EV Group Europe & Asia/Pacific GmbH DI Erich Thallner Strasse 1 4782 St. Florian am Inn Austria +43 7712 5311 0 Contact [email protected] www.EVGroup.com Printed on paper from sustainable sources. Data, design and specifications may not simultaneously apply; or depend on individual equipment configuration, process conditions and materials and may vary accordingly. EVG reserves the right to change data, design and specifications without prior notice. All trademarks, logos, website addresses or equipment names are registered trademarks and/or the property of EV Group or their respective owners. © EV Group (EVG). All rights reserved. V20/01 Features ■ Fully automated UV-NIL imprinting and low-force detachment ■ Up to 300 mm substrates ■ 200 mm / 300 mm bridge-tool capability ■ Continuous mode operation ■ Single-step full-area imprint process ■ Volume manufacturing of structures down to 40* nm and smaller ■ Supports a wide range of structure sizes and shapes, including 3D ■ Applicable on high-topography (rough) surfaces *resolution dependent on process and template Introduction Automated UV Nanoimprint solution up to 300 mm, featuring EVG´s proprietary SmartNIL® technology The EVG7300 leverages EVG´s SmartNIL technology to enable mass manufacturing of micro- and nanostructures. Capable of printing nanostructures as small as 40* nm over a large area with unmatched throughput and low cost of ownership, the EVG7300 supports the production of a variety of devices and applications, including optical devices for augmented/virtual reality (AR/ VR) headsets, 3D sensors, bio-medical devices, nanophotonics and plasmonics. EVG’s SmartNIL technology has also been improved and modularized for the EVG7300 system. Together with EVG´s material expertise it provides the most advanced nanoimprint capabilities on the market featuring conformal imprinting, fast curing times with high- power lamp and smooth stamp detachment. Technical Data Wafer diameter (substrate size) 200 mm / 300 mm 150 mm / 200 mm Resolution ≤ 40* nm Supported Process SmartNIL® Exposure source High-power LED (i-line) > 400 mW/cm² Alignment ≤ ± 3 µm Stamp separation Fully Automated Mini environment and climate control Optional Working stamp fabrication Supported EVG®7300 Automated SmartNIL® UV-NIL System