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IS 15422 (2003): Geometrical Product Specifications (GPS) -Surface Texture: Profile Method - Motif Parameters [PGD 25:Engineering Metrology]

IS 15422:2003M) 12085:1996

iF51-s$FT-wG-fa-4mt3mIndian Standard

GEOIVIETRICAL PRODUCT SPECIFICATIONS(GPS)SURFACE TEXTURE: PROFILE lVIETHOD

I tHSMOTIF PARAIvIE--- -

ICS 17.040.20

(3 B!S 2003BUREAU OF INDIAN STANDARDSMANAK BHAVAN, 9 BAHADUR SHAH ZAFAR MARG

NEW DELHI 110002

December 2003 Price Group 8

Engineering Metrology Sectional Committee, BP 25

NATIONAL FOREWORD

This Indian Standard which is identical with ISO 12085:1996 Geometrical Product Specification (GPS) Surface texture: Profile method Motif parameters issued by the International Organization forStandardization (ISO) was adopted by the Bureau of Indian Standards on the recommendations of theEngineering Metrology Sectional Committee and approval of the Basic and Production Engineering DivisionCouncil.

This standard defines terms and parameters used for determining surface texture by the motif method. Italso describes the corresponding ideal operator and measuring conditions. The approach described inthis standard facilitates the determining roughness and waviness parameters from the primary profile byfinding those motifs that characterize the surface under consideration. This method is independent ofany profile filter and results in parameters which are based on the depth and spacing of the motifs.

The text of the ISO Standard has been approved as suitable for publication as an Indian Standard withoutdeviations. In this adopted standard certain conventions are, however, not identical to those used inIndian Standards. Attention is particularly drawn to the following:

a) Wherever the words International Standard appear referring to this standard, they shouldbe read as Indian Standard.

b) Comma (,) has been used as a decimal marker in the International Standards, while inInaian Standards, the current practice is to use a point (.) as the decimal marker.

Technical Corrigendum 1 to the above International Standard has been incorporated.

In this adopted standard, reference appears to certain International Standards for which Indian Standardsalso exist. The corresponding Indian Standards which are to be substituted in their places are listedbelow along with their degree of equivalence for the editions indicated:

international Standard

ISO 1302 : 1992 Technicaldrawings Method of indicatingsurface texture

ISO 3274 : 1996 GeometricalProduct Specifications (GPS) Surtace texture : Profile method Nominal characteristics ofcontact (stylus) instrumentsISO 4287 : 1996 GeometricalProduct Specifications (GPS) Surface texture: Profile method Terms, definitions and parametersof surface texture

ISO 4288 : 1996 GeometricalProduct Specifications (GPS) Surface texture: Profile method Rules and procedures for theassessment of surface texture

Corresponding Indian Standard

IS 10719 : 1983 Method of indicatingsurface texture on technical drawings

IS 15261 : 2002 Geometrical ProductSpecifications (GPS) Surface texture :Profile method Nominal characteristics ofcontact (stylus) instruments

IS 15262 : 2002 Geometrical ProductSpecifications (GPS) Surface textu~e :Profile methodTerms, definitions andsurface texture parameters

IS 15263 : 2002 Geometrical ProductSpecifications (GPS) Surface texture :Profile method Rules and procedures forthe assessment of surface texture

Degree ofEquivalence

Identical withISO 1302:1978

Identical

do

do

IS 15422:2003ISO 12085:1996

1 Scope

This International Standard defines terms and parameters used for determining surface texture by the motifmethod. it also describes the corresponding ideal operator and measuring conditions.

2 Normative references

The following standards contain provisions which, through reference in this text, constitute provisions of this inter-national Standard. At the time of publication, the editions indicated were valid. All standards are subject to revision,and parties to agreements based on this International Standard are encouraged to investigate the possibility of ap-plying the most recent editions of the standards indicated below. Members of IEC and ISO maintain registers ofcurrently valid International Standards.

ISO 1302:1992, Technical drawings Method of indicating surface texture.

ISO 3274:1996, Geometrical Product Specifications (GPS) Surface texture: Profile method Nominal character-istics of contact (stylus) instruments.

iS0 4287:1997, Geometrical product specifications (GPS) Surface texture.. Profile method Terms, definitionsand parameters of surface texture.

