Lucent Technologies Proprietary New Jersey Nanotechnology New Jersey Nanotechnology Consortium Consortium 1 Fabrication of MEMS Devices: Fundamentals and State of the Art Bill Mansfield New Jersey Nanotechnology Consortium www.njnc.com Bell Labs Lucent Technology [email protected]
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Lucent Technologies Proprietary
New Jersey Nanotechnology New Jersey Nanotechnology ConsortiumConsortium
1
Fabrication of MEMS Devices:Fundamentals and State of the Art
Bill MansfieldNew Jersey Nanotechnology Consortiumwww.njnc.comBell LabsLucent [email protected]
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OUTLINE
I. MEMS Basics
II. MEMS Fabrication Fundamentals
III. MEMS Fabrication Processes and ExamplesA. Bulk Micro-machining Processes
1. Non silicon based HAR
2. Silicon based
B. Hybrid Processes
C. Surface Micro-machining Processes
D. Soft MEMS Processes
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Micro and Nano Machines:Many Different Types of Motion
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MEMS and NEMS: In-plane motion
20 µm
V
Electrostatic actuation
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1. Film Deposition
2. Lithography
3. Pattern transfer
4. Cleaning
5. Metrology
6. Chemical Mechanical Polishing
7. Structure release
MEMS FABRICATION BASICS
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MEMS FABRICATION BASICS: Deposition
1. Film stress
2. Deposited film gap fill considerations
3. Thermal budget considerations
Critical Characteristics for MEMS
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500 600 700 800 900 1000 1100
-300
-200
-100
0
100
200
580oC
615oC
550oC
Stre
ss (
MPa
)
Annealing Temperature (oC)
Controlling Stress in a single layer of poly-Si: Thermal annealing
Annealing in N2 at 1050c for 2 hours will reduce the stress to <5MPa/um
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Controlling Stress and Gradient Stress with multilayer design
Compressive
Compressive
Compressive
Tensile
Tensile
Out-of-plane Stress gradient ~ 2 Mpa/um can be reached.No annealing is needed. This also allows structural design to be customized to compressive or tensile and by varying
the layer thickness, a desired stress can be achieved.
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Film stress pattern and process dependencies
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Gap Fill Considerations
Greater thesurface mobilityof deposited atomsbetter the fill.
11111111111
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MEMS FABRICATION BASICS: Lithography
1. Wafer flatness – thick stressed films distort wafers resulting in loading and chucking problems.2. Depth of focus – thick films result in extreme topo- graphy over which fine feature resolution cannot be maintained.3. Level to level alignment – thick films can result in attenuated or no alignment mark signal compromising alignment capability.4. Resist material etch selectivity- resist materials for advanced lithography are designed for thin films pattern transfer and may not have sufficient selectivity for dry etch pattern transfer to thick films.
Critical Issues for MEMS
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0.25 um wide, 12um deep fingers, about a factor of 3 more than our initial design target in both width and depth.
