Demonstration of Sub- Rayleigh Lithography Using a Multi-Photon Absorber Heedeuk Shin, Hye Jeong Chang*, Malcolm N. O'Sullivan-Hale, Sean Bentley # , and Robert W. Boyd The Institute of Optics, University of Rochester, Rochester, NY 14627, USA * The Korean Intellectual Property Office, DaeJeon 302- 791, Korea # Department of Physics, Adelphi University, Garden City, NY sented at OSA annual meeting, October 11 th , 2006
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Demonstration of Sub-Rayleigh Lithography Using a Multi-Photon Absorber
Demonstration of Sub-Rayleigh Lithography Using a Multi-Photon Absorber. Heedeuk Shin , Hye Jeong Chang*, Malcolm N. O'Sullivan-Hale, Sean Bentley # , and Robert W. Boyd The Institute of Optics, University of Rochester, Rochester, NY 14627, USA - PowerPoint PPT Presentation
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Demonstration of Sub-Rayleigh Lithography
Using aMulti-Photon Absorber
Heedeuk Shin, Hye Jeong Chang*, Malcolm N. O'Sullivan-Hale, Sean Bentley# , and Robert W. Boyd
The Institute of Optics, University of Rochester, Rochester, NY 14627, USA* The Korean Intellectual Property Office, DaeJeon 302-791, Korea
# Department of Physics, Adelphi University, Garden City, NY
Presented at OSA annual meeting, October 11th, 2006
Motivation
Quantum lithography
Proof-of-principle experiments
Multi-photon lithographic recording material
Experimental results
Non-sinusoidal 2-D patterns
Conclusion & future work
Outline
1/16
Motivation
In optical lithography, the feature size is limited by diffraction, called the ‘Rayleigh criterion’.- Rayleigh criterion : ~ /2
Quantum lithography using an N-photon lithographic recording material & entangled light source was suggested to improve optical lithography.
We suggest PMMA as a good candidate for an N-photon lithographic material.
2/16
Advantage : high visibility is possible even with large resolution enhancement.
Recording wavelength = 800 nm Two pulses with phase shiftPulse energy = 90 J per beam Pulse duration = 120 fsRecording angle, θ = 70 degree Fundamental period λ/(2sinθ) = 425 nmPeriod of written grating = 213 nm
213 nm
10/16
Threefold enhanced resolution (M = 3)
Recording wavelength = 800 nm Three pulses with 2π/3 & 4π/3 phase shiftPulse energy = 80 J per beam Pulse duration = 120 fsRecording angle, θ = 8.9 degree Fundamental period λ/(2sinθ) = 2.6 mPeriod of written grating = 0.85 m
213 nm
2.6 m
1.67 m
0.8 m
11/16
Non-sinusoidal fringes PMMA is a 3PA at 800 nm. (N=3)
Illumination with two pulses. (M=2)
If the phase shift of the second shot is
, where ,
the interference fringe is
Numerical calculation is similar to the experimental result.
This shows the possibility of non-sinusoidal fringe patterns.
33 ))cos(1(85.0))cos(1( KxKxI
10
7
141 nm
12/16
Non-sinusoidal Patterns
Different field amplitudes on each shot can generate more general non-sinusoidal patterns.
M
m
Nmm KxAI
1
)]cos(1[
For example, if N = 3 , M = 3
A1 = 1 A2 = 0.75 A3 = 0.4
∆1 = 0∆2 = π/2∆3 = π
13/16
Two Dimensional Patterns Method can be extended into two
dimensions using four recording beams.
M
mymx
Nmymy
Nmxmx KyAKxAthicknessPattern
1,
)]cos(1[)]cos(1[
For example,N=8, M=14
14/16
Conclusion The possibility of the use of PMMA as a multi-photon
lithographic recording medium for the realization of quantum lithography.
Experimental demonstration of sub-Rayleigh resolution by means of the phase-shifted-grating method using a classical light source.
- writing fringes with a period of /4
Quantum lithography (as initially proposed by Prof. Dowling) has a good chance of becoming a reality.
Future work Higher enhanced resolution (M = 3 or more)
Build an entangled light source with the high gain optical parametric amplification.
Realization of the quantum lithography method.15/16
Acknowledgement
Supported by - the US Army Research Office through a MURI grant- the Post-doctoral Fellowship Program of Korea Science and Engineering Foundation (KOSEF) and Korea Research Foundation (KRF)
Dr. Samyon Papernov &
16/16
Thank you for your attention!
http://www.optics.rochester.edu/~boyd
Two Dimensional Patterns Experimental 2-D pattern
1)Illuminate one shot, N = 3, M = 12)Rotate the sample3)Illuminate the second shot, N = 3, M = 1