVDV
MV
CV
unmeasured disturbance
MPCProcess
PVSP CV
PV
unmeasured disturbance
PIDProcess
CV – Controlled (Process) Variables: objective and/or constraints
MV – Manipulated Variables: PID targets or outputs that MPC adjusts to meet objectives
DV – Disturbance Variables: affects CVs, but is independent of controller
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• Design the MPC Application:• Controlled Variables: What are we trying to do better, what is in the way/limits this today?• Manipulated Variables: What can we adjust to affect this result today?• Disturbance Variables: What do you watch out for that causes/forecasts a change?
• Perform Plant Testing (set up trends/logs for above variables)• Individually step each MV and DV (as possible) within safe limits to see changes in CVs
• Develop MPC models based on identification of above data• Develop any calculations necessary to support MPC goals• Implement/integrate and test application, train operators and turn-on!
Measure improvement!
A MPC Project
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MPC in Integrated Architecture®
10
FactoryTalk® ProductionCentre®, FactoryTalk® Historian, Pavilion® Real-Time Optimization™ software…
Pavilion8® MPC, Software CEM®, VOA®, Asset Management, …Rockwell Software® Studio 5000® environment,PlantPAx® MPCBuilder, PlantPAx® ModelBuilder
• PlantPAx® MPC• IMC,CC,MMC• FuzzyLogic• Soft Sensor® (AOI)• PID,PIDE• Motion• Discrete
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PlantPAx® MPC Lab Setup
Controller 1756-MPC Module with firmware
Lab Files:
Oven.ACD
OvenDataSet.CSV
Oven_ModelReady.mpc
Oven_SimulationReady.mpc
Oven_ExportReady.mpc
0 1 2
• PlantPAx® MPCBuilder
• Studio 5000® environment
• RSLinx® Classic
• FactoryTalk® View SE Client
192.168.1.112
192.168.1.113
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Dynamic Identification
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Combustion Gas Suction
MV0
DV3
CV0Oven_Temp
CV1Oven_Press
Ambient_Temp
MV1
HeatingChamber
rpm constantCombustion gas circulation
Atmospheric pressure (constant)
Curing Oven MPC – 2 MVs, 4DVs, 2CVs
Metal strip DV2
Combustion gas exhaust
Metal stripHot air inlets Suction flow
Pressure(constant)
DV2
DV1
MV0
MV1
DV0
CV1
Air_Flap_Valve
Gas_Valve
Suction_Flow
Hot_Air_Temp
Hot_Air_Press
Oven_Temp
Oven_PressAmbient_Temp
DV3
CV0
Hot Air Supply
Gas Supply
Hot_Air_Temp
Hot_Air_PressDV0DV1 Air_Flap_Valve
Gas_Valve
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MPC Configuration & Settings
Oven
DV2
DV1
MV0
MV1
DV0
CV1
Air_Flap_Valve
Gas _Valve
Suction_Flow
Hot_Air_Press
Hot_Air_Temp
Oven_Temp
Oven_PressAmbient_Temp
DV3
CV0310 °C
340 °C
60 50 260 s
2 °C/s
21 65
max -1 Pa
min -20 Pa
≤ 100%
0%
100%
0%
max 600 °Cmin 550 °C
max 250 Pamin 200 Pa
max 40 °Cmin 27 °C
max 0.3 m3/smin 0.2 m3/s
keep pressure within limits
track temperature setpoint
OversampleDT – MPC frequency 0.5 seconds
SPValueReq - TrueSPProg 0% ROC 10%/sScale 100%
ROC 10%/sScale 100%
SPTrajectoryReq - TrueCoef 100Scale 100 °C
ZoneReq - TrueCoef 10Scale 10 Pa
CVSPTrajectory0 s 310 °C6 s 310 °C
21 s 340 °C50 s 340 °C65 s 310 °C
260 s 310 °C
ZoneHiLimit -1 PaZoneLoLimit -20 PaDV2
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Do Not Skip Faceplates
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PlantPAx® MPC Configuration Faceplates MPC Step Test AOI MPC Model Quality AOI MPC Control Status AOI
PP MPC Process Library AcceleratorsTrack 2 AOI and Faceplates: if you have already completed Track 1
PlantPAx® MPC Faceplates
PlantPAx® MPC Status
PlantPAx® MPC Step Test SupportPlantPAx® MPC Model Quality
www.rockwellautomation.com
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Thank You!