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1
Supplementary Information for:
Hierarchical patterns with sub-20 nm pattern fidelity via
block copolymer self-assembly and soft nanotransfer
printing
Helen Tran1,†, Harrison M. Bergman1, §, Kaia Parenti1, Arend M. van der Zande2,∥, Cory R. Dean3, Luis M. Campos1*
1Department of Chemistry, Columbia University, New York, NY, 10027. 2Department of
Mechanical Engineering, Columbia University, New York, NY, 10027. 3Department of Physics,
Columbia University, New York, NY, 10027.
Figure S1. Optical images of soft pattern-transfer printing process. (A) A film of P3HT is spin
coated on 280 nm SiO2/silicon and show next to a piece of PDMS stamp adhered to a glass slide.
Notably, the PDMS was cured in an oven for 2 days to ensure full crosslinking then subsequently
washed with toluene to ensure removal of unreacted materials. (B) The P3HT film is placed in
direct contact with the PDMS and (C) soaked in 1M KOH. (D) The P3HT film is transferred to
the PDMS after SiO2 etches and the silicon substrate detaches. (E) The P3HT film on PDMS is