Diffusion MSE 528 Fall 2010. Case Hardening: --Diffuse carbon atoms into the host iron atoms at the surface. --Example of interstitial diffusion is.

Diffusion

MSE 528

Fall 2010

• Case Hardening: --Diffuse carbon atoms into the host iron atoms at the surface. --Example of interstitial diffusion is a case hardened gear.

• Result: The "Case" is --hard to deform: C atoms "lock" planes from shearing. --hard to crack: C atoms put the surface in compression.

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Fig. 5.0, Callister 6e.(Fig. 5.0 iscourtesy ofSurface Division, Midland-Ross.)

PROCESSING USING DIFFUSION (1)

• Doping Silicon with P for n-type semiconductors:• Process:

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1. Deposit P rich layers on surface.

2. Heat it.

3. Result: Doped semiconductor regions.

silicon

siliconmagnified image of a computer chip

0.5mm

light regions: Si atoms

light regions: Al atoms

Fig. 18.0, Callister 6e.

PROCESSING USING DIFFUSION (2)