Department of Mechanical Engineering Institute of Micro- and Nanotechnologies FG Technische Optik Xinrui Cao, Prof. S. Sinzinger Phone +49 3677 69-2489 Fax +49 3677 69-1281 [email protected] www.tu-ilmenau.de/to B1- Interference lithography on curved surfaces (Lau effect for optical lithography) Theoretical and practical study on Lau effect - Optical coherence of illumination - Intensity distribution at variable grating separations - 3D filed distribution around the image plane Application of Lau effect in lithographic structuring Motivation Experimental results and lithography - Optical coherence of illumination for Lau effect The project is funded by the DFG in the framework of Research Training group „Tip and laser-based 3D-Nanofabrication in extended macroscopic working areas“ (GRK 2182/1) at the Technische Universität Ilmenau, Germany. - Intensity distribution in the image plane - 3D field distribution around the image plane - Application of Lau effect in optical lithography Fig.1: Setup of Lau effect Fig.5: Lithographic structuring (light source: UV-LED) Fig.4: Intensity distribution around the back focal plane of the Fourier lens (f=120mm) Fig.2: Intensity image under (a) spatially coherent illumination, and (b) spatially incoherent illumination Fig.3: Intensity distribution in the back focal plane of the Fourier lens (f=120mm) at variable grating separations