EC Participants: UPS, UCAM, UMIL, UoS, SU, F ZR, LiU, MTA A ngström Participants:E .C oronel, S.V alizadeh,F.Ericson etc. M useum of N aturalH istory Participants:U .H ålenius A rrhenius Participants:G .Svensson,Terasaki Fysikum SU :S.C sillag, S.N yquist,S.W achtm eister, A.Zobelli Sam ples Sa m ple s
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EELS (electron energy loss spectroscopy): electron populations and excitations involved
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ECParticipants:
UPS, UCAM, UMIL, UoS,SU, FZR, LiU, MTA
Angström
Participants:E.Coronel,S.Valizadeh, F.Ericson etc.
Museum ofNatural History
Participants:U.Hålenius
Arrhenius
Participants:G.Svensson, Terasaki
Fysikum SU: S.Csillag,S.Nyquist,S.Wachtmeister,A.Zobelli
Samples
Samples
NETWORK SHORT TITLE: NEW FULLERENE LIKE MATERIALS
Part A - The Participants
The Principal Contractor
1. Stockholm University [SU] Sweden
The Members
2 Linköping University [LiU] Sweden 3 University of Newcastle upon Tyne [UNEW] United Kingdom4 Forschungszentrum Rossendorf [FZR] Germany5 Université Paris Sud [UPS] France6 The Chancellor, Masters and Scholars of the University of Cambridge [UCAM-DENG] United Kingdom7 Technische Universitet Dreseden [TUD] Germany8 University of Milano [UMIL] Italy9 University of Sussex [UoS] United Kingdom10 Research Institute for Technical Physics and Materials Science of the Hungarian Academy of Sciences [MTA MFA] Hungary
EELS (electron energy loss spectroscopy): electron populations and excitations involved
0 100 200 300 400 5000
0.5
1.0
1.5
2.0
2.5
Energy loss (eV)
Inte
nsity
(nb
er o
f cou
nts
x 10
6 )
600 700
x50 x106
Low lossCore loss
CK
MnL2,3
EF
unoccupiedconduction
states
1s corestates
Core loss(K edge)
250 300 400 350
CK
Energy-loss (eV)
Low loss
0 10 20 30 40Energy-loss (eV)
Plasmon mode
2p corestates
Core loss(L edge)
690630 640 650 660 670 680
c)
Energy-loss (eV)
MnL2,3
I I I I
250 300 350 400
0-
40-
(nm)
Energy Loss (eV)
Spectrum line
A
B
HADF image
20 nm
450400350300Energy Loss (eV)
EELS spectrum
AB
Specimen
Magnetic spectrometer
Field emission gun
E
E -E
o
o
CameraCCD
HADF detectors
Spectrum
Probe• 0.1 to 1nA• in 0.5 to 1 nm
Scanning coils
100 keV
0.5 to 0.8 eV1ms to 10s
The spectrum image mode
4
IntroductionIntroduction
Growing interest in FIBGrowing interest in FIB
What are the drivers of this ?What are the drivers of this ? Smaller critical dimensionsSmaller critical dimensions Fewer and smaller critical sitesFewer and smaller critical sites More reliance on TEMMore reliance on TEM Interest in micro and nano machiningInterest in micro and nano machining Greater variety of materials from: biologicalGreater variety of materials from: biological