Vertical Comb Drive Etch Process
MEMS FABRICATION BASICS: Pattern Transfer
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MEMS FABRICATION BASICS: Pattern Transfer
High Aspect Ratio (HAR) Deep Silicon Etching
50um wide features etched 250um deepwith standard Bosch process
50um wide features etched 240um deepwith modified Bosch process
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MEMS FABRICATION BASICS: Pattern Transfer
1. Etch Rate versus feature size2. Profile control-angle and texture3. Etch mask and etch stop layers4. Etch rate versus area considerations (loading)5. Etch uniformity
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Si Etch Rate
0.4
0.6
0.8
1
1.2
1.4
1.6
1.8
2
0 10 20 30 40 50 60
Trench width (micron)
Etch
rate
(mic
ron/
min
) 7_5_2
5_5_2
5_5_1
5_6_1
5_7_1
MEMS FABRICATION BASICS: Pattern Transfer
Etch Rate versus feature size
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Side Wall Profile
89.3
89.4
89.5
89.6
89.7
89.8
89.9
90
90.1
90.2
90.3
90.4
0 2 4 6 8 10 12
Trench width (micron)
Sid
e w
all
an
gle
(d
eg
)
7_5_2
5_5_2
5_5_1
5_6_1
5_7_1
Profile control
MEMS FABRICATION BASICS: Pattern Transfer
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substrate
Etch stoplayer
Etched features
Etch mask
Etch uniformity, etch stop layers, loading, and etch mask layers
MEMS FABRICATION BASICS: Pattern Transfer
Feature undercut
Etch residues
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MEMS FABRICATION BASICS: Pattern Transfer
Silicon sidewall – Bosch etch with resist etch mask
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Silicon Substrate
Nitride
Poly 0
1st Oxide
Poly 1
2nd Oxide
Poly 2
Metal
Multi-User MEMS Processes (MUMPS) Introduction and Design Rules, rev. 4, 7/15/96, MCNC MEMS Technology Applications Center, Research Triangle Park, NC 27709
0.6 µm Si nitride
0.5 µm Si
2 µm PSG
2 µm Si
0.75 µm PSG
1.5 µm Si 0.5 µm Au, on Cr adhesion layer
SurfaceMicromachiningProcess
MEMS FABRICATION BASICS: Chemical Mechanical Polishing
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Chemical Mechanical Polishing
Side View Top View
Slurry Feed
Carrier
Holder
Wafer
Platen
Polishing Pad
Slurry
z = oxide topographyt = polish timep = pressurev = velocityρ(x,y,z) = pattern density
KP = Preston constant
K = Constant
Oxide 2 zPad
Slurry
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Patten Density EffectsAs Deposited Topography
Oxide 2
Oxide 1
Metal
Dummy Fill Pattern
Oxide 2
Oxide 1
Metal
CMP: Global PlanarityOxide 2
Oxide 1
Metal
CMP: Local Planarity
Oxide 2
Oxide 1
Metal
Reverse Tone: Litho
Oxide 2
Oxide 1
Metal
Resist
Reverse Tone: Etch
Oxide 2
Oxide 1
Metal
CMP: Global PlanarityOxide 2
Oxide 1
Metal
Global Non-Planarity
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Layers of structural materials, sacrificial layers, and interconnects or electrodes are deposited and patterned.
The sacrificial layers are selectively removed, releasing the moving parts.
Some micromachines self-assemble during release.
MEMS FABRICATION BASICS: Release
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MEMS FABRICATION BASICS: Release
Post wet release processing usually entails rinse with DI waterthen solvent or critical CO2 dry.
* Will not attack Aluminum metallization
Structural Material Sacrificial Material Release Agent
silicon silicon dioxide Aqueos HFsilicon/germanium HF Gas
PAD Etch*
protected silicon silicon Xenon difluoride gas*
silicon/germanium germanium Hydrogen peroxide*
Germanium silicon dioxide Aqueos HFHF Gas
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Stiction after release No stiction
MEMS FABRICATION BASICS: Release
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BULK MICROMACHINING:Non-silicon High Aspect Ratio(HAR) MEMS
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LIGA Nickel High Aspect Ratio (HAR) Micromachining(Lithographie, Galvanoformung, Abformung (LIGA))
1. Electroplate into moldand remove mold material.–
X-Ray Radiation
PMMA
Gold Mask
2. Develop PMMA into mold1. Expose PMMA to Synchrotron radiation
Feature lengths and widths as small as 20um
Feature heights are from 200-300um
Aspect Ratios > 10
E. W. Becker etal., ),” Microelectron.Eng., vol. 4, pp. 35–36, 1986.
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Optical absorption of SU-8 (A) as compared to a diazo type resist system (B) and Dupont RISTON dry film (C)
* Reference: N. LaBianca, and J. Delorme, "High aspect ratio resist for thick film applications", in Proc. SPIE vol. 2438, SPIE, (1995)
22umgap,24um line feature Profiles in 290xm thick SU-8 film with non-
optimized process.