ISO 4288:1996, Geometrical Product Specifications (GPS) Surface texture: Profile method Rules and pro-cedtires for the assessment of surface texture.

3 Definitions

For the purposes of this International Standard the following definitions apply.

3.1 General definitions

3.1.1 surface profile: (See ISO 4287.)

3.1.2 primary profile (See ISO 3274.)

IS 15422 :200~ISO 12085:1996

3.1.3 local peak of profile: A part of a profile between two adjacent minima of the profile (see figure 1).

- Local peak of the profile/

Figure 1 Localpeak of profile

3.1.4 localvalley of profile: A part of a profile between two adjacent maxima of the profile (see figure 2).

I Local valley of the profile

Figure 2 Localvalley of profile

3.1.5 motif: A portion of the primary profile between the highest points of two local peaks of the profile, whichare not necessarily adjacent.

A motif is characterized by (see figures 3 and 5):

its length, ARi or AWi, measured parallel to the general direction of the profile; its two depths, Hi and Hi+ 1, or HWj and HWj+ I, measured perpendicular to the 9eneral direction of the PrimarY

profile; its T characteristic, that is the smallest depth between the two depths.

T= MINIH,:H,.,1here: T = H,. ,

Figure 3 Roughness motif

3.1.6 roughness motif: Motif derived by using the ideal operator with limit value A (see figure 3).NOTE 1 By this definition, a roughness motif has a length Al/j smaller than or equal to A.

2

IS 15422:2003ISO 12085:1996

3.1.7 upper envelope line of the primary profi-le(waviness profile): Straight lines joining the highest points ofpeaks of the primary profile, after conventional discrimination of peaks (see figure 4),

r

Upper enve[ope line

Figure 4 Upper envelope line

3.1.8 waviness motif Motif derived on the upper envelope line by using the ideal operator with limit value B (seefigure 5).

..

Upper envelope line .? ?

.

(JA W,

T =MINIHw,: Hw, .,]here: T = Hwj. ,

Figure 5 Waviness motif

3.2 Parameter definitions

3.2.1 mean spacing of roughness motifs, AR: The arithmetical mean value of the lengths ARi of roughness mo-tifs, within the evaluation length (see figure 6), i.e.

AR=~~ARin,

,=1

where n is the number of roughness motifs (equal to the number of ARi values).

3.2.2 mean depth of roughness motifs, R: The arithmetical mean value of the depths Hj of roughness motifs,within the evaluation length (see figure 6), i.e.

R.+Hjm j=l

where m is the number of Hj values

NOTE 2 The number of Hj values is twice the number of ARi values (m = 2n)

3.2.3 maximum depth of profileirregularity, Rx: The largest depth, Hj, within the evaluation length.

EXAMPLE

On figure 6: Rx = H3,

3

IS 15422:2003ISO 12085:1996

Figure 6 Roughness parameters

3.2.4 mean spacing of waviness motifs, AIW The arithmetical mean value of the lengths AWi of waviness mo-tifs, within the evaluation length (see figure 7), i.e.

AW=~~AWin id

where n is the number of waviness motifs (equal to the number of AWi values).

3.2.5 mean depth of waviness motifs, w The arithmetical mean value of the depths HWj of waviness motifs,within the evaluation length (see figure 7), i.e.

W=~~ Hwjm j=l

where m is the number of Hwj values:

NOTE 3 The number of Hwj values is twice the number of AWi values (m = 2rz).

3.2.6 maximum depth of waviness, Wx: The largest depth Hwj, within the evaluation length (see figure 7)

3.2.7 total depth of waviness, Wte: The distance, measured in a direction perpendicular to the general directionof the primary profile, between the highest point and the lowest point of the upper envelope line of the primaryprofile (see figure 7).

z

2,5 @ IL-.---xS00pm

4

Figure 7 Waviness parameters

IS 15422:2003ISO 12085:1996

4 Theoretically exact operator of the motif method

4.1 Generai

This clause describes the identification conditions of motifs (length and depth discrimination) and presents theprocess for calculating roughness and waviness parameters.

4.2 Conventions! limits of motifs

The recommended values for limits A and B as described in figure 8 are given under clause 5.

