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Hitachi High-Tech Science Corporation’s
FT-150 XRF for Ultra Thin Measurements (Eastern Applied Research, Inc. is responsible for the contents of this presentation.
Certain material is used with the permission of Hitachi High-Tech Science Corporation.)
Authorized Distributor;
United States and Mexico
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What is Ultra Thin?
Can be considered a layer of material ranging from fractions of a nanometer
(monolayer) to several micrometers in thickness.
Quality control of ultra thin coatings with XRF is commonly seen in the printed
circuit board industry but may also be utilized in semiconductor wafer fabrication
facilities for process control. Applications are not limited to these industries.
Benefits (may vary to application)
Flat surface
Through-put efficiencies
Uniform plating
Lead (Pb) free
Ideal soldering surfaces
Common Methods to create thin films
Electro-Plating
Immersion Coating
Vapor Deposition Methods
PVD, physical vapor deposition
CVD, chemical vapor deposition
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Common Examples
Immersion Silver
5~16 micro-inches (0.12~0.40µm)
Typical: 8~12 micro-inches (0.2~0.3µm)
ENIG (Au/Eni):
Immersion Au: 5 micro-inches (0.127µm)
Electroless Ni: 150 micro-inches (3.8µm)
ENEPIG (Au/Pd/Ni):
Au: 2 micro-inches (0.05µm) Min. Immersion Gold
Pd: 3~8 micro-inches (0.076~0.2µm) Electroless Palladium
Ni: 120~240 micro-inches (3~6µm) Electroless Nickel
On Silicon Substrates:
SiO2, AlSi, Ti, TiN, Pt, Al, and BPSG
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The Answer: FT-150
-Printed Circuit Boards (PCBs)
-Ultra Small Chips
-Wafer Bumps
-Metal Film Stacks
-Data Interconnects
-Lead Frames
The Hitachi FT-150 XRF analyzer combines industry leading detector
technology with poly-capillary optics to offer high performance and
repeatability of ultra thin film measurements.
The poly-capillary optics achieve a 30uM beam (FWHM: 17uM), allowing
for enhanced performance of ultra thin measurements in small regions.
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Analyzer Evolution
Even greater performance
from Hitachi FT-150
High performance from
Seiko SFT-9500 series
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Improved RSD%
FT9500X FT150
Avg SD RSD% Avg SD RSD%
Au (uM) 0.0129 0.00040 3.1% 0.0131 0.00016 1.3%
Pd (uM) 0.0118 0.00031 2.6% 0.0111 0.00019 1.7%
Ni (uM) 0.4940 0.00116 0.2% 0.4676 0.00047 0.1%
Standards:
Au (0.013 uM)
Pd (0.012 uM)
Ni (0.5 uM)
Cu substrate
Repeated 30 times
FT9500X FT150
Avg SD RSD% Avg SD RSD%
Au (uM) 0.0061 0.00018 2.9% 0.0062 0.00010 1.5%
Pd (uM) 0.0176 0.00058 3.3% 0.0180 0.00034 1.9%
Ni (uM) 0.9042 0.00164 0.2% 0.9045 0.00078 0.1%
Lead frames
Repeated 10 times
Note: RSD% is relative standard deviation; the absolute value of the coefficient of
variation…CV is defined as the ratio of the standard deviation to the mean.
It shows the extent of variability in relation to mean.
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FT-150 Highlights
• High Precision Measurements at Micro-Spots
• Poly-Capillary Optics
• Enhanced Visibility of Sample and Measurement Spots
• Variation of Application Capabilities
• Ease of Use, New Graphical User Interface
• Redesigned Chamber/Door for Ease of Operation
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Vortex Detector
High Performance Silicon Drift Detector (SDD): Vortex Detector
Benefits: Faster Measurement Times, Greater Resolution
Resolution compared to
predecessor (SFT9500’s)
Vortex is a registered trademark of Hitachi High-Tech Science Corporation
Registered trademark number 5184003
High Energy Resolution
High Count Rate Detector
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Poly-Capillary Optics
Poly-capillary: an optical element that works like a convex lens to focus x-rays
onto a micro spot and is composed of several thousands of glass capillary tubes.
Benefit:
Greater performance at micro-spots
(under 100uM)
Example:
Au/Pd/Ni/Cu multi-layer coatings
in circuit boards or connectors
Important to Note:
Spot size lists at 30uM,
but FWHM is 17uM
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Chamber Design
An innovative chamber door design
provides an enhanced opening
Benefits:
Enhanced sample visibility
Simple and efficient sample positioning
Easier access than competitive systems
The higher resolution camera
provides a clearer image of samples
FT150
SFT9500
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Software Functions
Newly developed software results in greater ease of use
Register various measurement methods by creating “apps”
Benefits:
Streamlined…results and conditions are
automatically saved into the database.
Secure verification and data management
Increased operator efficiency and throughput
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Three Variations
FT150 FT150H
Mo Target W Target
17 keV 30-40 keV
Max Sample:
15.7 x 11.8 x 3.9 inches (WxDxH)
Stage Travel:
15.7 x 11.8 inches (W-D)
Major Difference: Mo and W tube targets. Tungsten (W) is for when higher
excitation is required (ie Tin). Mo for when lower excitation is required (ie Gold).
FT150L
Mo Target
17keV
Max Sample:
23.6 x 23.6 x 0.78 inches (WxDxH)
Stage Travel:
11.8 x 11.8 inches (W-D)
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Specifications
Element Range Aluminum (13) to Uranium (92)
X-ray Source 45kV, (varied targets, Mo and W)
Detector Silicon Drift Detector (SDD)
X-ray Focusing Optics Poly-Capillary
Sample Observation CCD Camera, 1 million pixels
Focus Adjustment Laser focus, Auto focus
Max Sample Size, base model Two Options (see variations)
Stage Travel Two Options (see variations)
Measurement Software
Thin Film FP (5 layers, 10 elements)
Thin Film Calibration Curve Method
Qualitative Analysis
Data Process Microsoft Excel and Word
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Contact Info
FT-150 Info and Literature:
http://www.easternapplied.com/hitachi-FT150-xrf-analyzer
Contact Eastern Applied Research Inc
for literature, demonstrations, discussions:
http://www.easternapplied.com/
716-201-1115 ~ [email protected]