UV-LIGA High Aspect Ratio (HAR) Micro-machining
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BULK MICROMACHINING: Silicon Dry Etch Based
Bulk machined parts in 300um silicon using
Modified Bosch process.
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Lucent Lambda Router Mirrors ( Bishop etal.)
BULK MICROMACHINING: SOI
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Pattern Front-side of SOI ( Silicon on Insulator) wafer with Mirror Array Pattern:
High Throughput, High Resolution, High alignment precision step and repeat exposure tool
Siliconoxide
Silicon
Hard Mask MaterialThin resist
BULK MICROMACHINING
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Pattern Transfer Resist Pattern into Hard Mask Material with Dry Etch
Strip and clean residual resist
Siliconoxide
Silicon
BULK MICROMACHINING
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Pattern Transfer Resist Pattern into Hard Mask Material with Dry Etch
Strip and clean residual resist
Siliconoxide
Silicon
BULK MICROMACHINING
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Protective Coat Patterned Front-side
Coating can also act to balance stress forHigh yield release
Siliconoxide
Silicon
BULK MICROMACHINING
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Handle wafer thinning
Wafer wet cleaning
Backside lithography with contact printer
oxide
Silicon
Silicon
BULK MICROMACHINING
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Backside Cavity Deep Reactive Ion Etch
oxide
Silicon
Silicon
BULK MICROMACHINING
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Backside resist strip and clean
Wafer wet release in HF
Mirror Coat at Chip Scale
oxide
Silicon
Silicon
BULK MICROMACHINING
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MEMS FABRICATION BASICS: Deposition
Currently available materials ( polysilicon and single crystalSilicon) are either not possible at low temperatures.(<600C) or cannot be made low stress at low temperature. Low temperature, low stress materials such as poly Si-Ge are currently being developed but they have not been rigorously tested for reliability for long term reliability.
Critical Issues for MEMS
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• >10 degrees of continuous tilt
• 10 µm to 200 µm mirrors
• actuation voltage < 100V
• high speed
• high fill factor (0.3 µm gap btw mirrors)
• no electromechanical crosstalk
• surface-micromachined
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Angle amplification
The transmission mechanism increases work produced by the actuator:• larger area can be used
• actuator gap can be decreased,
while maintaining the required range of motion
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PolySilicon 0.5um
PolySilicon 1.0um
Mirror Metal 0.04um
Si-Rich Nitride 0.5um
Pad Metal 0.6um
Sacrificial Si Oxide 4.0um
Process Flow
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BULK MICROMACHINING:
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Overview
Superhydrophobic microfabricated surfaces
+
Electrowetting
Control droplet movement and
wetting
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Si Wafer
Oxide-protected PolySi
XeF2 Etch
Si Wafer
HF Etch
Active Membrane
Grid
Dry Release of Protected Silicon Structures
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Superhydrophobic SurfacesMobilityMobility
Joonwon Kim & “CJ” Kim (UCLA, 2002)
Sin
(α)
Droplet volume (m3)
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High mobility and super-repellency based
tunable microfluidic mixerno slip complete slip
V V
Applications: Micro and Nano-fluidics
3 µm 3 µm3 µmLiquid- solidcontact angle
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STRESS RELIEF BORDER
No Border 100um Border-100um space
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SU-8 290um thick,coded 25um gap, 22um feature
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Droplet Movement
• Electrostatic cosθf – cosθr = K(Vf
2 – Vr2) Vf
2> Vr2
•Area density cosθf – cosθr = (ff
– fr)(cosθ0 + 1) ff > fr
cosθrcosθf
dF = γLV (cosθf – cosθr)dy
f = A1 / A2
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MEMS FABRICATION
Premise: as with semiconductor fabrication the need for increasing functionality of MEMS devices in time will lead to a need for more, smaller components on individual devices. This in turn will necessitate the need for advanced fabrication equipment and processes and integration of control electronics and MEMS on a single substrate.