0. spacing s ,4L4

.a) Roughness mctlfs b) Waviness motifs

Figure 8 Conventional limits of motifs

4.3 Depth discrimination

The depth discri,nination applies to the primary profile for the assessment of surface roughness.

4.3.1 Discrimination based on minimum depth

Divide the primary profile into sections of width A/2, and take the height of each rectangle.

The local peaks taken into account are those whose depth is larger than 5 % of the mean height of these rec-tangles (see figure 9).

~Local peak retained L-- Local peak reJected L- Height Of this rectan91e{example) (example)

z

!- XFigure 9 Depth discrimination

5

IS 15422:2003ISO 12085:1996

4.3.2 Discrimination based on maximum depth

For the roughness motifs the depths of which are Hjt the value ~j (mean value of Hj) and ~Hj (standard devi-

ation) are calculated. Any depth of local peak or valley the value of which is larger than H = Hj + 1,65 ~Hj, is lev-elled equal to the H value (see figure 10).NOTE 4 If the distribution of Hj is Gaussian, this condition concerns 5 V. of the peaks and valleys, This discrimination obviatesthe risk of high isolated peaks Interfering with the envelope line,

~-

1fI!1

t

x

Figure 10 Discrimination based on maximum depth

6

IS 15422:2003!S0 12085:1996

(Blank page)

IS 15422:2003ISO 12085: 1996

4.4 Identification of roughness and waviness motifs through the combination of motifs

(These four conditions are related to figure 11.) In figure 11, R stands for roughness and W for waviness.

I Envelope condition

The first condition retains peaks, which are higher than one of the adjacent peaks.

II Length condition

The second condition limits the length of motif to the A value (conventional limit between roughness and waviness)or the B value (conventional limit between waviness and residual form!, as defined in 4.2 and 5.2.

Ill Enlargement condition

The third condition eliminates the smallest peaks, by trying to find the largest motif possible.

It does not allow the combining of two motifs into one motif, longer than the two original ones, if it results in a mo-tif the T characteristic of which is smaller than one of the two original motifs.(It eliminates small peaks which are inserted between large peaks.)

IV Similar depth condition

The fourth condition limits combination of motifs with similar depths, particularly for periodical surfaces.(It avoids eliminating peaks the depth of which is similar to adjacent peaks.)

The combination algorithm shall be applied until no further combination can be accomplished

8

IS 15422:2003ISO 12085:1996

E NOcombination Condltlons Possible combinationI I

P,

P?PJ

& I--_______;

P,. P2and P3

.

Aor BI

AR; .,

\ ,LJ

/ AR, or ~

or Ai#, .ql

/ AWjL-_---__;

(AR, +ARj.,). A(for R)(A W,+ AW, .,). B(for W)

;L;T, LT2 ,L--- ___a TT. T,or T2

I Examination of motif i andmotif i + 1 III

Condltlon I

I Common peak z one ofthe adjacent peaks I4 YES

NO YES

1

I

Condition Ill

Enlargement of the Tcharacteristic of both motifs

No YES

+

1One of the depths s 60 % ofthe T characteristic of themotif under considerationH,. ,and H,.2.60%T(for R) IHw,,, and Hw,.2 .60A T(for W)

NO YES

~

Test if one other motif is available

L

NO

mPJ.P,P2 ,---_______JP,5P70r P3

, Aor B

AR,+,IARj I

;@-or

Iorl AWi.,IAW, I_______ J

(ARi+Af?j .q)s A(for R)(A Wi+AWj.,ls8(for W)

IIT! ~d T2 \: T,1--- _____lT ? T, and T2Hj+, or Hj+z=60%T(for R)Hw,., or Hwj.2s60%T(for W)

I

Combine the two motifs and testif two other motifs are availab~e It I

NO] YES

End of this combination sequence

Figure 11 Combination of motifs

IS 15422:2003ISO 12085:1996

4.5 Procedure for parameter calculation

Primary profileI

v [Figure 12 a)]Elimination of small local peaks

1

Iv

Seeking all peaks and valleys which define individual roughness motifs

w

Combination of individual roughness motifs two by two over the whole profile, in order to find motifs as large aspossible which comply with the four conditions [Figure 12 b)]

.

