Instrumentation January 22-25, 2002 San Diego, California, U.S.A IFPAC SM 2002 Sixteenth International Forum Process Analytical Chemistry SM Surface Mount Technology for Surface Mount Technology for Process Analytic Sampling Systems Process Analytic Sampling Systems Update 2002 Update 2002 Steve Doe, Parker Hannifin Corporation Steve Doe, Parker Hannifin Corporation
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Instrumentation January 22-25, 2002 San Diego, California, U.S.A IFPAC SM 2002 Sixteenth International Forum Process Analytical Chemistry SM Surface Mount.
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InstrumentationJanuary 22-25, 2002
San Diego, California, U.S.A
IFPACSM 2002Sixteenth International Forum Process
Analytical ChemistrySM
Surface Mount Technology for Surface Mount Technology for Process Analytic Sampling Systems Process Analytic Sampling Systems
Update 2002Update 2002
Steve Doe, Parker Hannifin CorporationSteve Doe, Parker Hannifin Corporation
Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002
Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002
COMMON
NORMALLY CLOSED
NORMALLY OPEN
AIR
3-WAY R-max
FILTER
(1.5 CR)
H2O CELL
(1.5 CR)
FLOW CONTROLLERWITH EXTERNAL NEEDLE VALVE
UPSTREAM REFERENCE
(2.5 CL)
DOME
DOME
BPR-4000
(2.5 CL)
BACK PRESSURE REGULATOR
123
3L45
IR-4000
(2.5 CR)
PRESSURE REGULATOR
3R45
123
4 3R
33R4
a123
ANALYZERCELL
METERING VALVE1.5" SUBSTRATE
123
3R45 FLOW
CONTROLLER
23
3L4
15
1
4
2
3
(2.5 C)
2
1
3
12
(2.5 CR)
4
(1.5 CL)
TEMP. SENSOR1.5" SUBSTRATE
123L
345
TEMP
a
NeSSI SYSTEMNo. 3
H20 ANALYZER
ACTUATING AIR
ASPIRATOR
ACTUATING AIR
VENT RECOVERY
ASPIRATOR
SAMPLE IN
RTN.
RETURN HDR.
IN
9
6
BY-PASS
4
TO R-max
FROM R-max
FROM R-max
3TO R-max
1½” UHP System1½” UHP System Designed for delivery of ultra high Designed for delivery of ultra high
purity gasses used in semiconductor purity gasses used in semiconductor applicationsapplications
Recommended for detection Recommended for detection thresholds in the PPB rangethresholds in the PPB range
Utilizes metallic “C” or “W” seals at Utilizes metallic “C” or “W” seals at interfaces interfaces
Systems normally incorporate welded Systems normally incorporate welded and faceseal type fittings; departure and faceseal type fittings; departure from existing petrochem technologyfrom existing petrochem technology
Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002
1111//88” UHP System” UHP System
Same features as 1½” Same features as 1½” system, only smallersystem, only smaller
Emerging as de-facto Emerging as de-facto standard based on desires standard based on desires of leading semiconductor of leading semiconductor equipment OEM equipment OEM
Cartridge heaters availableCartridge heaters available
Surface Mount Technology for Surface Mount Technology for Sample Systems: Update 2002Sample Systems: Update 2002
In full production; handle & gauge face interference’s In full production; handle & gauge face interference’s identified and in process of correctionidentified and in process of correction