Device Fabrication Facilities NFFJeol JBX6300FS Direct write on wafers, high throughput, mask writing, for nanoelectronics –25, 50, 100 kV accelerating.

Device Fabrication Facilities

NFF Jeol

JBX6300FS

Direct write on wafers, high throughput, mask writing, for nanoelectronics

– 25, 50, 100 kV accelerating voltage

– 2 nm minimum spot size

– 12 MHz scanning rate

– 150 x 190 mm write area

– 0.62 nm stage movement precision

– < 25 nm stitching & overlay accuracy

MCPF e_LiNE & ionLiNE e_LiNE is a ultra high resolution electron beam lithography system and nano-engineering workstation. Key applications: Lithography on 4 inch samples; Electron beam induced deposition and etching; In-situ electrical measurements and nano-manipulation, e.g. CNT or nanorods.

ionLiNE is dedicated to ion beam nanolithography, fabrication, and engineering. Key applications: Low dose ion events; Thin film engineering; Surface fictionalization; Localized defect injection.

1. Light sources: Ar+ laser, He-Cd laser, Xe-lamp, Ti-sapphire fs laser.

2. Photoluminescence (PL), excitation PL, photoconductivity facilities.

3. Modulated photo-reflectance facilities.

4. Hamamatsu Streak Camera C5680 for time-resolved PL.

5. OI Spectro-Mag 4000 system: magnetic field up to 7T; sample temperature range from 5K to 300K.

6. OI Spectro-Mag 2000 system: magnetic field up to 14T; sample temperature range from 0.3K to 80K.

7. Closed cycle (10 - 300K) system for variable temperature transport and optical measurements.

8. LHe cryostat (2 – 300K) for variable temperature magneto-transport measurements.

9. LN2 cryostat (77 – 450K) for variable temperature magneto-transport and optical measurements.

10.Various electronic equipments for transport measurements

Laboratory Equipment List

Quantum wire resonant tunneling diode fabrication by photolithography

Structure fabricated by e-beam lithography

2 3 4 5 60.0000

0.0002

0.0004

0.0006

T=1.6K

Cur

rent

(A

)

sweep down

sweep up

10T

12T

8T

4T

B=0T

Voltage(V)

Low temperature and high magnetic field transport measurements

Low temperature magneto-photoluminescence measurements

Variable temperature magneto-transport measurements

Transport measurement facilities

Oxford Spectro-Mag 2000 system (B: 014T; T: 0.3K80K)

LHe cryostat (2 – 300K, 0 – 800mT))

Oxford Spectro-Mag 4000 system (B: 07T; T: 5K300K)

Magneto-optical measurement facilities

Spex 1403 monochromator

Closed cycle (10 - 300K) system

Hamamatsu Streak Camera

2D image including spectra and temporal information

Time

Wavelength

Electronic equipments for transport measurements