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h Background and History of Cymerh Pulse power requirements for lithography light-sourcesh High volume manufacturing requirements issuesh Survey of Cymer’s solid state pulse power
h Past, present and futureh Specificationsh Designh Lessons learned
Solid State Pulsed Power Module (SSPPM) Technology Introduced at CYMER in Early '90sh Components developed by Dan Birx Through a DARPA SBIR
Contracth Significant Advantages for Lithography Laser Over Prior
Technologyh "Infinite" Lifetime Compared to Thyratron Based Unitsh Energy Recovery of Pulse Reflected from Laser Load Increases Chamber
Lifetime Significantly (at Least ~70%)h Less Impact on Semiconductor Fab Operation (Fewer
Repairs/Replacements, No Warm-up Time Needed, etc.)h No Pre-Fires Causing Missing Pulses and Wafer Level Rework h Laser Cost of Ownership (CoO) Therefore Significantly Reduced
h First SSPPM Unit Shipped in Production Laser in 1995h ~3800 SSPPM Module Sets Manufactured Since Then
Laser Trend is Higher Rep-Rate and Power, Lower Bandwidth, Lower Cost of Operation
SSPPM Introduced Here
Lithography Lasers Highly Line Narrowed (Lots of Energy Thrown Away for Spectral Purity).Therefore, Electrical Power Increases With Bandwidth Improvements in Addition to Rep-Rate Increases.
Example at Left is KrF TrendCoc/Bp: Cost of Consumables ($) / Billion Pulses
Spectral Power: Laser Power (W) / Laser Bandwidth (pm)
A Variety of Issues Existed for Successful Volume Manufacturing of SSPPM Modulesh Design/Change Management: Detailed Documentation was
Developed:h Part Specificationsh Piece Part, Sub-Assembly, and Assembly Drawingsh Multi-Level Bills of Material (~800 Line Items)h Assy and Test Procedures for Sub-Assy and Module Levels
h Supply Chain: Procurement Had to Ramp Up With Parts / New Vendors
h Manufacturing/QA: Manufacturing Staff was Trainedh Testing: Intermediate and Final Test Stand HW was Set Uph Logistics: Worldwide Spares Distribution / Stocking was Initiated
h 1000 Hz Operationh 1.5 - 4.0 J/Pulse Initial Stored Energy on C0h 550 - 800 V Input Voltage Rangeh ~12 - 19 kV Output Voltage Rangeh 150 ns Output Voltage Risetime (5000)h 110 ns Output Voltage Risetime (5010)
5000/5010 Series SSPPMElectrical Schematic Diagram
Compression HeadCommutator
HVPS
Laser Chamberh Capacitor Charging Power Supplyh Parallel SCR Switchingh 26X (28X in 5010) Inductive Voltage Adder Transformerh 3 Stages of Magnetic Pulse Compression
5000 Timing Compensation - Customer Requires Tight Control of Throughput Delay*
h Stepper/Scanner Manufacturers Require Sync Out Signal for Their Own Diagnostics
h Trigger-to-Laser Light Must be Constant in Spite of SSPPM Operation at Different Voltages as Laser Chamber Ages
h Solution: Sample Final Charging Voltage and Insert Appropriate Proportional Delay in Low Level Electronics Prior to SCR Trigger
"Timing Compensation for an Excimer Laser Solid-State Pulsed Power Module (SSPPM)", with D. Johns, et al, IEEE Transactions on Plasma Science, Volume 28, Number 5, October 2000.
h 4000 Hz Operationh 1.5 - 5.4 J/Pulse Initial Stored Energy on C0h 750 - 1450 V Input Voltage Rangeh ~16 - 31 kV Output Voltage Rangeh 60 ns Output Voltage Risetime
Resonant Charger Technology Replaced Cap Charging Power Supply for 7000 Series SSPPM
h As Rep-Rate Increases, Inter-Pulse Time Decreasesh Significant Part of Time Required by Controller to
Calculate Voltage for Next Pulse in Constant Energy Modeh Additional Time Required for Energy Recoveryh As a Result, Time Allowed for Charging Decreasing Faster
Than Rep-Rate Increase - Cap Charger Not Effectiveh Solution - Resonant Charging and Simpler HVPS
h Pulse Charging can be Done Very Fasth HVPS Can Still Deliver Constant Power Flow to Filter Capacitor
Resulting in More Constant AC Power Draw with Fewer Harmonics
Laser Design Paradigm Occurs in 2002 at CYMER as Laser Power and BW Requirements Get Tougher
h Laser Power Traditionally Increased by Rep-Rate Increaseh However, Chamber Blower Power Increasing with Cube of
Rep-Rate (All Else Constant)h Chamber Acoustics and Tougher BW Complicating Issuesh Optics Issues and Module Lifetimes Also Not Acceptableh Solution - Two Chamber MOPA Laser
h Low Power Master Oscillator (MO) Which Produces Tight BWh High Gain Power Amplifier (PA) Which Boosts Output Power
SSPPM Systems Also Being Developed to Support EUV Lithography Light Sources
Electrodes
Insulator
Pinch
h Dense Plasma Focus Device Produces 13.5 nm Lighth SSPPM Design Conceptually Very Similar to Laser Designs
h Energy Recovery to Reduce Electrode Erosion / Improve Efficiencyh HV Power Supply and Resonant Chargingh Parallel IGBTs and Several Stages Magnetic Pulse Compressionh Inductive Voltage Adder Transformer
h 5000 Hz Operationh 15 - 21 J/Pulse Initial Stored Energy on C0h 1200 - 1400 V Input Voltage Rangeh 4 - 5 kV Output Voltage Rangeh ~30 ns Output Voltage Risetime into DPF Load