I Calculation of RX3) [Figure 12 c)]

+

Correction of individual peaks and valleys the depth of which is greater than H = =j + 1,65~HjThese depths are levelled equal to H

*

[ Calculation of R and AR 1,3, II

Corrected upper envelope line [Figure 12 d)]I

*

On this line: seeking all peaks and valleys which define individual waviness motifsI

Iv

Combination of individual waviness motifs two by two, in order to find motifs as large as possible which complywith the four conditions

T

calculation of W,A W2) WX and Wt. 3, [Figure 12 e)]

1) R and AR parameters are calculated for at least three motifs.2) W and AW parameters are calculated for at least three motifs,3) If there are less than three motifs, RX, m Wx, is calculated.

10

IS 15422:2003ISO 12085:1996

zI 1 Combination

L.- 1 of motifs2 pm x500 ~m

~@

).;+;r.,**.

5W.

a) Primary prdila

A

Primary profile

Roughness peaks \

.

Roughness motifs

Roughness valleysb) Roughness motifs superimposed on primary profile

.,

i ;

d/

11

-.

i- Calculation of Hj and AR;C) Roughnaas motifs

1Corrected upper envelope line

.=

d) Wavineas profila superimposed on primary profile

~

Waviness peak

I$. r

Waviness motifs Corrected upperenvelope line

Waviness valley

e) Waviness motifs superimposed on waviness profile

Figure 12 Illustration of procedure for parameter calculation

11

IS 15422:2003ISO 12085:1996

5 Measuring conditions of parameters

5.1 Convention concerning traversing the primary profile

In order to calculate waviness parameters, the primary profile shall be measured relative to a reference guide (seeISO 3274).

5.2 Recommended measurement conditions

The recommended measurement conditions (see ISO 3274) are stated in table 1.

Table 1

Traversing Evaluation MaximumstylusAl) El) length length as tip raclhsmm mm mm mm .~m pm

0,02 0,1 0,64 0,64 2,5 2 & 0,50,1 0,5 3,2 3,2 2,5 2 k 0,50,5 2,5 16 16 8 5*1

2,5 12,5 80 80 25 10*2

1) If not otherwise specified, the default values shall be A = 0,5 mm and B = 2,5 mm, respectively.

5.3 Profile quantization step

The parameters covered by this standard are only valid if the primary profile contains a minimum of 150 verticalquantization steps.

5.4 Rule for acceptance

The 16 ?4. rule given in ISO 4288 applies for motif parameters.

5.5 Use of motifs method for analysis of multiprocess surfaces

The corrected upper envelope line can be used as an alternative to the filter defined in ISO 13565-1, for the as-sessment of parameters Rk, Rpk and Rvk defined in ISO 13565-2. In this case, these parameters are named Rke,Rpke and Rvke.

5.6 Indications on the drawings

The motif parameters are specified on the drawings according to ISO 1302.

12

IS 15422:2003ISO 12085:1996

Annex A(normative)

Calculationmethod for combination of motifs

lnorder tohavereproducible results with existing apparatus, the method of calculation given inA.1 to A.3shalibeapplied in the software (see figure Al).

A.1 Profile decomposition in segments, the length of which is smaller than or equalto A for roughness and B for waviness (A and B values in 5,2)

Find two peaks Pi, Pi+ 1 satisfying the folIowing conditions:

the horizontal distance between these two peaks is maximum;

this horizontal distance is smaller than or equal to A or B (see table 1); there is no peak between them, higher than either of them.

The part of the profile comprised between these two peaks is called segment.

A.2 Motif combination inside eachsegment

Inside each segment, the three conditions 1, Ill, IV of 4,4 are successively tested on each pair of motifs. The com-bination of two individual motifs is only possible if these three conditions are fulfilled.

For condition IV, the minimum (Ffj + 1, Hj + z) is compared to 60 O/. of the vertical reference T of the segment(T= minimum of the two heights hl, hz of the segment) and not to that of the possible combined motif.

