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All of the products in this brochure are under export restriction. The export of these products is controlled by Japanese Foreign Exchange and Foreign Trade and International export control regime. They shall not be exported without authorization from the appropriate government authorities.
Gen 6 Plate FPD Lithography System Delivering a Resolution of 3 μm with High ProductivityThe FX-66S2 supports the production of small- and medium-sized panels from Gen 6 plates. With its high productivity and stable exposure performance, the FX-66S2 enables the high volume production of small- and medium-sized panels with a resolution of 3 μm or less (L/S).
Key Features
Multi-lens System
High Throughput
High ResolutionThe FX-66S2 achieves a high resolution of 3.0 μm (L/S).
High Overlay AccuracyOverlay accuracy is improved using simultaneous multi-point alignment with the ultraprecise stage.
Improved Exposure PerformanceThe FX-66S2 employs a variety of calibration functions developed utilizing our unique technology and provides enhanced exposure performance stability.
PerformanceFX-66S2
Resolution (L/S) 解像度(L/S) 3.0 μm (g+h+i-line)
Projection magnification 投影倍率 1:1
Overlay 重ね合わせ精度 ≦ ±0.6 μm
Maximum plate size 最大プレートサイズ 1,500 mm 1,850 mm
Takt time タクトタイム 53 sec./plateConditions: 1,500 mm 1,850 mm, 4 scans, g+h+i-line, 30 mJ/cm2
FX-66S2
100-8331 東京都千代田区丸の内3-2-3 富士ビル
www.nikon.co.jp/
100-8331 東京都千代田区有楽町1-12-1 (新有楽町ビル)
www.nikon.co.jp/
100-8331 東京都千代田区有楽町1-12-1 (新有楽町ビル)
www.nikon.co.jp/
www.nikon.com/
Fuji Bldg., 2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331, Japan
NIKON CORPORATION
www.nikon.com/
Fuji Bldg., 2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331, Japan
NIKON CORPORATION
www.nikon.com/
Fuji Bldg., 2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331, Japan
NIKON CORPORATION
http://www.nikonusa.com/
1300 Walt Whitman Road, Melville, N.Y. 11747-3064, U.S.A.phone: +1-631-547-8500; +1-800-52-NIKON (within the U.S.A. only)fax: +1-631-547-0306
NIKON INSTRUMENTS INC.
http://www.nikonusa.com/
1300 Walt Whitman Road, Melville, N.Y. 11747-3064, U.S.A.phone: +1-631-547-8500; +1-800-52-NIKON (within the U.S.A. only)fax: +1-631-547-0306
NIKON INSTRUMENTS INC.
www.nikon.com/
Fuji Bldg., 2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331, Japan
NIKON CORPORATION
www.nikon.com/
Fuji Bldg., 2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331, Japan
Gen 6 Plate FPD Lithography System Delivering a High Resolution of 1.5 μm The FX-68S supports the production of leading edge high-resolution small- and medium-sized panels from Gen 6 plates. The scanner method enables improved productivity, excellent resolution and high overlay accuracy.
Key Features
Multi-lens System
High ResolutionIn order to achieve higher resolution, we developed a new i-line projection lens and an innovative correction system that takes advantage of our multi-lens system in large plate exposure. In this correction system, the focal surface follows inclination changes in a plate. This enables the high volume production of panels with a high resolution of 1.5 μm (L/S) in Gen 6 plates.
High Overlay AccuracyThe new interferometer system for position measurement is designed to realize high overlay accuracy by enhancing measurement accuracy and position control performance.
High ThroughputWith the new projection lens and stage, the FX-68S achieves high throughput of 78 plates per hour by enabling 4-scan on a Gen 6 plate.
Improved Exposure Performance
Gen 10.5 Plate FPD Lithography Systems for High-definition Panel Production By incorporating techniques from both the FX-67S2, which is ideal for the production of small and medium-sized, high-definition panels, and the FX-86SH2, which excels in the production of TV panels, the FX-103SH/103S is optimized for manufacturing high-definition, large-sized panels and achieves a shorter takt time than our conventional Gen 10 lithography system. The FX-103SH enables a high resolution of 2.2 μm.
Key Features
Short Takt TimeIncorporating the renewed exposure sequence and calibration sequence of the conventional model, the FX-103SH/103S realizes faster and higher accuracy exposure.
High ResolutionThe FX-103SH has fully enhanced illumination and multi-lens systems, both of which use Nikon’s proprietary resolution enhancement technique, originally developed for the FX-86SH2. It also incorporates a new auto-focus system that optimally corrects the measurement errors of mask bending and plate flatness. This enables a high resolution of 2.2 μm (L/S) and a wide depth of focus.
High Overlay AccuracyThe new position measuring system achieves a high overlay accuracy of ±0.5 μm.
High ThroughputThe FX-103SH/103S achieves the high throughput of 480 plates per hour for 65-inch panels, and 322 plates per hour for 75-inch panels.
Gen 8 Plate FPD Lithography Systems for Large Panel ProductionThe FX-86SH2/86S2 incorporates techniques from both the FX-67S, which is ideal for high-definition panel production, and our Gen 10 lithography system, which supports ultra-large plates, enabling high-definition large panel production. The FX-86SH2/86S2 achieves reduced takt time compared with previous Gen 8 lithography systems. The FX-86SH2 also enables a high resolution of 2.2 μm.
Key Features
Multi-lens System
High Throughput2,200 mm × 2,500 mm plate size: 587 panels/hr (46-inch panels)
378 panels/hr (55-inch panels)
High ResolutionThe FX-86SH2 achieves a high resolution of 2.2 μm (L/S).
High Overlay AccuracyThe optimally designed measurement system, which incorporates an interferometer, has led to improved measurement stability and a high overlay accuracy of ±0.5 μm.
Improved Exposure PerformanceThe FX-86SH2/86S2 employs a variety of calibration functions developed utilizing our unique technology and provides enhanced exposure performance stability.
Gen 6 Plate FPD Lithography System Delivering a High Resolution of 2 μmThe FX-67S2 supports the production of small- and medium-sized panels from Gen 6 plates. The scanner method enables improved productivity, excellent resolution and high overlay accuracy.
Key Features
Multi-lens System
High Throughput
High ResolutionThe FX-67S2 achieves a high resolution of 2.0 μm (L/S).
High Overlay AccuracyOverlay accuracy is improved using simultaneous multi-point alignment with the ultraprecise stage.
Improved Exposure PerformanceThe FX-67S2 employs a variety of calibration functions developed utilizing our unique technology and provides enhanced exposure performance stability.
PerformanceFX-67S2
Resolution (L/S) 解像度(L/S) 2.0 μm (g+h+i-line)
Projection magnification 投影倍率 1:1
Overlay 重ね合わせ精度 ≦ ±0.5 μm
Maximum plate size 最大プレートサイズ 1,500 mm 1,850 mm
Takt time タクトタイム 57 sec./plateConditions: 1,500 mm 1,850 mm, 4 scans, g+h+i-line, 30 mJ/cm2