When all individual motifs inside the segment have been successively tested, the combination operation is per-formed again from the beginning of the segment until no combination is possible inside this segment,

The following segments are then examined in the same manner

A.3 Combination over the whole profile

All motifs resulting from the previous step are combined two by two over the whole profile. For each pair of motifs,the conditions I, 11,Ill, IV are successively tested. The two considered motifs are combined only if these four con-cfkions are fulfilled. For condition IV, the vertical characteristic T is the minimum of the two heights of the possiblecombined motif considered.

When all motifs of the profile are successively tested, the combination operation is performed again from the be-ginning of the profile until no combination is possible.

13

IS 15422:2003ISO 12085: 1996

A.4 Summary of the calculationmethod for combination of motifs

Decomposition of profile into segments(width s A for roughness and width s B for waviness)

I

Motif combination inside each segmentTest of conditions 1, Ill, IV

I

J

I Motif combination over the whole profileTest of conditions 1, 11,Ill, IV I

14

IS 15422:2003ISO 12085:1996

Profile decompositionin segments

Motif combinationinside segments

[ombinatlon over thewhole profile

X Eliminated peak(conditions 1, II, III, IVfultilled)

.,

\ II

Eliminated peak

rkfl-L-

. .

I v IPeak preserved(condition IV) /m/ ll\

Eliminated oeak Y \.1 A Eliminated oeak - I

w /(7L v

Peak preserved

I(conditions I and 11) (condition W)

End of possiblecombinations

O Peaks pceserved End of tests

Figure A.1 Combination of motifs

IS 15422:2003ISO 12085:1996

Annex B(informative)

Relation between motif parameters and function of surfaces

Table B.1 gives, for information, the motif parameters which can be specified according to the function of surfaces.

Tabl B.1

Parameters IFunctionsarmlied

Roughness Waviness Primaryprofile profile profile

R Rx AR w Wx Wte AW Pt P&

l < 0,8R o ll o l ol s 0,3R l o 00 0 0 0 ll o 0l o 0 ==0,6R l o

0 l < 0,6R l

o l CR o 0

0 l CR l

o l

l o0 0 l lo l o 0l l

o 0l s 2R ll

IS 15422:2003ISO 12085:1996

Annex C(informative)

to the GPS matrix model

For full details about the GPS matrix model, see lSO/TR 14638,

C.1 -Information about the standard and its use

This International Standard defines roughness and waviness parameters which are complementary to the profilemethod parameters defined in ISO 4287. They can be used when the peaks of the surface are important for thefunction of the surface.

NOTE 5 The conversion from the profile method parameters to the motif parameters and vice versa is not, in general, poss-ible,

C.2 Position in the GPS matrix model

This International Standard is a general GPS standard, which influences chain links 2, 3 and 4 of the chain of stan-dards on roughness profile and waviness profile in the general GPS matrix, as graphically illustrated in figure C.1.

Fundamental

GPS

standards

GlobalGPS standards

GeneralGPS matrix

Chainlinknumber I 1!2]3] 41516 1SizeDistanceRadiusAngleForm of line independent of datumForm of line dependent on datum 1 I I IForm of surface mdeoendent of datum I IForm of surface dependent on datumOrientationLocationCircular run-out

I Total run-out 1111111\Datums IRoughness profileWaviness profilePrimary profileSurface defectsEdges

Figure C.1

C.3 Related International Standards

The related International Standards are those of the chains of standards indicated in figure C.1.

17

IS 15422:2003ISO 12085:1996

Annex D(informative)

Bibliography

[1] 1S013565-1:1996, Geornetrica/ Product Specifications (G/?S) Surface texture: Profile method Surfaceshaving stratified functional properties Part 1: Filtering and general measurement conditions.

[21 ISO 13565-2:1996, Geometrical Product Specifications (GPS) Surface texture: Profile method Surfaceshaving stratified functional properties Part 2: Height characterization using the linear material ratio curve.

[3] lSO/TR 14638:1995, Geometrical Product Specification (GPS) Masterplan.

[4] V/M /nternationa/ vocabulary of basic and genera/ terms in metrology. BIPM, IEC, IFCC, ISO, IUPAC, IUPAP,OIML, 2nd edition, 1993.

18

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This Indian Standard has been developed from DOC: No. 6P 25 (021 4).

Amendments Issued Since Publication

Amend No. Date of Issue Text Affected

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